Claims
- 1. 1,1,1-Triaryl-2,2,2-trifluoroethane of the formula ##STR3## wherein X and Y are hydrogen or halogen atoms, or radicals selected from the class consisting of methoxy, phenoxy, hydroxy, alkyl of up to 5 carbon atoms, trifluoromethyl, carboxy, formyl, and nitro.
- 2. A process for the formation of a triaryl-2,2,2-trifluoroethane which comprises the condensation reaction of an .alpha.,.alpha.,.alpha.-trifluoroacetophenone with a phenyl compound in the presence of a catalytic quantity of trifluoromethylsulfonic acid.
- 3. The process of claim 2 wherein the aromatic ring of the acetophenone is substituted in the para position with an halogen atom or with a radical selected from the class consisting of the methoxy, phenoxy, alkyl of up to about five carbon atoms, trifluoromethyl, amino and nitro.
- 4. The process of claim 2 wherein the phenyl compound is substituted with halogen atoms or radicals selected from the class consisting of the methoxy, phenoxy, alkyl of up to about five carbon atoms, trifluoromethyl, amino and nitro.
- 5. The process of claim 2 wherein the condensation reaction is carried out by stirring the reaction mixture at ambient temperature for a period of up to about 48 hours.
- 6. The process of claim 2 wherein the reaction mixture is refluxed in benzene or toluene for up to about 24 hours.
ORIGIN
The invention described herein was made in the performance of work under a NASA contract and is subject to the provisions of Section 305 of the National Aeronautics and Space Act of 1958, Public Law 85-568 (72 Stat. 435; 42 U.S.C. 2457).
Non-Patent Literature Citations (3)
Entry |
Hey et al., Chemical Abstracts, vol. 54, Cols. 8710 to 8714 (1960). |
Steadman, Chemical Abstracts, vol. 79, Item 104937h (1973). |
Kray et al., J. Organic Chemistry, vol. 42, No. 7, pp. 1186 to 1189 (1977). |