for evaporating or etching

Industry

CPC
H01J37/3053

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3053for evaporating or etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment apparatus, lower electrode assembly and forming me...
- Patent number 12,261,012
- Issue date Mar 25, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC.
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microscopy feedback for improved milling accuracy
- Patent number 12,249,482
- Issue date Mar 11, 2025
- FEI Company
- Thomas Gary Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-breakdown ion source discharge apparatus
- Patent number 12,243,713
- Issue date Mar 4, 2025
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge carrier generation source
- Patent number 12,211,663
- Issue date Jan 28, 2025
- SCIA SYSTEMS GMBH
- Enrico Loos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for anisotropic pattern etching and treatment
- Patent number 12,205,793
- Issue date Jan 21, 2025
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam plasma enhanced chemical vapor deposition system for an...
- Patent number 12,191,156
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching isolation features and dense features within a substrate
- Patent number 12,119,232
- Issue date Oct 15, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Modulation of rolling k vectors of angled gratings
- Patent number 12,106,935
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 12,106,936
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner, reaction chamber and semiconductor processing equipment
- Patent number 12,106,934
- Issue date Oct 1, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jinrong Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and system
- Patent number 12,087,591
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch and ion beam etch patterning
- Patent number 12,080,562
- Issue date Sep 3, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,020,892
- Issue date Jun 25, 2024
- Kioxia Corporation
- Yusuke Goki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices for extending a time period until changing a me...
- Patent number 11,977,097
- Issue date May 7, 2024
- Carl Zeiss SMT GmbH
- Gabriel Baralia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid structures of ion beam etching (IBE) systems
- Patent number 11,961,706
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun David Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automatic adjustment method and automatic adjustment device of beam...
- Patent number 11,955,309
- Issue date Apr 9, 2024
- United Microelectronics Corp.
- Zheng-Yang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias supply with resonant switching
- Patent number 11,942,309
- Issue date Mar 26, 2024
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 11,908,700
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 11,894,213
- Issue date Feb 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Asako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for structuring a decorative of technical pattern in an obje...
- Patent number 11,894,215
- Issue date Feb 6, 2024
- Comadur S.A.
- Alexis Boulmay
- G04 - HOROLOGY
Information Patent Grant
Angle control for neutral reactive species generated in a plasma
- Patent number 11,881,378
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for semiconductor device
- Patent number 11,862,471
- Issue date Jan 2, 2024
- Kioxia Corporation
- Atsushi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Depositive shielding for fiducial protection from redeposition
- Patent number 11,817,395
- Issue date Nov 14, 2023
- FEI Company
- Sean Morgan-Jones
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion gun and vacuum processing apparatus
- Patent number 11,810,748
- Issue date Nov 7, 2023
- Canon Anelva Corporation
- Tsutomu Hiroishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source for optical device fabrication using a segmented io...
- Patent number 11,810,755
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
Focused Ion Beam System
- Publication number 20250109481
- Publication date Apr 3, 2025
- JEOL Ltd.
- Noriaki Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250096006
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Rin SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...
- Publication number 20250069958
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Alex Buxbaum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...
- Publication number 20250040442
- Publication date Jan 30, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Hung-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...
- Publication number 20240363304
- Publication date Oct 31, 2024
- FEI Company
- Jaroslav Velcovský
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GUIDING STRUCTURES FOR FABRICATION OF ANGLED FEATURES IN A SEMICOND...
- Publication number 20240319591
- Publication date Sep 26, 2024
- International Business Machines Corporation
- Steven Holmes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND DEVICES FOR EXTENDING A TIME PERIOD UNTIL CHANGING A ME...
- Publication number 20240272198
- Publication date Aug 15, 2024
- Carl Zeiss SMT GMBH
- Gabriel Baralia
- G01 - MEASURING TESTING
Information Patent Application
OPERATING A PARTICLE BEAM APPARATUS
- Publication number 20240274397
- Publication date Aug 15, 2024
- CARL ZEISS MICROSCOPY GMBH
- Sebastian Schaedler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Apparatus
- Publication number 20240258062
- Publication date Aug 1, 2024
- HITACHI HIGH-TECH CORPORATION
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Grid Structures Of Ion Beam Etching (IBE) Systems
- Publication number 20240222071
- Publication date Jul 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Fabrication of Shield Plate
- Publication number 20240208762
- Publication date Jun 27, 2024
- JEOL Ltd.
- Tsutomu Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS SUPPLY WITH RESONANT SWITCHING
- Publication number 20240194452
- Publication date Jun 13, 2024
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MILLING DEVICE
- Publication number 20240194443
- Publication date Jun 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Kengo ASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR PREPARING A SPECIMEN
- Publication number 20240071720
- Publication date Feb 29, 2024
- FEI Company
- Jamie Dee Gravell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240071731
- Publication date Feb 29, 2024
- Linco Technology Co., Ltd.
- Yi-Yuan HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS INJECTION SUBSYSTEM FOR USE IN AN INSPECTION SYSTEM TO INSPECT...
- Publication number 20230402251
- Publication date Dec 14, 2023
- Carl Zeiss SMT GmbH
- Louise Barris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATIC SELECTION OF STRUCTURES-OF-INTEREST FOR LAMELLA SAMPLE PR...
- Publication number 20230394852
- Publication date Dec 7, 2023
- FEI Company
- Radim Kríz
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHODS FOR AUTOMATED PROCESSING OF MULTIPLE SAMPLES IN...
- Publication number 20230377833
- Publication date Nov 23, 2023
- FEI Company
- Michal HROUZEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANGLE CONTROL FOR NEUTRAL REACTIVE SPECIES GENERATED IN A PLASMA
- Publication number 20230369013
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device and Ion Milling Method
- Publication number 20230369010
- Publication date Nov 16, 2023
- HITACHI HIGH-TECH CORPORATION
- Toru Iwaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE...
- Publication number 20230335375
- Publication date Oct 19, 2023
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE T...
- Publication number 20230326709
- Publication date Oct 12, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULATION OF ROLLING K VECTORS OF ANGLED GRATINGS
- Publication number 20230260746
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Joseph C. OLSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS SUPPLY WITH RESONANT SWITCHING
- Publication number 20230253187
- Publication date Aug 10, 2023
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DEPOSITING HARD CARBON LAYERS
- Publication number 20230223234
- Publication date Jul 13, 2023
- Fraunhofer Gesellschaft zur Forderung der angewandten Forschung e.V.
- Bert Scheffel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Automatic Detection of Required Peak for Sample Machining...
- Publication number 20230215689
- Publication date Jul 6, 2023
- TESCAN Brno, s.r.o.
- Sharang Sharang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE BAFFLE, ION ETCHING MACHINE, AND USAGE METHOD THEREFOR
- Publication number 20230207250
- Publication date Jun 29, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-BREAKDOWN ION SOURCE DISCHARGE APPARATUS
- Publication number 20230207260
- Publication date Jun 29, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROSCOPY FEEDBACK FOR IMPROVED MILLING ACCURACY
- Publication number 20230197403
- Publication date Jun 22, 2023
- FEI Company
- Thomas Gary Miller
- H01 - BASIC ELECTRIC ELEMENTS

