with the semiconductor substrates being dipped in baths or vessels

Industry

CPC
H01L21/67086

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67086with the semiconductor substrates being dipped in baths or vessels

Industries

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,972,958
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet bench structure
- Patent number 11,961,745
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,948,804
- Issue date Apr 2, 2024
- Tokyo Electron Limited
- Takumi Honda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Module for chemically processing a substrate
- Patent number 11,938,522
- Issue date Mar 26, 2024
- SEMSYSCO GMBH
- Andreas Gleissner
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,915,947
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Takumi Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method and substrate treatment equipment
- Patent number 11,901,174
- Issue date Feb 13, 2024
- Organo Corporation
- Daisaku Yano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,887,871
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Kazushige Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 11,869,780
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Takahiro Kawazu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,869,781
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Hiroshi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving etching rate of wet etching
- Patent number 11,869,774
- Issue date Jan 9, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Nannan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control device and substrate processing method
- Patent number 11,842,904
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Hiroshi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wetting processing apparatus and operation method thereof
- Patent number 11,810,797
- Issue date Nov 7, 2023
- PYXIS CF PTE. LTD.
- Amlan Sen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Structure production wet etch method and structure production appar...
- Patent number 11,791,151
- Issue date Oct 17, 2023
- Sumitomo Chemical Company, Limited
- Fumimasa Hirikiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and manufacturing method of semicondu...
- Patent number 11,784,064
- Issue date Oct 10, 2023
- Kioxia Corporation
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching etch layer
- Patent number 11,784,065
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Manish Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for degumming and inserting silicon wafers and method for pr...
- Patent number 11,749,538
- Issue date Sep 5, 2023
- HANGZHOU ZHONGWEI PHOTOELECTRIC TECHNOLOGY CO., LTD.
- Hong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 11,742,226
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Takahiko Otsu
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus
- Patent number 11,742,223
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Yuji Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing device
- Patent number 11,728,188
- Issue date Aug 15, 2023
- Kioxia Corporation
- Yuji Hashimoto
- B08 - CLEANING
Information Patent Grant
Substrate processing method
- Patent number 11,699,601
- Issue date Jul 11, 2023
- SCREEN Holdings Co., Ltd.
- Tomohiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and manufacturing method of semicondu...
- Patent number 11,682,568
- Issue date Jun 20, 2023
- Kioxia Corporation
- Satoshi Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and manufacturing method of s...
- Patent number 11,676,828
- Issue date Jun 13, 2023
- Kioxia Corporation
- Shinsuke Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 11,637,026
- Issue date Apr 25, 2023
- Tokyo Electron Limited
- Hiroyuki Masutomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus and rec...
- Patent number 11,626,294
- Issue date Apr 11, 2023
- Tokyo Electron Limited
- Takumi Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrasonic tank and methods for uniform glass substrate etching
- Patent number 11,610,783
- Issue date Mar 21, 2023
- Corning Incorporated
- John Tyler Keech
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Semiconductor manufacturing apparatus and method of manufacturing s...
- Patent number 11,610,789
- Issue date Mar 21, 2023
- Kioxia Corporation
- Katsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 11,600,502
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Hiroshi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 11,594,430
- Issue date Feb 28, 2023
- Tokyo Electron Limited
- Takafumi Tsuchiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,538,697
- Issue date Dec 27, 2022
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet bench and chemical treatment method using the same
- Patent number 11,532,493
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chen Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...
- Publication number 20240096659
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Fuyuma ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SE...
- Publication number 20240087918
- Publication date Mar 14, 2024
- KIOXIA Corporation
- Tomohiko SUGITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BATCH SUBSTRATE TREATMENT APPARATUS
- Publication number 20240014050
- Publication date Jan 11, 2024
- SCREEN Holdings Co., Ltd.
- Mitsutoshi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING ETCH LAYER
- Publication number 20230377912
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Manish Kumar SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING SYS...
- Publication number 20230377894
- Publication date Nov 23, 2023
- SEMES CO., LTD.
- Minyoung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET BENCH PROCESS WITH IN-SITU PRE-TREATMENT OPERATION
- Publication number 20230369056
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID-CARRYING ROLLER FOR WET ETCHING AND WET ETCHING METHOD
- Publication number 20230343888
- Publication date Oct 26, 2023
- JA Solar Technology Yangzhou Co., Ltd.
- Lin LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230307265
- Publication date Sep 28, 2023
- KIOXIA Corporation
- Takaumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230298910
- Publication date Sep 21, 2023
- KIOXIA Corporation
- Shusaku MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20230282493
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Keita HIRASE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20230268202
- Publication date Aug 24, 2023
- TOKYO ELECTRON LIMITED
- Keita HIRASE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REMOVING PARTICLES OR PHOTORESIST ON SUBST...
- Publication number 20230143401
- Publication date May 11, 2023
- ACM RESEARCH (SHANGHAI), INC.
- Xiaoyan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230121666
- Publication date Apr 20, 2023
- SCREEN Holdings Co., Ltd.
- Tomohiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRODUCTION APPARATUS FOR PRODUCING STRUCTURAL BODY AND PRODUCTION M...
- Publication number 20230099777
- Publication date Mar 30, 2023
- SCIOCS Company Limited
- Fumimasa HORIKIRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND METHO...
- Publication number 20220406626
- Publication date Dec 22, 2022
- KIOXIA Corporation
- Tomohiko SUGITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220367203
- Publication date Nov 17, 2022
- SCREEN Holdings Co., Ltd.
- Takashi AKIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET BENCH AND CHEMICAL TREATMENT METHOD USING THE SAME
- Publication number 20220359238
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Chen CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET BENCH STRUCTURE
- Publication number 20220351986
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-DIMENSIONAL SEMICONDUCTOR FABRICATION
- Publication number 20220349084
- Publication date Nov 3, 2022
- Nielson Scientific, LLC
- Gregory Nolan Nielson
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCT...
- Publication number 20220333246
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shiung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WET ETCHING APPARATUS
- Publication number 20220319878
- Publication date Oct 6, 2022
- JIN WOO LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220285166
- Publication date Sep 8, 2022
- TOKYO ELECTRON LIMITED
- Takumi Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS, FAILURE PREDICTION METHOD FO...
- Publication number 20220181180
- Publication date Jun 9, 2022
- EBARA CORPORATION
- Jumpei FUJIKATA
- G05 - CONTROLLING REGULATING
Information Patent Application
CONTROL DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20220181172
- Publication date Jun 9, 2022
- TOKYO ELECTRON LIMITED
- Hiroshi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR TREATING WAFERS
- Publication number 20220173265
- Publication date Jun 2, 2022
- Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
- Martin ZIMMER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE PRODUCTION METHOD AND STRUCTURE PRODUCTION APPARATUS
- Publication number 20220172943
- Publication date Jun 2, 2022
- SCIOCS Company Limited
- Fumimasa HIRIKIRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...
- Publication number 20220139734
- Publication date May 5, 2022
- TOKYO ELECTRON LIMITED
- Kouji Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING DEVICE USING ETCHING CHAMBER
- Publication number 20220115248
- Publication date Apr 14, 2022
- ZEUS CO., LTD.
- Seung Hoon LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220108898
- Publication date Apr 7, 2022
- TOKYO ELECTRON LIMITED
- Takumi Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPROVING ETCHING RATE OF WET ETCHING
- Publication number 20220102157
- Publication date Mar 31, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Nannan ZHANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

