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H01J37/32908

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32908Utilities

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Calibration jig and calibration method
- Patent number 12,148,645
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Andrew Myles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration jig and calibration method
- Patent number 11,935,773
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Andrew Myles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intake plasma generator systems and methods
- Patent number 11,773,811
- Issue date Oct 3, 2023
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,735,392
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,643,727
- Issue date May 9, 2023
- HITACHI HIGH-TECH CORPORATION
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system
- Patent number 11,495,480
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Suguru Motegi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operational method thereof
- Patent number 11,424,110
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placing table and plasma treatment apparatus
- Patent number 11,373,884
- Issue date Jun 28, 2022
- Tokyo Electron Limited
- Dai Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intake plasma generator systems and methods
- Patent number 11,352,988
- Issue date Jun 7, 2022
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,011,347
- Issue date May 18, 2021
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly and semiconductor manufacturing appara...
- Patent number 11,004,716
- Issue date May 11, 2021
- Samsung Electronics Co., Ltd.
- Song-yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensor and adjuster for a consumable
- Patent number 10,985,078
- Issue date Apr 20, 2021
- Lam Research Corporation
- Ian Kenworthy
- G05 - CONTROLLING REGULATING
Information Patent Grant
Controlling multiple plasma processes
- Patent number 10,971,342
- Issue date Apr 6, 2021
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intake oxidant generator systems and methods
- Patent number 10,947,933
- Issue date Mar 16, 2021
- ThrivalTech, LLC
- Garrett Hill
- F02 - COMBUSTION ENGINES HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
Information Patent Grant
Filter device and plasma processing apparatus
- Patent number 10,897,808
- Issue date Jan 19, 2021
- Tokyo Electron Limited
- Nozomu Nagashima
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Wafer boat and treatment apparatus for wafers
- Patent number 10,867,825
- Issue date Dec 15, 2020
- Michael Klick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, method of operating plasma processing...
- Patent number 10,699,883
- Issue date Jun 30, 2020
- Tokyo Electron Limited
- Satoru Teruuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placing table and plasma treatment apparatus
- Patent number 10,679,869
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Dai Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxy-flouride films based on oxidation of metal flourides
- Patent number 10,563,303
- Issue date Feb 18, 2020
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flourination process to create sacrificial oxy-flouride layer
- Patent number 10,443,125
- Issue date Oct 15, 2019
- Applied Materials, Inc.
- Xiaowei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask shrink layer for high aspect ratio dielectric etch
- Patent number 10,431,458
- Issue date Oct 1, 2019
- Lam Research Corporation
- Eric A. Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma CVD apparatus
- Patent number 10,392,703
- Issue date Aug 27, 2019
- Toyota Jidosha Kabushiki Kaisha
- Hirohiko Hisano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pneumatic exhaust system
- Patent number 10,354,842
- Issue date Jul 16, 2019
- Lam Research Corporation
- Jacqulyn Edem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of maintaining a supply of power to a load
- Patent number 10,212,797
- Issue date Feb 19, 2019
- TRUMPF Huettinger GmbH + Co. KG
- Ekkehard Mann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,184,182
- Issue date Jan 22, 2019
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique to deposit metal-containing sidewall passivation for high...
- Patent number 10,170,323
- Issue date Jan 1, 2019
- Lam Research Corporation
- Eric A. Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,026,596
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operational method thereof
- Patent number 9,767,997
- Issue date Sep 19, 2017
- Hitachi High-Technologies Corporation
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device, semiconductor manufa...
- Patent number 9,721,910
- Issue date Aug 1, 2017
- RENESAS ELECTRONICS CORPORATION
- Yohei Hamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,660,182
- Issue date May 23, 2017
- Tokyo Electron Limited
- Takashi Sone
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...
- Publication number 20250157798
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Ryohei TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION JIG AND CALIBRATION METHOD
- Publication number 20240178035
- Publication date May 30, 2024
- Applied Materials, Inc.
- Andrew MYLES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTAKE PLASMA GENERATOR SYSTEMS AND METHODS
- Publication number 20230332564
- Publication date Oct 19, 2023
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINEAR ARRANGEMENT FOR SUBSTRATE PROCESSING TOOLS
- Publication number 20230085987
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- Danny Arthur BROWN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20230015560
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Suguru MOTEGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTAKE PLASMA GENERATOR SYSTEMS AND METHODS
- Publication number 20220298995
- Publication date Sep 22, 2022
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210280385
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Daisuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTAKE PLASMA GENERATOR SYSTEMS AND METHODS
- Publication number 20210199076
- Publication date Jul 1, 2021
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE AND PLASMA TREATMENT APPARATUS
- Publication number 20200266081
- Publication date Aug 20, 2020
- TOKYO ELECTRON LIMITED
- Dai KITAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXY-FLOURIDE FILMS BASED ON OXIDATION OF METAL FLOURIDES
- Publication number 20200140996
- Publication date May 7, 2020
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROLLING MULTIPLE PLASMA PROCESSES
- Publication number 20200066498
- Publication date Feb 27, 2020
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Intake Oxidant Generator Systems and Methods
- Publication number 20200049109
- Publication date Feb 13, 2020
- ThrivalTech, LLC
- Garrett Hill
- F02 - COMBUSTION ENGINES HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190100840
- Publication date Apr 4, 2019
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOURINATION PROCESS TO CREATE SACRIFICIAL OXY-FLOURIDE LAYER
- Publication number 20180327898
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER BOAT AND TREATMENT APPARATUS FOR WAFERS
- Publication number 20180076071
- Publication date Mar 15, 2018
- Michael Klick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF
- Publication number 20170372878
- Publication date Dec 28, 2017
- Hitachi High-Technologies Corporation
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PNEUMATIC EXHAUST SYSTEM
- Publication number 20170140901
- Publication date May 18, 2017
- LAM RESEARCH CORPORATION
- Jacqulyn Edem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROXIMITY CONTACT COVER RING FOR PLASMA DICING
- Publication number 20160086852
- Publication date Mar 24, 2016
- James M. Holden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROPLASMA MICROCHANNEL REACTOR DEVICES, MINIATURE REACTOR...
- Publication number 20150270110
- Publication date Sep 24, 2015
- THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
- J. Gary Eden
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES
Information Patent Application
HAND-HELD DEVICE AND METHOD OF PLASMA TREATMENT OF A WORKPIECE WITH...
- Publication number 20150069911
- Publication date Mar 12, 2015
- Reinhausen Plasma GmbH
- Stefan Nettesheim
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150050750
- Publication date Feb 19, 2015
- TOKYO ELECTRON LIMITED
- Takashi Sone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF
- Publication number 20150021294
- Publication date Jan 22, 2015
- Hitachi High-Technologies Corporation
- Masahito Togami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20140352890
- Publication date Dec 4, 2014
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROLLED PLASMA PROCESSING CHAMBER COMPONENT WITH ZON...
- Publication number 20140083978
- Publication date Mar 27, 2014
- Chetan Mahadeswaraswamy
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
RF FEED LINE
- Publication number 20130340940
- Publication date Dec 26, 2013
- Peter HEISS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process Gas Conduits Having Increased Usage Lifetime and Related Me...
- Publication number 20120192398
- Publication date Aug 2, 2012
- Greene, Tweed of Delaware, Inc.
- Francis Vo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single axis gate valve for vacuum applications
- Publication number 20120160417
- Publication date Jun 28, 2012
- Kenneth K L. Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE CONTROL IN PLASMA PROCESSING APPARATUS USING PULSED HEA...
- Publication number 20120132397
- Publication date May 31, 2012
- Applied Materials, Inc.
- Fernando M. Silveira
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma and Induction Heating Power Supply Systems and Related Methods
- Publication number 20120101642
- Publication date Apr 26, 2012
- HUETTINGER Elektronik GmbH + Co. KG
- Thomas Pohl
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPONENT TEMPERATURE CONTROL BY COOLANT FLOW CONTROL AND HEATER DU...
- Publication number 20120048467
- Publication date Mar 1, 2012
- Applied Materials, Inc.
- Chetan Mahadeswaraswamy
- G05 - CONTROLLING REGULATING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Calibration jig and calibration method