for evaporating or etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma treatment apparatus, lower electrode assembly and forming me...

Microscopy feedback for improved milling accuracy

Anti-breakdown ion source discharge apparatus

Ion beam source, substrate process apparatus including the same, an...

Charge carrier generation source

Method and apparatus for anisotropic pattern etching and treatment

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Ribbon beam plasma enhanced chemical vapor deposition system for an...

Method for producing lamella, analysis system and method for analyz...

System and methods for automated processing of multiple samples in...

Etching isolation features and dense features within a substrate

Ion beam processing apparatus, electrode assembly, and method of cl...

Modulation of rolling k vectors of angled gratings

Scanned angled etching apparatus and techniques providing separate...

Liner, reaction chamber and semiconductor processing equipment

Plasma processing apparatus and system

Atomic layer etch and ion beam etch patterning

Etching apparatus and etching method

Methods and devices for extending a time period until changing a me...

Grid structures of ion beam etching (IBE) systems

Automatic adjustment method and automatic adjustment device of beam...

Bias supply with resonant switching

Method for manufacturing semiconductor structure

Ion milling device

Method for structuring a decorative of technical pattern in an obje...

Angle control for neutral reactive species generated in a plasma

Manufacturing method for semiconductor device

Depositive shielding for fiducial protection from redeposition

Ion gun and vacuum processing apparatus

Ion beam source for optical device fabrication using a segmented io...

Patents Applicationslast 30 patents

Focused Ion Beam System

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...

POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

IN-VACUUM CHAMBER CONTROLLED-GAS-FILM DEVICE TO REDUCE LASER ABLATI...

GUIDING STRUCTURES FOR FABRICATION OF ANGLED FEATURES IN A SEMICOND...

METHODS AND DEVICES FOR EXTENDING A TIME PERIOD UNTIL CHANGING A ME...

OPERATING A PARTICLE BEAM APPARATUS

Ion Milling Apparatus

Grid Structures Of Ion Beam Etching (IBE) Systems

Apparatus and Method for Fabrication of Shield Plate

BIAS SUPPLY WITH RESONANT SWITCHING

ION MILLING DEVICE

METHOD AND SYSTEM FOR PREPARING A SPECIMEN

SUBSTRATE PROCESSING APPARATUS

GAS INJECTION SUBSYSTEM FOR USE IN AN INSPECTION SYSTEM TO INSPECT...

AUTOMATIC SELECTION OF STRUCTURES-OF-INTEREST FOR LAMELLA SAMPLE PR...

SYSTEM AND METHODS FOR AUTOMATED PROCESSING OF MULTIPLE SAMPLES IN...

ANGLE CONTROL FOR NEUTRAL REACTIVE SPECIES GENERATED IN A PLASMA

Ion Milling Device and Ion Milling Method

SCANNED ANGLED ETCHING APPARATUS AND TECHNIQUES PROVIDING SEPARATE...

ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE T...

MODULATION OF ROLLING K VECTORS OF ANGLED GRATINGS

BIAS SUPPLY WITH RESONANT SWITCHING

APPARATUS AND METHOD FOR DEPOSITING HARD CARBON LAYERS

Method of Automatic Detection of Required Peak for Sample Machining...

ION SOURCE BAFFLE, ION ETCHING MACHINE, AND USAGE METHOD THEREFOR

ANTI-BREAKDOWN ION SOURCE DISCHARGE APPARATUS

MICROSCOPY FEEDBACK FOR IMPROVED MILLING ACCURACY