Variable cross-section or shape

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CPC
H01J2237/0835

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0835Variable cross-section or shape

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ion source and ion implantation apparatus
- Patent number 10,573,490
- Issue date Feb 25, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for controlling a high power ion beam
- Patent number 9,887,066
- Issue date Feb 6, 2018
- NEUTRON THERAPEUTICS INC.
- Geoffrey Ryding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for optimizing diffusion section of electron beam
- Patent number 9,767,985
- Issue date Sep 19, 2017
- Huazhong University of Science & Technology
- Jiang Huang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lower dose rate ion implantation using a wider ion beam
- Patent number 9,748,072
- Issue date Aug 29, 2017
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam applied apparatus, and irradiation method
- Patent number 8,907,278
- Issue date Dec 9, 2014
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter
- Patent number 8,653,490
- Issue date Feb 18, 2014
- Nissin Ion Equipment Co., Ltd.
- Masao Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
External cathode ion source
- Patent number 8,502,161
- Issue date Aug 6, 2013
- Semequip, Inc.
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-vacuum variable aperture mechanism and method of using same
- Patent number 8,278,623
- Issue date Oct 2, 2012
- KLA-Tencor Corporation
- Mohammed Tahmassebpur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation ion source, system and method
- Patent number 8,154,210
- Issue date Apr 10, 2012
- Semequip, Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion source with adjustable aperture
- Patent number 8,089,052
- Issue date Jan 3, 2012
- Axcelis Technologies, Inc.
- Daniel Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of acquiring offset deflection amount for shaped beam and li...
- Patent number 8,008,631
- Issue date Aug 30, 2011
- Nuflare Technology, Inc.
- Takahito Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion beam system and machining method
- Patent number 7,952,083
- Issue date May 31, 2011
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Grant
External cathode ion source
- Patent number 7,838,850
- Issue date Nov 23, 2010
- Semequip, Inc.
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and method for adjusting ion beam
- Patent number 7,807,986
- Issue date Oct 5, 2010
- Advanced Ion Beam Technology, Inc.
- Ko-Chuan Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual mode ion source for ion implantation
- Patent number 7,800,312
- Issue date Sep 21, 2010
- Semequip, Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling beam current uniformity in an...
- Patent number 7,767,986
- Issue date Aug 3, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation ion source, system and method
- Patent number 7,732,787
- Issue date Jun 8, 2010
- SemEquip, Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Variable shaped electron beam lithography system and method for man...
- Patent number 7,714,308
- Issue date May 11, 2010
- Elpida Memory, Inc.
- Masahito Hiroshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle exposure apparatus
- Patent number 7,598,499
- Issue date Oct 6, 2009
- IMS Nanofabrications AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and polishing system using the same
- Patent number 7,567,026
- Issue date Jul 28, 2009
- Hon Hai Precision Industry Co., Ltd.
- Ga-Lane Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation ion source, system and method
- Patent number 7,479,643
- Issue date Jan 20, 2009
- SemEquip, Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Irradiation system ion beam and method to enhance accuracy of irrad...
- Patent number 7,429,743
- Issue date Sep 30, 2008
- Sen Corporation
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase low-energy beam current in irradiation system wi...
- Patent number 7,361,892
- Issue date Apr 22, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Irradiation system with ion beam
- Patent number 7,351,987
- Issue date Apr 1, 2008
- SEN Corporation, an SHI and Axcelis Company
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam system and machining method
- Patent number 7,326,942
- Issue date Feb 5, 2008
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Grant
Ion implantation ion source, system and method
- Patent number 7,185,602
- Issue date Mar 6, 2007
- SemEquip, Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implantation ion source, system and method
- Patent number 7,112,804
- Issue date Sep 26, 2006
- SemEquip, Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implantation ion source, system and method
- Patent number 7,107,929
- Issue date Sep 19, 2006
- SemEquip, Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implantation ion source, system and method
- Patent number 7,022,999
- Issue date Apr 4, 2006
- Semequip Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric beamline and methods for generating a mass-analyzed ribbo...
- Patent number 6,885,014
- Issue date Apr 26, 2005
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...
- Publication number 20240212967
- Publication date Jun 27, 2024
- PHOTO ELECTRON SOUL INC.