Calibration jig and calibration method

Intake plasma generator systems and methods

Plasma processing apparatus

Plasma processing apparatus

Substrate processing system

Plasma processing apparatus and operational method thereof

Placing table and plasma treatment apparatus

Intake plasma generator systems and methods

Plasma processing apparatus

Electrostatic chuck assembly and semiconductor manufacturing appara...

Sensor and adjuster for a consumable

Controlling multiple plasma processes

Intake oxidant generator systems and methods

Filter device and plasma processing apparatus

Wafer boat and treatment apparatus for wafers

Plasma processing apparatus, method of operating plasma processing...

Placing table and plasma treatment apparatus

Metal oxy-flouride films based on oxidation of metal flourides

Flourination process to create sacrificial oxy-flouride layer

Mask shrink layer for high aspect ratio dielectric etch

Plasma CVD apparatus

Pneumatic exhaust system

Method of maintaining a supply of power to a load

Plasma processing apparatus

Technique to deposit metal-containing sidewall passivation for high...

Substrate processing apparatus

Plasma processing apparatus and operational method thereof

Method for manufacturing semiconductor device, semiconductor manufa...

Plasma processing method and plasma processing apparatus

Patents Applicationslast 30 patents

CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...

CALIBRATION JIG AND CALIBRATION METHOD

INTAKE PLASMA GENERATOR SYSTEMS AND METHODS

LINEAR ARRANGEMENT FOR SUBSTRATE PROCESSING TOOLS

SUBSTRATE PROCESSING SYSTEM

INTAKE PLASMA GENERATOR SYSTEMS AND METHODS

PLASMA PROCESSING APPARATUS

INTAKE PLASMA GENERATOR SYSTEMS AND METHODS

PLACING TABLE AND PLASMA TREATMENT APPARATUS

METAL OXY-FLOURIDE FILMS BASED ON OXIDATION OF METAL FLOURIDES

CONTROLLING MULTIPLE PLASMA PROCESSES

Intake Oxidant Generator Systems and Methods

PLASMA PROCESSING APPARATUS

FLOURINATION PROCESS TO CREATE SACRIFICIAL OXY-FLOURIDE LAYER

WAFER BOAT AND TREATMENT APPARATUS FOR WAFERS

PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF

PNEUMATIC EXHAUST SYSTEM

PROXIMITY CONTACT COVER RING FOR PLASMA DICING

MODULAR MICROPLASMA MICROCHANNEL REACTOR DEVICES, MINIATURE REACTOR...

HAND-HELD DEVICE AND METHOD OF PLASMA TREATMENT OF A WORKPIECE WITH...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND OPERATIONAL METHOD THEREOF

SUBSTRATE PROCESSING APPARATUS

TEMPERATURE CONTROLLED PLASMA PROCESSING CHAMBER COMPONENT WITH ZON...

RF FEED LINE

Process Gas Conduits Having Increased Usage Lifetime and Related Me...

Single axis gate valve for vacuum applications

TEMPERATURE CONTROL IN PLASMA PROCESSING APPARATUS USING PULSED HEA...

Plasma and Induction Heating Power Supply Systems and Related Methods

COMPONENT TEMPERATURE CONTROL BY COOLANT FLOW CONTROL AND HEATER DU...