Information
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Trademark
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88698404
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Serial Number
88698404
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Registration Number
6667318
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International Classifications
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Filing Date
November 19, 2019
5 years ago
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Registration Date
March 08, 2022
2 years ago
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Transaction Date
October 19, 2023
a year ago
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Status Date
March 08, 2022
2 years ago
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Published for Opposition Date
May 26, 2020
4 years ago
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Location Date
February 01, 2022
2 years ago
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First Use Anywhere Date
May 24, 2021
3 years ago
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First Use In Commerce Date
May 24, 2021
3 years ago
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Status Code
700
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Current Location
PUBLICATION AND ISSUE SECTION
Employee Name
CLARK, ROBERT C
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Attorney Docket Number
461010762001
Attorney Name
Cynthia Johnson Walden
Law Office Assigned Location Code
L10
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Owners
Mark Drawing Code
4000
Mark Identification
CMC MATERIALS
Case File Statements
- GS0071: Non-abrasive polishing pads for chemical-mechanical planarizing or chemical mechanical polishing (cmp) machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for use in the manufacture of advanced integrated circuit devices within the semiconductor industry
- GS0041: Industrial lubricants, namely, valve lubricants for the oil and gas storage, pipeline and gas distribution markets; Industrial lubricants and greases
- PM0001: CABOT MICROELECTRONICS CORPORATION MATERIALS
- GS0031: Industrial abrasives, namely, abrasive compounds for lapping and polishing semiconductors, silicon wafers, glass and metal surfaces; Chemical cleaner directed to the electronics industry; Post-copper chemical mechanical planarization (cmp) cleaning solution for use in the manufacturing and processing of semiconductors; Chemical cleaning solution for processing of integrated circuit (ic) in the opto-electronics and photonics industries; Post-ash cleaning solution for use in the manufacturing and processing of semiconductors; Abrasive preparations, namely, chemical cleaners, namely, abrasive dispersion slurries and cleaning and polishing preparations for use in the finishing of electronic components and substrates, optical components, glass, metals, plastics, machinery, computer parts, magnetic data-storage disks and heads
- GS0011: Chemical slurry for polishing semiconductors; Chemical slurries for polishing semiconductors, silicon wafers, glass, metals, plastics, machinery, electronic components and substrates, optical components, computer parts, magnetic data-storage disks and heads for use in the semiconductor, electronic, rigid disk and magnetic head industries; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth, or otherwise modify their chemical-mechanical properties; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth or otherwise modify their mechanical, physical, chemical and electrical properties; Chemical solutions for use in the manufacturing and processing of semiconductors, namely, photoresist stripper, benzotriazole (BTA) and L-proline solution; Fumed silica dispensed in water used to polish semiconductors; Aqueous metal oxide dispersions for use in semiconductor polishing; Chemical additives, namely, abrasive dispersions for use in the manufacture of electronic components and substrates, optical components, metals, machinery, computer parts, and magnetic data-storage disks and heads; Chemical slurries for use in the manufacture of advanced integrated circuit devices within the semi-conductor industry; High purity chemical compositions for electronic component manufacture; Chemical compositions for use in semiconductor manufacturing, solar cell panel manufacturing and flat panel display manufacturing; Chemical compositions for removal of photoresist and post-etch residues in the manufacture of semiconductors, integrated circuits and related products; Chemicals for use in industry and science; Chemical preparations for use in industry and science, namely, for use in the semiconductor and micro-electronics industries; Chemicals, namely, polymer-containing drag reducers and flow improvers to increase flow of hydrocarbons through pipelines; Chemical mechanical polishing (cmp) slurry and chemical mechanical planarization (cmp) slurry for use in the manufacturing and processing of semiconductors in the optoelectronics and photonics industries
- D10000: "MATERIALS"
Case File Event Statements
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10/18/2023 - a year ago
48 - AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
Type: ASGN
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8/9/2023 - a year ago
47 - TEAS CHANGE OF CORRESPONDENCE RECEIVED
Type: TCCA
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8/9/2023 - a year ago
46 - ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
Type: ARAA
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8/9/2023 - a year ago
45 - TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
