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H01J37/32238

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32238Windows

Industries

Patents Grantslast 30 patents

Information Patent Grant
Artificial diamond plasma production device
- Patent number 12,084,759
- Issue date Sep 10, 2024
- WAVE POWER TECHNOLOGY INC.
- Ming-Hsiung Tsao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching oxide semiconductor film and plasma processing a...
- Patent number 12,068,171
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Masahiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing apparatus
- Patent number 11,996,270
- Issue date May 28, 2024
- Samsung Electronics Co., Ltd.
- Eunhee Jeang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,967,485
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 11,887,819
- Issue date Jan 30, 2024
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 11,854,775
- Issue date Dec 26, 2023
- Board of Trustees of Michigan State University
- Timothy A. Grotjohn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular microwave source with local lorentz force
- Patent number 11,721,532
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming plasma processing apparatus, related apparatus, a...
- Patent number 11,715,628
- Issue date Aug 1, 2023
- Samsung Electronics Co., Ltd.
- Jeongil Mun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 11,495,441
- Issue date Nov 8, 2022
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,424,106
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Yuki Kondo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote modular high-frequency source
- Patent number 11,393,661
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Hanh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma reactor for manufacturing synthetic diamond material
- Patent number 11,371,147
- Issue date Jun 28, 2022
- Element Six Technologies Limited
- Steven Edward Coe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma chemical vapor deposition reactor with a microwave resonant...
- Patent number 11,270,869
- Issue date Mar 8, 2022
- Taiyuan University of Technology
- Shengwang Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,232,932
- Issue date Jan 25, 2022
- HITACHI HIGH-TECH CORPORATION
- Masatoshi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition reactor to grow diamond film by microwave...
- Patent number 11,214,871
- Issue date Jan 4, 2022
- II-VI DELAWARE, INC.
- David Sabens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma probe device and plasma processing apparatus
- Patent number 11,164,730
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elementary device for producing a plasma, having a coaxial applicator
- Patent number 11,120,972
- Issue date Sep 14, 2021
- SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQU...
- Louis Latrasse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quartz component with protective coating
- Patent number 11,087,961
- Issue date Aug 10, 2021
- Lam Research Corporation
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,056,318
- Issue date Jul 6, 2021
- Tokyo Electron Limited
- Takashi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with local Lorentz force
- Patent number 11,037,764
- Issue date Jun 15, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device
- Patent number 10,991,555
- Issue date Apr 27, 2021
- SAMSUNG DISPLAY CO., LTD.
- Soo Beom Jo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source
- Patent number 10,923,324
- Issue date Feb 16, 2021
- Verity Instruments, Inc.
- Mark A. Meloni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating unit and plasma processing apparatus
- Patent number 10,923,323
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Takashi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna device, radiation method of electromagnetic waves, plasma p...
- Patent number 10,896,811
- Issue date Jan 19, 2021
- Tokyo Electron Limited
- Ayako Ito
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Antenna, plasma processing device and plasma processing method
- Patent number 10,832,892
- Issue date Nov 10, 2020
- Tokyo Electron Limited
- Kazuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 10,825,661
- Issue date Nov 3, 2020
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna and plasma processing apparatus
- Patent number 10,825,658
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Yuki Kawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric and irregular shaped plasmas using modular microwave sources
- Patent number 10,707,058
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave control method
- Patent number 10,679,826
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,672,622
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Yusuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing Apparatus
- Publication number 20240339300
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...
- Publication number 20240339299
- Publication date Oct 10, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297020
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...
- Publication number 20240222085
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Koichiro NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20240203692
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Shin OOWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240186115
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE DIELECTRIC CONSTANT CERAMIC WINDOW
- Publication number 20240162010
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Chin-Yi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20230369021
- Publication date Nov 16, 2023
- SEMES CO., LTD.
- Yoon Seok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CEILING WALL
- Publication number 20230343561
- Publication date Oct 26, 2023
- TOKYO ELECTRON LIMITED
- Satoshi ITOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230317421
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Takafumi NOGAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230238217
- Publication date Jul 27, 2023
- TOKYO ELECTRON LIMITED
- Koji KOTANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARTIFICIAL DIAMOND PLASMA PRODUCTION DEVICE
- Publication number 20230220543
- Publication date Jul 13, 2023
- WAVE POWER TECHNOLOGY INC.
- Ming-Hsiung TSAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MICROWAVE RADIATION SOURCE
- Publication number 20230178339
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Kenta KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230178340
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Isao GUNJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230110096
- Publication date Apr 13, 2023
- Hitachi High-Tech Corporation
- Anil PANDEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230106303
- Publication date Apr 6, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20230081103
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Kenta KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS
- Publication number 20230039721
- Publication date Feb 9, 2023
- LAM RESEARCH CORPORATION
- Jon MCCHESNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20230033323
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230031447
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220367156
- Publication date Nov 17, 2022
- Hitachi High-Tech Corporation
- Tatsuya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20220319812
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Hanh NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING APPARATUS
- Publication number 20220216039
- Publication date Jul 7, 2022
- Samsung Electronics Co., Ltd.
- Eunhee Jeang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20220199369
- Publication date Jun 23, 2022
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220068606
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PLASMA PROCESSING APPARATUS, RELATED APPARATUS, A...
- Publication number 20220044912
- Publication date Feb 10, 2022
- Samsung Electronics Co., Ltd.
- Jeongil MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210358722
- Publication date Nov 18, 2021
- Hitachi High-Technologies Corporation
- Anil Pandey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUARTZ COMPONENT WITH PROTECTIVE COATING
- Publication number 20210343510
- Publication date Nov 4, 2021
- LAM RESEARCH CORPORATION
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR MICROWAVE SOURCE WITH LOCAL LORENTZ FORCE
- Publication number 20210287882
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ETCHING OXIDE SEMICONDUCTOR FILM AND PLASMA PROCESSING A...
- Publication number 20210242036
- Publication date Aug 5, 2021
- TOKYO ELECTRON LIMITED
- Masahiro YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Artificial diamond plasma production device

