Apparatus and method for operating a micromechanical switch

Information

  • Patent Grant
  • 6246305
  • Patent Number
    6,246,305
  • Date Filed
    Tuesday, December 7, 1999
    25 years ago
  • Date Issued
    Tuesday, June 12, 2001
    23 years ago
Abstract
A micromechanical switch and a method for operating the micromechanical switch between an open position and a closed position by moving a magnet between two positions. The magnet produces a magnetic flux that travels through a magnetically conductive layer. The magnetic flux within the magnetically conductive layer forcibly draws a contact element into contact with an electrically conductive layer and electrically shorts the open electrical contacts.
Description




BACKGROUND OF THE INVENTION




1. Field of the Invention




This invention relates to a micromechanical switch and a method for operating the micromechanical switch wherein a permanent magnet is moved between two positions, one position where the micromechanical switch is normally open and another position where the micromechanical switch is normally closed.




2. Discussion of Related Art




Conventional micro switches that operate between an open position and a closed position use electrostatic forces, elastic forces or thermally-induced forces to operate the micro switch. Conventional electrostatically actuated switches and relays experience excessive charge build-up which causes a magnitude of a closing force, which is necessary to operate the micro switch, to change over time.




SUMMARY OF THE INVENTION




It is one object of this invention to provide a micromechanical switch that is operated between a normally closed position and a normally open position by moving a permanent magnet between two positions.




It is another object of this invention to provide a micromechanical switch that electromagnetically draws a free end of a cantilever arm toward a first conductive layer or a second conductive layer to form a normally closed conductive path or a normally open conductive path.




It is another object of this invention to provide a micromechanical switch which uses magnetic forces to transmit externally acting forces necessary to open and close the micromechanical switch.




It is yet another object of this invention to provide a micromechanical switch that can be manufactured using conventional integrated circuit processing techniques.




It is still another object of this invention to provide a micromechanical switch wherein contacting surfaces that complete a conductive path are hermetically sealed and isolated from an external environment in which the switch body resides.




The above and other objects of this invention are accomplished with a micromechanical switch that has a magnet which is moved between two positions to set the micromechanical switch in a normally closed position or a normally open position. In one preferred embodiment of this invention, the magnet moves within a slot at least partially formed by primary openings in a first conductive layer and in a second conductive layer. However, it is apparent that several other various magnet configurations, path configurations and/or mechanical elements can be used to move the magnet between the two positions.




An actuator is used to selectively move the magnet between the two positions. The actuator may be a pushbutton switch or any other suitable mechanical switch used to move the magnet between two positions. The actuator can be automatically or manually operated.




A contact element is moveably mounted between two different positions, one position within one secondary opening of the first conductive layer and another position within another secondary opening within the second conductive layer. In one preferred embodiment of this invention, when the magnet is in the first position, the contact element is positioned within or bridges the secondary opening of the first conductive layer, and when the magnet is in the second position, the contact element is positioned within or bridges the secondary opening of the second conductive layer.




The contact element can be mounted to or integral with a free end of a cantilever arm. The cantilever arm preferably has a fixed end secured to the same substrate on which the first conductive layer and/ or the second conductive layer is supported. It is apparent that suitable mechanical arrangements can be used to allow the contact element to move between the secondary openings of the first conductive layer and of the second conductive layer.




The magnetic forces used to open and close the micromechanical switch of this invention can be of several orders of magnitude stronger than other conventional electrostatic forces, elastic forces or gravitational forces necessary to operate other conventional micromechanical switches. There is an apparent need to provide a micromechanical switch that uses a moveable magnet to operate the micromechanical switch between a normally open position and a normally closed position. One preferred embodiment of this invention is particularly suited for satisfying such need, by using a contact element of a free end of a cantilever arm to move toward either the first conductive layer or the second conductive layer upon electromagnetic demand from electromagnetic forces acting through the first conductive layer or the second conductive layer.