- Tomohiro NISHITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTIC...
- Publication number 20230065475
- Publication date Mar 2, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE AND ION IMPLANTATION APPARATUS
- Publication number 20190326089
- Publication date Oct 24, 2019
- NISSIN ION EQUIPMENT CO., LTD.
- Tetsuro YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR CONTROLLING A HIGH POWER ION BEAM
- Publication number 20170178859
- Publication date Jun 22, 2017
- Geoffrey Ryding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WRITING DATA CORRECTING METHOD, WRITING METHOD, AND MANUFACTURING M...
- Publication number 20150060704
- Publication date Mar 5, 2015
- Kabushiki Kaisha Toshiba
- Keisuke YAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPLIED APPARATUS, AND IRRADIATION METHOD
- Publication number 20130299697
- Publication date Nov 14, 2013
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS FIELD IONIZATION ION SOURCE, SCANNING CHARGED PARTICLE MICROSCO...
- Publication number 20130087704
- Publication date Apr 11, 2013
- Hitachi High-Technologies Corporation
- Tohru Ishitani
- B82 - NANO-TECHNOLOGY
Information Patent Application
ION IMPLANTER
- Publication number 20130042809
- Publication date Feb 21, 2013
- NISSIN ION EQUIPMENT CO., LTD.
- Masao Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-Vacuum Variable Aperture Mechanism And Method Of Using Same
- Publication number 20120181444
- Publication date Jul 19, 2012
- Mohammed TAHMASSEBPUR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLUME STEERING
- Publication number 20120080308
- Publication date Apr 5, 2012
- VEECO INSTRUMENTS, INC.
- Ikuya Kameyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION Beam System and Machining Method
- Publication number 20110204225
- Publication date Aug 25, 2011
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON BEAM GENERATOR HAVING ADJUSTABLE BEAM WIDTH
- Publication number 20110199027
- Publication date Aug 18, 2011
- Yong Hwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTERNAL CATHODE ION SOURCE
- Publication number 20100320395
- Publication date Dec 23, 2010
- SemEquip, Inc.
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD
- Publication number 20100148089
- Publication date Jun 17, 2010
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ACQUIRING OFFSET DEFLECTION AMOUNT FOR SHAPED BEAM AND LI...
- Publication number 20100001203
- Publication date Jan 7, 2010
- NuFlare Technology, Inc.
- Takahito Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN...
- Publication number 20090314962
- Publication date Dec 24, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh DORAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH ADJUSTABLE APERTURE
- Publication number 20090266997
- Publication date Oct 29, 2009
- Axcelis Technologies, Inc.
- Daniel Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas field ionization ion source, scanning charged particle microsco...
- Publication number 20090152462
- Publication date Jun 18, 2009
- Hitachi High-Technologies Corporation
- Tohru Ishitani
- B82 - NANO-TECHNOLOGY
Information Patent Application
TECHNIQUES FOR SHAPING AN ION BEAM
- Publication number 20090121149
- Publication date May 14, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Svetlana Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20090057558
- Publication date Mar 5, 2009
- HITACHI
- Toru Iwaya
- G01 - MEASURING TESTING
Information Patent Application
EXTERNAL CATHODE ION SOURCE
- Publication number 20090014667
- Publication date Jan 15, 2009
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Beam System And Machining method
- Publication number 20080135779
- Publication date Jun 12, 2008
- Hiroyasu Shichi
- G01 - MEASURING TESTING
Information Patent Application
Charged-particle exposure apparatus
- Publication number 20080099693
- Publication date May 1, 2008
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Variable shaped electron beam lithography system and method for man...
- Publication number 20080054196
- Publication date Mar 6, 2008
- Elpida Memory, Inc.
- Masahito Hiroshima
- B82 - NANO-TECHNOLOGY
Information Patent Application
Ion implantation ion source, system and method
- Publication number 20070262262
- Publication date Nov 15, 2007
- SemEquip, Inc.
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION SOURCE AND POLISHING SYSTEM USING THE SAME
- Publication number 20070132358
- Publication date Jun 14, 2007
- HON HAI Precision Industry CO., LTD.
- Ga-Lane Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implantation ion source, system and method
- Publication number 20070108394
- Publication date May 17, 2007
- Thomas Neil Horsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ion implantation ion source, system and method
- Publication number 20070107841
- Publication date May 17, 2007
- SemEquip, Inc.
- Thomas Neil Horsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to increase low-energy beam current in irradiation system wi...
- Publication number 20060113465
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Irradiation system ion beam and method to enhance accuracy of irrad...
- Publication number 20060113493
- Publication date Jun 1, 2006
- SUMITOMO EATON NOVA CORPORATION
- Mitsuaki Kabasawa
- H01 - BASIC ELECTRIC ELEMENTS