Method for etching oxide semiconductor film and plasma processing a...

Wafer processing apparatus

Plasma processing apparatus and plasma processing method

Systems for cooling RF heated chamber components

Methods and apparatus for microwave plasma assisted chemical vapor...

Modular microwave source with local lorentz force

Method of forming plasma processing apparatus, related apparatus, a...

Systems for cooling RF heated chamber components

Plasma processing apparatus

Remote modular high-frequency source

Microwave plasma reactor for manufacturing synthetic diamond material

Plasma chemical vapor deposition reactor with a microwave resonant...

Plasma processing apparatus and plasma processing method

Chemical vapor deposition reactor to grow diamond film by microwave...

Plasma probe device and plasma processing apparatus

Elementary device for producing a plasma, having a coaxial applicator

Quartz component with protective coating

Plasma processing apparatus

Modular microwave source with local Lorentz force

Plasma processing device

Microwave plasma source

Plasma generating unit and plasma processing apparatus

Antenna device, radiation method of electromagnetic waves, plasma p...

Antenna, plasma processing device and plasma processing method

Systems for cooling RF heated chamber components

Antenna and plasma processing apparatus

Symmetric and irregular shaped plasmas using modular microwave sources

Microwave control method

Etching method and etching apparatus

Patents Applicationslast 30 patents

Plasma Processing Apparatus

MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

PLASMA PROCESSING APPARATUS

ADJUSTABLE DIELECTRIC CONSTANT CERAMIC WINDOW

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

PLASMA PROCESSING APPARATUS AND CEILING WALL

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

ARTIFICIAL DIAMOND PLASMA PRODUCTION DEVICE

PLASMA PROCESSING APPARATUS AND MICROWAVE RADIATION SOURCE

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS

PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

REMOTE MODULAR HIGH-FREQUENCY SOURCE

WAFER PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD OF FORMING PLASMA PROCESSING APPARATUS, RELATED APPARATUS, A...

PLASMA PROCESSING APPARATUS

QUARTZ COMPONENT WITH PROTECTIVE COATING

MODULAR MICROWAVE SOURCE WITH LOCAL LORENTZ FORCE

METHOD FOR ETCHING OXIDE SEMICONDUCTOR FILM AND PLASMA PROCESSING A...