using particular waveforms

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CPC
H01J37/32293

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32293using particular waveforms

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Artificial diamond plasma production device
- Patent number 12,084,759
- Issue date Sep 10, 2024
- WAVE POWER TECHNOLOGY INC.
- Ming-Hsiung Tsao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,046,453
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,009,180
- Issue date Jun 11, 2024
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of power generation with phase linked solid-state...
- Patent number 11,721,526
- Issue date Aug 8, 2023
- MKS Instruments, Inc.
- Francesco Braghiroli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF power source operation in plasma enhanced processes
- Patent number 11,631,583
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Farhad Moghadam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of power generation with phase linked solid-state...
- Patent number 11,476,092
- Issue date Oct 18, 2022
- MKS Instruments, Inc.
- Kenneth Trenholm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generalized cylindrical cavity system for microwave rotation and im...
- Patent number 11,195,699
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ECR ion source and method for operating an ECR ion source
- Patent number 11,094,510
- Issue date Aug 17, 2021
- Dreebit GmbH
- Alexandra Philipp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave output device and plasma processing apparatus
- Patent number 10,971,337
- Issue date Apr 6, 2021
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,971,336
- Issue date Apr 6, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma reactor for manufacturing synthetic diamond material
- Patent number 10,734,198
- Issue date Aug 4, 2020
- Element Six Technologies Limited
- John Robert Brandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generalized cylindrical cavity system for microwave rotation and im...
- Patent number 10,340,124
- Issue date Jul 2, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method with a car...
- Patent number 10,217,612
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency surface wave plasma source
- Patent number 10,083,820
- Issue date Sep 25, 2018
- Tokyo Electron Limited
- Sergey A. Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming device, film forming method, and film forming program
- Patent number 9,972,476
- Issue date May 15, 2018
- Brother Kogyo Kabushiki Kaisha
- Kazunari Taki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dipole ring magnet assisted microwave radial line slot antenna plas...
- Patent number 9,852,893
- Issue date Dec 26, 2017
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and shower plate
- Patent number 9,663,856
- Issue date May 30, 2017
- Tokyo Electron Limited
- Shigeru Kasai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,583,314
- Issue date Feb 28, 2017
- Hitachi High-Technologies Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnetic-radiation power-supply mechanism for exciting a coa...
- Patent number 9,072,158
- Issue date Jun 30, 2015
- Tokyo Electron Limited
- Taro Ikeda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Low electron temperature microwave surface-wave plasma (SWP) proces...
- Patent number 8,968,588
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,075,733
- Issue date Dec 13, 2011
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus and plasma generation method
- Patent number 7,305,934
- Issue date Dec 11, 2007
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,071,442
- Issue date Jul 4, 2006
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma device and plasma generating method
- Patent number 6,911,617
- Issue date Jun 28, 2005
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,847,003
- Issue date Jan 25, 2005
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor using inductive RF coupling, and processes
- Patent number 6,545,420
- Issue date Apr 8, 2003
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing substrates using gaseous silicon scavenger
- Patent number 6,444,137
- Issue date Sep 3, 2002
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etch processes
- Patent number 6,251,792
- Issue date Jun 26, 2001
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon scavenger in an inductively coupled RF plasma reactor
- Patent number 5,556,501
- Issue date Sep 17, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297020
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20240222084
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240014007
- Publication date Jan 11, 2024
- Hitachi High-Tech Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARTIFICIAL DIAMOND PLASMA PRODUCTION DEVICE
- Publication number 20230220543
- Publication date Jul 13, 2023
- WAVE POWER TECHNOLOGY INC.
- Ming-Hsiung TSAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20220093364
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Power Source Operation In Plasma Enhanced Processes
- Publication number 20210125820
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Farhad Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD OF POWER GENERATION WITH PHASE LINKED SOLID-STATE...
- Publication number 20200381219
- Publication date Dec 3, 2020
- MKS Instruments, Inc.
- Kenneth Trenholm
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
ECR ION SOURCE AND METHOD FOR OPERATING AN ECR ION SOURCE
- Publication number 20200357614
- Publication date Nov 12, 2020
- Dreebit GmbH
- ALEXANDRA PHILIPP
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...
- Publication number 20190326099
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190148115
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave output device and plasma processing apparatus
- Publication number 20190057844
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180090301
- Publication date Mar 29, 2018
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...
- Publication number 20170125219
- Publication date May 4, 2017
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATE...
- Publication number 20170040145
- Publication date Feb 9, 2017
- ELEMENT SIX TECHNOLOGIES LIMITED
- JOHN ROBERT BRANDON
- C30 - CRYSTAL GROWTH
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160141151
- Publication date May 19, 2016
- Hitachi High-Technologies Corporation
- Hitoshi TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GENERATING PLASMA PULSES
- Publication number 20160093475
- Publication date Mar 31, 2016
- FORSCHUNGSVERBUND BERLIN E.V.
- Roland Gesche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING DEVICE, FILM FORMING METHOD, AND FILM FORMING PROGRAM
- Publication number 20160013023
- Publication date Jan 14, 2016
- National University Corporation Nagoya University
- Kazunari TAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND SHOWER PLATE
- Publication number 20140283747
- Publication date Sep 25, 2014
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140251541
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Toshihiko IWAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ELECTRON TEMPERATURE MICROWAVE SURFACE-WAVE PLASMA (SWP) PROCES...
- Publication number 20130256272
- Publication date Oct 3, 2013
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE EMITTING DEVICE AND SURFACE WAVE PLASMA PROCESSING APPARATUS
- Publication number 20130192760
- Publication date Aug 1, 2013
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GENERATING PLASMA PULSES
- Publication number 20130187544
- Publication date Jul 25, 2013
- FORSCHUNGSVERBUND BERLIN E.V.
- Roland Gesche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Tuning Rods in Surface Wave Antenna (SWA) Sources
- Publication number 20130084706
- Publication date Apr 4, 2013
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC-RADIATION POWER-SUPPLY MECHANISM AND MICROWAVE INTR...
- Publication number 20120299671
- Publication date Nov 29, 2012
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20120090782
- Publication date Apr 19, 2012
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System for pretreating the lumen of a catheter
- Publication number 20100174245
- Publication date Jul 8, 2010
- Ward Dean Halverson
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100043976
- Publication date Feb 25, 2010
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050173382
- Publication date Aug 11, 2005
- TOKYO ELECTRON LIMITED
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment apparatus and plasma generation method
- Publication number 20050082003
- Publication date Apr 21, 2005
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma device and plasma generating method
- Publication number 20040045672
- Publication date Mar 11, 2004
- Nobou Ishii
- H01 - BASIC ELECTRIC ELEMENTS

