with electrostatic means

Industry

CPC
H01J2237/04756

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/04756with electrostatic means

Industries

Patents Grantslast 30 patents

Information Patent Grant
Stage apparatus suitable for a particle beam apparatus
- Patent number 11,908,656
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Han Willem Hendrik Severt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cell detector for charged particles
- Patent number 11,784,024
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Joe Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus and composite beam apparatus
- Patent number 11,682,536
- Issue date Jun 20, 2023
- Hitachi High-Tech Science Corporation
- Koji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,562,882
- Issue date Jan 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Method of manufacturing a charged particle detector
- Patent number 11,417,498
- Issue date Aug 16, 2022
- FEI Company
- Bart Jozef Janssen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and method for adjusting position of d...
- Patent number 11,342,155
- Issue date May 24, 2022
- HITACHI HIGH-TECH CORPORATION
- Yuta Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cell detector for charged particles
- Patent number 11,222,766
- Issue date Jan 11, 2022
- ASML Netherlands B.V.
- Joe Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope with composite detection system and sp...
- Patent number 11,145,487
- Issue date Oct 12, 2021
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,133,148
- Issue date Sep 28, 2021
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,037,758
- Issue date Jun 15, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
High-current ion implanter and method for controlling ion beam usin...
- Patent number 11,011,343
- Issue date May 18, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive beam optic containing internal heating element
- Patent number 10,879,038
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Scott E. Peitzsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for decelerated ion beam with no energy co...
- Patent number 10,692,697
- Issue date Jun 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,600,612
- Issue date Mar 24, 2020
- Hitachi High-Tech Science Corporation
- Toshiyuki Iwahori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical systems and arrangements and particle-optical comp...
- Patent number 10,504,681
- Issue date Dec 10, 2019
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion implantation method and ion implantation apparatus performing t...
- Patent number 10,002,799
- Issue date Jun 19, 2018
- BOE Technology Group Co., Ltd.
- Hui Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam device
- Patent number 9,966,218
- Issue date May 8, 2018
- Hitachi High-Technologies Corporation
- Tsunenori Nomaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deceleration apparatus for ribbon and spot beams
- Patent number 9,824,850
- Issue date Nov 21, 2017
- Advanced Ion Beam Technology, Inc.
- Nicholas White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical systems and arrangements and particle-optical comp...
- Patent number 9,673,024
- Issue date Jun 6, 2017
- Applied Materials Israel, Ltd.
- Rainer Knippelmeyer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion beam line
- Patent number 9,502,213
- Issue date Nov 22, 2016
- Nissin Ion Equipment Co., Ltd.
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 9,324,540
- Issue date Apr 26, 2016
- Hitachi High-Technologies Corporation
- Ichiro Tachibana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical systems and arrangements and particle-optical comp...
- Patent number 9,224,576
- Issue date Dec 29, 2015
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Deceleration apparatus for ribbon and spot beams
- Patent number 8,941,077
- Issue date Jan 27, 2015
- Advanced Ion Beam Technology, Inc.
- Nicholas White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle detector
- Patent number 8,907,305
- Issue date Dec 9, 2014
- FEI Company
- Eric Kneedler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Switchable multi perspective detector, optics therefor and method o...
- Patent number 8,723,117
- Issue date May 13, 2014
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Stefan Lanio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical systems and arrangements and particle-optical comp...
- Patent number 8,637,834
- Issue date Jan 28, 2014
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
In-vacuum beam defining aperture cleaning for particle reduction
- Patent number 8,604,418
- Issue date Dec 10, 2013
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam processing
- Patent number 8,598,542
- Issue date Dec 3, 2013
- FEI Company
- Milos Toth
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Scanning electron microscope
- Patent number 8,487,253
- Issue date Jul 16, 2013
- Hitachi High-Technologies Corporation
- Minoru Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240242921
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DEVICE AND METHOD
- Publication number 20240087835
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20230230795
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CELL DETECTOR FOR CHARGED PARTICLES
- Publication number 20220246391
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Joe WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE APPARATUS SUITABLE FOR A PARTICLE BEAM APPARATUS
- Publication number 20220028648
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Han Willem Hendrik SEVERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20210384007
- Publication date Dec 9, 2021
- HITACHI HIGH-TECH CORPORATION
- Takuma YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM APPARATUS AND COMPOSITE BEAM APPARATUS
- Publication number 20210296079
- Publication date Sep 23, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Koji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Method for Adjusting Position of D...
- Publication number 20210296081
- Publication date Sep 23, 2021
- Hitachi High-Tech Corporation
- Yuta IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE WITH COMPOSITE DETECTION SYSTEM AND SP...
- Publication number 20210066031
- Publication date Mar 4, 2021
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A CHARGED PARTICLE DETECTOR
- Publication number 20210020400
- Publication date Jan 21, 2021
- FEI Company
- Bart Jozef Janssen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-CURRENT ION IMPLANTER AND METHOD FOR CONTROLLING ION BEAM USIN...
- Publication number 20210020399
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20210013001
- Publication date Jan 14, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
MULTI-CELL DETECTOR FOR CHARGED PARTICLES
- Publication number 20200286708
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Joe WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20190362929
- Publication date Nov 28, 2019
- Hitachi High-Technologies Corporation
- Takuma YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE-OPTICAL SYSTEMS AND ARRANGEMENTS AND PARTICLE-OPTICAL COMP...
- Publication number 20170287674
- Publication date Oct 5, 2017
- CARL ZEISS MICROSCOPY GMBH
- Rainer KNIPPELMEYER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Beam Device
- Publication number 20170040139
- Publication date Feb 9, 2017
- Tsunenori NOMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Beam Line
- Publication number 20160005570
- Publication date Jan 7, 2016
- NISSIN ION EQUIPMENT CO., LTD.
- Sami K. Hahto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particle-Optical Systems and Arrangements and Particle-Optical Comp...
- Publication number 20140158902
- Publication date Jun 12, 2014
- APPLIED MATERIALS ISRAEL, LTD.
- Rainer Knippelmeyer
- B82 - NANO-TECHNOLOGY
Information Patent Application
INSULATING-LAYER-CONTAINING CERAMIC MEMBER, METAL-MEMBER-CONTAINING...
- Publication number 20130284948
- Publication date Oct 31, 2013
- KYOCERA CORPORATION
- Kouichi Iwamoto
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
SWITCHABLE MULTI PERSPECTIVE DETECTOR, OPTICS THEREFOR AND METHOD O...
- Publication number 20130270438
- Publication date Oct 17, 2013
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik GmbH
- Stefan LANIO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DETECTOR
- Publication number 20130214156
- Publication date Aug 22, 2013
- FEI Company
- Eric Kneedler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND AN APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON...
- Publication number 20120132801
- Publication date May 31, 2012
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Particle-Optical Systems and Arrangements and Particle-Optical Comp...
- Publication number 20120104252
- Publication date May 3, 2012
- Applied Materials Israel Ltd.
- Rainer KNIPPELMEYER
- B82 - NANO-TECHNOLOGY
Information Patent Application
DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS
- Publication number 20120097861
- Publication date Apr 26, 2012
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Nicholas White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Processing Substrate Using Neutralized Bea...
- Publication number 20120068058
- Publication date Mar 22, 2012
- Do-Haing Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20120061566
- Publication date Mar 15, 2012
- Hitachi High-Technologies Corporation
- Minoru YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Distributed Potential Charged Particle Detector
- Publication number 20120037802
- Publication date Feb 16, 2012
- FEI Company
- Eric Kneedler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Vacuum Beam Defining Aperture Cleaning for Particle Reduction
- Publication number 20110240889
- Publication date Oct 6, 2011
- Acelis Technologies. Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWIN BEAM CHARGED PARTICLE COLUMN AND METHOD OF OPERATING THEREOF
- Publication number 20110220795
- Publication date Sep 15, 2011
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Jürgen FROSIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM PROCESSING
- Publication number 20100224592
- Publication date Sep 9, 2010
- FEI Company
- MILOS TOTH
- B81 - MICRO-STRUCTURAL TECHNOLOGY