BRIEF DESCRIPTION OF THE DRAWINGS




The objects of this invention and features of a micromechanical switch according to this invention, as discussed throughout this specification, can be better understood when taken in view of the drawings, wherein:





FIG. 1

is a schematic top view of a layout for a first conductive layer, a second conductive layer, a magnet, a common contact, a normally open contact, and a normally closed contact, for a micromechanical switch according to one preferred embodiment of this invention;





FIG. 2

is a schematic sectional view taken along line


2





2


, as show in

FIG. 1

;





FIG. 3

is a schematic sectional view taken along line


3





3


, as shown in

FIG. 1

;





FIGS. 4

,


6


,


7


,


9


and


10


are schematic sectional views and

FIGS. 5

,


8


and


11


are schematic top views of a micromechanical switch according to one preferred embodiment of this invention, showing different development stages as the integrated circuit is manufactured;





FIG. 12

is a schematic sectional view showing the contact element, as shown in

FIGS. 2 and 3

, and of a cantilever arm, according to one preferred embodiment of this invention; and





FIG. 13

is a schematic top view of a layout for a micromechanical switch, according to another preferred embodiment of this invention.





FIG. 14

is a schematic perspective view of an alternative embodiment of the present invention.





FIG. 15

is a top view of an embodiment similar to

FIG. 14

which illustrates an alternative lead placement.





FIG. 16

is a perspective view of an alternative top cap for the embodiment of FIG.


14


.





FIG. 17

is a cross-sectional side view of a commercially encased switch product according to the alternative embodiment of the micromechanical switch.











DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS




As schematically shown in

FIGS. 1-3

, in one preferred embodiment of this invention, micromechanical switch


20


comprises conductive layer


30


and conductive layer


40


which are preferably conductively isolated from each other. As explained in further detail below, magnet


50


is moved between a magnet first position and a magnet second position to operate micromechanical switch


20


between a normally closed position and a normally opened position.




Conductive layer


30


forms closure path


31


which has primary opening


35


and secondary opening


37


, as shown in

FIGS. 1 and 5

. Conductive layer


40


forms closure path


41


and has primary opening


45


and secondary opening


47


, as shown in

FIGS. 1 and 5

. In one preferred embodiment of this invention, primary opening


35


and primary opening


45


form at least a portion of slot


51


. Magnet


50


is moveably mounted with respect to conductive layer


30


and conductive layer


40


. Although magnet


50


may be moveably mounted within slot


51


, such as shown in

FIG. 1

, it is apparent that any other suitable shape of primary opening


35


and/or primary opening


45


can be used to form a path over which magnet


50


moves between the magnet first position and the magnet second position. Although

FIG. 1

shows slot


51


as a linear path over which magnet


50


moves, it is apparent that any other suitably shaped path can be used to move magnet


50


between the first position and the second position of magnet


50


. It is also apparent that the shape of magnet


50


, primary opening


35


and/or primary opening


45


can be varied to accommodate each different layout and design of conductive layer


30


and/or conductive layer


40


.




Actuator


55


is preferably used to selectively move magnet


50


between the magnet first position and the magnet second position. In one preferred embodiment according to this invention, actuator


55


comprises pushrod


56


, as schematically shown by the dashed lines in FIG.


1


. Pushrod


56


can comprise any suitable mechanical structure used to move magnet


50


with respect to conductive layer


30


and/or conductive layer


40


.




In another preferred embodiment according to this invention, actuator


55


may comprise any suitable mechanical device connected to magnet


50


. It is also apparent that magnet


50


can be moved using an independent electrical, electromechanical or electromagnetic device.




As shown in

FIGS. 1-3

, contact element


60


is moveably mounted with respect to conductive layer


30


and/or conductive layer


40


. Contact element


60


moves between an element first position and an element second position. In one preferred embodiment of this invention, when in the element first position contact element


60


electrically shorts conductive layer


30


across secondary opening


35


, and when in the element second position contact element


60


electrically shorts conductive layer


40


across secondary opening


47


. The arrows in

FIG. 2

indicate a direction in which contact element


60


moves, according to one preferred embodiment of this invention.




As shown in

FIG. 2

, when moved upward contact element


60


contacts or bridges conductive layer


30


across secondary opening


37


. Also as shown in

FIG. 2

, when moved downward contact element


60


contacts or bridges conductive layer


40


across secondary opening


47


. It is apparent that other suitable shapes of conductive layer


30


, conductive layer


40


, secondary opening


37


, secondary opening


47


and/or contact element


60


can be used to achieve the same result of bridging and thus electrically shorting conductive layer


30


across secondary opening


37


or bridging and thus electrically shorting conductive layer


40


across secondary opening


47


, for the purpose of closing closure path


31


or closing closure path


41


.




