Utilizing antireflective layer

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CPC
Y10S438/952

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S438/00Semiconductor device manufacturing: process

Current Industry

Y10S438/952Utilizing antireflective layer

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Patents Grantslast 30 patents

Information Patent Grant
Anti-reflective coatings using vinyl ether crosslinkers
- Patent number 9,110,372
- Issue date Aug 18, 2015
- Brewer Science Inc.
- Douglas J. Guerrero
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming fine patterns of semiconductor device
- Patent number 8,999,840
- Issue date Apr 7, 2015
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Material with tunable index of refraction
- Patent number 8,900,897
- Issue date Dec 2, 2014
- Intermolecular, Inc.
- Philip Kraus
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for forming underlayer coating for litography containin...
- Patent number 8,460,855
- Issue date Jun 11, 2013
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hardmask composition having antireflective properties and method of...
- Patent number 8,445,187
- Issue date May 21, 2013
- Cheil Industries, Inc.
- Kyong Ho Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for fabricating a semiconductor device by considering the ex...
- Patent number 8,440,557
- Issue date May 14, 2013
- Spansion LLC
- Seiji Yokoyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Graded topcoat materials for immersion lithography
- Patent number 8,440,387
- Issue date May 14, 2013
- International Business Machines Corporation
- Robert D. Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer having antireflective properties and high carbon content, h...
- Patent number 8,263,321
- Issue date Sep 11, 2012
- Cheil Industries, Inc.
- Kyong Ho Yoon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Anti-reflection film forming material, and method for forming resis...
- Patent number 8,216,775
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yuriko Shirai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective coating compositions
- Patent number 8,211,621
- Issue date Jul 3, 2012
- AZ Electronic Materials USA Corp.
- David Abdallah
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Self-segregating multilayer imaging stack with built-in antireflect...
- Patent number 8,084,193
- Issue date Dec 27, 2011
- International Business Machines Corporation
- Joy Cheng
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor device having an organic anti-reflective coating (ARC...
- Patent number 8,039,389
- Issue date Oct 18, 2011
- FREESCALE SEMICONDUCTOR, INC.
- Douglas M. Reber
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 8,039,202
- Issue date Oct 18, 2011
- AZ Electronic Materials USA Corp.
- Yu Sui
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer for organic anti-reflective coating layer and composition i...
- Patent number 8,026,042
- Issue date Sep 27, 2011
- Dongjin Semichem Co., Ltd.
- Sang-Jeoung Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Copolymer and composition for organic and antireflective layer
- Patent number 8,021,826
- Issue date Sep 20, 2011
- Korea Kumho Petrochemicals Co., Ltd.
- Myung-Woong Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hardmask composition having antirelective properties and method of...
- Patent number 7,981,594
- Issue date Jul 19, 2011
- Cheil Industries, Inc.
- Kyong Ho Yoon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 7,935,636
- Issue date May 3, 2011
- Renesas Electronics Corporation
- Takeo Ishibashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Deep trench in a semiconductor structure
- Patent number 7,893,479
- Issue date Feb 22, 2011
- International Business Machines Corporation
- June Cline
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective coating composition, antireflective coating, and pat...
- Patent number 7,879,530
- Issue date Feb 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymer having antireflective properties and high carbon content, h...
- Patent number 7,862,990
- Issue date Jan 4, 2011
- Cheil Industries, Inc.
- Kyong Ho Yoon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Methods of forming dual-damascene metal interconnect structures usi...
- Patent number 7,855,142
- Issue date Dec 21, 2010
- Samsung Electronics Co., Ltd.
- Young Mook Oh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer for organic anti-reflective coating layer and composition i...
- Patent number 7,829,650
- Issue date Nov 9, 2010
- Dongjin Semichem Co., Ltd.
- Sang-Jeoung Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 7,824,837
- Issue date Nov 2, 2010
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for forming underlayer coating for lithography containi...
- Patent number 7,794,919
- Issue date Sep 14, 2010
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Condensation type polymer-containing anti-reflective coating for se...
- Patent number 7,790,356
- Issue date Sep 7, 2010
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for fabricating a semiconductor device by considering the ex...
- Patent number 7,781,320
- Issue date Aug 24, 2010
- Spansion LLC
- Seiji Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antireflective coating compositions
- Patent number 7,759,046
- Issue date Jul 20, 2010
- AZ Electronic Materials USA Corp.
- David Abdallah
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Graded topcoat materials for immersion lithography
- Patent number 7,678,537
- Issue date Mar 16, 2010
- International Business Machines Corporation
- Robert D. Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
In situ deposition of a low κ dielectric layer, barrier layer, etch...
- Patent number 7,670,945
- Issue date Mar 2, 2010
- Applied Materials, Inc.
