using particular waveforms

Industry

CPC
H01J37/32128

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32128using particular waveforms

Industries

Patents Grantslast 30 patents

Information Patent Grant
Enhanced tuning methods for mitigating RF load impedance variations...
- Patent number 12,278,090
- Issue date Apr 15, 2025
- MKS Instruments, Inc.
- Aaron Burry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage pulse time-domain multiplexing
- Patent number 12,261,019
- Issue date Mar 25, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for depositing a layer
- Patent number 12,255,053
- Issue date Mar 18, 2025
- ASM IP Holding B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process control for ion energy delivery using multiple generators a...
- Patent number 12,255,052
- Issue date Mar 18, 2025
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-shape voltage pulse trains for uniformity and etch profile tu...
- Patent number 12,255,051
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing aspect ratio dependent etch with direct current bias pulsing
- Patent number 12,237,149
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Deyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 12,237,148
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanosecond pulser ADC system
- Patent number 12,230,477
- Issue date Feb 18, 2025
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,205,798
- Issue date Jan 21, 2025
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solid-state switch based high-speed pulser with plasma IEDF modific...
- Patent number 12,205,797
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable output impedance RF generator
- Patent number 12,198,898
- Issue date Jan 14, 2025
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage waveform generator for plasma assisted processing apparatuses
- Patent number 12,136,534
- Issue date Nov 5, 2024
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Jordi Everts
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed voltage source for plasma processing applications
- Patent number 12,125,673
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Fabrice Cubaynes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,125,677
- Issue date Oct 22, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Programmable plasma ignition profiles
- Patent number 12,074,008
- Issue date Aug 27, 2024
- Advanced Energy Industries, Inc.
- Mike Armstrong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio-frequency power supply apparatus
- Patent number 12,068,132
- Issue date Aug 20, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback loop for controlling a pulsed voltage waveform
- Patent number 12,057,292
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing with broadband RF waveforms
- Patent number 12,020,902
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,009,180
- Issue date Jun 11, 2024
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage waveform generator, wafer processing apparatus and plasma p...
- Patent number 12,002,651
- Issue date Jun 4, 2024
- Samsung Electronics Co., Ltd.
- Hyunbae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time, non-invasive IEDF plasma sensor
- Patent number 11,996,274
- Issue date May 28, 2024
- MKS Instruments, Inc.
- Linnell Martinez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber and chamber component cleaning methods
- Patent number 11,984,306
- Issue date May 14, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,978,612
- Issue date May 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Frequency tuning for modulated plasma systems
- Patent number 11,972,927
- Issue date Apr 30, 2024
- Advanced Energy Industries, Inc.
- Gideon van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling RF parameters at multiple fre...
- Patent number 11,956,883
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, method...
- Patent number 11,923,173
- Issue date Mar 5, 2024
- Kokusai Electric Corporation
- Teruo Yoshino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VARIABLE OUTPUT IMPEDANCE RF GENERATOR
- Publication number 20250118530
- Publication date Apr 10, 2025
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250095963
- Publication date Mar 20, 2025
- Hitachi High-Tech Corporation
- Haixiang HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS
- Publication number 20250087459
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Pingshan Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE-ASSISTED PLASMA STRIKE
- Publication number 20250087461
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250062101
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A METHOD AND APPARATUS FOR ENHANCING ION ENERGY AND REDUCING ION EN...
- Publication number 20250046572
- Publication date Feb 6, 2025
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION
- Publication number 20250046576
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250014872
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240429033
- Publication date Dec 26, 2024
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240420922
- Publication date Dec 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING
- Publication number 20240412947
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...
- Publication number 20240395503
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20240395502
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240379328
- Publication date Nov 14, 2024
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING
- Publication number 20240355586
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced Tuning Methods for Mitigating RF Load Impedance Variations...
- Publication number 20240355585
- Publication date Oct 24, 2024
- MKS Instruments, Inc.
- Aaron BURRY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240331974
- Publication date Oct 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND FILM FORMING APPARATUS
- Publication number 20240321551
- Publication date Sep 26, 2024
- Sony Semiconductor Solutions Corporation
- Kiyotaka TABUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS
- Publication number 20240312766
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT ENERGY RECOVERY IN A NANOSECOND PULSER CIRCUIT
- Publication number 20240304417
- Publication date Sep 12, 2024
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Non-Invasive IED Estimation For Pulsed-DC And Low Frequency Applica...
- Publication number 20240249914
- Publication date Jul 25, 2024
- MKS Instruments, Inc.
- Linnell MARTINEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD
- Publication number 20240234094
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Changho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSECOND PULSER ADC SYSTEM
- Publication number 20240234090
- Publication date Jul 11, 2024
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-FREQUENCY POWER SUPPLY SYSTEM
- Publication number 20240222082
- Publication date Jul 4, 2024
- DAIHEN Corporation
- Yuichi HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-FREQUENCY POWER SUPPLY SYSTEM
- Publication number 20240222079
- Publication date Jul 4, 2024
- DAIHEN Corporation
- Yuichi HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240212984
- Publication date Jun 27, 2024
- Hitachi High-Tech Corporation
- Isao MORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240213002
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Ikko TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER
- Publication number 20240194446
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER
- Publication number 20240194447
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS

using particular waveforms

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Enhanced tuning methods for mitigating RF load impedance variations...

Voltage pulse time-domain multiplexing

Plasma processing apparatus and plasma processing method

Methods and systems for depositing a layer

Process control for ion energy delivery using multiple generators a...

Multi-shape voltage pulse trains for uniformity and etch profile tu...

Reducing aspect ratio dependent etch with direct current bias pulsing

Plasma processing assembly using pulsed-voltage and radio-frequency...

Nanosecond pulser ADC system

High-frequency power supply apparatus

Solid-state switch based high-speed pulser with plasma IEDF modific...

Variable output impedance RF generator

Control method and plasma processing apparatus

Plasma uniformity control in pulsed DC plasma chamber

Plasma processing chambers configured for tunable substrate and edg...

Voltage waveform generator for plasma assisted processing apparatuses

Pulsed voltage source for plasma processing applications

High-frequency power supply apparatus

Programmable plasma ignition profiles

Radio-frequency power supply apparatus

Feedback loop for controlling a pulsed voltage waveform

Plasma processing with broadband RF waveforms

Plasma processing apparatus

Voltage waveform generator, wafer processing apparatus and plasma p...

Real-time, non-invasive IEDF plasma sensor

Plasma chamber and chamber component cleaning methods

Plasma processing apparatus

Frequency tuning for modulated plasma systems

Methods and apparatus for controlling RF parameters at multiple fre...

Substrate processing apparatus, substrate processing method, method...

Patents Applicationslast 30 patents

VARIABLE OUTPUT IMPEDANCE RF GENERATOR

PLASMA PROCESSING APPARATUS

TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS

PULSED VOLTAGE-ASSISTED PLASMA STRIKE

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

A METHOD AND APPARATUS FOR ENHANCING ION ENERGY AND REDUCING ION EN...

PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING

Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS

MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING

Enhanced Tuning Methods for Mitigating RF Load Impedance Variations...

PLASMA PROCESSING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND FILM FORMING APPARATUS

PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS

EFFICIENT ENERGY RECOVERY IN A NANOSECOND PULSER CIRCUIT

Non-Invasive IED Estimation For Pulsed-DC And Low Frequency Applica...

PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD

NANOSECOND PULSER ADC SYSTEM

HIGH-FREQUENCY POWER SUPPLY SYSTEM

HIGH-FREQUENCY POWER SUPPLY SYSTEM

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER

LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER