with gaseous HF

Industry

CPC
H01L21/02049

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02049with gaseous HF

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for cleaning high aspect ratio structures
- Patent number 12,170,196
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Schubert S. Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System with substrate carrier deterioration detection and repair
- Patent number 12,162,134
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Ti Wang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 12,148,597
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Low-temperature plasma pre-clean for selective gap fill
- Patent number 11,955,381
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Yi Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry non-plasma treatment system
- Patent number 11,745,202
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Martin Kent
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-based process for production of F and HF from benign precurs...
- Patent number 11,626,291
- Issue date Apr 11, 2023
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Grant
Methods and systems for cleaning high aspect ratio structures
- Patent number 11,605,544
- Issue date Mar 14, 2023
- Applied Materials, Inc.
- Schubert S. Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate carrier deterioration detection and repair
- Patent number 11,584,019
- Issue date Feb 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Ti Wang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 11,581,165
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method in inspection apparatus, and the inspection apparatus
- Patent number 11,515,141
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Hiroyuki Nakayama
- B08 - CLEANING
Information Patent Grant
Plasma-based process for production of F and HF from benign precurs...
- Patent number 11,404,280
- Issue date Aug 2, 2022
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,373,876
- Issue date Jun 28, 2022
- Tokyo Electron Limited
- Satoshi Takagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Element chip manufacturing method
- Patent number 11,189,480
- Issue date Nov 30, 2021
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Shogo Okita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 11,164,737
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Lara Hawrylchak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method
- Patent number 11,087,979
- Issue date Aug 10, 2021
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxy system integrated with high selectivity oxide removal and h...
- Patent number 11,049,719
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Hydrogen fluoride vapor phase corrosion method
- Patent number 11,031,260
- Issue date Jun 8, 2021
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Kaidong Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 10,903,054
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate carrier deterioration detection and repair
- Patent number 10,861,692
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Ti Wang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma-based process for production of F and HF from benign precurs...
- Patent number 10,854,441
- Issue date Dec 1, 2020
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Grant
Semiconductor device
- Patent number 10,644,008
- Issue date May 5, 2020
- Samsung Electronics Co., Ltd.
- Jun-won Lee
- G11 - INFORMATION STORAGE
Information Patent Grant
Substrate treatment method and substrate treatment apparatus
- Patent number 10,629,446
- Issue date Apr 21, 2020
- Tokyo Electron Limited
- Masahiko Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-clean of silicon germanium for pre-metal contact at source and...
- Patent number 10,615,034
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Bo Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and guide portion
- Patent number 10,513,774
- Issue date Dec 24, 2019
- Kokusai Electric Corporation
- Masato Terasaki
- B08 - CLEANING
Information Patent Grant
Naturally oxidized film removing method and naturally oxidized film...
- Patent number 10,460,946
- Issue date Oct 29, 2019
- Tokyo Electron Limited
- Jun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for reducing contamination for reliable bond pads
- Patent number 10,410,854
- Issue date Sep 10, 2019
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Honghui Mou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for cleaning semiconductor device structure wi...
- Patent number 10,269,556
- Issue date Apr 23, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Shu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method
- Patent number 10,199,221
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for selective deposition
- Patent number 10,199,215
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Abhishek Dube
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ASSISTED DAMAGE ENGINEERING DURING ION IMPLANTATION
- Publication number 20240153775
- Publication date May 9, 2024
- Applied Materials, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240030022
- Publication date Jan 25, 2024
- Jusung Engineering Co., Ltd.
- Ji Hoon KIM
- B08 - CLEANING
Information Patent Application
APPARATUS FOR MANUFACTURING DISPLAY APPARATUS AND METHOD OF MANUFAC...
- Publication number 20230395365
- Publication date Dec 7, 2023
- SAMSUNG DISPLAY CO., LTD.
- Gugrae Jo
- B08 - CLEANING
Information Patent Application
MULTI-ZONE GAS DISTRIBUTION SYSTEMS AND METHODS
- Publication number 20230197416
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR CLEANING HIGH ASPECT RATIO STRUCTURES
- Publication number 20230170228
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Schubert S. CHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL LAYER DEPOSITION METHODS, SEMICONDUCTOR PROCESSING SYSTEMS...
- Publication number 20230125884
- Publication date Apr 27, 2023
- ASM IP HOLDING, B.V.
- Gregory Deye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A MICROSTRUCTURE
- Publication number 20220388837
- Publication date Dec 8, 2022
- MEMSSTAR LIMITED
- Anthony O'HARA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20220375751
- Publication date Nov 24, 2022
- Applied Materials, Inc.
- Yi-Chiau HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER SURFACE TREATMENT DEVICE
- Publication number 20220336208
- Publication date Oct 20, 2022
- JOY ALLIED TECHNOLOGY INC.
- TE-MING CHIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Based Process for Production of F and HF from Benign Precurs...
- Publication number 20220328322
- Publication date Oct 13, 2022
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Application
GAS TREATMENT APPARATUS
- Publication number 20220301821
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Yuji SAEGUSA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20220059342
- Publication date Feb 24, 2022
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-TEMPERATURE PLASMA PRE-CLEAN FOR SELECTIVE GAP FILL
- Publication number 20210398850
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Yi Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN FLUORIDE VAPOR PHASE CORROSION APPARATUS AND METHOD
- Publication number 20210265179
- Publication date Aug 26, 2021
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Kaidong XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE GAS DISTRIBUTION SYSTEMS AND METHODS
- Publication number 20210265134
- Publication date Aug 26, 2021
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SURFACE TREATMENT DEVICE AND METHOD THEREOF
- Publication number 20210175068
- Publication date Jun 10, 2021
- JOY ALLIED TECHNOLOGY INC.
- TE-MING CHIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM SURFACE TREATMENT METHOD AND FILM SURFACE TREATMENT DEVICE
- Publication number 20210125822
- Publication date Apr 29, 2021
- CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Zhiguo DENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Based Process for Production of F and HF from Benign Precurs...
- Publication number 20210082687
- Publication date Mar 18, 2021
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELEMENT CHIP MANUFACTURING METHOD
- Publication number 20200294791
- Publication date Sep 17, 2020
- Panasonic Intellectual Property Management Co., Ltd.
- SHOGO OKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD IN INSPECTION APPARATUS, AND THE INSPECTION APPARATUS
- Publication number 20200286728
- Publication date Sep 10, 2020
- TOKYO ELECTRON LIMITED
- Hiroyuki NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200035508
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Satoshi TAKAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Based Process for Production of F and HF from Benign Precurs...
- Publication number 20190378691
- Publication date Dec 12, 2019
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Application
PRE-CLEAN OF SILICON GERMANIUM FOR PRE-METAL CONTACT AT SOURCE AND...
- Publication number 20190326115
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Bo ZHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYDROGEN FLUORIDE VAPOR PHASE CORROSION APPARATUS AND METHOD
- Publication number 20190318941
- Publication date Oct 17, 2019
- JIANGSU LEUVEN INSTRUMMENTS CO. LTD
- Kaidong XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR REDUCING CONTAMINATION FOR RELIABLE BOND PADS
- Publication number 20190206676
- Publication date Jul 4, 2019
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Honghui MOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE GAS DISTRIBUTION SYSTEMS AND METHODS
- Publication number 20190189401
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD
- Publication number 20190172712
- Publication date Jun 6, 2019
- Applied Materials, Inc.
- Christopher S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SELECTIVE DEPOSITION
- Publication number 20190148131
- Publication date May 16, 2019
- Applied Materials, Inc.
- Abhishek DUBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20190067294
- Publication date Feb 28, 2019
- Samsung Electronics Co., Ltd.
- Jun-won LEE
- G11 - INFORMATION STORAGE
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20190066998
- Publication date Feb 28, 2019
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