- Judy H. Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antireflective coating compositions
- Patent number 7,666,575
- Issue date Feb 23, 2010
- AZ Electronic Materials USA Corp.
- Woo-Kyu Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
MATERIAL WITH TUNABLE INDEX OF REFRACTION
- Publication number 20140191262
- Publication date Jul 10, 2014
- INTERMOLECULAR INC.
- Philip Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS
- Publication number 20120156613
- Publication date Jun 21, 2012
- BREWER SCIENCE INC.
- Douglas J. Guerrero
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Self-Segregating Multilayer Imaging Stack With Built-In Antireflect...
- Publication number 20110300483
- Publication date Dec 8, 2011
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Self-Segregating Multilayer Imaging Stack With Built-In Antireflect...
- Publication number 20110294068
- Publication date Dec 1, 2011
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARDMASK COMPOSITION HAVING ANTIREFLECTIVE PROPERTIES AND METHOD OF...
- Publication number 20110275019
- Publication date Nov 10, 2011
- CHEIL INDUSTRIES, INC.
- Kyong Ho YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer having antireflective properties and high carbon content, h...
- Publication number 20110097672
- Publication date Apr 28, 2011
- CHEIL INDUSTRIES, INC.,
- Kyong Ho Yoon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER FOR ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION I...
- Publication number 20110003478
- Publication date Jan 6, 2011
- Sang-Jeoung KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE BY CONSIDERING THE EX...
- Publication number 20100279441
- Publication date Nov 4, 2010
- Seiji Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition for forming underlayer coating for litography containin...
- Publication number 20100279227
- Publication date Nov 4, 2010
- Nissan Chemical Industries, Ltd.
- Takahiro KISHIOKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Compositons
- Publication number 20100248137
- Publication date Sep 30, 2010
- David Abdallah
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Methods of Forming Dual-Damascene Metal Interconnect Structures Usi...
- Publication number 20100178771
- Publication date Jul 15, 2010
- SAMSUNG ELECTRONICS CO., LTD.
- Young Mook Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
- Publication number 20100168337
- Publication date Jul 1, 2010
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-SEGREGATING MULTILAYER IMAGING STACK WITH BUILT-IN ANTIREFLECT...
- Publication number 20100009132
- Publication date Jan 14, 2010
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS
- Publication number 20090317747
- Publication date Dec 24, 2009
- Douglas J. Guerrero
- C07 - ORGANIC CHEMISTRY
Information Patent Application
DEEP TRENCH IN A SEMICONDUCTOR STRUCTURE
- Publication number 20090294926
- Publication date Dec 3, 2009
- International Business Machines Corporation
- June Cline
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE BY CONSIDERING THE EX...
- Publication number 20090269864
- Publication date Oct 29, 2009
- Seiji Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Anti-reflection film forming material, and method for forming resis...
- Publication number 20090253077
- Publication date Oct 8, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yuriko Shirai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20090227046
- Publication date Sep 10, 2009
- Renesas Technology Corp.
- Takeo Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FABRICATION OF SEMICONDUCTOR DEVICES USING ANTI-REFLECTIVE COATINGS
- Publication number 20090203206
- Publication date Aug 13, 2009
- GURTEJ S. SANDHU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN SITU DEPOSITION OF A LOW K DIELECTRIC LAYER, BARRIER LAYER, ETCH...
- Publication number 20090130837
- Publication date May 21, 2009
- APPLIED MATERIALS, INC.
- Judy H. Huang
- C30 - CRYSTAL GROWTH
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PAT...
- Publication number 20090087799
- Publication date Apr 2, 2009
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Copolymer and composition for organic and antireflective layer
- Publication number 20080318167
- Publication date Dec 25, 2008
- KOREA KUMHO PETROCHEMICAL CO., LTD.
- Myung-Woong Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
- Publication number 20080311506
- Publication date Dec 18, 2008
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
- Publication number 20080311530
- Publication date Dec 18, 2008
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hardmask composition having antirelective properties and method of...
- Publication number 20080305441
- Publication date Dec 11, 2008
- Kyong Ho YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Forming Fine Pattern of Semiconductor Device
- Publication number 20080272467
- Publication date Nov 6, 2008
- Hynix Semiconductor Inc.
- Cheol Kyu Bok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Anti-Reflective Coating Forming Composition For Lithography Contain...
- Publication number 20080268379
- Publication date Oct 30, 2008
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER FOR ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION I...
- Publication number 20080213701
- Publication date Sep 4, 2008
- Sang-Jeoung KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer having antireflective properties and high carbon content, h...
- Publication number 20080160461
- Publication date Jul 3, 2008
- Kyong Ho Yoon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20080153035
- Publication date Jun 26, 2008
- David Abdallah
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Utilizing antireflective layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Anti-reflective coatings using vinyl ether crosslinkers

