with inhibitor or stabilizer

Industry

CPC
Y10S430/118

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/118with inhibitor or stabilizer

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming pattern
- Patent number 8,883,023
- Issue date Nov 11, 2014
- JSR Corporation
- Goji Wakamatsu
- B44 - DECORATIVE ARTS
Information Patent Grant
Positive photosensitive composition
- Patent number 7,977,029
- Issue date Jul 12, 2011
- FUJIFILM Corporation
- Toru Fujimori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for electron beam or EUV
- Patent number 7,879,528
- Issue date Feb 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Takeo Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition, method of patterning thin film using the s...
- Patent number 7,713,677
- Issue date May 11, 2010
- Samsung Electronics Co., Ltd.
- Hi Kuk Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Nanocomposite photoresist composition for imaging thick films
- Patent number 7,524,606
- Issue date Apr 28, 2009
- AZ Electronic Materials USA Corp.
- Chunwei Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photosensitive composition
- Patent number 7,514,201
- Issue date Apr 7, 2009
- FUJIFILM Corporation
- Toru Fujimori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition and method of forming a photoresist pattern...
- Patent number 7,442,489
- Issue date Oct 28, 2008
- Samsung Electronics Co., Ltd.
- Boo-Deuk Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for electron beam or EUV
- Patent number 7,407,734
- Issue date Aug 5, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeo Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive elements and their storage stability
- Patent number 7,285,372
- Issue date Oct 23, 2007
- Kodak Graphic Communications GmbH
- Harald Baumann
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Low-viscous, radiation curable formulation, particularly for the st...
- Patent number 7,232,646
- Issue date Jun 19, 2007
- Dreve-Otoplastik GmbH
- Martin Klare
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Positive photosensitive composition
- Patent number 7,192,681
- Issue date Mar 20, 2007
- Fuji Photo Film Co., Ltd.
- Toru Fujimori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,060,414
- Issue date Jun 13, 2006
- JSR Corporation
- Aki Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Selected polymeric sulfonate acid generators and their use in proce...
- Patent number 6,977,131
- Issue date Dec 20, 2005
- Kodak Polychrome Graphics LLC
- Ting Tao
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Onium salts and the use therof as latent acids
- Patent number 6,929,896
- Issue date Aug 16, 2005
- Ciba Specialty Chemicals Corporation
- Hitoshi Yamato
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photopolymerizable composition and recording material using the same
- Patent number 6,919,159
- Issue date Jul 19, 2005
- Fuji Photo Film Co., Ltd.
- Hirotaka Matsumoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,899,989
- Issue date May 31, 2005
- JSR Corporation
- Aki Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and patterning process
- Patent number 6,869,748
- Issue date Mar 22, 2005
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermal initiator system using leuco dyes and polyhalogene compounds
- Patent number 6,864,040
- Issue date Mar 8, 2005
- Kodak Polychrome Graphics LLC
- Ursula Müller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist material and pattern forming method
- Patent number 6,815,143
- Issue date Nov 9, 2004
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Stabilizer for organic borate salts and photosensitive composition...
- Patent number 6,562,543
- Issue date May 13, 2003
- Showa Denko K.K.
- Tomonari Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition containing a dissolution inhibitor and a...
- Patent number 6,340,552
- Issue date Jan 22, 2002
- Kabushiki Kaisha Toshiba
- Naoko Kihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition and method of forming a pattern using th...
- Patent number 6,306,553
- Issue date Oct 23, 2001
- Kabushiki Kaisha Toshiba
- Naoko Kihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical information medium, and method and apparatus for fabricatin...
- Patent number 6,263,939
- Issue date Jul 24, 2001
- Matsushita Electric Industrial Co., Ltd.
- Hisaki Miyamoto
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Photosensitive resin composition and photosensitive element using t...
- Patent number 6,242,158
- Issue date Jun 5, 2001
- Nichigo-Morton Co., Ltd.
- Eiji Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive composition
- Patent number 6,238,842
- Issue date May 29, 2001
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stabilizer for organic borate salts and photosensitive composition...
- Patent number 6,218,076
- Issue date Apr 17, 2001
- Showa Denko K.K.
- Tomonari Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Nitrone compounds as photopolymer polymerization inhibitors and con...
- Patent number 6,162,579
- Issue date Dec 19, 2000
- Corning Incorporated
- Kelly M. T. Stengel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polymer, dissolution inhibitor and chemically amplif...
- Patent number 6,103,450
- Issue date Aug 15, 2000
- SamSung Electronics Co., Ltd.
- Sang-jun Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution...
- Patent number 6,030,746
- Issue date Feb 29, 2000
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Nagata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Apparatus for fabricating an optical information medium
- Patent number 5,972,250
- Issue date Oct 26, 1999
- Matsushita Electric Industrial Co., Ltd.
- Hisaki Miyamoto
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20130098870
- Publication date Apr 25, 2013
- JSR Corporation
- Goji WAKAMATSU
- B44 - DECORATIVE ARTS
Information Patent Application
POSITIVE PHOTOSENSITIVE COMPOSITION
- Publication number 20080318159
- Publication date Dec 25, 2008
- FUJIFILM Corporation
- Toru FUJIMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR ELECTRON BEAM OR EUV
- Publication number 20080176170
- Publication date Jul 24, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE S...
- Publication number 20070190454
- Publication date Aug 16, 2007
- Samsung Electronics Co., Ltd.
- Hi Kuk LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photosensitive composition
- Publication number 20070141513
- Publication date Jun 21, 2007
- Fuji Photo Film Co., Ltd.
- Toru Fujimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition for electron beam or euv
- Publication number 20070077512
- Publication date Apr 5, 2007
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low-viscous, radiation curable formulation, particularly for the st...
- Publication number 20060264526
- Publication date Nov 23, 2006
- Martin Klare
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Nanocomposite photoresist composition for imaging thick films
- Publication number 20060228644
- Publication date Oct 12, 2006
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition and method of forming a photoresist pattern...
- Publication number 20060160021
- Publication date Jul 20, 2006
- Boo-Deuk Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive elements and their storage stability
- Publication number 20060051699
- Publication date Mar 9, 2006
- Kodak Polychrome Graphics LLC
- Harald Baumann
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20050158657
- Publication date Jul 21, 2005
- Aki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Onium salts and the use therof as latent acids
- Publication number 20040053158
- Publication date Mar 18, 2004
- Hitoshi Yamato
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
Resist compostion and patterning process
- Publication number 20040023153
- Publication date Feb 5, 2004
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Selected polymeric sulfonate acid generators and their use in proce...
- Publication number 20030224284
- Publication date Dec 4, 2003
- Ting Tao
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Positive photosensitive composition
- Publication number 20030186161
- Publication date Oct 2, 2003
- Fuji Photo Film Co., Ltd.
- Toru Fujimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photopolymerizable composition and recording material using the same
- Publication number 20030129523
- Publication date Jul 10, 2003
- Hirotaka Matsumoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermal initiator system using leuco dyes and polyhalogene compounds
- Publication number 20030003399
- Publication date Jan 2, 2003
- Ursula Muller
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Resist material and pattern forming method
- Publication number 20020136981
- Publication date Sep 26, 2002
- Satoshi Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20020090569
- Publication date Jul 11, 2002
- Aki Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Stabilizer for organic borate salts and photosensitive composition...
- Publication number 20010046643
- Publication date Nov 29, 2001
- Tomonari Ogata
- C07 - ORGANIC CHEMISTRY

