3544756

Information

• Patent Grant
• 3544756

• References
• Source

• Patent Number

  3,544,756

• Date Filed

  Not available

• Date Issued

  Tuesday, December 1, 1970
  54 years ago

• CPC

  • H01J37/3053 - for evaporating or etching
  • C03C17/09 - by deposition from the vapour phase
  • C03C17/245 - by deposition from the vapour phase
  • C23C14/30 - by electron bombardment
  • C03C2217/213 - SiO2
  • C03C2217/263 - Metals other than noble metals, Cu or Hg
  • C03C2218/15 - from the vapour phase
  • C03C2218/151 - by vacuum evaporation

• US Classifications

  • 219 - Electric heating