3642442

Information

• Patent Grant
• 3642442

• References
• Source

• Patent Number

  3,642,442

• Date Filed

  Not available

• Date Issued

  Tuesday, February 15, 1972
  52 years ago

• CPC

  • C01B13/28 - using a plasma or an electric discharge
  • C01B33/183 - by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
  • C01G23/07 - Producing by vapour phase processes
  • C01P2002/54 - one element only
  • C01P2004/62 - Submicrometer sized
  • C01P2006/60 - Optical properties
  • C01P2006/80 - Compositional purity
  • H05H1/40 - using applied magnetic fields

• US Classifications

  • 423 - Chemistry of inorganic compounds