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3647581
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Information
Patent Grant
3647581
References
Source
Patent Number
3,647,581
Date Filed
Not available
Date Issued
Tuesday, March 7, 1972
53 years ago
CPC
H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H01L21/302 - to change their surface-physical characteristics or shape
H01L29/00 - Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier
Y10S148/035 - Diffusion through a layer
Y10S148/049 - Equivalence and options
Y10S148/051 - Etching
Y10S148/085 - Isolated-integrated
Y10S148/135 - Removal of substrate
Y10S148/162 - Testing steps
Y10S438/977 - Thinning or removal of substrate
US Classifications
438 - Semiconductor device manufacturing: process
148 - Metal treatment
257 - Active solid-state devices
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