using scanning ray

Industry

CPC
H01J37/292

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/292using scanning ray

Industries

Patents Grantslast 30 patents

Information Patent Grant
Arbitrary electron dose waveforms for electron microscopy
- Patent number 12,080,514
- Issue date Sep 3, 2024
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Ruth Shewmon Bloom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arbitrary electron dose waveforms for electron microscopy
- Patent number 11,728,128
- Issue date Aug 15, 2023
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Ruth Shewmon Bloom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,657,999
- Issue date May 23, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arbitrary electron dose waveforms for electron microscopy
- Patent number 11,476,082
- Issue date Oct 18, 2022
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Ruth Shewmon Bloom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,398,368
- Issue date Jul 26, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,049,686
- Issue date Jun 29, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron channeling pattern acquisition from small crystalline areas
- Patent number 11,003,942
- Issue date May 11, 2021
- International Business Machines Corporation
- Stephen W. Bedell
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,811,222
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite beam apparatus
- Patent number 10,636,615
- Issue date Apr 28, 2020
- Hitachi High-Tech Science Corporation
- Tatsuya Asahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring spherical and chromatic aberrations in cathode lens elect...
- Patent number 10,593,510
- Issue date Mar 17, 2020
- International Business Machines Corporation
- Rudolf M. Tromp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,586,681
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 10,535,494
- Issue date Jan 14, 2020
- Carl Zeiss Microscopy GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,446,359
- Issue date Oct 15, 2019
- Hitachi High-Technologies Corporation
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron channeling pattern acquisition from small crystalline areas
- Patent number 10,417,519
- Issue date Sep 17, 2019
- International Business Machines Corporation
- Stephen W. Bedell
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for inspection of scattered hot spot areas on...
- Patent number 10,217,605
- Issue date Feb 26, 2019
- KLA-Tencor Corporation
- Sean X. Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite beam apparatus
- Patent number 10,204,759
- Issue date Feb 12, 2019
- Hitachi High-Tech Science Corporation
- Tatsuya Asahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for inspecting and reviewing a sample
- Patent number 10,177,048
- Issue date Jan 8, 2019
- Applied Materials Israel Ltd.
- Juergen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 10,163,603
- Issue date Dec 25, 2018
- Carl Zeiss Microscopy GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,141,160
- Issue date Nov 27, 2018
- Hermes-Microvision, Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 10,134,558
- Issue date Nov 20, 2018
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron channeling pattern acquisition from small crystalline areas
- Patent number 10,127,649
- Issue date Nov 13, 2018
- International Business Machines Corporation
- Stephen W. Bedell
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Cross-section processing-and-observation method and cross-section p...
- Patent number 10,096,449
- Issue date Oct 9, 2018
- Hitachi High-Tech Science Corporation
- Xin Man
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imaging apparatus having a plurality of movable beam columns, and m...
- Patent number 10,026,588
- Issue date Jul 17, 2018
- Keysight Technologies, Inc.
- Kurt Stephen Werder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,020,164
- Issue date Jul 10, 2018
- Hermes Microvision Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and charged particle beam device contr...
- Patent number 9,881,769
- Issue date Jan 30, 2018
- Hitachi High-Technologies Corporation
- Kenji Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preparing a sample for microscopy
- Patent number 9,779,914
- Issue date Oct 3, 2017
- E. A. Fischione Instruments, Inc.
- Paul E. Fischione
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam substrate inspection using both vector and ra...
- Patent number 9,620,332
- Issue date Apr 11, 2017
- Multibeam Corporation
- David K. Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and image generation method
- Patent number 9,478,392
- Issue date Oct 25, 2016
- Hitachi High-Technologies Corporation
- Kazuki Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,362,087
- Issue date Jun 7, 2016
- Hermes-Microvision, Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus and sample observation apparatus
- Patent number 9,171,695
- Issue date Oct 27, 2015
- Hitachi High-Technologies Corporation
- Yasuyuki Momoi
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES
- Publication number 20240094150
- Publication date Mar 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Dror Shemesh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY
- Publication number 20230411112
