3574009

Information

• Patent Grant
• 3574009

• References
• Source

• Patent Number

  3,574,009

• Date Filed

  Not available

• Date Issued

  Tuesday, April 6, 1971
  53 years ago

• CPC

  • H01L21/2255 - the applied layer comprising oxides only
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • Y10S148/015 - Capping layer
  • Y10S148/049 - Equivalence and options
  • Y10S148/051 - Etching
  • Y10S148/085 - Isolated-integrated
  • Y10S148/144 - Shallow diffusion
  • Y10S148/145 - Shaped junctions
  • Y10S438/92 - Controlling diffusion profile by oxidation

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 065 - Glass manufacturing
  • 148 - Metal treatment
  • 257 - Active solid-state devices