Vacuum locks; Means for obtaining or maintaining the desired pressure within the vessel

Industry

CPC
H01J37/18

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/18Vacuum locks; Means for obtaining or maintaining the desired pressure within the vessel

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Vacuum apparatus
- Patent number 12,142,512
- Issue date Nov 12, 2024
- NuFlare Technology, Inc.
- Yoshiaki Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for sample transfer
- Patent number 12,112,916
- Issue date Oct 8, 2024
- FEI Company
- Krishna Kanth Neelisetty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and vacuum processing method
- Patent number 12,062,530
- Issue date Aug 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion gun and ion milling machine
- Patent number 12,051,560
- Issue date Jul 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample protection device for scanning electron microscopy
- Patent number 12,040,156
- Issue date Jul 16, 2024
- SHANGHAI NEMOR OPTOELECTRONIC TECHNOLOGY CO., LTD.
- Xuan Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and apparatuses for contamination-free vacuum transfer of s...
- Patent number 12,020,895
- Issue date Jun 25, 2024
- FEI Company
- Jakub Kuba
- G01 - MEASURING TESTING
Information Patent Grant
Ion generation device and ion generation method
- Patent number 11,978,608
- Issue date May 7, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yuuji Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum compatible X-ray shield
- Patent number 11,972,920
- Issue date Apr 30, 2024
- FEI Company
- Pleun Dona
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replaceable module for a charged particle apparatus
- Patent number 11,961,698
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Christiaan Otten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 11,955,315
- Issue date Apr 9, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus and method for controlling electron beam ap...
- Patent number 11,894,211
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Erina Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency (RF) and...
- Patent number 11,887,815
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for evacuating a chamber
- Patent number 11,830,701
- Issue date Nov 28, 2023
- ASML Netherlands B.V.
- Fangfu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing coated substrates
- Patent number 11,814,718
- Issue date Nov 14, 2023
- Bühler Alzenau GmbH
- Jürgen Pistner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,784,030
- Issue date Oct 10, 2023
- Canon Anelva Corporation
- Atsushi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for reducing vacuum loss in an ion implantatio...
- Patent number 11,764,042
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transport apparatus and method for transferring a sample between tw...
- Patent number 11,753,254
- Issue date Sep 12, 2023
- FEI Company
- Tomas Kratochvíl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,756,773
- Issue date Sep 12, 2023
- Canon Anelva Corporation
- Kazunari Sekiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Ion implanter and electrostatic quadrupole lens device
- Patent number 11,710,618
- Issue date Jul 25, 2023
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Haruka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder and charged particle beam system
- Patent number 11,640,895
- Issue date May 2, 2023
- Jeol Ltd.
- Shuichi Yuasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system
- Patent number 11,631,569
- Issue date Apr 18, 2023
- Jeol Ltd.
- Shuichi Yuasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Back-scatter electrons (BSE) imaging with a SEM in tilted mode usin...
- Patent number 11,626,267
- Issue date Apr 11, 2023
- Applied Materials Israel Ltd.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,626,270
- Issue date Apr 11, 2023
- Canon Anelva Corporation
- Tadashi Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,600,469
- Issue date Mar 7, 2023
- Canon Anelva Corporation
- Atsushi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and operating method of vacuum processi...
- Patent number 11,600,472
- Issue date Mar 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Ryoichi Isomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,569,070
- Issue date Jan 31, 2023
- Canon Anelva Corporation
- Kazunari Sekiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus and method
- Patent number 11,538,664
- Issue date Dec 27, 2022
- JCU CORPORATION
- Keisuke Asano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced electron beam generation
- Patent number 11,517,975
- Issue date Dec 6, 2022
- Arcam AB
- Mattias Fager
- B22 - CASTING POWDER METALLURGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION
- Publication number 20250014857
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Shaoqian WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20240412946
- Publication date Dec 12, 2024
- NuFlare Technology, Inc.
- Kensuke KOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN
- Publication number 20240412940
- Publication date Dec 12, 2024
- AIRSEM TECHNOLOGIES LTD.
- Jenny SHKLOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20240404780
- Publication date Dec 5, 2024
- HITACHI HIGH-TECH CORPORATION
- Masahiro KAMIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION ELECTRON MICROSCOPE
- Publication number 20240373591
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Daesung Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Concentrated Solar Irradiation of Targets in Plasmas
- Publication number 20240363308
- Publication date Oct 31, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Jeffrey Daniel ENGERER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced OES Characterization
- Publication number 20240339309
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20240282548
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device For Interfacing A Sample Transfer Device To An Analytic Or S...
- Publication number 20240274399
- Publication date Aug 15, 2024
- Ferrovac AG
- Urs MAIER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL SURFACE REFORMING APPARATUS USING ION IMPLANTATION
- Publication number 20240258069
- Publication date Aug 1, 2024
- Radpion Inc.
- Myung Jin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus with Plasma and Thermal Processing S...
- Publication number 20240212981
- Publication date Jun 27, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN CHAMBER FOR SCANNING ELECTRON MICROSCOPE, ELECTRON GUN...
- Publication number 20240212971
- Publication date Jun 27, 2024
- National Institute for Materials Science
- Han ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETRON SPUTTER DEVICE
- Publication number 20240203715
- Publication date Jun 20, 2024
- DAEGU GYEONGBUK INSTITUTE OF SCIENCE & TECHNOLOGY
- June Seo KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Transmission Electron Microscope
- Publication number 20240186103
- Publication date Jun 6, 2024
- Hitachi High-Tech Corporation
- Akinari HANAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPORIZER, ION SOURCE, ION BEAM IRRADIATION APPARATUS, AND AN OPERA...
- Publication number 20240186101
- Publication date Jun 6, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING LASER BEAM FOR SEM BASE TOOLS, WORKING DISTANCE MEASUREMENT A...
- Publication number 20240177962
- Publication date May 30, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Ofer Dudovitch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Sample Analysis Method
- Publication number 20240170250
- Publication date May 23, 2024
- Hitachi High-Tech Corporation
- Masayoshi YOSHIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser Thermal Epitaxy in a Charged Particle Microscope
- Publication number 20240161999
- Publication date May 16, 2024
- FEI Company
- Rudolf Geurink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE MICROSCOPE HAVING VACUUM IN SPECIMEN CHAMBER
- Publication number 20240112878
- Publication date Apr 4, 2024
- FEI Company
- Pleun Dona
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR IMAGING AND PROCESSING A SAMPLE USING A FOCUSED PARTICLE...
- Publication number 20240062989
- Publication date Feb 22, 2024
- Carl Zeiss SMT GMBH
- Daniel Schwarz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTOR AND METHOD FOR OBTAINING KIKUCHI IMAGES
- Publication number 20240047174
- Publication date Feb 8, 2024
- BRUKER NANO GMBH
- Uwe ROSSEK
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
Vacuum Treatment Apparatus and Vacuum Treatment Method
- Publication number 20230402248
- Publication date Dec 14, 2023
- Hitachi High-Tech Corporation
- Akito TANOKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS APPARATUS
- Publication number 20230395353
- Publication date Dec 7, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE DEVICE, CHARGED PARTICLE BEAM DEVICE, AND VACUUM DEVICE
- Publication number 20230369011
- Publication date Nov 16, 2023
- HITACHI HIGH-TECH CORPORATION
- Motohiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED CHARGED PARTICLE BEAM APPARATUS
- Publication number 20230335369
- Publication date Oct 19, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Source and Charged Particle Beam System
- Publication number 20230317400
- Publication date Oct 5, 2023
- JEOL Ltd.
- Kyouichi Kamino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20230307205
- Publication date Sep 28, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND APPARATUSES FOR CONTAMINATION-FREE VACUUM TRANSFER OF S...
- Publication number 20230253176
- Publication date Aug 10, 2023
- FEI Company
- Jakub Kuba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE FEEDTHROUGH AND CONNECTOR FOR A CHARGED PARTICLE APPAR...
- Publication number 20230238736
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Boudewijn Weijert Herman Jan VAN DER KROON
- H01 - BASIC ELECTRIC ELEMENTS

