using supplementary magnetic fields

Industry

CPC
H01J37/3402

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3402using supplementary magnetic fields

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Physical vapor deposition process apparatus and method of optimizin...
- Patent number 12,165,935
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Hung Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 12,094,699
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode arc source, filters thereof and method of filtering macropa...
- Patent number 11,903,116
- Issue date Feb 13, 2024
- NANOFILM TECHNOLOGIES INTERNATIONAL LIMITED
- Xu Shi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling ion fraction in physical vapo...
- Patent number 11,810,770
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Xiaodong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 11,512,388
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathodic arc evaporation with predetermined cathode material removal
- Patent number 11,342,168
- Issue date May 24, 2022
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Joerg Vetter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering system and method
- Patent number 11,257,663
- Issue date Feb 22, 2022
- Agency for Science, Technology and Research
- Jianwei Chai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and sputtering method
- Patent number 11,094,515
- Issue date Aug 17, 2021
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Daisuke Suetsugu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arc evaporation source
- Patent number 10,982,318
- Issue date Apr 20, 2021
- Kobe Steel, Ltd.
- Shinichi Tanifuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ionized physical vapor deposition (IPVD) apparatus and method for a...
- Patent number 10,672,596
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surrounding field sputtering source
- Patent number 10,358,713
- Issue date Jul 23, 2019
- Kurt J. Lesker Company
- Matthew Jaszcar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactors for plasma-assisted processes and associated methods
- Patent number 10,304,665
- Issue date May 28, 2019
- Nano-Product Engineering, LLC
- Vladimir Gorokhovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for direct-write sputter deposition and method therefor
- Patent number 10,156,011
- Issue date Dec 18, 2018
- Case Western Reserve University
- Edwin D. Burwell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-ionized and inductively-coupled plasma for sputtering and resp...
- Patent number 10,047,430
- Issue date Aug 14, 2018
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering source and arrangement with adjustable seconda...
- Patent number 10,043,642
- Issue date Aug 7, 2018
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Othmar Zueger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition system and physical vapor depositing meth...
- Patent number 9,887,073
- Issue date Feb 6, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chien Chi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Production method for transparent conductive film
- Patent number 9,624,573
- Issue date Apr 18, 2017
- Nitto Denko Corporation
- Kazuaki Sasa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter source for semiconductor process chambers
- Patent number 9,620,339
- Issue date Apr 11, 2017
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition RF plasma shield deposit control
- Patent number 9,605,341
- Issue date Mar 28, 2017
- Applied Materials, Inc.
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron plasma apparatus
- Patent number 9,508,532
- Issue date Nov 29, 2016
- BB PLASMA DESIGN AB
- Ladislav Bardos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electronic component manufacturing method and electrode structure
- Patent number 9,437,702
- Issue date Sep 6, 2016
- Canon Anelva Corporation
- Akira Matsuo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing plasma flow, method for plasma processing, app...
- Patent number 9,426,875
- Issue date Aug 23, 2016
- Ferrotec Corporation
- Keisuke Sagisaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arc evaporation source having fast film-forming speed, coating film...
- Patent number 9,266,180
- Issue date Feb 23, 2016
- Kobe Steel, Ltd.
- Shinichi Tanifuji
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Process for forming thin film and system for forming thin film
- Patent number 9,260,780
- Issue date Feb 16, 2016
- Tohoku Seiki Industries, Ltd.
- Masanobu Kusunoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High metal ionization sputter gun
- Patent number 9,175,382
- Issue date Nov 3, 2015
- Intermolecular, Inc.
- Hong Sheng Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter gun having variable magnetic strength
- Patent number 9,085,821
- Issue date Jul 21, 2015
- Intermolecular, Inc.
- Owen Ho Yin Fong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum deposition apparatus
- Patent number 9,017,534
- Issue date Apr 28, 2015
- Kobe Steel, Ltd.
- Kenji Yamamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-ionized and inductively-coupled plasma for sputtering and resp...
- Patent number 8,696,875
- Issue date Apr 15, 2014
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-ionized and inductively-coupled plasma for sputtering and resp...
- Patent number 8,668,816
- Issue date Mar 11, 2014
- Applied Materials Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Drive end-block for a rotatable magnetron
- Patent number 8,506,773
