Claims
- 1. An aqueous, mild, antimicrobial cleansing composition, comprising:
a. an effective amount of a water soluble or dispersible antimicrobial agent, or a precursor or salt thereof; b. a nonionic surfactant; and wherein said composition contains less than 1% of any compound selected from the group consisting of an amphoteric surfactant, an anionic surfactant, a halogenated aromatic hydrocarbon, an amide, and a volatile alcohol with a boiling point of under 210° C.
- 2. The composition of claim 1 wherein said antimicrobial agent is a cationic compound, or a salt or precursor thereof.
- 3. The composition of claim 2 wherein said cationic compound is a quaternary ammonium compound having at least one aromatic group.
- 4. The composition of claim 3 wherein said aromatic quaternary ammonium compound is selected from the group consisting of benzethonium chloride, benzalkonium chloride and methyl benzethonium chloride.
- 5. The composition of claim 3 wherein said aromatic quaternary ammonium compound is present in a concentration range of 0.05 to 0.5 weight percent.
- 6. The composition of claim 1 wherein the nonionic surfactant is selected from the group consisting of a condensation product of a saccharide polymer and a C8 to C12 alcohol.
- 7. The composition of claim 6 wherein the nonionic surfactant is selected from the group consisting of decyl glucoside, lauryl glucoside, coco-glucoside and mixtures thereof.
- 8. The composition of claim 1 wherein the composition does not contain any compound selected from the group consisting of an amphoteric surfactant, an anionic surfactant, a halogenated aromatic hydrocarbon, an amide, and a volatile alcohol with a boiling point of under 210° C.
- 9. The composition of claim 1 wherein said composition contains a benefit agent.
- 10. The composition of claim 9 wherein said benefit agent is selected from the group consisting of a polyhydric alcohol, a polyol, vitamins, skin emollients and anti acne compounds.
- 11. A mild antimicrobial, cleansing wipe, comprising:
a. a water insoluble substrate; b. an aqueous, mild, antimicrobial cleansing composition, said composition including an effective amount of a water soluble or dispersible bactericidal agent, or a precursor or salt thereof; and a nonionic surfactant; and wherein said composition contains less than 1% of any compound selected from the group consisting of an amphoteric surfactant, an anionic surfactant, a halogenated aromatic hydrocarbon, an amide, and a volatile alcohol with a boiling point of under 210° C.
- 12. The wipe of claim 11 wherein the water insoluble substrate is selected from the group consisting of wet-laid, hydroentangled, meltblown or air-laid nonwovens.
- 13. The wipe of claim 11 wherein said bactericidal agent is a quaternary ammonium compound, or a salt or precursor thereof.
- 14. The wipe of claim 13 wherein said quaternary ammonium compound has at least one aromatic group.
- 15. The wipe of claim 14 wherein said aromatic quaternary ammonium compound is selected from the group consisting of benzethonium chloride, benzalkonium chloride and methyl benzethonium chloride.
- 16. The wipe of claim 14 wherein said aromatic quaternary ammonium compound is present in a concentration range of 0.05 to 0.5 weight percent.
- 17. The wipe of claim 11 wherein the nonionic surfactant is selected from the group consisting of a condensation product of a saccharide polymer and a C8 to C12 alcohol.
- 18. The wipe of claim 17 wherein the nonionic surfactant is selected from the group consisting of decyl glucoside, lauryl glucoside, coco-glucoside and mixtures thereof.
- 19. The wipe of claim 11 wherein the composition does not contain any compound selected from the group consisting of an amphoteric surfactant, an anionic surfactant, a halogenated aromatic hydrocarbon, an amide, and a volatile alcohol with a boiling point of under 210° C.
- 20. The wipe of claim 11 wherein said composition contains a benefit agent.
- 21. The wipe of claim 11 wherein said benefit agent is selected from the group consisting of a polyhydric alcohol, a polyol, vitamins, skin emollients sunscreen compounds and anti-acne compounds.
- 22. The process of making a mild antimicrobial, cleansing wipe, comprising the step of coating a water insoluble substrate with an aqueous, mild, antimicrobial cleansing composition, said composition including an effective amount of a water soluble or dispersible bactericidal agent, or a precursor or salt thereof; and a nonionic surfactant; and wherein said composition contains less than 1% of any compound selected from the group consisting of an amphoteric surfactant, an anionic surfactant, a halogenated aromatic hydrocarbon, an amide, and a volatile alcohol with a boiling point of under 210° C.
- 23. The process of making a mild antimicrobial, cleansing wipe, comprising the step of coating a water insoluble substrate with an aqueous, mild, antimicrobial cleansing composition, said composition including an effective amount of a water soluble or dispersible bactericidal agent, or a precursor or salt thereof; and a nonionic surfactant; and wherein said composition contains less than 1% of a compound selected from the group consisting of an amphoteric surfactant, an anionic surfactant, a halogenated aromatic hydrocarbon, an amide, and a volatile alcohol with a boiling point of under 210° C.
- 24. The process of using a mild antimicrobial, cleansing wipe, comprising the step of applying the wipe to the skin to remove dirt and oil, said composition including an effective amount of a water soluble or dispersible bactericidal agent, or a precursor or salt thereof; and a nonionic surfactant; and wherein said composition contains less than 1% of a compound selected from the group consisting of an amphoteric surfactant, an anionic surfactant, a halogenated aromatic hydrocarbon, an amide, and a volatile alcohol with a boiling point of under 210° C.
Parent Case Info
[0001] This application claims the benefit of U.S. provisional application no. 60/203,412 filed May 11,2000.
Provisional Applications (1)
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Number |
Date |
Country |
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60203412 |
May 2000 |
US |