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H01J2237/30494

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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H01J2237/30494Vector scan

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Patents Grantslast 30 patents

Information Patent Grant
Operating a particle beam apparatus with an object holder
- Patent number 11,688,583
- Issue date Jun 27, 2023
- Carl Zeiss Microscopy GmbH
- Alexander Orchowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross section processing method and method of manufacturing cross s...
- Patent number 8,703,247
- Issue date Apr 22, 2014
- SII NanoTechnology Inc.
- Hidekazu Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle optics with azimuthally-varying third-order aberra...
- Patent number 8,242,457
- Issue date Aug 14, 2012
- Multibeam Corporation
- N. William Parker
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of implanting a substrate and an ion implanter for performin...
- Patent number 7,282,427
- Issue date Oct 16, 2007
- Applied Materials, Inc.
- Adrian Murrell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam exposure writing strategy system and method
- Patent number 7,244,953
- Issue date Jul 17, 2007
- Applied Materials, Inc.
- Benyamin Buller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and machine for pattern writing by an electron beam
- Patent number 6,781,140
- Issue date Aug 24, 2004
- Leica Microsystems Lithography Limited
- David Martin Platton King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged beam pattern data generating method and a charged beam patt...
- Patent number 5,812,412
- Issue date Sep 22, 1998
- Mitsubishi Denki Kabushiki Kaisha
- Koichi Moriizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Virtual addressing for E-beam lithography
- Patent number 4,498,010
- Issue date Feb 5, 1985
- The Perkin-Elmer Corporation
- Charles S. Biechler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam system
- Patent number 4,494,004
- Issue date Jan 15, 1985
- International Business Machines Corporation
- John L. Mauer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Continuously writing electron beam stitched pattern exposure system
- Patent number 4,477,729
- Issue date Oct 16, 1984
- International Business Machines Corporation
- Tai-Hon P. Chang
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
OPERATING A PARTICLE BEAM APPARATUS WITH AN OBJECT HOLDER
- Publication number 20220230843
- Publication date Jul 21, 2022
- CARL ZEISS MICROSCOPY GMBH
- Alexander Orchowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Processing of an Object
- Publication number 20120145895
- Publication date Jun 14, 2012
- CARL ZEISS NTS GMBH
- Josef BIBERGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS SECTION PROCESSING METHOD AND METHOD OF MANUFACTURING CROSS S...
- Publication number 20100189917
- Publication date Jul 29, 2010
- Hidekazu Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE OPTICS WITH AZIMUTHALLY-VARYING THIRD-ORDER ABERRA...
- Publication number 20080224063
- Publication date Sep 18, 2008
- N. William Parker
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF IMPLANTING A SUBSTRATE AND AN ION IMPLANTER FOR PERFORMIN...
- Publication number 20070259511
- Publication date Nov 8, 2007
- Adrian Murrell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam exposure writing strategy system and method
- Publication number 20070075275
- Publication date Apr 5, 2007
- APPLIED MATERIALS, INC.
- Benyamin Buller
- B82 - NANO-TECHNOLOGY

Vector scan

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Operating a particle beam apparatus with an object holder

Cross section processing method and method of manufacturing cross s...

Charged particle optics with azimuthally-varying third-order aberra...

Method of implanting a substrate and an ion implanter for performin...

Beam exposure writing strategy system and method

Method of and machine for pattern writing by an electron beam

Charged beam pattern data generating method and a charged beam patt...

Virtual addressing for E-beam lithography

Electron beam system

Continuously writing electron beam stitched pattern exposure system

Patents Applicationslast 30 patents

OPERATING A PARTICLE BEAM APPARATUS WITH AN OBJECT HOLDER

Method of Processing of an Object

CROSS SECTION PROCESSING METHOD AND METHOD OF MANUFACTURING CROSS S...

CHARGED PARTICLE OPTICS WITH AZIMUTHALLY-VARYING THIRD-ORDER ABERRA...

METHOD OF IMPLANTING A SUBSTRATE AND AN ION IMPLANTER FOR PERFORMIN...

Beam exposure writing strategy system and method