X-ray

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CPC
Y10S430/167

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/167X-ray

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Drug development and manufacturing
- Patent number 9,157,875
- Issue date Oct 13, 2015
- Benjamin P. Warner
- G01 - MEASURING TESTING
Information Patent Grant
Fluorine-containing compound, fluorine-containing polymer, negative...
- Patent number 8,513,457
- Issue date Aug 20, 2013
- Central Glass Company, Limited
- Yoshimi Isono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing compound, fluorine-containing polymer, negative...
- Patent number 8,187,787
- Issue date May 29, 2012
- Central Glass Company, Limited
- Yoshimi Isono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for electron beam, X-ray, or EUV, and pattern-fo...
- Patent number 8,084,183
- Issue date Dec 27, 2011
- FUJIFILM Corporation
- Katsuhiro Yamashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonium salt-containing polymer, resist composition, and patterni...
- Patent number 8,048,610
- Issue date Nov 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-type resist composition
- Patent number 7,906,269
- Issue date Mar 15, 2011
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for detecting binding events using micro-X-ray fluorescence...
- Patent number 7,858,385
- Issue date Dec 28, 2010
- LOS ALAMOS NATIONAL SECURITY, LLC
- Benjamin P. Warner
- G01 - MEASURING TESTING
Information Patent Grant
Photosensitive composition, compound for use in the photosensitive...
- Patent number 7,851,130
- Issue date Dec 14, 2010
- FUJIFILM Corporation
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for electron beam, EUV or X-ray
- Patent number 7,521,168
- Issue date Apr 21, 2009
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photothermographic material
- Patent number 7,455,960
- Issue date Nov 25, 2008
- FUJIFILM Corporation
- Takeshi Funakubo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for EUV and method for forming photoresist...
- Patent number 7,282,318
- Issue date Oct 16, 2007
- Hynix Semiconductor Inc.
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Image forming method using photothermographic material
- Patent number 7,214,476
- Issue date May 8, 2007
- FUJIFILM Corporation
- Katsutoshi Yamane
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
High-speed positive-working photothermographic system comprising an...
- Patent number 7,198,889
- Issue date Apr 3, 2007
- Eastman Kodak Company
- Michael R. Roberts
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High-speed positive-working photothermographic system
- Patent number 7,183,024
- Issue date Feb 27, 2007
- Eastman Kodak Company
- Michael R. Roberts
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Defect inspection of extreme ultraviolet lithography masks and the...
- Patent number 7,179,568
- Issue date Feb 20, 2007
- Wisconsin Alumni Research Foundation
- Francesco Cerrina
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Radiation-sensitive composition
- Patent number 7,179,579
- Issue date Feb 20, 2007
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Blocked aliphatic thiol stabilizers for photothermographic materials
- Patent number 7,169,543
- Issue date Jan 30, 2007
- Eastman Kodak Company
- William D. Ramsden
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer compound, resist material and pattern formation method
- Patent number 7,169,530
- Issue date Jan 30, 2007
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photothermographic materials containing silver halide sensitized wi...
- Patent number 7,157,219
- Issue date Jan 2, 2007
- Eastman Kodak Company
- Sharon M. Simpson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Ultrahigh speed imaging assembly for radiography
- Patent number 7,147,982
- Issue date Dec 12, 2006
- Eastman Kodak Company
- Robert E. Dickerson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photothermographic material
- Patent number 7,144,692
- Issue date Dec 5, 2006
- Fuji Photo Film Co., Ltd.
- Takeshi Funakubo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photothermographic material and image forming method
- Patent number 7,129,033
- Issue date Oct 31, 2006
- Fuji Photo Film Co., Ltd.
- Takayoshi Mori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin composition, resist composition, fabrication m...
- Patent number 7,122,297
- Issue date Oct 17, 2006
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photothermographic materials with opaque crossover control means
- Patent number 7,112,399
- Issue date Sep 26, 2006
- Eastman Kodak Company
- Robert E. Dickerson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist polymer and photoresist composition including the same
- Patent number 7,081,325
- Issue date Jul 25, 2006
- Hynix Semiconductor Inc.
- Sung Koo Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Nanocomposite negative resists for next generation lithographies
- Patent number 7,049,044
- Issue date May 23, 2006
- The University of North Carolina at Charlotte
- Kenneth Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming material and method of forming pattern
- Patent number 7,041,428
- Issue date May 9, 2006
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Phosphor screen and imaging assembly
- Patent number 7,029,819
- Issue date Apr 18, 2006
- Eastman Kodak Company
- Thomas M. Laney
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Photothermographic materials containing silver halide sensitized wi...
- Patent number 7,026,105
- Issue date Apr 11, 2006
- Eastman Kodak Company
- Sharon M. Simpson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High speed reflective radiographic material
- Patent number 7,018,770
- Issue date Mar 28, 2006
