Claims
- 1. A heat-developable diazotype material comprising a base material as a support and a multilayer sensitive layer supported on the base material and which contains as essential ingredients a diazonium salt, a coupler and a base generator as an activator precursor for the coupling reaction generating a coloured trace from said diazonium salt and said coupler, wherein no more than two of the essential ingredients are present in any one layer of the multilayer sensitive layer, the base generator being a salt comprising a basic component and an acid component, and the acid component being a 2-carboxycarboxamide group, the diazotype materials being characterized in that the basic component of the base generator consists of an alkali metal cation.
- 2. The diazotype material according to claim 1, characterised in that the base generator is a compound of the general formula (I): ##STR45## in which the various symbols represent the following: R.sub.1, R.sub.2, R.sub.3 and R.sub.4 : a hydrogen atom, a halogen atom or an alkyl, halogenoalkyl, alkoxy, alkoxycarbonyl, hydroxyl, carbamoyl or carboxamide group, or the groups R.sub.1 and/or R.sub.2 may form, with the groups R.sub.3 and/or R.sub.4, a valence bond and/or a divalent group forming, with the two carbon atoms to which the groups R.sub.1 (or R.sub.2) and R.sub.3 (or R.sub.4) are attached, a group (L) which may contain another 2-carboxycarboxamide group, and the group (L) being cyclic or polycyclic or or the group (L) consists of a combination of several cyclic groups joined to one another by a valence bond, a hetero-atom or a methylene or carboxyl group,
- R: an integer equal to 1 or 2,
- p: an integer equal to 1 or 2 and representing the valence of the symbol R,
- R: a valence bond or one of the following radicals:
- (a) a monovalent radical consisting of a hydrogen atom, a group --CONHR.sub.5 or --CSNHR.sub.5, R.sub.5 being a hydrogen atom, an alkyl radical, a saturated or unsaturated aliphatic or cycloaliphatic hydrocarbon radical, or an aromatic radical; or any one of the foregoing radicals substituted by alkyl groups, halogenated alkyl groups, halogen atoms, carboxyl groups, nitro groups, urea groups, thiourea groups or hydroxyl groups; or
- (b) a divalent alkylene, cycloalkylene or phenylene radical or a combination of alkylene or phenylene groups joined to one another by a hetero-atom or a group ##STR46## R.sub.5 representing a hydrogen atom or an alkyl group, M: an alkali metal cation or alkaline earth metal cation of valence q or a quaternary tetralkylammonium cation, and
- n: an integer equal to 1 or 2 and such that the overall ionic charge on the base generator is zero.
- 3. The diazotype material according to one of claim 1, chacterised in that the base generator is a compound of the general formula (I) in which the various symbols represent the following:
- R.sub.1, R.sub.2, R.sub.3 and R.sub.4 : a hydrogen atom, a chlorine atom or an alkyl or alkoxy group having from 1 to 4 carbon atoms, two of the groups R.sub.1, R.sub.2, R.sub.3 and R.sub.4 consisting of hydrogen atoms, or the groups R.sub.1 and/or R.sub.2 may form, with the groups R.sub.3 and/or R.sub.4, a valence bond and/or a divalent group forming, with the two carbon atoms to which the groups R.sub.1 (or R.sub.2) and R.sub.3 (or R.sub.4) are attached, a group (L) which can contain another 2-carboxycarboxamide group, and the group (L) being selected from the group consisting of the following cyclic or polycyclic groups:
- a saturated or unsaturated cycloaliphatic radical having from 4 to 6 nuclear carbon atoms, or said radicals substituted by alkyl groups, halogen atoms or COOH or NO.sub.2 groups,
- a phenyl or naphthalene radical or said radical substituted by alkyl groups, halogen atoms or COOH or NO.sub.2 groups,
- a saturated, unsaturated or aromatic heterocyclic group having 4 to 6 atoms in the ring, including a hetero atom,
- a saturated or unsaturated cycloaliphatic polycyclic radical or a heterocyclic polycyclic radical containing from 4 to 11 atoms, and
- a combination of two saturated or unsaturated cycloaliphatic groups having from 4 to 6 nuclear carbon atoms, or of two phenyl groups, joined to one another by a valence bond, an oxygen atom, a group NH or a carbonyl group,
- R: valence bond or one of the following radicals:
- (a) a monovalent radical consisting of a hydrogen atom, a group --CONH.sub.2 or CSNH.sub.2, an alkyl or alkenyl radical having from 1 to 4 carbon atoms, or said radical substituted by halogen atoms, a phenyl radical which can be substituted by halogen atoms or by alkyl radicals or halogenated alkyl radicals, or a cyclohexyl or cyclopentyl radical, or
- (b) a divalent alkylene radical having at most 6 carbon atoms or a divalent cyclohexylene, cyclopentylene or phenylene radical, or a combination of 2 to 10 alkylene groups having at most 6 carbon atoms, or of 2 to 10 phenylene groups, joined to one another by --O--, --NH-- or ##STR47## M: an alkali metal cation or alkaline earth metal cation or a quaternary tetraalkylammonium cation, each alkyl group having from 1 to 8 carbon atoms.