Vacuum locks; Means for obtaining or maintaining the desired pressure within the vessel

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Vacuum apparatus

Plasma processing system and method using radio frequency and micro...

Methods and systems for sample transfer

Vacuum processing apparatus and vacuum processing method

Ion gun and ion milling machine

Sample protection device for scanning electron microscopy

Systems and apparatuses for contamination-free vacuum transfer of s...

Ion generation device and ion generation method

Vacuum compatible X-ray shield

Replaceable module for a charged particle apparatus

Workpiece processing apparatus with plasma and thermal processing s...

Electron beam apparatus and method for controlling electron beam ap...

Plasma processing system and method using radio frequency (RF) and...

System for evacuating a chamber

Method for producing coated substrates

Plasma processing apparatus

Method and apparatus for reducing vacuum loss in an ion implantatio...

Transport apparatus and method for transferring a sample between tw...

Plasma processing apparatus

Method and system for the removal and/or avoidance of contamination...

Ion implanter and electrostatic quadrupole lens device

Sample holder and charged particle beam system

Charged particle beam system

Back-scatter electrons (BSE) imaging with a SEM in tilted mode usin...

Plasma processing apparatus

Plasma processing apparatus

Vacuum processing apparatus and operating method of vacuum processi...

Plasma processing apparatus

Plasma treatment apparatus and method

Enhanced electron beam generation

Patents Applicationslast 30 patents

METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN

SEMICONDUCTOR PROCESSING APPARATUS

TRANSMISSION ELECTRON MICROSCOPE

Concentrated Solar Irradiation of Targets in Plasmas

Advanced OES Characterization

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

Device For Interfacing A Sample Transfer Device To An Analytic Or S...

MATERIAL SURFACE REFORMING APPARATUS USING ION IMPLANTATION

Workpiece Processing Apparatus with Plasma and Thermal Processing S...

ELECTRON GUN CHAMBER FOR SCANNING ELECTRON MICROSCOPE, ELECTRON GUN...

MAGNETRON SPUTTER DEVICE

Transmission Electron Microscope

VAPORIZER, ION SOURCE, ION BEAM IRRADIATION APPARATUS, AND AN OPERA...

USING LASER BEAM FOR SEM BASE TOOLS, WORKING DISTANCE MEASUREMENT A...

Charged Particle Beam Device and Sample Analysis Method

Laser Thermal Epitaxy in a Charged Particle Microscope

CHARGED PARTICLE MICROSCOPE HAVING VACUUM IN SPECIMEN CHAMBER

DEVICE FOR IMAGING AND PROCESSING A SAMPLE USING A FOCUSED PARTICLE...

DETECTOR AND METHOD FOR OBTAINING KIKUCHI IMAGES

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

Vacuum Treatment Apparatus and Vacuum Treatment Method

PROCESS APPARATUS

STAGE DEVICE, CHARGED PARTICLE BEAM DEVICE, AND VACUUM DEVICE

FOCUSED CHARGED PARTICLE BEAM APPARATUS

Charged Particle Beam Source and Charged Particle Beam System

FOCUSED ION BEAM SYSTEM

SYSTEMS AND APPARATUSES FOR CONTAMINATION-FREE VACUUM TRANSFER OF S...

HIGH VOLTAGE FEEDTHROUGH AND CONNECTOR FOR A CHARGED PARTICLE APPAR...