Number | Date | Country | Kind |
---|---|---|---|
38 27 567.8 | Aug 1988 | DEX |
Number | Name | Date | Kind |
---|---|---|---|
4192929 | Wingfield, Jr. | Mar 1980 | |
4576903 | Baron et al. | Mar 1986 | |
4820621 | Tanka et al. | Apr 1989 | |
4833067 | Tanaka et al. | May 1989 | |
4863828 | Kawabe et al. | Oct 1989 | |
4877719 | Higashi et al. | Oct 1989 | |
4929605 | Domet et al. | May 1990 |
Number | Date | Country |
---|---|---|
0080042 | Jun 1983 | EPX |
124297 | Nov 1984 | EPX |
231028 | Aug 1987 | EPX |
0336400 | Oct 1989 | EPX |
2193335 | Feb 1988 | GBX |
8707039 | Nov 1987 | WOX |
Entry |
---|
Aldrich Chemical Catalog p. 1065. |
Novolak Resins used in Positive Resist Systems, T. R. Pampalone Solid State Technology, Jun. 1984 pp. 115-120. |
Evaluations of Pure Novolak Cresol-Formaldehyde Resins for Deep U.V. Lithography, Gipstein et al. J. Chem. Soc. Jan. 1982 pp. 201-205. |
Number | Date | Country | |
---|---|---|---|
Parent | 391253 | Aug 1989 |