Kashiwagi et al, Organic films containing metal prepared by plasma polymerization, J.Vac.Sci.&Tech.A 5(4), pp. 1828-1830, Jul. 1, 1987. |
Felts et al, Commerical-scale application of plasma processing for polymeric substrates: From laboratory to production, J.Vac.Sci.&Tech.A 10(4), pp. 1675-1681, Jul. 1992. |
Bruno et al, Study of the NF3 plasma cleaning of reactors for amorphous silicon deposition, J.Vac.Sci.&Tech.A 12(3), pp. 690-698, May 1994. |
Halverson et al, Plasma assisted chemical vapor deposition on "three-dimensional" substrates, J.Vac.Sci.&Tech.A 10(3), pp. 439-443, May 1992. |
Hamasaki et al, New mode of plasma deposition in a capacitive coupled reactor, App.Phy.Let. 44(11), pp. 1049-1051, Jun. 1, 1994. |