Method of forming fine patterns of semiconductor device

Material with tunable index of refraction

Composition for forming underlayer coating for litography containin...

Hardmask composition having antireflective properties and method of...

Method for fabricating a semiconductor device by considering the ex...

Graded topcoat materials for immersion lithography

Polymer having antireflective properties and high carbon content, h...

Anti-reflection film forming material, and method for forming resis...

Antireflective coating compositions

Self-segregating multilayer imaging stack with built-in antireflect...

Semiconductor device having an organic anti-reflective coating (ARC...

Positive-working photoimageable bottom antireflective coating

Polymer for organic anti-reflective coating layer and composition i...

Copolymer and composition for organic and antireflective layer

Hardmask composition having antirelective properties and method of...

Method of fabricating semiconductor device

Deep trench in a semiconductor structure

Antireflective coating composition, antireflective coating, and pat...

Polymer having antireflective properties and high carbon content, h...

Methods of forming dual-damascene metal interconnect structures usi...

Polymer for organic anti-reflective coating layer and composition i...

Positive-working photoimageable bottom antireflective coating

Composition for forming underlayer coating for lithography containi...

Condensation type polymer-containing anti-reflective coating for se...

Method for fabricating a semiconductor device by considering the ex...

Antireflective coating compositions

Graded topcoat materials for immersion lithography

In situ deposition of a low κ dielectric layer, barrier layer, etch...

Antireflective coating compositions

Patents Applicationslast 30 patents

MATERIAL WITH TUNABLE INDEX OF REFRACTION

ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS

Self-Segregating Multilayer Imaging Stack With Built-In Antireflect...

Self-Segregating Multilayer Imaging Stack With Built-In Antireflect...

HARDMASK COMPOSITION HAVING ANTIREFLECTIVE PROPERTIES AND METHOD OF...

Polymer having antireflective properties and high carbon content, h...

POLYMER FOR ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION I...

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE BY CONSIDERING THE EX...

Composition for forming underlayer coating for litography containin...

Antireflective Coating Compositons

Methods of Forming Dual-Damascene Metal Interconnect Structures Usi...

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY

SELF-SEGREGATING MULTILAYER IMAGING STACK WITH BUILT-IN ANTIREFLECT...

ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS

DEEP TRENCH IN A SEMICONDUCTOR STRUCTURE

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE BY CONSIDERING THE EX...

Anti-reflection film forming material, and method for forming resis...

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

FABRICATION OF SEMICONDUCTOR DEVICES USING ANTI-REFLECTIVE COATINGS

IN SITU DEPOSITION OF A LOW K DIELECTRIC LAYER, BARRIER LAYER, ETCH...

ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PAT...

Copolymer and composition for organic and antireflective layer

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY

Hardmask composition having antirelective properties and method of...

Method for Forming Fine Pattern of Semiconductor Device

Anti-Reflective Coating Forming Composition For Lithography Contain...

POLYMER FOR ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION I...

Polymer having antireflective properties and high carbon content, h...

Antireflective Coating Compositions