with gaseous HF

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and systems for cleaning high aspect ratio structures

System with substrate carrier deterioration detection and repair

Multi-zone gas distribution systems and methods

Integrated epitaxy and preclean system

Low-temperature plasma pre-clean for selective gap fill

Dry non-plasma treatment system

Plasma-based process for production of F and HF from benign precurs...

Methods and systems for cleaning high aspect ratio structures

Substrate carrier deterioration detection and repair

Multi-zone gas distribution systems and methods

Cleaning method in inspection apparatus, and the inspection apparatus

Plasma-based process for production of F and HF from benign precurs...

Film forming method and film forming apparatus

Element chip manufacturing method

Integrated epitaxy and preclean system

Cleaning method

Epitaxy system integrated with high selectivity oxide removal and h...

Hydrogen fluoride vapor phase corrosion method

Multi-zone gas distribution systems and methods

Substrate carrier deterioration detection and repair

Plasma-based process for production of F and HF from benign precurs...

Semiconductor device

Substrate treatment method and substrate treatment apparatus

Pre-clean of silicon germanium for pre-metal contact at source and...

Substrate processing apparatus and guide portion

Naturally oxidized film removing method and naturally oxidized film...

Method and device for reducing contamination for reliable bond pads

Method and apparatus for cleaning semiconductor device structure wi...

Cleaning method

Apparatus and method for selective deposition

Patents Applicationslast 30 patents

PLASMA ASSISTED DAMAGE ENGINEERING DURING ION IMPLANTATION

SUBSTRATE PROCESSING METHOD

APPARATUS FOR MANUFACTURING DISPLAY APPARATUS AND METHOD OF MANUFAC...

MULTI-ZONE GAS DISTRIBUTION SYSTEMS AND METHODS

METHODS AND SYSTEMS FOR CLEANING HIGH ASPECT RATIO STRUCTURES

MATERIAL LAYER DEPOSITION METHODS, SEMICONDUCTOR PROCESSING SYSTEMS...

METHOD OF MANUFACTURING A MICROSTRUCTURE

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

WAFER SURFACE TREATMENT DEVICE

Plasma-Based Process for Production of F and HF from Benign Precurs...

GAS TREATMENT APPARATUS

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

LOW-TEMPERATURE PLASMA PRE-CLEAN FOR SELECTIVE GAP FILL

HYDROGEN FLUORIDE VAPOR PHASE CORROSION APPARATUS AND METHOD

MULTI-ZONE GAS DISTRIBUTION SYSTEMS AND METHODS

WAFER SURFACE TREATMENT DEVICE AND METHOD THEREOF

FILM SURFACE TREATMENT METHOD AND FILM SURFACE TREATMENT DEVICE

Plasma-Based Process for Production of F and HF from Benign Precurs...

ELEMENT CHIP MANUFACTURING METHOD

CLEANING METHOD IN INSPECTION APPARATUS, AND THE INSPECTION APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

Plasma-Based Process for Production of F and HF from Benign Precurs...

PRE-CLEAN OF SILICON GERMANIUM FOR PRE-METAL CONTACT AT SOURCE AND...

HYDROGEN FLUORIDE VAPOR PHASE CORROSION APPARATUS AND METHOD

METHOD AND DEVICE FOR REDUCING CONTAMINATION FOR RELIABLE BOND PADS

MULTI-ZONE GAS DISTRIBUTION SYSTEMS AND METHODS

CLEANING METHOD

APPARATUS AND METHOD FOR SELECTIVE DEPOSITION

SEMICONDUCTOR DEVICE

INTEGRATED EPITAXY AND PRECLEAN SYSTEM