As shown between

FIGS. 1

,


2


and


5


, in one preferred embodiment of this invention, at least primary portion


32


of conductive layer


30


is positioned within plane


21


.

FIG. 1

shows secondary portion


33


of conductive layer


30


. In the embodiment shown in

FIGS. 1-3

and


5


, a plating-up process can be used to form conductive material that causes an electrical short between primary portion


32


and secondary portion


33


of conductive layer


30


. As shown in

FIG. 2

, secondary portion


33


is positioned within plane


22


which is spaced at a distance from plane


21


. Although other suitable shapes and arrangements can be used to form conductive layer


30


and/or conductive layer


40


, the embodiment shown in

FIGS. 1-3

, or any other suitable structurally equivalent layout and design, as long as contact element


60


is able to move between the element first position and the element second position.




As shown in

FIGS. 1-3

, primary portion


32


of conductive layer


30


forms primary opening


35


and secondary portion


33


of conductive layer


30


forms secondary opening


37


. Also as shown in

FIGS. 1-3

, slot


51


is rectangularly shaped so that primary opening


35


and primary opening


45


align with each other.




In the embodiment shown in

FIGS. 1-3

, with contact element


60


in the element first position, contact element


60


is positioned at least partially within plane


21


, and in the element second position, contact element


60


is positioned at least partially within plane


22


. As used in this specification and the claims, contact element


60


being positioned at least partially within plane


21


or plane


22


means that in the element first position contact element


60


contacts or bridges and thus electrically shorts conductive layer


30


across secondary opening


37


and simultaneously contact element


60


does not contact or bridge and thus does not electrically short conductive layer


40


. Likewise, the language means that contact element


60


when in the second position contacts or bridges and thus electrically shorts conductive layer


40


across secondary opening


47


but does not contact or bridge and thus does not electrically short conductive layer


30


.




In one preferred embodiment according to this invention, contact element


60


comprises head


61


positioned at free end


66


of cantilever arm


65


. Fixed end


67


of cantilever arm


65


, which is opposite free end


66


, is preferably secured with respect to conductive layer


30


and/or conductive layer


40


, such as directly on substrate


25


. Head


61


can have any suitable shape that forms sufficient contact with conductive layer


30


across secondary opening


37


or with conductive layer


40


across secondary opening


47


. Cantilever arm


65


allows head


61


of contact element


60


to move in a vertical direction, as shown by the arrows in

FIG. 2

, between the element first position and the element second position.




With magnet


50


in the magnet first position, a magnetic circuit is formed as magnetic flux from magnet


50


travels through conductive layer


30


, from primary portion


32


to secondary portion


33


, and then creates an electromagnetic force across secondary opening


33


that draws contact element


60


toward conductive layer


30


, such as in an upward direction as shown in FIG.


2


. When contact element


60


contacts conductive layer


30


, an electrical short is formed across secondary opening


37


. With magnet


50


in the magnet second position, a magnetic circuit is formed as magnetic flux from magnet


50


travels through conductive layer


40


and creates an electromagnetic force that draws contact element


60


toward conductive layer


40


, such as in a downward direction as shown in FIG.


2


. When contact element


60


contacts conductive layer


40


, conductive layer


40


is electrically shorted across secondary opening


47


.




When magnet


50


is in the magnet first position and contact element


60


closes closure path


31


, conductive layer


30


forms electrical communication between common contact


27


and normally closed contact


29


. With magnet


50


in the magnet second position and contact element


60


closing closure path


41


, conductive layer


40


forms electrical communication between common contact


27


and normally open contact


28


. Thus, by moving magnet


50


between the magnet first position and the magnet second position and thereby correspondingly moving contact element


60


, micromechanical switch


20


can be operated in either the normally open position or the normally closed position. Magnetic forces of magnet


50


can be several orders of magnitude stronger than conventional micromechanical switches using electrostatic forces, elastic forces or gravitational forces to operate the micromechanical switch. By positioning secondary portion


33


of the conductive layer


30


within plane


22


, which is at a distance from conductive layer


40


within plane


21


, cantilever arm


65


can be used to assure strong bi-directional opening and closing forces, thereby rendering micromechanical switch


20


of this invention particularly suitable for double-throw switches.