Type: REAP
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8/9/2023 - a year ago
44 - APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
Type: CHAN
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8/9/2023 - a year ago
43 - TEAS CHANGE OF OWNER ADDRESS RECEIVED
Type: COAR
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3/8/2022 - 2 years ago
42 - REGISTERED-PRINCIPAL REGISTER
Type: R.PR
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2/2/2022 - 2 years ago
41 - NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED
Type: SUNA
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2/1/2022 - 2 years ago
40 - ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED
Type: CNPR
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2/1/2022 - 2 years ago
39 - NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED
Type: EXRA
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1/31/2022 - 2 years ago
38 - STATEMENT OF USE PROCESSING COMPLETE
Type: SUPC
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1/21/2022 - 2 years ago
37 - USE AMENDMENT FILED
Type: IUAF
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1/31/2022 - 2 years ago
36 - SOU EXTENSION 3 GRANTED
Type: EX3G
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1/21/2022 - 2 years ago
35 - SOU EXTENSION 3 FILED
Type: EXT3
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1/31/2022 - 2 years ago
34 - CASE ASSIGNED TO INTENT TO USE PARALEGAL
Type: AITU
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1/21/2022 - 2 years ago
33 - SOU TEAS EXTENSION RECEIVED
Type: EEXT
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1/21/2022 - 2 years ago
32 - TEAS STATEMENT OF USE RECEIVED
Type: EISU
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7/23/2021 - 3 years ago
31 - NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED
Type: EXRA
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7/21/2021 - 3 years ago
30 - SOU EXTENSION 2 GRANTED
Type: EX2G
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7/21/2021 - 3 years ago
29 - SOU EXTENSION 2 FILED
Type: EXT2
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7/21/2021 - 3 years ago
28 - SOU TEAS EXTENSION RECEIVED
Type: EEXT
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5/12/2021 - 3 years ago
27 - AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
Type: ASGN
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4/13/2021 - 3 years ago
26 - PETITION TO DIRECTOR GRANTED
Type: PCGR
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4/13/2021 - 3 years ago
25 - ASSIGNED TO PETITION STAFF
Type: APET
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4/13/2021 - 3 years ago
24 - ASSIGNED TO PETITION STAFF
Type: APET
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1/14/2021 - 4 years ago
23 - NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED
Type: EXRA
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1/12/2021 - 4 years ago
22 - SOU EXTENSION 1 GRANTED
Type: EX1G
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1/12/2021 - 4 years ago
21 - SOU EXTENSION 1 FILED
Type: EXT1
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1/12/2021 - 4 years ago
20 - SOU TEAS EXTENSION RECEIVED
Type: EEXT
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1/12/2021 - 4 years ago
19 - TEAS PETITION TO DIRECTOR RECEIVED
Type: TPDR
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7/21/2020 - 4 years ago
18 - NOA E-MAILED - SOU REQUIRED FROM APPLICANT
Type: NOAM
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5/26/2020 - 4 years ago
17 - OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Type: NPUB
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5/26/2020 - 4 years ago
16 - PUBLISHED FOR OPPOSITION
Type: PUBO
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5/6/2020 - 4 years ago
15 - NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
Type: NONP
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4/22/2020 - 4 years ago
14 - ASSIGNED TO LIE
Type: ALIE
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4/14/2020 - 4 years ago
13 - APPROVED FOR PUB - PRINCIPAL REGISTER
Type: CNSA
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4/13/2020 - 4 years ago
12 - TEAS/EMAIL CORRESPONDENCE ENTERED
Type: TEME
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4/13/2020 - 4 years ago
11 - CORRESPONDENCE RECEIVED IN LAW OFFICE
Type: CRFA
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4/13/2020 - 4 years ago
10 - TEAS RESPONSE TO OFFICE ACTION RECEIVED
Type: TROA
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2/25/2020 - 4 years ago
9 - NOTIFICATION OF NON-FINAL ACTION E-MAILED
Type: GNRN
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2/25/2020 - 4 years ago
8 - NON-FINAL ACTION E-MAILED
Type: GNRT
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2/25/2020 - 4 years ago
7 - NON-FINAL ACTION WRITTEN
Type: CNRT
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2/24/2020 - 4 years ago
6 - NOTIFICATION OF NON-FINAL ACTION E-MAILED
Type: GNRN
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2/24/2020 - 4 years ago
5 - NON-FINAL ACTION E-MAILED
Type: GNRT
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2/24/2020 - 4 years ago
4 - NON-FINAL ACTION WRITTEN
Type: CNRT
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2/24/2020 - 4 years ago
3 - ASSIGNED TO EXAMINER
Type: DOCK
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11/26/2019 - 5 years ago
2 - NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Type: NWOS
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11/22/2019 - 5 years ago
1 - NEW APPLICATION ENTERED
Type: NWAP