with a treatment

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CPC
H01L21/28176

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/28176with a treatment

Industries

Patents Grantslast 30 patents

Information Patent Grant
Gate structure of semiconductor device and method of manufacture
- Patent number 12,211,701
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a semiconductor device by driving hydrogen into a...
- Patent number 12,183,581
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning threshold voltage through meta stable plasma treatment
- Patent number 12,148,620
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate stack treatment for ferroelectric transistors
- Patent number 12,034,058
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Ming Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field effect transistor having a gate dielectric with a dipole laye...
- Patent number 11,984,506
- Issue date May 14, 2024
- Intel Corporation
- Vishal Tiwari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Partial metal grain size control to improve CMP loading effect
- Patent number 11,978,781
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Anhao Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including buried gate structure and method for...
- Patent number 11,943,912
- Issue date Mar 26, 2024
- SK Hynix Inc.
- Dong-Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of cutting metal gates and structures formed thereof
- Patent number 11,923,251
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsu-Hsiu Perng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of semiconductor device comprising oxide semic...
- Patent number 11,923,204
- Issue date Mar 5, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structures in transistors and method of forming same
- Patent number 11,916,114
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing gate structure with additional oxide layer
- Patent number 11,854,789
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Wei Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heating device for heating object material using laser beam and ind...
- Patent number 11,798,824
- Issue date Oct 24, 2023
- RNR LAB INC.
- Jeong Do Ryu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor device by driving hydrogen into a d...
- Patent number 11,776,814
- Issue date Oct 3, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hongfa Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antiferroelectric gate dielectric transistors and their methods of...
- Patent number 11,764,282
- Issue date Sep 19, 2023
- Intel Corporation
- Ravi Pillarisetty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning threshold voltage through meta stable plasma treatment
- Patent number 11,688,606
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 11,677,012
- Issue date Jun 13, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same including...
- Patent number 11,670,511
- Issue date Jun 6, 2023
- SK Hynix Inc.
- Seon-Haeng Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming memory device
- Patent number 11,637,017
- Issue date Apr 25, 2023
- Powerchip Semiconductor Manufacturing Corporation
- Wen Chung Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate stack treatment for ferroelectric transistors
- Patent number 11,621,338
- Issue date Apr 4, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Ming Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making MOSFET and MOSFET
- Patent number 11,569,093
- Issue date Jan 31, 2023
- Hua Hong Semiconductor (Wuxi) Limited
- Mingxu Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of cutting metal gates and structures formed thereof
- Patent number 11,545,400
- Issue date Jan 3, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsu-Hsiu Perng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Complementary metal oxide semiconductor device having fin field eff...
- Patent number 11,515,217
- Issue date Nov 29, 2022
- International Business Machines Corporation
- Takashi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having fluorine in the interface regions betwe...
- Patent number 11,462,625
- Issue date Oct 4, 2022
- Asahi Kasel Microdevices Corporation
- Shuntaro Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heating device for heating object material using laser beam and ind...
- Patent number 11,462,424
- Issue date Oct 4, 2022
- RNR LAB INC.
- Jeong Do Ryu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide semiconductor-device
- Patent number 11,456,187
- Issue date Sep 27, 2022
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structures in transistors and method of forming same
- Patent number 11,437,474
- Issue date Sep 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dopant profile control in gate structures for semiconductor devices
- Patent number 11,417,571
- Issue date Aug 16, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chandrashekhar Prakash Savant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for forming the same
- Patent number 11,398,383
- Issue date Jul 26, 2022
- Winbond Electronics Corp.
- Hsin-Huang Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including buried gate structure and method for...
- Patent number 11,393,824
- Issue date Jul 19, 2022
- SK Hynix Inc.
- Dong-Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure with additional oxide layer and method for manufactu...
- Patent number 11,362,089
- Issue date Jun 14, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Wei Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE HAVING GATE DIELECTRIC LAYER