With the cantilever design of cantilever arm


65


, thermal expansion along a length of cantilever arm


65


more suitably accommodates an in-rush of electrical current each time micromechanical switch


20


is closed, particularly if head


61


of contact element


60


bounces against conductive layer


30


or against conductive layer


40


. As shown in

FIGS. 1-3

, head


61


of contact element


60


can be rounded to reduce a contact area and thereby reduce sticking and/or electrostatic pulling forces.




Micromechanical switch


20


of this invention can be fabricated using conventional integrated circuit processing techniques know to those skilled in the art of silicon chip design.

FIGS. 4-11

show different steps used to manufacture micromechanical switch


20


of this invention.




As shown in

FIG. 4

, conductive layers


30


and


40


are mounted, supported or formed on substrate


25


. Substrate


25


may comprise any suitable conventional silicon wafer material. Conductive layer


30


and/or conductive layer


40


may comprise a layer of gold (Au) sandwiched between two layers of titanium (Ti).

FIG. 5

shows a schematic top view of the layout of primary portion


32


of conductive layer


30


, conductive layer


40


, common contact


27


, normally open contact


28


and normally closed contact


29


.





FIG. 6

shows a sectional side view where a layer of a polyimide is deposited, cut and etched, preferably slope etched.





FIG. 7

shows a schematic diagram of the structure of

FIG. 2

which is further deposited, cut and etched to form cantilever arm


65


and contact element


60


, and then is further etched to remove the polyimide and portions of the Ti and the Au.

FIG. 8

shows a schematic top view of the structure as shown in FIG.


7


. The structure is then electroplated, such as with NiFe and then rhodium (Rh).




As shown in

FIG. 9

, the structure is then photocut, and plating bars and metal on cantilever arm


65


are wet etched, so that cantilever arm


65


is partially free. SiO


2


is cut and etched to free a tip portion of cantilever arm


65


. At this stage the first wafer structure which comprises substrate


25


is complete.




A top cap structure is then manufactured, such as shown in

FIG. 10

, where Ti and Au are blanket deposited as a plating base on substrate


26


, which may comprise a thin glass wafer. The NiFe and the Rh are then electroplated. The structure is then stripped to the form shown in FIG.


11


.

FIG. 2

shows the bonded structure where support


70


is used to structurally support substrate


25


with respect to substrate


26


. Support


70


may comprise any suitable solder, epoxy, adhesive or other suitable sealing material known to those skilled in the art.




In one preferred embodiment of this invention, seal


80


can be formed about a periphery of at least a portion of micromechanical switch


20


, such as shown in FIG.


1


. Seal


80


may comprise a suitable solder, a suitable epoxy or any other suitable adhesive that can bond to or with substrate


25


and substrate


26


, to form a hermetric seal. In one preferred embodiment of this invention, support


70


may form at least a portion of seal


80


. The material used to construct seal


80


preferably meets any necessary temperature constraints and outgassing needs of micromechanical switch


20


. Also, the material of seal


80


can sealably surround and still allow movement of pushrod


56


or any other moveable element that mechanically moves magnet


50


. Depending on the particular design of seal


80


, the magnetic flux through conductive layer


30


and/or conductive layer


40


can penetrate the hermetic seal and actuate contact element


60


.





FIG. 12

shows a schematic sectional view of micromechanical switch


20


. In

FIG. 12

, head


61


is shown in a neutral position, such as the position shown in

FIG. 1

, where contact element


60


contacts neither conductive layer


30


nor conductive layer


40


.





FIG. 13

is a schematic top view showing a layout of micromechanical switch


20


, according to another preferred embodiment of this invention.




It is apparent that any other suitable method know to those skilled in the art of silicon microstructure design can be used in lieu of or in addition to the above-described process steps for manufacturing micromechanical switch


20


of this invention.




In a method for operating micromechanical switch


20


, according to one preferred embodiment of this invention, magnet


50


is selectively moved between the magnet first position and the magnet second position. When magnet


50


is in the magnet first position, magnet


50


creates a magnetic flux that electromagnetically shorts conductive layer


30


and thereby draws or positions contact element


60


in the element first position where contact element


60


electromagnetically shorts conductive layer


30


, such as across secondary opening


37


, to electrically short conductive layer


30


, common contact


27


and normally closed contact


29


. When magnet


50


is in the magnet second position, magnet


50


creates a magnetic flux that electromagnetically shorts conductive layer


40


and thereby draws or positions contact element


60


in the element second position where contact element


60


electromagnetically shorts conductive layer


40


across secondary opening


47


, to electrically short conductive layer


40


, common contact


27


and normally open contact


28


.




