with non-macromolecular additives

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CPC
G03C1/61

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GPHYSICS G03Photography G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHOTOGRAPHIC PROCESSES G03C1/00Photosensitive materials

Current Industry

G03C1/61with non-macromolecular additives

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive resin composition
- Patent number 9,256,118
- Issue date Feb 9, 2016
- Cheil Industries Inc.
- Ji-Yun Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photothermographic element comprising improved base precursors and...
- Patent number 7,029,835
- Issue date Apr 18, 2006
- Eastman Kodak Company
- Ramanuj Goswami
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Thermal base precursors
- Patent number 6,974,662
- Issue date Dec 13, 2005
- Eastman Kodak Company
- Ramanuj Goswami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Base precursors for use in a photothermographic element
- Patent number 6,699,651
- Issue date Mar 2, 2004
- Eastman Kodak Company
- Ramanuj Goswami
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Heat development duplicating material comprising ascorbic acid
- Patent number 5,945,247
- Issue date Aug 31, 1999
- Fuji Photo Film Co., Ltd.
- Hirokazu Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-sensitive recording material
- Patent number 5,935,757
- Issue date Aug 10, 1999
- Fuji Photo Film Co., Ltd.
- Hisao Yamada
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Bisguanidine salts and a method for releasing a base using the same...
- Patent number 5,728,879
- Issue date Mar 17, 1998
- Fuji Photo Film Co., Ltd.
- Jiro Tsukahara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Heat-sensitive recording material comprising a diazonium salt, a co...
- Patent number 5,679,494
- Issue date Oct 21, 1997
- Fuji Photo Film Co., Ltd.
- Kazumori Minami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working naphthoquinone diazide photoresist composition con...
- Patent number 5,434,031
- Issue date Jul 18, 1995
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazo-type recording material comprising a 1-phenyl-3-pyrazolidone(...
- Patent number 5,407,777
- Issue date Apr 18, 1995
- Fuji Photo Film Co., Ltd.
- Hirokazu Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photographic element containing a thermal dye bleach system
- Patent number 5,266,452
- Issue date Nov 30, 1993
- Minnesota Mining and Manufacturing Company
- Jonathan P. Kitchin
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Light-sensitive composition consisting essentially of, in admixture...
- Patent number 5,200,292
- Issue date Apr 6, 1993
- Fuji Photo Film Co., Ltd.
- Fumiaki Shinozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermal dye bleach construction
- Patent number 5,135,842
- Issue date Aug 4, 1992
- Minnesota Mining and Manufacturing Company
- Jonathan P. Kitchin
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Heat developable light-sensitive material containing an amidine bas...
- Patent number 5,093,229
- Issue date Mar 3, 1992
- Fuji Photo Film Co., Ltd.
- Yoshiharu Yabuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for formation of base
- Patent number 4,981,965
- Issue date Jan 1, 1991
- Fuji Photo Film Co., Ltd.
- Yoshiharu Yabuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for formation of base and light-sensitive material
- Patent number 4,970,307
- Issue date Nov 13, 1990
- Fuji Photo Film Co., Ltd.
- Keiji Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for formation of base and light-sensitive material
- Patent number 4,835,272
- Issue date May 30, 1989
- Fuji Photo Film Co., Ltd.
- Kozo Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming an image
- Patent number 4,824,759
- Issue date Apr 25, 1989
- Fuji Photo Film Co., Ltd.
- Kozo Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alkali generating process
- Patent number 4,740,363
- Issue date Apr 26, 1988
- Fuji Photo Film Co., Ltd.
- Hiroyuki Hirai
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Image forming process
- Patent number 4,740,445
- Issue date Apr 26, 1988
- Fuji Photo Film Co., Ltd.
- Hiroyuki Hirai
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Thermal diazo composition
- Patent number 4,705,736
- Issue date Nov 10, 1987
- Minnesota Mining and Manufacturing Company
- Norman T. Notley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-sensitive recording material
- Patent number 4,665,411
- Issue date May 12, 1987
- Fuji Photo Film Co., Ltd.
- Masataka Kiritani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-sensitive recording diazo material with recording sensitizer
- Patent number 4,659,643
- Issue date Apr 21, 1987
- Kanzaki Paper Manufacturing Co. Ltd.
- Katsuhiko Ishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazo-type thermosensitive recording material with hydrazone couple...
- Patent number 4,659,644
- Issue date Apr 21, 1987
- Ricoh Company, Ltd.
- Takayuki Hoshina
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat and light-sensitive recording materials with dialonium compoun...
- Patent number 4,652,512
- Issue date Mar 24, 1987
- Kanzaki Paper Manufacturing Company, Limited
- Katsuhiko Ishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mixed anhydrides of carbamic and hydroxamic acids
- Patent number 4,637,902
- Issue date Jan 20, 1987
- Fuji Photo Film Co., Ltd.
- Hiroyuki Hirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat-developable light-sensitive material with base precursor
- Patent number 4,622,289
- Issue date Nov 11, 1986
- Fuji Photo Film Co., Ltd.
- Hiroyuki Hirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazotype materials which can be developed by heat and contain an a...
- Patent number 4,584,256
- Issue date Apr 22, 1986
- Rhone-Poulenc Systemes
- Claude Ceintrey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diazo-type thermosensitive recording material with imidazole compound
- Patent number 4,575,479
- Issue date Mar 11, 1986
- Ricoh Company, Ltd.
- Masanaka Nagamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Base precursor for heat-developable photosensitive material
- Patent number 4,560,763
- Issue date Dec 24, 1985
- Fuji Photo Film Co., Ltd.
- Kozo Sato
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Positive Photosensitive Resin Composition
- Publication number 20140170562
- Publication date Jun 19, 2014
- Ji-Yun Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermal base precursors
- Publication number 20050032009
- Publication date Feb 10, 2005
- Eastman Kodak Company
- Ramanuj Goswami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photothermographic element comprising improved base precursors and...
- Publication number 20040185352
- Publication date Sep 23, 2004
- Ramanuj Goswami
- C07 - ORGANIC CHEMISTRY

with non-macromolecular additives

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Positive photosensitive resin composition

Photothermographic element comprising improved base precursors and...

Thermal base precursors

Base precursors for use in a photothermographic element

Heat development duplicating material comprising ascorbic acid

Heat-sensitive recording material

Bisguanidine salts and a method for releasing a base using the same...

Heat-sensitive recording material comprising a diazonium salt, a co...

Positive-working naphthoquinone diazide photoresist composition con...

Diazo-type recording material comprising a 1-phenyl-3-pyrazolidone(...

Photographic element containing a thermal dye bleach system

Light-sensitive composition consisting essentially of, in admixture...

Thermal dye bleach construction

Heat developable light-sensitive material containing an amidine bas...

Process for formation of base

Process for formation of base and light-sensitive material

Process for formation of base and light-sensitive material

Method for forming an image

Alkali generating process

Image forming process

Thermal diazo composition

Heat-sensitive recording material

Heat-sensitive recording diazo material with recording sensitizer

Diazo-type thermosensitive recording material with hydrazone couple...

Heat and light-sensitive recording materials with dialonium compoun...

Mixed anhydrides of carbamic and hydroxamic acids

Heat-developable light-sensitive material with base precursor

Diazotype materials which can be developed by heat and contain an a...

Diazo-type thermosensitive recording material with imidazole compound

Base precursor for heat-developable photosensitive material

Patents Applicationslast 30 patents

Positive Photosensitive Resin Composition

Thermal base precursors

Photothermographic element comprising improved base precursors and...