with inhibitor or stabilizer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for forming pattern

Positive photosensitive composition

Resist composition for electron beam or EUV

Photoresist composition, method of patterning thin film using the s...

Nanocomposite photoresist composition for imaging thick films

Positive photosensitive composition

Photoresist composition and method of forming a photoresist pattern...

Resist composition for electron beam or EUV

Radiation-sensitive elements and their storage stability

Low-viscous, radiation curable formulation, particularly for the st...

Positive photosensitive composition

Radiation-sensitive resin composition

Selected polymeric sulfonate acid generators and their use in proce...

Onium salts and the use therof as latent acids

Photopolymerizable composition and recording material using the same

Radiation-sensitive resin composition

Resist composition and patterning process

Thermal initiator system using leuco dyes and polyhalogene compounds

Resist material and pattern forming method

Stabilizer for organic borate salts and photosensitive composition...

Photosensitive composition containing a dissolution inhibitor and a...

Photosensitive composition and method of forming a pattern using th...

Optical information medium, and method and apparatus for fabricatin...

Photosensitive resin composition and photosensitive element using t...

Positive photosensitive composition

Stabilizer for organic borate salts and photosensitive composition...

Nitrone compounds as photopolymer polymerization inhibitors and con...

Photosensitive polymer, dissolution inhibitor and chemically amplif...

Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution...

Apparatus for fabricating an optical information medium

Patents Applicationslast 30 patents

METHOD FOR FORMING PATTERN

POSITIVE PHOTOSENSITIVE COMPOSITION

RESIST COMPOSITION FOR ELECTRON BEAM OR EUV

PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE S...

Positive photosensitive composition

Resist composition for electron beam or euv

Low-viscous, radiation curable formulation, particularly for the st...

Nanocomposite photoresist composition for imaging thick films

Photoresist composition and method of forming a photoresist pattern...

Radiation-sensitive elements and their storage stability

Radiation-sensitive resin composition

Onium salts and the use therof as latent acids

Resist compostion and patterning process

Selected polymeric sulfonate acid generators and their use in proce...

Positive photosensitive composition

Photopolymerizable composition and recording material using the same

Thermal initiator system using leuco dyes and polyhalogene compounds

Resist material and pattern forming method

Radiation-sensitive resin composition

Stabilizer for organic borate salts and photosensitive composition...