- Issue date Aug 13, 2013
- Von Ardenne Anlagentechnik GmbH
- Hans-Juergen Heinrich
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING CHAMBERS
- Publication number 20250062165
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Hung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-BEAM-ASSISTED SPUTTERING DEVICE AND METHOD THEREFOR
- Publication number 20250019819
- Publication date Jan 16, 2025
- INFOVION INC.
- Yong Hwan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20240194462
- Publication date Jun 13, 2024
- EMD CORPORATION
- Akinori EBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE PLASMA ION SOURCE FOR INLINE SECONDARY ION MASS SPECTROMETRY
- Publication number 20240090111
- Publication date Mar 14, 2024
- Ming Hong YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...
- Publication number 20230402271
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Xiaodong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA DISCHARGE UNIFORMITY CONTROL USING MAGNETIC FIELDS
- Publication number 20230260768
- Publication date Aug 17, 2023
- LAM RESEARCH CORPORATION
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED CATHODE ARC SOURCE, FILTERS THEREOF AND METHOD OF FILTERIN...
- Publication number 20230137012
- Publication date May 4, 2023
- Nanofilm Technologies International Limited
- Xu SHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHYSICAL VAPOR DEPOSITION PROCESS APPARATUS AND METHOD OF OPTIMIZIN...
- Publication number 20230067466
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Hung LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR SPUTTER DEPOSITION
- Publication number 20220277940
- Publication date Sep 1, 2022
- Dyson Technology Limited
- Michael Edward RENDALL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON PLASMA APPARATUS
- Publication number 20220181129
- Publication date Jun 9, 2022
- BB PLASMA DESIGN AB
- Ladislav BARDOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CATHODIC ARC EVAPORATION WITH PREDETERMINED CATHODE MATERIAL REMOVAL
- Publication number 20200402781
- Publication date Dec 24, 2020
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Joerg VETTER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING SYSTEM AND METHOD
- Publication number 20200279723
- Publication date Sep 3, 2020
- Agency for Science, Technology and Research
- Jianwei Chai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200165716
- Publication date May 28, 2020
- Konica Minolta, Inc.
- Masaaki Nose
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Apparatus and Film Forming Method
- Publication number 20200048759
- Publication date Feb 13, 2020
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION
- Publication number 20190189465
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- KEITH A. MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARC EVAPORATION SOURCE
- Publication number 20180371605
- Publication date Dec 27, 2018
- Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
- Shinichi Tanifuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...
- Publication number 20180327893
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS AND SPUTTERING METHOD
- Publication number 20180174808
- Publication date Jun 21, 2018
- Panasonic Intellectual Property Management Co., Ltd.
- DAISUKE SUETSUGU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON PLASMA APPARATUS
- Publication number 20180012738
- Publication date Jan 11, 2018
- BB PLASMA DESIGN AB
- Ladislav BARDOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ionized Physical Vapor Deposition (IPVD) Apparatus And Method For A...
- Publication number 20170278686
- Publication date Sep 28, 2017
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURROUNDING FIELD SPUTTERING SOURCE
- Publication number 20170175251
- Publication date Jun 22, 2017
- Kurt J. Lesker Company
- Matthew Jaszcar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRODUCTION METHOD FOR TRANSPARENT CONDUCTIVE FILM
- Publication number 20160024644
- Publication date Jan 28, 2016
- NITTO DENKO CORPORATION
- Kazuaki Sasa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FACING TARGET SPUTTERING APPARATUS
- Publication number 20150027883
- Publication date Jan 29, 2015
- SAMSUNG DISPLAY CO., LTD.
- Hun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC COMPONENT MANUFACTURING METHOD AND ELECTRODE STRUCTURE
- Publication number 20140319676
- Publication date Oct 30, 2014
- Akira MATSUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE AND VACUUM PLASMA PROCESSING APPARATUS PROVIDED WITH...
- Publication number 20140312761
- Publication date Oct 23, 2014
- Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
- Hiroshi Tamagaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...
- Publication number 20140305802
- Publication date Oct 16, 2014
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetron Plasma Apparatus
- Publication number 20140305795
- Publication date Oct 16, 2014
- Angstrom Sciences, Inc.
- Ladislav Bardos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS
- Publication number 20140262767
- Publication date Sep 18, 2014
- Anantha K. SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION RF PLASMA SHIELD DEPOSIT CONTROL
- Publication number 20140251789
- Publication date Sep 11, 2014
- Applied Materials, Inc.
- KEITH A. MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CYLINDRICAL EVAPORATION SOURCE
- Publication number 20140238852
- Publication date Aug 28, 2014
- SULZER METAPLAS GMBH
- Joerg VETTER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

