Constructional details of the reactor

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CPC
H01J37/32431

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/32431Constructional details of the reactor

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Variable output impedance RF generator
- Patent number 12,198,898
- Issue date Jan 14, 2025
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,961,718
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shojiro Yahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manifold valve for controlling multiple gases
- Patent number 11,859,282
- Issue date Jan 2, 2024
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas-dispersing apparatus for multiple chemical resources
- Patent number 11,767,592
- Issue date Sep 26, 2023
- PIOTECH INC.
- Huaqiang Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power feeding mechanism and method for controlling temperature of a...
- Patent number 11,756,807
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Dai Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for improving chemical utilization rate in de...
- Patent number 11,713,508
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Kevin Griffin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 11,705,346
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Yusei Kuwabara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable output impedance RF generator
- Patent number 11,670,484
- Issue date Jun 6, 2023
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for processing gases
- Patent number 11,634,323
- Issue date Apr 25, 2023
- Transform Materials LLC
- David S. Soane
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Grant
Systems and methods for processing gases
- Patent number 11,634,324
- Issue date Apr 25, 2023
- Transform Materials LLC
- David S. Soane
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Grant
Low-pressure plasma chamber, low-pressure plasma installation and m...
- Patent number 11,532,465
- Issue date Dec 20, 2022
- Christof-Herbert Diener
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
System for focused deposition of atomic vapors
- Patent number 11,515,131
- Issue date Nov 29, 2022
- The Charles Stark Draper Laboratory Inc.
- Isaac Ehrenberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manifold valve for multiple precursors
- Patent number 11,427,908
- Issue date Aug 30, 2022
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precise plasma control system
- Patent number 11,430,635
- Issue date Aug 30, 2022
- Eagle Harbor Technologies, Inc.
- Timothy Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for improving chemical utilization rate in de...
- Patent number 11,396,703
- Issue date Jul 26, 2022
- Applied Materials, Inc.
- Kevin Griffin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating apparatus
- Patent number 11,358,168
- Issue date Jun 14, 2022
- VisEra Technologies Company Limited
- Shao-Wei Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing device having connection plates, substrate pro...
- Patent number 11,339,476
- Issue date May 24, 2022
- ASM IP Holding B.V.
- Naoto Tsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition apparatus and deposition method
- Patent number 11,319,630
- Issue date May 3, 2022
- Ulvac, Inc.
- Kazuhiko Tonari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 11,239,060
- Issue date Feb 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma sheath control for RF plasma reactors
- Patent number 11,227,745
- Issue date Jan 18, 2022
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatuses having a dielectric injector
- Patent number 11,152,194
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power feeding mechanism and method for controlling temperature of a...
- Patent number 11,121,009
- Issue date Sep 14, 2021
- Tokyo Electron Limited
- Dai Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-conditioned chamber components
- Patent number 11,072,852
- Issue date Jul 27, 2021
- Applied Materials, Inc.
- Brian T. West
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable output impedance RF generator
- Patent number 11,004,660
- Issue date May 11, 2021
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,991,556
- Issue date Apr 27, 2021
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid distributing device for a thin-film deposition apparatus, rel...
- Patent number 10,982,325
- Issue date Apr 20, 2021
- Picosun Oy
- Juhana Kostamo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber of plasma system, liner for plasma system and method for in...
- Patent number 10,763,082
- Issue date Sep 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Hsien Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for processing gases
- Patent number 10,676,353
- Issue date Jun 9, 2020
- Transform Materials LLC
- David S. Soane
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Polygonal toroidal plasma source
- Patent number 10,553,403
- Issue date Feb 4, 2020
- MKS Instruments, Inc.
- Paul Michael Meneghini
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,553,404