with the semiconductor substrates being dipped in baths or vessels

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Wet bench structure

Substrate processing method and substrate processing apparatus

Module for chemically processing a substrate

Substrate processing apparatus and substrate processing method

Substrate treatment method and substrate treatment equipment

Substrate processing apparatus and substrate processing method

Substrate liquid processing apparatus

Substrate processing apparatus and substrate processing method

Method for improving etching rate of wet etching

Control device and substrate processing method

Wetting processing apparatus and operation method thereof

Structure production wet etch method and structure production appar...

Substrate treatment apparatus and manufacturing method of semicondu...

Method for etching etch layer

Device for degumming and inserting silicon wafers and method for pr...

Substrate liquid processing apparatus

Substrate processing apparatus

Semiconductor manufacturing device

Substrate processing method

Substrate treatment apparatus and manufacturing method of semicondu...

Semiconductor manufacturing apparatus and manufacturing method of s...

Substrate liquid processing apparatus

Substrate processing method, substrate processing apparatus and rec...

Ultrasonic tank and methods for uniform glass substrate etching

Semiconductor manufacturing apparatus and method of manufacturing s...

Substrate liquid processing apparatus, substrate liquid processing...

Substrate liquid processing apparatus, substrate liquid processing...

Substrate processing apparatus

Wet bench and chemical treatment method using the same

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SE...

BATCH SUBSTRATE TREATMENT APPARATUS

METHOD FOR ETCHING ETCH LAYER

METHOD OF FORMING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING SYS...

WET BENCH PROCESS WITH IN-SITU PRE-TREATMENT OPERATION

LIQUID-CARRYING ROLLER FOR WET ETCHING AND WET ETCHING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

METHOD AND APPARATUS FOR REMOVING PARTICLES OR PHOTORESIST ON SUBST...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PRODUCTION APPARATUS FOR PRODUCING STRUCTURAL BODY AND PRODUCTION M...

SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND METHO...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

WET BENCH AND CHEMICAL TREATMENT METHOD USING THE SAME

WET BENCH STRUCTURE

THREE-DIMENSIONAL SEMICONDUCTOR FABRICATION

GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCT...

WET ETCHING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS, FAILURE PREDICTION METHOD FO...

CONTROL DEVICE AND SUBSTRATE PROCESSING METHOD

DEVICE AND METHOD FOR TREATING WAFERS

STRUCTURE PRODUCTION METHOD AND STRUCTURE PRODUCTION APPARATUS

SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...

ETCHING DEVICE USING ETCHING CHAMBER

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD FOR IMPROVING ETCHING RATE OF WET ETCHING