- Publication number 20240395564
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Ming CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT
- Publication number 20240387178
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DOPING HIGH-K METAL GATES FOR TUNING THRESHOLD VOLTAGES
- Publication number 20240379365
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Feng Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT METAL GATE STRUCTURE
- Publication number 20240379811
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yong-Tian Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STACK TREATMENT FOR FERROELECTRIC TRANSISTORS
- Publication number 20240322000
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Ming LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240258119
- Publication date Aug 1, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Structures in Transistors and Method of Forming Same
- Publication number 20240162303
- Publication date May 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a Semiconductor Device by Driving Hydrogen into a...
- Publication number 20230386847
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hongfa LUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTIAL METAL GRAIN SIZE CONTROL TO IMPROVE CMP LOADING EFFECT
- Publication number 20230387244
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Anhao CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING AN ELECTRODE STRUCTURE AND APPARATUS FOR FABR...
- Publication number 20230360932
- Publication date Nov 9, 2023
- Samsung Electronics Co., Ltd.
- Dohyung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tuning Threshold Voltage Through Meta Stable Plasma Treatment
- Publication number 20230282484
- Publication date Sep 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gate Stack Treatment For Ferroelectric Transistors
- Publication number 20230238443
- Publication date Jul 27, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Ming LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTIAL METAL GRAIN SIZE CONTROL TO IMPROVE CMP LOADING EFFECT
- Publication number 20230063995
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Anhao CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20230019824
- Publication date Jan 19, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING DEVICE FOR HEATING OBJECT MATERIAL USING LASER BEAM AND IND...
- Publication number 20220392788
- Publication date Dec 8, 2022
- RNR LAB INC.
- Jeong Do RYU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Structures in Transistors and Method of Forming Same
- Publication number 20220336591
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPANT PROFILE CONTROL IN GATE STRUCTURES FOR SEMICONDUCTOR DEVICES
- Publication number 20220336289
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chandrashekhar Prakash SAVANT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING BURIED GATE STRUCTURE AND METHOD FOR...
- Publication number 20220320102
- Publication date Oct 6, 2022
- SK HYNIX INC.
- Dong-Soo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20220310405
- Publication date Sep 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for Doping High-K Metal Gates for Tuning Threshold Voltages
- Publication number 20220285161
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Feng Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR STRUCTURE, AND SEMICONDUCTOR...
- Publication number 20220223421
- Publication date Jul 14, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Mengmeng YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tuning Threshold Voltage Through Meta Stable Plasma Treatment
- Publication number 20220139712
- Publication date May 5, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MAKING MOSFET AND MOSFET
- Publication number 20220059354
- Publication date Feb 24, 2022
- Hua Hong Semiconductor (Wuxi) Limited
- Mingxu FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURES IN TRANSISTORS AND METHOD OF FORMING SAME
- Publication number 20220052162
- Publication date Feb 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIELD EFFECT TRANSISTOR HAVING A GATE DIELECTRIC WITH A DIPOLE LAYE...
- Publication number 20210408282
- Publication date Dec 30, 2021
- Intel Corporation
- Vishal TIWARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTIFERROELECTRIC GATE DIELECTRIC TRANSISTORS AND THEIR METHODS OF...
- Publication number 20210399113
- Publication date Dec 23, 2021
- Intel Corporation
- Ravi Pillarisetty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20210398813
- Publication date Dec 23, 2021
- WINBOND ELECTRONICS CORP.
- Hsin-Huang SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPANT PROFILE CONTROL IN GATE STRUCTURES FOR SEMICONDUCTOR DEVICES
- Publication number 20210391220
- Publication date Dec 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chandrashekhar Prakash SAVANT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STACK TREATMENT FOR FERROELECTRIC TRANSISTORS
- Publication number 20210351278
- Publication date Nov 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Ming LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME INCLUDING...
- Publication number 20210327716
- Publication date Oct 21, 2021
- SK HYNIX INC.
- Seon-Haeng LEE
- H01 - BASIC ELECTRIC ELEMENTS

with a treatment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Gate structure of semiconductor device and method of manufacture

Method of forming a semiconductor device by driving hydrogen into a...