- Robert E. Dickerson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...
- Publication number 20120226070
- Publication date Sep 6, 2012
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNI...
- Publication number 20090269696
- Publication date Oct 29, 2009
- Youichi OHSAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive-Type Resist Composition
- Publication number 20090061353
- Publication date Mar 5, 2009
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY, OR EUV, AND PATTERN-FO...
- Publication number 20090047598
- Publication date Feb 19, 2009
- FUJIFILM CORPORATION
- Katsuhiro YAMASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...
- Publication number 20090011199
- Publication date Jan 8, 2009
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE...
- Publication number 20080081288
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Yasutomo Kawanishi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photothermographic material
- Publication number 20070026349
- Publication date Feb 1, 2007
- Fuji Photo Film Co., Ltd.
- Takeshi Funakubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Blocked aliphatic thiol stabilizers for photothermographic materials
- Publication number 20060141403
- Publication date Jun 29, 2006
- Eastman Kodak Company
- William D. Ramsden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOCOMPOSITE NEGATIVE RESISTS FOR NEXT GENERATION LITHOGRAPHIES
- Publication number 20060088787
- Publication date Apr 27, 2006
- Kenneth Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photothermographic materials containing silver halide sensitized wi...
- Publication number 20060078833
- Publication date Apr 13, 2006
- Sharon M. Simpson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photothermographic materials with opaque crossover control means
- Publication number 20060040222
- Publication date Feb 23, 2006
- Eastman Kodak Company
- Robert E. Dickerson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photothermographic material and image forming method
- Publication number 20060035178
- Publication date Feb 16, 2006
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photothermographic material
- Publication number 20050277073
- Publication date Dec 15, 2005
- Fuji Photo Film Co., Ltd.
- Takeshi Funakubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of making information storage devices by molecular photolith...
- Publication number 20050232000
- Publication date Oct 20, 2005
- Jonathan S. Lindsey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polymer compound, resist material and pattern formation method
- Publication number 20050186501
- Publication date Aug 25, 2005
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photothermographic materials containing silver halide sensitized wi...
- Publication number 20050123870
- Publication date Jun 9, 2005
- Eastman Kodak Company
- Sharon M. Simpson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phosphor screen and imaging assembly with poly(lactic acid) support
- Publication number 20050121620
- Publication date Jun 9, 2005
- Thomas M. Laney
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Photoresist composition for EUV and method for forming photoresist...
- Publication number 20050106497
- Publication date May 19, 2005
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phosphor screen and imaging assembly
- Publication number 20050098738
- Publication date May 12, 2005
- Eastman Kodak Comapny
- Thomas M. Laney
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High speed imaging assembly for radiography
- Publication number 20050100840
- Publication date May 12, 2005
- Eastman Kodak Company
- Robert E. Dickerson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH SPEED RADIOGRAPHIC IMAGING ASSEMBLY
- Publication number 20050100838
- Publication date May 12, 2005
- Eastman Kodak Company
- Robert E. Dickerson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High-speed radiographic film
- Publication number 20050100839
- Publication date May 12, 2005
- Eastman Kodak Company
- Robert E. Dickerson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ultrahigh speed imaging assembly for radiography
- Publication number 20050100841
- Publication date May 12, 2005
- Eastman Kodak Company
- Robert E. Dickerson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Image forming method using photothermographic material
- Publication number 20050074707
- Publication date Apr 7, 2005
- Katsutoshi Yamane
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Novel monomers containing an oxepan-2-one group, photoresist compos...
- Publication number 20050042539
- Publication date Feb 24, 2005
- Korea Advanced Institute of Science and Technology
- Jin-Baek Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photosensitive resin composition, resist composition, fabrication m...
- Publication number 20050031992
- Publication date Feb 10, 2005
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Defect inspection of extreme ultraviolet lithography masks and the...
- Publication number 20050008944
- Publication date Jan 13, 2005
- Francesco Cerrina
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photoresist polymer and photoresist composition including the same
- Publication number 20040265743
- Publication date Dec 30, 2004
- Sung Koo Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High-speed positive-working photothermographic system
- Publication number 20040259041
- Publication date Dec 23, 2004
- Michael R. Roberts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High-speed positive-working photothermographic system comprising an...
- Publication number 20040253552
- Publication date Dec 16, 2004
- Michael R. Roberts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Drug development and manufacturing