using particular waveforms

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Artificial diamond plasma production device

Plasma processing apparatus

Plasma processing apparatus

Cylindrical cavity with impedance shifting by irises in a power-sup...

System and method of power generation with phase linked solid-state...

RF power source operation in plasma enhanced processes

System and method of power generation with phase linked solid-state...

Generalized cylindrical cavity system for microwave rotation and im...

ECR ion source and method for operating an ECR ion source

Microwave output device and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Microwave plasma reactor for manufacturing synthetic diamond material

Generalized cylindrical cavity system for microwave rotation and im...

Plasma processing apparatus and plasma processing method with a car...

Dual-frequency surface wave plasma source

Film forming device, film forming method, and film forming program

Dipole ring magnet assisted microwave radial line slot antenna plas...

Plasma processing apparatus and shower plate

Plasma processing apparatus

Electromagnetic-radiation power-supply mechanism for exciting a coa...

Low electron temperature microwave surface-wave plasma (SWP) proces...

Plasma processing apparatus

Plasma treatment apparatus and plasma generation method

Plasma processing apparatus

Plasma device and plasma generating method

Plasma processing apparatus

Plasma reactor using inductive RF coupling, and processes

Method for processing substrates using gaseous silicon scavenger

Plasma etch processes

Silicon scavenger in an inductively coupled RF plasma reactor

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

PLASMA PROCESSING APPARATUS

ARTIFICIAL DIAMOND PLASMA PRODUCTION DEVICE

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

RF Power Source Operation In Plasma Enhanced Processes

SYSTEM AND METHOD OF POWER GENERATION WITH PHASE LINKED SOLID-STATE...

ECR ION SOURCE AND METHOD FOR OPERATING AN ECR ION SOURCE

GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Microwave output device and plasma processing apparatus

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...

A MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATE...

PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR GENERATING PLASMA PULSES

FILM FORMING DEVICE, FILM FORMING METHOD, AND FILM FORMING PROGRAM

PLASMA PROCESSING APPARATUS AND SHOWER PLATE

PLASMA PROCESSING APPARATUS

LOW ELECTRON TEMPERATURE MICROWAVE SURFACE-WAVE PLASMA (SWP) PROCES...

MICROWAVE EMITTING DEVICE AND SURFACE WAVE PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR GENERATING PLASMA PULSES

Plasma-Tuning Rods in Surface Wave Antenna (SWA) Sources

ELECTROMAGNETIC-RADIATION POWER-SUPPLY MECHANISM AND MICROWAVE INTR...

MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

System for pretreating the lumen of a catheter

PLASMA PROCESSING APPARATUS

Plasma processing apparatus

Plasma treatment apparatus and plasma generation method

Plasma device and plasma generating method