Claims
- 1. A method of preparing aluminum printing plates comprising the following steps in sequence:a) graining the aluminum; b) de-smutting the aluminum; c) rinsing with hot water; d) acetating the aluminum; and e) silicating the aluminum.
- 2. A method according to claim 1 wherein a layer of a cross linkable azide photoresist solution is spun onto the plates after the silicating step.
- 3. A method according to claim 2 wherein the photoresist is flood exposed with ultraviolet light.
- 4. A method according to claim 2 wherein the photoresist is pattern exposed with a light source and developed to dissolve soluble portions of the photoresist.
- 5. A method according to claim 4 wherein the photoresist is exposed using a computer controlled laser diode.
- 6. A grained aluminum printing plate prepared according to the method of claim 1 having a layer of oxide having a maximum thickness of about 0.5 micron.
- 7. A grained aluminum printing plate according to claim 6 wherein the oxide layer is from 0.1 to 0.3 micron thick.
- 8. A grained aluminum printing plate according to claim 6 having a layer of silicate over the oxide layer.
- 9. A grained aluminum printing plate prepared according to the method of claim 1 having a layer of oxide having a maximum thickness of 0.5 micron, a layer of silicate thereover and a layer of a cross linkable azide photoresist thereover.
- 10. A printing plate according to claim 9 wherein said photoresist has been pattern exposed with light and developed with a developer solvent.
Parent Case Info
This invention is a continuation-in-part of application Ser. No. 09/525,262 filed Mar. 14, 2000, now abandoned, which is a divisional of application Ser. No. 08/666,169 filed Jun. 19, 1996, now U.S. Pat. No. 6,037,085 issued Mar. 14, 2000.
This invention relates to improved aluminum printing plates that can be exposed using an infrared light source. More particularly, this invention relates to improved aluminum printing plates and to methods of preparing printing plates that are to be infrared light exposed using a positive photopolymer resist.
US Referenced Citations (14)
Number |
Name |
Date |
Kind |
4116695 |
Mori et al. |
Sep 1978 |
A |
4121980 |
Gohausen et al. |
Oct 1978 |
A |
4175964 |
Uchida et al. |
Nov 1979 |
A |
4399021 |
Gillich et al. |
Aug 1983 |
A |
4492616 |
Pliefke et al. |
Jan 1985 |
A |
4672022 |
Reiss et al. |
Jun 1987 |
A |
4714528 |
Takeuchi et al. |
Dec 1987 |
A |
4902389 |
Nishino et al. |
Feb 1990 |
A |
5637441 |
Brenk et al. |
Jun 1997 |
A |
5645972 |
Jonkheere |
Jul 1997 |
A |
5773194 |
Hattori et al. |
Jun 1998 |
A |
5811215 |
Van Damme et al. |
Sep 1998 |
A |
5962192 |
Holman et al. |
Oct 1999 |
A |
6037085 |
Holman, III et al. |
Mar 2000 |
A |
Foreign Referenced Citations (1)
Number |
Date |
Country |
1230447 |
May 1971 |
GB |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09/525262 |
Mar 2000 |
US |
Child |
09/902416 |
|
US |