Fluorine-containing compound, fluorine-containing polymer, negative...

Fluorine-containing compound, fluorine-containing polymer, negative...

Resist composition for electron beam, X-ray, or EUV, and pattern-fo...

Sulfonium salt-containing polymer, resist composition, and patterni...

Positive-type resist composition

Method for detecting binding events using micro-X-ray fluorescence...

Photosensitive composition, compound for use in the photosensitive...

Resist composition for electron beam, EUV or X-ray

Photothermographic material

Photoresist composition for EUV and method for forming photoresist...

Image forming method using photothermographic material

High-speed positive-working photothermographic system comprising an...

High-speed positive-working photothermographic system

Defect inspection of extreme ultraviolet lithography masks and the...

Radiation-sensitive composition

Blocked aliphatic thiol stabilizers for photothermographic materials

Polymer compound, resist material and pattern formation method

Photothermographic materials containing silver halide sensitized wi...

Ultrahigh speed imaging assembly for radiography

Photothermographic material

Photothermographic material and image forming method

Photosensitive resin composition, resist composition, fabrication m...

Photothermographic materials with opaque crossover control means

Photoresist polymer and photoresist composition including the same

Nanocomposite negative resists for next generation lithographies

Pattern-forming material and method of forming pattern

Phosphor screen and imaging assembly

Photothermographic materials containing silver halide sensitized wi...

High speed reflective radiographic material

Patents Applicationslast 30 patents

Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNI...

Positive-Type Resist Composition

RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY, OR EUV, AND PATTERN-FO...

Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...

PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE...

Photothermographic material

Blocked aliphatic thiol stabilizers for photothermographic materials

NANOCOMPOSITE NEGATIVE RESISTS FOR NEXT GENERATION LITHOGRAPHIES

Photothermographic materials containing silver halide sensitized wi...

Photothermographic materials with opaque crossover control means

Photothermographic material and image forming method

Photothermographic material

Method of making information storage devices by molecular photolith...

Polymer compound, resist material and pattern formation method

Photothermographic materials containing silver halide sensitized wi...

Phosphor screen and imaging assembly with poly(lactic acid) support

Photoresist composition for EUV and method for forming photoresist...

Phosphor screen and imaging assembly

High speed imaging assembly for radiography

HIGH SPEED RADIOGRAPHIC IMAGING ASSEMBLY

High-speed radiographic film

Ultrahigh speed imaging assembly for radiography

Image forming method using photothermographic material

Novel monomers containing an oxepan-2-one group, photoresist compos...

Photosensitive resin composition, resist composition, fabrication m...

Defect inspection of extreme ultraviolet lithography masks and the...

Photoresist polymer and photoresist composition including the same

High-speed positive-working photothermographic system

High-speed positive-working photothermographic system comprising an...