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR PROCESSING GASES
- Publication number 20240010492
- Publication date Jan 11, 2024
- TRANSFORM MATERIALS LLC
- David S. Soane
- C01 - INORGANIC CHEMISTRY
Information Patent Application
ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR
- Publication number 20230369024
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VARIABLE OUTPUT IMPEDANCE RF GENERATOR
- Publication number 20230352271
- Publication date Nov 2, 2023
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANIFOLD VALVE FOR CONTROLLING MULTIPLE GASES
- Publication number 20220372619
- Publication date Nov 24, 2022
- LAM RESEARCH CORPORATION
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR
- Publication number 20220148856
- Publication date May 12, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR PROCESSING GASES
- Publication number 20220041439
- Publication date Feb 10, 2022
- TRANSFORM MATERIALS LLC
- David S. Soane
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POWER FEEDING MECHANISM AND METHOD FOR CONTROLLING TEMPERATURE OF A...
- Publication number 20210375648
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Dai KITAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE OUTPUT IMPEDANCE RF GENERATOR
- Publication number 20210351006
- Publication date Nov 11, 2021
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND METHODS FOR PLASMA PROCESSING
- Publication number 20200365372
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRECISE PLASMA CONTROL SYSTEM
- Publication number 20200357607
- Publication date Nov 12, 2020
- Eagle Harbor Technologies, Inc.
- Timothy Ziemba
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
VARIABLE OUTPUT IMPEDANCE RF GENERATOR
- Publication number 20200176221
- Publication date Jun 4, 2020
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20200118798
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PROCESSING GASES
- Publication number 20200062591
- Publication date Feb 27, 2020
- TRANSFORM MATERIALS LLC
- David S. Soane
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA SHEATH CONTROL FOR RF PLASMA REACTORS
- Publication number 20200051785
- Publication date Feb 13, 2020
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-CONDITIONED CHAMBER COMPONENTS
- Publication number 20200024725
- Publication date Jan 23, 2020
- Applied Materials, Inc.
- Brian T. WEST
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS AND DEPOSITION METHOD
- Publication number 20190284697
- Publication date Sep 19, 2019
- ULVAC, Inc.
- KAZUHIKO TONARI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COOLING ELEMENT FOR AN ELECTROSTATIC CHUCK ASSEMBLY
- Publication number 20190244848
- Publication date Aug 8, 2019
- Applied Materials, Inc.
- Michael D. Willwerth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUSCEPTOR
- Publication number 20190131163
- Publication date May 2, 2019
- NGK Insulators,Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180218933
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSPARENT CONDUCTIVE FILM
- Publication number 20180170016
- Publication date Jun 21, 2018
- NANCHANG O-FILM DISPLAY TECHNOLOGY CO., LTD.
- Shuang DU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTI-ARC ZERO FIELD PLATE
- Publication number 20180119281
- Publication date May 3, 2018
- Applied Materials, Inc.
- Jonghoon BAEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DISPLAY AND METHOD FOR MANUFACTURING DISPLAY
- Publication number 20180052356
- Publication date Feb 22, 2018
- Mitsubishi Electric Corporation
- Toshihiko IWASAKA
- G02 - OPTICS
Information Patent Application
CHAMBER OF PLASMA SYSTEM, LINER FOR PLASMA SYSTEM AND METHOD FOR IN...
- Publication number 20170256383
- Publication date Sep 7, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Hsien Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170221682
- Publication date Aug 3, 2017
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER FEEDING MECHANISM AND METHOD FOR CONTROLLING TEMPERATURE OF A...
- Publication number 20170140957
- Publication date May 18, 2017
- TOKYO ELECTRON LIMITED
- Dai KITAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROOVED BACKING PLATE FOR STANDING WAVE COMPENSATION
- Publication number 20170092469
- Publication date Mar 30, 2017
- Applied Materials, Inc.
- Shinichi KURITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR TREATING AN OUTER SURFACE OF A HEAT TRANSFER FLUID TUBE
- Publication number 20170076913
- Publication date Mar 16, 2017
- NEM Energy B.V.
- Peter Simon Rop
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
USE OF ATOMIC LAYER DEPOSITION COATINGS TO PROTECT BRAZING LINE AGA...
- Publication number 20160375515
- Publication date Dec 29, 2016
- LAM RESEARCH CORPORATION
- Lin XU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL
- Publication number 20160268136
- Publication date Sep 15, 2016
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Circulating Cooling/Heating Device
- Publication number 20160196954
- Publication date Jul 7, 2016
- KELK LTD.
- Daisuke GOTO
- H01 - BASIC ELECTRIC ELEMENTS