- Publication date Dec 21, 2023
- Integrated Dynamic Electron Solutions, Inc.
- Ruth Shewmon BLOOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALYSIS SYSTEM, ANALYSIS METHOD, COMPUTER PROGRAM PRODUCT AND SAMP...
- Publication number 20230178333
- Publication date Jun 8, 2023
- CARL ZEISS MICROSCOPY GMBH
- Bruno Linn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM
- Publication number 20230086984
- Publication date Mar 23, 2023
- ASML NETHERLANDS B.V.
- Te-Yu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY
- Publication number 20220406561
- Publication date Dec 22, 2022
- Integrated Dynamic Electron Solutions, Inc.
- Ruth Shewmon BLOOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY
- Publication number 20220336185
- Publication date Oct 20, 2022
- Integrated Dynamic Electron Solutions, Inc.
- Ruth Shewmon BLOOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, APPARATUS AND METHODS FOR FORMING METAL STRIPS INTO DIES
- Publication number 20220044051
- Publication date Feb 10, 2022
- Ontario Die International Inc.
- Tin To Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...
- Publication number 20210313137
- Publication date Oct 7, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20210193433
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20210042943
- Publication date Feb 11, 2021
- Shimadzu Corporation
- Ryuta MATSUMOTO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20200251305
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Zhongwei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...
- Publication number 20200098541
- Publication date Mar 26, 2020
- CARL ZEISS MICROSCOPY GMBH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON CHANNELING PATTERN ACQUISITION FROM SMALL CRYSTALLINE AREAS
- Publication number 20190318193
- Publication date Oct 17, 2019
- International Business Machines Corporation
- Stephen W. Bedell
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPOSITE BEAM APPARATUS
- Publication number 20190189388
- Publication date Jun 20, 2019
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tatsuya ASAHATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190172677
- Publication date Jun 6, 2019
- HERMES MICROVISION, INC.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...
- Publication number 20190122852
- Publication date Apr 25, 2019
- CARL ZEISS MICROSCOPY GMBH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON CHANNELING PATTERN ACQUISITION FROM SMALL CRYSTALLINE AREAS
- Publication number 20180211378
- Publication date Jul 26, 2018
- International Business Machines Corporation
- Stephen W. Bedell
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTRON CHANNELING PATTERN ACQUISITION FROM SMALL CRYSTALLINE AREAS
- Publication number 20180211376
- Publication date Jul 26, 2018
- International Business Machines Corporation
- Stephen W. Bedell
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPOSITE BEAM APPARATUS
- Publication number 20180076001
- Publication date Mar 15, 2018
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tatsuya ASAHATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20180012725
- Publication date Jan 11, 2018
- Hitachi High-Technologies Corporation
- Toshiyuki YOKOSUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Source
- Publication number 20170047207
- Publication date Feb 16, 2017
- KLA-Tencor Corporation
- Yung-Ho Alex Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20170018394
- Publication date Jan 19, 2017
- Hitachi High-Technologies Corporation
- Yasunari SOHDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT APPARATUS, MEASUREMENT METHOD, AND MANUFACTURING METHOD...
- Publication number 20160379902
- Publication date Dec 29, 2016
- KABUSHIKI KAISHA TOSHIBA
- Yoshinori HAGIO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMAGING WAFER WITH FOCUSED CHARGED PARTICLE BEAM IN SEMI...
- Publication number 20160365222
- Publication date Dec 15, 2016
- Taiwan Semiconductor Manufacturing Co., LTD
- Ting-Tsung CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Providing a Clean Environment in an Electron-...
- Publication number 20160358741
- Publication date Dec 8, 2016
- KLA-Tencor Corporation
- William G. Schultz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS-SECTION PROCESSING-AND-OBSERVATION METHOD AND CROSS-SECTION P...
- Publication number 20160343541
- Publication date Nov 24, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Xin MAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION OF SCATTERED HOT SPOT AREAS ON...
- Publication number 20160260577
- Publication date Sep 8, 2016
- KLA-Tencor Corporation
- Sean X. Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR INSPECTING AND REVIEWING A SAMPLE
- Publication number 20160260642
- Publication date Sep 8, 2016
- APPLIED MATERIALS ISRAEL LTD.
- Juergen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Charged Particle Beam Device Contr...
- Publication number 20160203947
- Publication date Jul 14, 2016
- Hitachi High-Technologies Corporation
- Kenji AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING APPARATUS HAVING A PLURALITY OF MOVABLE BEAM COLUMNS, AND M...
- Publication number 20160064185
- Publication date Mar 3, 2016
- Keysight Technologies, Inc.
- Kurt Stephen Werder
- H01 - BASIC ELECTRIC ELEMENTS