As seen in

FIG. 14

, an alternative embodiment of the micro-machined switch


201


is produced from a base layer


203


from which the cantilever


265


is etched, leaving thc cantilever


265


and its head


260


free of the top surface


205


by about one thousandth of an inch, or one mil of travel in y axis of FIG.


14


. First and second holes are then etched through the base layer


203


in the y axis from the top surface


205


of the base layer


203


to its bottom surface


211


beneath the cantilever tip and filled with first and second plugs


207


,


209


of soft magnetic material which is preferably, but not necessarily, also electrically conductive, such as permalloy. A single plug


245


, such as may be inferred from

FIG. 17

can be used although a lack of return path for the flux may make the magnetic action somewhat weaker. The first and second plugs


207


,


209


, respectively, serve as magnetic shunts for transferring magnetic flux from the permanent magnet


50


when located in its operative position adjacent the bottom surface


211


. It will be appreciated that some liberties have been taken with the scale and positioning of the elements in the Figures as an aid to ease of illustration and understanding of the invention.




The plugs


207


,


209


are electrically isolated with space between them in the Z axis, but are spaced so as to be contacted by first


217


and second


219


lateral sides of the cantilever head


260


along the Z axis thereof, when the cantilever head


60


is moved to contact with the plugs


207


,


209


, through magnetic attraction. Referencing also

FIG. 15

, first and second electrical leads


221


,


223


are attached to the first and second plugs


207


,


209


, respectively, representing the open electrical circuit which the cantilever head


260


closes.




It will be appreciated that the plugs need not be electrically conductive and that suitable construction and arrangement of the elements may position the magnetic circuit, for motive force on cantilever tip, and the electrical circuit, which the cantilever tip bridges, as physically separate entities as indicated in FIG.


15


.




The magnet


50


is located on a plunger or pushrod


56


and biased by a spring


237


or the like preferably away from the bottom surface


211


of the base layer


203


. Magnet travel of about one and one half mils is considered adequate in the preferred embodiment.




The top cap


225


serves as a cover for the SPST switch embodiment of

FIG. 14

upon suitable sealing and spacing from the base layer


203


as discussed elsewhere. Referencing

FIG. 16

, an alternative cap embodiment


227


may have its own pair of electrical contacts


229


,


231


with suitable connection to solder pads


233


,


235


. In this embodiment the top cap electrical contacts


229


,


231


are placed so as to contact the cantilever head


260


in its normal, or at rest, position thereby enabling the present invention to serve as a normally open or normally closed double pole single throw, or DPST, switch mechanism.




Referencing

FIG. 17

, the micromechanical switch


201


having been assembled with spacers


247


between the base layer


203


and top cap


225


, may then be assembled into a covering case


249


with outside leads


251


for the convenient utilization of the present invention. The micromechanical switch


201


may be further sealed by a hermetic layer


253


between the base layer and the magnet


50


at this time.




The embodiment of

FIGS. 14-17

has low permanent magnet travel, and effective shunt construction to make a low cost, highly effective, and hermetically sealable switch utilizing very little substrate real estate.




It is apparent that different elements of this invention can be modified in shape, size, material and/or construction and still achieve the result of opening or closing micromechanical switch


20


in response to movement of magnet


50


that thereby causes contact element


60


to move between two positions.




While in the foregoing specification this invention has been described in relation to certain preferred embodiments thereof, and many details have been set forth for purpose of illustration, it will be apparent to those skilled in the art that the invention is susceptible to additional embodiments and that certain of the details described herein can be varied considerably without departing from the basic principles of the invention.