using supplementary magnetic fields

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Physical vapor deposition process apparatus and method of optimizin...

Methods and apparatus for controlling ion fraction in physical vapo...

Cathode arc source, filters thereof and method of filtering macropa...

Methods and apparatus for controlling ion fraction in physical vapo...

Film forming apparatus and film forming method

Cathodic arc evaporation with predetermined cathode material removal

Sputtering system and method

Sputtering apparatus and sputtering method

Arc evaporation source

Ionized physical vapor deposition (IPVD) apparatus and method for a...

Surrounding field sputtering source

Reactors for plasma-assisted processes and associated methods

Apparatus for direct-write sputter deposition and method therefor

Self-ionized and inductively-coupled plasma for sputtering and resp...

Magnetron sputtering source and arrangement with adjustable seconda...

Physical vapor deposition system and physical vapor depositing meth...

Production method for transparent conductive film

Sputter source for semiconductor process chambers

Physical vapor deposition RF plasma shield deposit control

Magnetron plasma apparatus

Electronic component manufacturing method and electrode structure

Method for producing plasma flow, method for plasma processing, app...

Arc evaporation source having fast film-forming speed, coating film...

Process for forming thin film and system for forming thin film

High metal ionization sputter gun

Sputter gun having variable magnetic strength

Vacuum deposition apparatus

Self-ionized and inductively-coupled plasma for sputtering and resp...

Self-ionized and inductively-coupled plasma for sputtering and resp...

Drive end-block for a rotatable magnetron

Patents Applicationslast 30 patents

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING CHAMBERS

ELECTRON-BEAM-ASSISTED SPUTTERING DEVICE AND METHOD THEREFOR

SPUTTERING APPARATUS

MULTIPLE PLASMA ION SOURCE FOR INLINE SECONDARY ION MASS SPECTROMETRY

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPO...

PLASMA DISCHARGE UNIFORMITY CONTROL USING MAGNETIC FIELDS

IMPROVED CATHODE ARC SOURCE, FILTERS THEREOF AND METHOD OF FILTERIN...

PHYSICAL VAPOR DEPOSITION PROCESS APPARATUS AND METHOD OF OPTIMIZIN...

METHOD AND APPARATUS FOR SPUTTER DEPOSITION

MAGNETRON PLASMA APPARATUS

CATHODIC ARC EVAPORATION WITH PREDETERMINED CATHODE MATERIAL REMOVAL

SPUTTERING SYSTEM AND METHOD

FILM FORMING METHOD AND FILM FORMING APPARATUS

Film Forming Apparatus and Film Forming Method

METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION

ARC EVAPORATION SOURCE

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...

SPUTTERING APPARATUS AND SPUTTERING METHOD

MAGNETRON PLASMA APPARATUS

Ionized Physical Vapor Deposition (IPVD) Apparatus And Method For A...

SURROUNDING FIELD SPUTTERING SOURCE

PRODUCTION METHOD FOR TRANSPARENT CONDUCTIVE FILM

FACING TARGET SPUTTERING APPARATUS

ELECTRONIC COMPONENT MANUFACTURING METHOD AND ELECTRODE STRUCTURE

PLASMA SOURCE AND VACUUM PLASMA PROCESSING APPARATUS PROVIDED WITH...

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...

Magnetron Plasma Apparatus

SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS

PHYSICAL VAPOR DEPOSITION RF PLASMA SHIELD DEPOSIT CONTROL

CYLINDRICAL EVAPORATION SOURCE