using scanning ray

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Arbitrary electron dose waveforms for electron microscopy

Arbitrary electron dose waveforms for electron microscopy

Particle beam system and method for the particle-optical examinatio...

Arbitrary electron dose waveforms for electron microscopy

Apparatus of plural charged-particle beams

Particle beam system and method for the particle-optical examinatio...

Electron channeling pattern acquisition from small crystalline areas

Apparatus of plural charged-particle beams

Composite beam apparatus

Measuring spherical and chromatic aberrations in cathode lens elect...

Charged particle beam apparatus

Particle beam system and method for the particle-optical examinatio...

Charged particle beam device

Electron channeling pattern acquisition from small crystalline areas

Method and apparatus for inspection of scattered hot spot areas on...

Composite beam apparatus

System for inspecting and reviewing a sample

Particle beam system and method for the particle-optical examinatio...

Apparatus of plural charged-particle beams

Scanning electron microscope

Electron channeling pattern acquisition from small crystalline areas

Cross-section processing-and-observation method and cross-section p...

Imaging apparatus having a plurality of movable beam columns, and m...

Charged particle beam apparatus

Charged particle beam device and charged particle beam device contr...

Apparatus for preparing a sample for microscopy

Charged particle beam substrate inspection using both vector and ra...

Charged particle beam apparatus and image generation method

Charged particle beam apparatus

Stage apparatus and sample observation apparatus

Patents Applicationslast 30 patents

NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES

ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY

ANALYSIS SYSTEM, ANALYSIS METHOD, COMPUTER PROGRAM PRODUCT AND SAMP...

BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM

ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY

ARBITRARY ELECTRON DOSE WAVEFORMS FOR ELECTRON MICROSCOPY

SYSTEMS, APPARATUS AND METHODS FOR FORMING METAL STRIPS INTO DIES

PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

SCANNING ELECTRON MICROSCOPE

CHARGED PARTICLE BEAM APPARATUS

PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...

ELECTRON CHANNELING PATTERN ACQUISITION FROM SMALL CRYSTALLINE AREAS

COMPOSITE BEAM APPARATUS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...

ELECTRON CHANNELING PATTERN ACQUISITION FROM SMALL CRYSTALLINE AREAS

ELECTRON CHANNELING PATTERN ACQUISITION FROM SMALL CRYSTALLINE AREAS

COMPOSITE BEAM APPARATUS

Charged Particle Beam Device

Electron Source

Scanning Electron Microscope

MEASUREMENT APPARATUS, MEASUREMENT METHOD, AND MANUFACTURING METHOD...

METHOD FOR IMAGING WAFER WITH FOCUSED CHARGED PARTICLE BEAM IN SEMI...

System and Method for Providing a Clean Environment in an Electron-...

CROSS-SECTION PROCESSING-AND-OBSERVATION METHOD AND CROSS-SECTION P...

METHOD AND APPARATUS FOR INSPECTION OF SCATTERED HOT SPOT AREAS ON...

SYSTEM FOR INSPECTING AND REVIEWING A SAMPLE

Charged Particle Beam Device and Charged Particle Beam Device Contr...

IMAGING APPARATUS HAVING A PLURALITY OF MOVABLE BEAM COLUMNS, AND M...