CMC MATERIALS, INC

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AURORA, IL, US

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Patents Grantslast 30 patents

Information Patent Grant
Composition and method for polysilicon CMP
- Patent number 12,157,834
- Issue date Dec 3, 2024
- CMC MATERIALS LLC
- Sarah Brosnan
- B24 - GRINDING POLISHING
Information Patent Grant
Self-stopping polishing composition and method for high topological...
- Patent number 12,116,502
- Issue date Oct 15, 2024
- CMC MATERIALS LLC
- Juyeon Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical planarization pads with constant groove volume
- Patent number 11,938,584
- Issue date Mar 26, 2024
- CMC MATERIALS LLC
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Secondary battery cell with solid polymer electrolyte
- Patent number 11,855,258
- Issue date Dec 26, 2023
- CMC Materials, Inc.
- Deepak Shukla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternative oxidizing agents for cobalt CMP
- Patent number 11,851,584
- Issue date Dec 26, 2023
- CMC Materials, Inc.
- Steven Kraft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical planarization pads via vat-based production
- Patent number 11,845,157
- Issue date Dec 19, 2023
- CMC Materials, Inc.
- Eric S. Moyer
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad employing polyamine and cyclohexanedimethanol curatives
- Patent number 11,845,156
- Issue date Dec 19, 2023
- CMC Materials, Inc.
- Rui Ma
- B24 - GRINDING POLISHING
Information Patent Grant
UV-curable resins used for chemical mechanical polishing pads
- Patent number 11,807,710
- Issue date Nov 7, 2023
- CMC Materials, Inc.
- Chen-Chih Tsai
- B24 - GRINDING POLISHING
Information Patent Grant
Silica-based slurry for selective polishing of carbon-based films
- Patent number 11,802,220
- Issue date Oct 31, 2023
- CMC Materials, Inc.
- Brian Reiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP composition including a novel abrasive
- Patent number 11,725,116
- Issue date Aug 15, 2023
- CMC Materials, Inc.
- Alexander W. Hains
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Solid polymer electrolyte compositions and methods of preparing same
- Patent number 11,637,317
- Issue date Apr 25, 2023
- CMC Materials, Inc.
- Deepak Shukla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Titanium dioxide containing ruthenium chemical mechanical polishing...
- Patent number 11,629,271
- Issue date Apr 18, 2023
- CMC Materials, Inc.
- Jin-Hao Jhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method to increase barrier film removal rate in bulk tungsten slurry
- Patent number 11,597,854
- Issue date Mar 7, 2023
- CMC Materials, Inc.
- William J. Ward
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Derivatized polyamino acids
- Patent number 11,492,514
- Issue date Nov 8, 2022
- CMC Materials, Inc.
- Na Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Coated compressive subpad for chemical mechanical polishing
- Patent number 11,440,158
- Issue date Sep 13, 2022
- CMC Materials, Inc.
- Diane Scott
- B24 - GRINDING POLISHING
Information Patent Grant
Dual additive composition for polishing memory hard disks exhibitin...
- Patent number 11,384,253
- Issue date Jul 12, 2022
- CMC Materials, Inc.
- Tong Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface treated abrasive particles for tungsten buff applications
- Patent number 11,043,151
- Issue date Jun 22, 2021
- CMC Materials, Inc.
- Ji Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition and method utilizing abrasive particles treat...
- Patent number 11,034,862
- Issue date Jun 15, 2021
- CMC Materials, Inc.
- Steven Grumbine
- B24 - GRINDING POLISHING
Information Patent Grant
Composition and method for copper barrier CMP
- Patent number 10,988,635
- Issue date Apr 27, 2021
- CMC Materials, Inc.
- Steven Kraft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical processing slurry and methods for processing a...
- Patent number 10,968,377
- Issue date Apr 6, 2021
- CMC Materials, Inc.
- Tong Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition and method for metal CMP
- Patent number 10,968,366
- Issue date Apr 6, 2021
- CMC Materials, Inc.
- Steven Kraft
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Low density polishing pad
- Patent number 10,946,495
- Issue date Mar 16, 2021
- CMC Materials, Inc.
- Ping Huang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,920,107
- Issue date Feb 16, 2021
- CMC Materials, Inc.
- Alexander W. Hains
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
DUAL-CURE RESIN FOR PREPARING CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20240376238
- Publication date Nov 14, 2024
- CMC Materials LLC
- Achla Khanna
- B24 - GRINDING POLISHING
Information Patent Application
CMP COMPOSITION INCLUDING ANIONIC AND CATIONIC INHIBITORS
- Publication number 20240352280
- Publication date Oct 24, 2024
- CMC Materials LLC
- Hsin-Yen WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION AND CHEMICAL-MECHANICAL P...
- Publication number 20240263039
- Publication date Aug 8, 2024
- CMC Materials KK
- Hiroshi KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME
- Publication number 20240238937
- Publication date Jul 18, 2024
- CMC Materials LLC
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS
- Publication number 20240199917
- Publication date Jun 20, 2024
- CMC Materials LLC
- Chih-Hsien CHIEN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR HEAVILY-DOPED BORON S...
- Publication number 20240117220
- Publication date Apr 11, 2024
- CMC Materials LLC
- Alex Villani-Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PADS WITH A DISULFIDE BRIDGE
- Publication number 20240100648
- Publication date Mar 28, 2024
- CMC Materials LLC
- Jaeseok Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURF...
- Publication number 20240101865
- Publication date Mar 28, 2024
- CMC Materials LLC
- Na ZHANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DUAL-CURE RESIN FOR PREPARING CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20230405765
- Publication date Dec 21, 2023
- CMC Materials LLC
- Chen-Chih TSAI
- B24 - GRINDING POLISHING
Information Patent Application
UV-CURABLE RESINS FOR CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20230406984
- Publication date Dec 21, 2023
- CMC Materials LLC
- Ping HUANG
- B24 - GRINDING POLISHING
Information Patent Application
DUAL ADDITIVE POLISHING COMPOSITION FOR GLASS SUBSTRATES
- Publication number 20230323158
- Publication date Oct 12, 2023
- CMC Materials, Inc.
- Tong LI
- B24 - GRINDING POLISHING
Information Patent Application
CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP...
- Publication number 20230242790
- Publication date Aug 3, 2023
- CMC Materials, Inc.
- Brian Reiss
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP...
- Publication number 20230242791
- Publication date Aug 3, 2023
- CMC Materials, Inc.
- Brian Reiss
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE
- Publication number 20230166380
- Publication date Jun 1, 2023
- CMC Materials, Inc.
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
SILICA-BASED SLURRY COMPOSITIONS CONTAINING HIGH MOLECULAR WEIGHT P...
- Publication number 20230087984
- Publication date Mar 23, 2023
- CMC Materials, Inc.
- Brian REISS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL PLANARIZATION PAD WITH A RELEASE LINER COMPRISI...
- Publication number 20230090077
- Publication date Mar 23, 2023
- CMC Materials, Inc.
- Justin Stewart
- B24 - GRINDING POLISHING
Information Patent Application
TEXTURED CMP PAD COMPRISING POLYMER PARTICLES
- Publication number 20230076804
- Publication date Mar 9, 2023
- CMC Materials, Inc.
- Rui MA
- B24 - GRINDING POLISHING
Information Patent Application
CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE
- Publication number 20230070776
- Publication date Mar 9, 2023
- CMC Materials, Inc.
- Yang-Yao Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION AND METHOD FOR COBALT CMP
- Publication number 20230059396
- Publication date Feb 23, 2023
- CMC Materials, Inc.
- Fernando HUNG LOW
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD
- Publication number 20220243094
- Publication date Aug 4, 2022
- CMC Materials, Inc.
- Lung-Tai LU
- B82 - NANO-TECHNOLOGY
Information Patent Application
COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON
- Publication number 20220235247
- Publication date Jul 28, 2022
- CMC Materials, Inc.
- Brittany JOHNSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE
- Publication number 20220234167
- Publication date Jul 28, 2022
- CMC Materials, Inc.
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL POLISHING PAD WITH TEXTURED PLATEN ADHESIVE
- Publication number 20220203497
- Publication date Jun 30, 2022
- CMC Materials, Inc.
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL POLISHING SUBPAD HAVING POROGENS WITH POLYMERIC...
- Publication number 20220193860
- Publication date Jun 23, 2022
- CMC Materials, Inc.
- Dustin MILLER
- B24 - GRINDING POLISHING
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL...
- Publication number 20220195244
- Publication date Jun 23, 2022
- CMC Materials, Inc.
- Juyeon CHANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
UV-CURABLE RESINS USED FOR CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20220119586
- Publication date Apr 21, 2022
- CMC Materials, Inc.
- Chen-Chih TSAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICA-BASED SLURRY FOR SELECTIVE POLISHING OF CARBON-BASED FILMS
- Publication number 20220089908
- Publication date Mar 24, 2022
- CMC Materials, Inc.
- Brian REISS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TITANIUM DIOXIDE CONTAINING RUTHENIUM CHEMICAL MECHANICAL POLISHING...
- Publication number 20220033683
- Publication date Feb 3, 2022
- CMC Materials, Inc.
- Jin-Hao Jhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP COMPOSITION INCLUDING ANIONIC AND CATIONIC INHIBITORS
- Publication number 20220033682
- Publication date Feb 3, 2022
- CMC Materials, Inc.
- Hsin-Yen WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON WAFER POLISHING COMPOSITION AND METHOD
- Publication number 20220017781
- Publication date Jan 20, 2022
- CMC Materials, Inc.
- Hiroshi KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS

Trademarklast 30 trademarks

Information Trademark
90581923 - EPIC POWER
- Serial number 90581923
- Registration number 6847965
- Filing date Mar 16, 2021
- CMC MATERIALS, INC.
- 7 - Machines and machine tools
Information Trademark
90581990 - EPIC POWER
- Serial number 90581990
- Registration number 6847967
- Filing date Mar 16, 2021
- CMC MATERIALS, INC.
- 7 - Machines and machine tools
Information Trademark
88719666 - CMC MATERIALS
- Serial number 88719666
- Registration number 6667339
- Filing date Dec 9, 2019
- CMC MATERIALS, INC.
- 1 - Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry
Information Trademark
88698404 - CMC MATERIALS
- Serial number 88698404
- Registration number 6667318
- Filing date Nov 19, 2019
- CMC MATERIALS, INC.
- 1 - Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry

CMC MATERIALS, INC

Organization

Patents Grantslast 30 patents

Composition and method for polysilicon CMP

Self-stopping polishing composition and method for high topological...

Chemical mechanical planarization pads with constant groove volume

Secondary battery cell with solid polymer electrolyte

Alternative oxidizing agents for cobalt CMP

Chemical mechanical planarization pads via vat-based production

Polishing pad employing polyamine and cyclohexanedimethanol curatives

UV-curable resins used for chemical mechanical polishing pads

Silica-based slurry for selective polishing of carbon-based films

CMP composition including a novel abrasive

Solid polymer electrolyte compositions and methods of preparing same

Titanium dioxide containing ruthenium chemical mechanical polishing...

Method to increase barrier film removal rate in bulk tungsten slurry

Derivatized polyamino acids

Coated compressive subpad for chemical mechanical polishing

Dual additive composition for polishing memory hard disks exhibitin...

Surface treated abrasive particles for tungsten buff applications

Polishing composition and method utilizing abrasive particles treat...

Composition and method for copper barrier CMP

Chemical-mechanical processing slurry and methods for processing a...

Composition and method for metal CMP

Low density polishing pad

Self-stopping polishing composition and method for bulk oxide plana...

Patents Applicationslast 30 patents

DUAL-CURE RESIN FOR PREPARING CHEMICAL MECHANICAL POLISHING PADS

CMP COMPOSITION INCLUDING ANIONIC AND CATIONIC INHIBITORS

CHEMICAL-MECHANICAL POLISHING COMPOSITION AND CHEMICAL-MECHANICAL P...

CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME

NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS

CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR HEAVILY-DOPED BORON S...

CHEMICAL MECHANICAL POLISHING PADS WITH A DISULFIDE BRIDGE

TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURF...

DUAL-CURE RESIN FOR PREPARING CHEMICAL MECHANICAL POLISHING PADS

UV-CURABLE RESINS FOR CHEMICAL MECHANICAL POLISHING PADS

DUAL ADDITIVE POLISHING COMPOSITION FOR GLASS SUBSTRATES

CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP...

CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP...

ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE

SILICA-BASED SLURRY COMPOSITIONS CONTAINING HIGH MOLECULAR WEIGHT P...

CHEMICAL MECHANICAL PLANARIZATION PAD WITH A RELEASE LINER COMPRISI...

TEXTURED CMP PAD COMPRISING POLYMER PARTICLES

CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE

COMPOSITION AND METHOD FOR COBALT CMP

SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD

COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON

ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE

CHEMICAL-MECHANICAL POLISHING PAD WITH TEXTURED PLATEN ADHESIVE

CHEMICAL-MECHANICAL POLISHING SUBPAD HAVING POROGENS WITH POLYMERIC...

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL...

UV-CURABLE RESINS USED FOR CHEMICAL MECHANICAL POLISHING PADS

SILICA-BASED SLURRY FOR SELECTIVE POLISHING OF CARBON-BASED FILMS

TITANIUM DIOXIDE CONTAINING RUTHENIUM CHEMICAL MECHANICAL POLISHING...

CMP COMPOSITION INCLUDING ANIONIC AND CATIONIC INHIBITORS

SILICON WAFER POLISHING COMPOSITION AND METHOD

Trademarklast 30 trademarks

90581923 - EPIC POWER

90581990 - EPIC POWER

88719666 - CMC MATERIALS

88698404 - CMC MATERIALS