Variable cross-section or shape

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ion source and ion implantation apparatus

Systems for controlling a high power ion beam

Device and method for optimizing diffusion section of electron beam

Lower dose rate ion implantation using a wider ion beam

Charged particle beam applied apparatus, and irradiation method

Ion implanter

External cathode ion source

High-vacuum variable aperture mechanism and method of using same

Ion implantation ion source, system and method

Ion source with adjustable aperture

Method of acquiring offset deflection amount for shaped beam and li...

Ion beam system and machining method

External cathode ion source

Ion implanter and method for adjusting ion beam

Dual mode ion source for ion implantation

Method and apparatus for controlling beam current uniformity in an...

Ion implantation ion source, system and method

Variable shaped electron beam lithography system and method for man...

Charged-particle exposure apparatus

Ion source and polishing system using the same

Ion implantation ion source, system and method

Irradiation system ion beam and method to enhance accuracy of irrad...

Method to increase low-energy beam current in irradiation system wi...

Irradiation system with ion beam

Ion beam system and machining method

Ion implantation ion source, system and method

Ion implantation ion source, system and method

Ion implantation ion source, system and method

Ion implantation ion source, system and method

Symmetric beamline and methods for generating a mass-analyzed ribbo...

Patents Applicationslast 30 patents

ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...

PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTIC...

ION SOURCE AND ION IMPLANTATION APPARATUS

SYSTEMS FOR CONTROLLING A HIGH POWER ION BEAM

WRITING DATA CORRECTING METHOD, WRITING METHOD, AND MANUFACTURING M...

CHARGED PARTICLE BEAM APPLIED APPARATUS, AND IRRADIATION METHOD

GAS FIELD IONIZATION ION SOURCE, SCANNING CHARGED PARTICLE MICROSCO...

ION IMPLANTER

High-Vacuum Variable Aperture Mechanism And Method Of Using Same

PLUME STEERING

ION Beam System and Machining Method

ELECTRON BEAM GENERATOR HAVING ADJUSTABLE BEAM WIDTH

EXTERNAL CATHODE ION SOURCE

ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD

METHOD OF ACQUIRING OFFSET DEFLECTION AMOUNT FOR SHAPED BEAM AND LI...

METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN...

ION SOURCE WITH ADJUSTABLE APERTURE

Gas field ionization ion source, scanning charged particle microsco...

TECHNIQUES FOR SHAPING AN ION BEAM

SCANNING ELECTRON MICROSCOPE

EXTERNAL CATHODE ION SOURCE

Ion Beam System And Machining method

Charged-particle exposure apparatus

Variable shaped electron beam lithography system and method for man...

Ion implantation ion source, system and method

ION SOURCE AND POLISHING SYSTEM USING THE SAME

Ion implantation ion source, system and method

Ion implantation ion source, system and method

Method to increase low-energy beam current in irradiation system wi...

Irradiation system ion beam and method to enhance accuracy of irrad...