Claims
- 1. A microwave plasma chemical vapor deposition apparatus for forming a functional deposited film on a plurality of substrates which includes a substantially enclosed film-forming chamber comprising an outer wall having an end portion thereof provided with a microwave introducing window to which a waveguide extending from a microwave power source is connected, said film-forming chamber having a cylindrical discharge space having a cross sectional diameter and a center, encircled by a plurality of rotatable cylindrical substrate holders, each of said cylindrical substrate holders having one of said substrates thereon, said cylindrical substrate holders being concentrically arranged in said film-forming chamber, said film forming chamber being provided with means for evacuating said film-forming chamber and means for supplying a raw material gas into said discharge space, characterized in that said means for supplying the raw material gas comprises a gas feed pipe provided with a plurality of gas liberation holes capable of supplying a raw material gas radiately against each of said substrates, said gas feed pipe being longitudinally installed substantially at the center position of said discharge space.
- 2. The apparatus according to claim 1, wherein said gas feed pipe comprises a cylindrical gas feed pipe being provided with a plurality gas liberation holes.
- 3. The apparatus according to claim 2, wherein said cylindrical gas feed pipe has a cross sectional diameter corresponding to 1 to 30% of the apparent cross sectional diameter of said discharge space.
- 4. The apparatus according to claim 1, wherein said gas feed pipe is longitudinally installed at a position situated in the range of 20% or less of the shortest distance between the apparent center of said discharge space and the cylindrical substrate holder in said discharge space.
- 5. The apparatus according to claim 1, wherein said plurality of gas liberation holes provided with said gas feed pipe are present with a density of 0.1 to 2 holes/cm.sup.2 in all directions toward said cylindrical substrate holders.
- 6. The apparatus according to claim 1, wherein said gas feed pipe comprises a plurality of cylindrical gas feed pipes each being provided with gas liberation holes, each of said cylindrical gas feed pipes having a cross sectional diameter corresponding to 1 to 30% of the apparent cross sectional diameter of said discharge space.
- 7. The apparatus according to claim 6, wherein all of said plurality of gas feed pipes are longitudinally arranged at positions situated in the range of 20% or less of the shortest distance between the apparent center of said discharge space and said cylindrical substrate holder in said discharge space.
- 8. The apparatus according to claim 6, wherein said plurality of gas liberation holes provided with each of said plurality of gas feed pipes are present with a density of 0.1 to 2 holes/cm.sup.2 in all directions toward said cylindrical substrate holders.
- 9. The apparatus according to claim 1, wherein the gas feed pipe is composed of a material selected from the group consisting of Al, Cr, Mo, Au, In, Nb, Te, V, Ti, Pt, Pd, Fe, and alloys of these metals.
- 10. The apparatus according to claim 1, wherein the gas feed pipe is composed of a synthetic resin.
- 11. The apparatus according to claim 10, wherein the synthetic resin is polycarbonate.
- 12. The apparatus according to claim 1, wherein the gas feed pipe is composed of glass or ceramics.
- 13. The apparatus according to claim 12, wherein the ceramics are alumina ceramics.
- 14. The apparatus according to claim 1, wherein the plurality of substrates are positioned with a spacing of 5 mm to 20 mm.
Priority Claims (1)
Number |
Date |
Country |
Kind |
63-286733 |
Nov 1988 |
JPX |
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Parent Case Info
This application is a continuation of application Ser. No. 08/237,890 filed May 4, 1994 now abandoned, which is a division of application Ser. No. 07,884,286 filed May 13, 1992 now U.S. Pat. No. 5,338,580, which is a continuation of application Ser. No. 07/707,297 filed May 29, 1991, now abandoned, which is a continuation of application Ser. No. 07/435,178 filed Nov. 13, 1989, which is now abandoned.
US Referenced Citations (5)
Foreign Referenced Citations (2)
Number |
Date |
Country |
62-47485 |
Mar 1987 |
JPX |
63-62880 |
Mar 1988 |
JPX |
Divisions (1)
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Number |
Date |
Country |
Parent |
884286 |
May 1992 |
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Continuations (3)
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Number |
Date |
Country |
Parent |
237890 |
May 1994 |
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Parent |
707297 |
May 1991 |
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Parent |
435178 |
Nov 1989 |
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