Constructional details of the reactor

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Variable output impedance RF generator

Plasma processing method and plasma processing apparatus

Manifold valve for controlling multiple gases

Gas-dispersing apparatus for multiple chemical resources

Power feeding mechanism and method for controlling temperature of a...

Apparatus and methods for improving chemical utilization rate in de...

Substrate processing apparatus

Variable output impedance RF generator

Systems and methods for processing gases

Systems and methods for processing gases

Low-pressure plasma chamber, low-pressure plasma installation and m...

System for focused deposition of atomic vapors

Manifold valve for multiple precursors

Precise plasma control system

Apparatus and methods for improving chemical utilization rate in de...

Coating apparatus

Substrate processing device having connection plates, substrate pro...

Deposition apparatus and deposition method

Ion beam etching chamber with etching by-product redistributor

Plasma sheath control for RF plasma reactors

Plasma processing apparatuses having a dielectric injector

Power feeding mechanism and method for controlling temperature of a...

Pre-conditioned chamber components

Variable output impedance RF generator

Adjustable extended electrode for edge uniformity control

Fluid distributing device for a thin-film deposition apparatus, rel...

Chamber of plasma system, liner for plasma system and method for in...

Systems and methods for processing gases

Polygonal toroidal plasma source

Adjustable extended electrode for edge uniformity control

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR PROCESSING GASES

ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR

VARIABLE OUTPUT IMPEDANCE RF GENERATOR

MANIFOLD VALVE FOR CONTROLLING MULTIPLE GASES

ION BEAM ETCHING CHAMBER WITH ETCHING BY-PRODUCT REDISTRIBUTOR

SYSTEMS AND METHODS FOR PROCESSING GASES

POWER FEEDING MECHANISM AND METHOD FOR CONTROLLING TEMPERATURE OF A...

VARIABLE OUTPUT IMPEDANCE RF GENERATOR

APPARATUSES AND METHODS FOR PLASMA PROCESSING

PRECISE PLASMA CONTROL SYSTEM

VARIABLE OUTPUT IMPEDANCE RF GENERATOR

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

SYSTEMS AND METHODS FOR PROCESSING GASES

PLASMA SHEATH CONTROL FOR RF PLASMA REACTORS

PRE-CONDITIONED CHAMBER COMPONENTS

DEPOSITION APPARATUS AND DEPOSITION METHOD

COOLING ELEMENT FOR AN ELECTROSTATIC CHUCK ASSEMBLY

WAFER SUSCEPTOR

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

TRANSPARENT CONDUCTIVE FILM

ANTI-ARC ZERO FIELD PLATE

DISPLAY AND METHOD FOR MANUFACTURING DISPLAY

CHAMBER OF PLASMA SYSTEM, LINER FOR PLASMA SYSTEM AND METHOD FOR IN...

PLASMA PROCESSING APPARATUS

POWER FEEDING MECHANISM AND METHOD FOR CONTROLLING TEMPERATURE OF A...

GROOVED BACKING PLATE FOR STANDING WAVE COMPENSATION

METHOD FOR TREATING AN OUTER SURFACE OF A HEAT TRANSFER FLUID TUBE

USE OF ATOMIC LAYER DEPOSITION COATINGS TO PROTECT BRAZING LINE AGA...

NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL

Circulating Cooling/Heating Device