- 4. The diazotype material according to claim 1, characterised in that the base generator is a compound of the general formula (I) in which the various symbols represent the following:
- R.sub.1, R.sub.2, R.sub.3 and R.sub.4 : a hydrogen atom, a chlorine atom or a methyl or methoxy group, two of the groups R.sub.1, R.sub.2, R.sub.3 and R.sub.4 consisting of hydrogen atoms, or the groups R.sub.1 and/or R.sub.2 may form, with the groups R.sub.3 and/or R.sub.4, a valence bond and/or a divalent group forming, with the two carbon atoms to which the groups R.sub.1 (or R.sub.2) and R.sub.3 (or R.sub.4) are attached, a group (L) which can contain a 2-carboxycarboxamide group, and the group (L) being selected from the group consisting of the following cyclic or polycyclic groups:
- a saturated or unsaturated cycloaliphatic radical having from 4 to 6 nuclear carbon atoms or said radical substituted by a methyl radical, chlorine atoms or COOH or NO.sub.2 groups,
- a phenyl group, or phenyl substituted by a methyl radical, chlorine atoms or COOH or NO.sub.2 groups,
- a saturated or unsaturated heterocyclic group having 4 to 6 atoms in the ring, including an oxygen or nitrogen hetero-atom,
- a saturated or unsaturated cycloaliphatic polycyclic radical or a heterocyclic polycyclic radical having from 4 to 11 atoms, or said radical including an oxygen or nitrogen hetero-atom, and a combination of two phenyl groups joined to one another by a valence bond, an oxygen atom, a group NH or a carbonyl group,
- R: a valence bond or one of the following radicals:
- (a) a monovalent radical consisting of a hydrogen atom, a group CONH.sub.2, an alkyl radical having from 1 to 4 carbon atoms, a phenyl radical, a phenyl radical substituted by halogen atoms or by methyl radicals or by halogenated methyl radicals, or a cyclohexyl or cyclopentyl radical, or
- (b) a divalent alkylene radical having at most 6 carbon atoms or a divalent cyclopentylene, cyclohexylene or phenylene radical, or a combination of 2 to 5 alkylene groups having at most 6 carbon atoms and joined to one another by an oxygen atom or a group --NH or ##STR48## M: an alkali metal cation or alkaline earth metal cation or quaternary tetraalkylammonium, each alkyl group having from 1 to 8 carbon atoms.
- 5. The diazotype material according to claim 1, characterised in that the basic component is a sodium, potassium or lithium cation.
- 6. The diazotype material according to claim 1, characterised in that the base generator is a compound derived from a phthalamic acid.
- 7. The diazotype material according to claim 1, characterised in that the base generator is a compound derived from a maleamic acid.
- 8. The diazotype material according to claim 1, characterised in that the base generator is a compound derived from a succinamic acid.
- 9. The diazotype material according to claim 1, characterised in that the base generator is a compound derived from a polyhydrophthalamic acid.
- 10. A two-component diazotype material according to claim 1 wherein the sensitive layer comprises a photosensitive layer containing said diazonium salt and said coupler and a second layer adjacent thereto containing said base generator.
- 11. A two-component diazotype material according to claim 1 wherein said sensitive layer comprises a photosensitive layer containing said diazonium salt and said base generator and adjacent thereto a second layer containing said coupler.
- 12. The diazotype material according to claim 1 wherein the sensitive layer contains said diazonium salt and said coupler at a weight ratio of from 0.3/1 to 3/1 and the amount of base generator is from 0.1 to 5 g/m.sup.2.
- 13. The diazotype material according to claim 1 wherein the basic component is a sodium cation.
- 14. The diazotype material of claim 6 wherein the alkali metal cation is a sodium cation.
Priority Claims (1)
Number |
Date |
Country |
Kind |
80 25958 |
Dec 1980 |
FRX |
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Parent Case Info
This application is a continuation of application Ser. No. 403,613, filed July 30, 1982, abandoned.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
102e Date |
371c Date |
PCT/FR81/00151 |
11/19/1981 |
|
|
7/30/1982 |
7/30/1982 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO82/01944 |
6/10/1982 |
|
|
US Referenced Citations (9)
Foreign Referenced Citations (7)
Number |
Date |
Country |
1452286 |
Sep 1966 |
FRX |
1499319 |
Oct 1967 |
FRX |
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FRX |
2360909 |
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FRX |
2375620 |
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FRX |
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GBX |
1041022 |
Sep 1966 |
GBX |
Non-Patent Literature Citations (1)
Entry |
Kosar, J., Photo. Sci. & Eng., vol. 5, No. 4, 7/8/1961, pp. 239-243. |
Continuations (1)
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Number |
Date |
Country |
Parent |
403613 |
Jul 1982 |
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