Tuning threshold voltage through meta stable plasma treatment

Gate stack treatment for ferroelectric transistors

Field effect transistor having a gate dielectric with a dipole laye...

Partial metal grain size control to improve CMP loading effect

Semiconductor device including buried gate structure and method for...

Methods of cutting metal gates and structures formed thereof

Manufacturing method of semiconductor device comprising oxide semic...

Gate structures in transistors and method of forming same

Method for manufacturing gate structure with additional oxide layer

Heating device for heating object material using laser beam and ind...

Method of forming semiconductor device by driving hydrogen into a d...

Antiferroelectric gate dielectric transistors and their methods of...

Tuning threshold voltage through meta stable plasma treatment

Method of manufacturing semiconductor devices

Semiconductor device and method for fabricating the same including...

Method of forming memory device

Gate stack treatment for ferroelectric transistors

Method for making MOSFET and MOSFET

Methods of cutting metal gates and structures formed thereof

Complementary metal oxide semiconductor device having fin field eff...

Semiconductor device having fluorine in the interface regions betwe...

Heating device for heating object material using laser beam and ind...

Oxide semiconductor-device

Gate structures in transistors and method of forming same

Dopant profile control in gate structures for semiconductor devices

Semiconductor structure and method for forming the same

Semiconductor device including buried gate structure and method for...

Gate structure with additional oxide layer and method for manufactu...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE STRUCTURE HAVING GATE DIELECTRIC LAYER

TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT

METHODS FOR DOPING HIGH-K METAL GATES FOR TUNING THRESHOLD VOLTAGES

INTEGRATED CIRCUIT METAL GATE STRUCTURE

GATE STACK TREATMENT FOR FERROELECTRIC TRANSISTORS

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Gate Structures in Transistors and Method of Forming Same

Method of Forming a Semiconductor Device by Driving Hydrogen into a...

PARTIAL METAL GRAIN SIZE CONTROL TO IMPROVE CMP LOADING EFFECT

METHOD OF FABRICATING AN ELECTRODE STRUCTURE AND APPARATUS FOR FABR...

Tuning Threshold Voltage Through Meta Stable Plasma Treatment

Gate Stack Treatment For Ferroelectric Transistors

PARTIAL METAL GRAIN SIZE CONTROL TO IMPROVE CMP LOADING EFFECT

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

HEATING DEVICE FOR HEATING OBJECT MATERIAL USING LASER BEAM AND IND...

Gate Structures in Transistors and Method of Forming Same

DOPANT PROFILE CONTROL IN GATE STRUCTURES FOR SEMICONDUCTOR DEVICES

SEMICONDUCTOR DEVICE INCLUDING BURIED GATE STRUCTURE AND METHOD FOR...

GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

Methods for Doping High-K Metal Gates for Tuning Threshold Voltages

MANUFACTURING METHOD FOR SEMICONDUCTOR STRUCTURE, AND SEMICONDUCTOR...

Tuning Threshold Voltage Through Meta Stable Plasma Treatment

METHOD FOR MAKING MOSFET AND MOSFET

GATE STRUCTURES IN TRANSISTORS AND METHOD OF FORMING SAME

FIELD EFFECT TRANSISTOR HAVING A GATE DIELECTRIC WITH A DIPOLE LAYE...

ANTIFERROELECTRIC GATE DIELECTRIC TRANSISTORS AND THEIR METHODS OF...

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

DOPANT PROFILE CONTROL IN GATE STRUCTURES FOR SEMICONDUCTOR DEVICES

GATE STACK TREATMENT FOR FERROELECTRIC TRANSISTORS

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME INCLUDING...