with electrostatic means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Stage apparatus suitable for a particle beam apparatus

Multi-cell detector for charged particles

Particle beam apparatus and composite beam apparatus

Scanning electron microscope

In-situ plasma cleaning of process chamber components

Method of manufacturing a charged particle detector

Charged particle beam device and method for adjusting position of d...

Multi-cell detector for charged particles

Scanning electron microscope with composite detection system and sp...

Scanning electron microscope

In-situ plasma cleaning of process chamber components

High-current ion implanter and method for controlling ion beam usin...

Conductive beam optic containing internal heating element

Apparatus and techniques for decelerated ion beam with no energy co...

Charged particle beam apparatus

Particle-optical systems and arrangements and particle-optical comp...

Ion implantation method and ion implantation apparatus performing t...

Electron beam device

Deceleration apparatus for ribbon and spot beams

Particle-optical systems and arrangements and particle-optical comp...

Ion beam line

Charged particle beam device

Particle-optical systems and arrangements and particle-optical comp...

Deceleration apparatus for ribbon and spot beams

Charged particle detector

Switchable multi perspective detector, optics therefor and method o...

Particle-optical systems and arrangements and particle-optical comp...

In-vacuum beam defining aperture cleaning for particle reduction

Charged particle beam processing

Scanning electron microscope

Patents Applicationslast 30 patents

CHARGED PARTICLE APPARATUS AND METHOD

CHARGED PARTICLE DEVICE AND METHOD

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

MULTI-CELL DETECTOR FOR CHARGED PARTICLES

STAGE APPARATUS SUITABLE FOR A PARTICLE BEAM APPARATUS

Scanning Electron Microscope

PARTICLE BEAM APPARATUS AND COMPOSITE BEAM APPARATUS

Charged Particle Beam Device and Method for Adjusting Position of D...

SCANNING ELECTRON MICROSCOPE WITH COMPOSITE DETECTION SYSTEM AND SP...

METHOD OF MANUFACTURING A CHARGED PARTICLE DETECTOR

HIGH-CURRENT ION IMPLANTER AND METHOD FOR CONTROLLING ION BEAM USIN...

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

MULTI-CELL DETECTOR FOR CHARGED PARTICLES

Scanning Electron Microscope

PARTICLE-OPTICAL SYSTEMS AND ARRANGEMENTS AND PARTICLE-OPTICAL COMP...

Electron Beam Device

Ion Beam Line

Particle-Optical Systems and Arrangements and Particle-Optical Comp...

INSULATING-LAYER-CONTAINING CERAMIC MEMBER, METAL-MEMBER-CONTAINING...

SWITCHABLE MULTI PERSPECTIVE DETECTOR, OPTICS THEREFOR AND METHOD O...

CHARGED PARTICLE DETECTOR

METHOD AND AN APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON...

Particle-Optical Systems and Arrangements and Particle-Optical Comp...

DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS

Apparatus and Method for Processing Substrate Using Neutralized Bea...

SCANNING ELECTRON MICROSCOPE

Distributed Potential Charged Particle Detector

In-Vacuum Beam Defining Aperture Cleaning for Particle Reduction

TWIN BEAM CHARGED PARTICLE COLUMN AND METHOD OF OPERATING THEREOF

CHARGED PARTICLE BEAM PROCESSING