Claims
  • 1. A micromechanical switch comprising:a base layer having first and second major opposing parallel surfaces and having a cantilever etched from the first major surface, the cantilever having an arm and a head; first and second paired electrical leads being electrically isolated but spaced so as to allow contact with the cantilever head; the cantilever head having a surface that is magnetically and electrically conductive; the base layer having a magnetic shunt extending between the first and second major surfaces of the base layer and under the cantilever head so as to exert an attractive force on the head when carrying magnetic flux; a permanent magnet movably locatable in a first position sufficiently adjacent to the second major surface and said magnetic shunt so as to transfer enough flux from the permanent magnet to draw the cantilever head to the electric leads and locatable at a second position at a distance sufficiently far from the second major surface so as to not transfer enough flux to draw the cantilever head to the electric leads.
  • 2. The micromechanical switch according to claim 1 wherein the magnetic shunt extends through a body of the base layer between the first and second major surfaces.
  • 3. The micromechanical switch according to claim 1 wherein there are first and second magnetic shunts spaced apart.
  • 4. The micromechanical switch according to claim 3 wherein the shunts are electrically conductive.
  • 5. The micromechanical switch according to claim 1 wherein the shunt is electrically conductive.
  • 6. The micromechanical switch according to claim 1 further comprising:an actuator mechanism for moving the magnet between the first and second positions.
  • 7. The micromechanical switch according to claim 6 further comprising:a pushrod and biasing means operatively connected to the permanent magnet.
  • 8. The micromechanical switch according to claim 1 further comprising:a top cap for sealing the first major surface and extending over the cantilever.
  • 9. The micromechanical switch according to claim 8 further comprising:a spacer between the top cap and the base layer.
  • 10. The micromechanical switch according to claim 8 wherein the top cap is hermetically sealed to the base layer.
  • 11. The micromechanical switch according to claim 8 wherein the top cap has third and fourth paired electrical leads being electrically isolated but spaced so as to allow contact with the cantilever head.
  • 12. The micromechanical switch according to claim 1 wherein the cantilever is prestressed to contact one of the first and second or third and fourth electrical lead pairs and not contact the opposing electrical lead pair when not under magnetic influence.
  • 13. The micromechanical switch according to claim 12 wherein the magnet in the first position exerts an attractive force to overcome the prestress of the cantilever and draw the head to the first and second paired electrical leads.
  • 14. A micromechanical switch comprising:a base layer having first and second major opposing parallel surfaces parallel to an x-z plane and having a cantilever extending in the x-axis and attached thereto, the cantilever having an arm and a head and being positioned adjacent the first major surface; first and second electrical leads being electrically isolated but spaced so as to allow contact with the cantilever head, wherein an electrical circuit is formed by the first and second electrical leads; the cantilever head having a surface that is magnetically and electrically conductive; the base layer having first and second soft magnetic shunts spaced apart in a z-axis and extending through the base layer in the y-axis substantially under the cantilever head, wherein a magnetic circuit is formed by the first and second electrical leads; a permanent magnet movably locatable in the y-axis at a first position sufficiently adjacent to the second major surface and said first and second magnetic shunts so as to transfer enough flux from the permanent magnet to draw the cantilever head to the electric leads and locatable at a second position at a distance sufficiently far from the second major surface so as to not transfer enough flux to draw the cantilever head to the electric leads; an actuator mechanism for moving the magnet between the first and second positions; and a top cap for sealing the first major surface and extending over the cantilever.
  • 15. The micromechanical switch according to claim 14 further comprising:a casing surrounding the base layer, the top cap, and the actuator mechanism and having connecting electrical leads extending from the casing, the connecting electrical leads connected to said first and second electrical leads.
  • 16. The micromechanical switch according to claim 14 wherein the top cap is hermetically sealed to the base layer.
  • 17. The micromechanical switch according to claim 14 wherein the base layer is hermetically sealed from the magnet.
  • 18. The micromechanical switch according to claim 14 wherein the base layer is silicon.
RELATED APPLICATIONS

This is a continuation in part of Ser. No. 09/223,559, filed Dec. 30, 1998 now U.S. Pat. No. 6,040,749.

US Referenced Citations (2)
Number Name Date Kind
5872496 Asada et al. Feb 1999
6040749 Youngner et al. Feb 1999
Non-Patent Literature Citations (3)
Entry
Micromachined Magnetostatic Switches, NASA Tech Briefs, Oct., 1998, p. 58.
Technical Support Package to Micromachined Magnetostatic Switches, Oct., 1998, NASA Tech Brief, vol. 22, No. 10.
“Electrostatically Actuated Micromechanical Switches Using Surface Micromachining”, Northeastern University web site: www.ece.neu.edu/edsnu/zavrocky/mf1/programs/relay.html. 8 pp., circa: Jan. 13, 1998.
Continuation in Parts (1)
Number Date Country
Parent 09/223559 Dec 1998 US
Child 09/456107 US