Claims
- 1. A method for fabricating a honing head, having an array of depressions, used for burnishing a planar disc to be used in data recording and reproduction, using photolithographic techniques, comprising the steps of:applying a photoresist material to a bearing surface in a pattern defining an array of planar geometries; exposing the bearing surface to a light source, creating a mask in the form of an array of planar geometries, wherein the array of planar geometries are unmasked and define the surface topography of the bearing surface; exposing the head to plasma rays, wherein the unmasked array of planar geometries will be milled to a desired depth; and applying a diamond-like-carbon coating to all surfaces of the head.
- 2. A method for fabricating a honing head having an array of depressions, whereby the honing head is used for burnishing a planar disc to be used in data recording and reproduction, using photolithographic techniques, comprising the steps of:applying a photoresist material to a bearing surface of the honing head; exposing the photoresist to a light source thereby creating a mask in the form of an array of planar geometries, unmasking a portion of the array of planar geometries to define the surface topography of the bearing surface; removing material from the honing head in the portion of the unmasked array of planar geometries to a desired depth; and applying a diamond-like-carbon coating to all surfaces of the head.
- 3. The method of claim 2 wherein the step of exposing further includes creating the mask in the form of an oval-shaped array of planar geometries.
- 4. The method of claim 2 wherein the step of exposing further includes creating the mask in the form of a diamond-shaped array of planar geometries.
- 5. The method of claim 2 wherein the step of exposing further includes creating the mask in the form of an array of planar geometries, wherein the array of planar geometries further includes a plurality of recesses and at least one channel interconnecting the plurality of recesses.
- 6. The method of claim 5 wherein the step of creating the plurality of recesses further includes creating diamond-shaped recesses.
- 7. The method of claim 6 wherein the step of creating the plurality of recesses further includes creating diamond-shaped recesses wherein two opposed sides of each diamond-shaped recess are about 208 microns in length and two opposed sides about 264 microns in length.
- 8. The method of claim 5 wherein the step of creating the plurality of recesses further includes creating triangle-shaped recesses.
- 9. The method of claim 5 wherein the step of creating the mask in the form of an array of planar geometries further includes creating the plurality of recesses laterally overlapping.
- 10. The method of claim 2 wherein the step of removing material further includes removing material to a depth ranging from 10 to 20 microns.
- 11. The method of claim 2 wherein the step of removing material further includes removing material to a depth of about 14 microns.
- 12. The method of claim 2 wherein the step of removing material further includes removing material by ion milling.
- 13. The method of claim 2 wherein the step of removing material further includes removing material by acid etching.
- 14. The method of claim 2 wherein the step of removing material further includes removing material by plasma etching.
- 15. The method of claim 2 wherein the step of applying a photoresist material further includes applying a positive photoresist material.
- 16. The method of claim 2 wherein the step of applying a photoresist material further includes applying a negative photoresist material.
REFERENCE TO PRIOR APPLICATION
This application relies is a Div of Ser. No. 09/404,984 filed Sep. 22, 1999, U.S. Pat. No. 6,273,793 which relies for priority on a previously filed provisional application, Serial No. 60/100,903, filed in Sep. 23, 1998.
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5949612 |
Gudeman et al. |
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A |
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Provisional Applications (1)
|
Number |
Date |
Country |
|
60/100903 |
Sep 1998 |
US |