1. Field of the Invention
The present invention relates to a back pressure adjustment apparatus for a liquid ejection head which is capable of stabilizing variations in the back pressure in a liquid ejection head.
2. Description of the Related Art
A liquid ejection head has been proposed, which comprises nozzles which eject ink and pressure chambers connected to the nozzles, liquid being ejected from a nozzle by changing the pressure of the liquid inside the corresponding pressure chamber. A liquid ejection head of this kind comprises a sub tank which is connected to the liquid ejection head, and the pressure of liquid inside the sub tank is adjusted and treated as the back pressure of the liquid ejection head.
Furthermore, Japanese Patent Application Publication No. 2005-41048 and Japanese Patent Application Publication No. 2006-192785 teach the technology in which a flexible bag is provided inside a rigid container (sub tank), and by changing the volume of this flexible bag, the back pressure of a liquid ejection head connected to the bag is adjusted.
However, if the back pressure in a liquid head is adjusted by altering the volume of the flexible bag, then since the shape of the bag does not generally change in a stable fashion, sudden pressure changes may occur when the volume of the bag changes, and it is difficult to achieve fine adjustment of the back pressure.
Furthermore, it is known that since a bag structure is generally formed by creating joins using a thermal pressurization method, then in a state such as that shown in
Moreover, if it sought to eject ink at a resolution of 1000 dpi or above and a speed exceeding 300 mm/s, using a long head exceeding 8 inches in length, then the ink consumption per color exceeds around 20 cc/min. If ink ejection involving high duty of this kind is required, then a high-capacity bag having a volume greater than 1000 cc is required. However, since the creases described above are particularly liable to occur in the case of a large bag shape, it is generally difficult to use a bag of large capacity exceeding 500 cc.
The present invention has been contrived in view of these circumstances, an object thereof being to provide a back pressure adjustment apparatus for a liquid ejection head which is suited to the supply of large volume of liquid and which is able to stabilize variation in the back pressure of the liquid ejection head.
In order to attain an object described above, an aspect of the present invention relates to a back pressure adjustment apparatus for a liquid ejection head, the back pressure adjustment apparatus comprising: a container having a liquid accommodating chamber which is connected to the liquid ejection head and accommodates liquid to be supplied to the liquid ejection head, and a gas accommodating chamber which accommodates gas; a movable film which separates the liquid accommodating chamber and the gas accommodating chamber, and forms a portion of whole walls of the liquid accommodating chamber; and a pressure adjustment device which causes all or a portion of the movable film to deform so as to adjust pressure of the liquid accommodated in the liquid accommodating chamber.
If a liquid accommodating chamber of large capacity is required for a liquid ejection head having a large number of nozzles, then if a bag is used as the liquid accommodating chamber, as in the related art, the surface of the boundary between the bag and the gas accommodating chamber forming the space outside same is composed entirely by the surface of the large bag; therefore, sudden changes occur in the back pressure when creases occur or disappear. However, according to this aspect of the present invention, the pressure of the liquid in the liquid accommodating chamber is adjusted by deforming the movable film which constitutes only a portion of the walls of the liquid accommodating chamber, and therefore the boundary surface between the liquid accommodating chamber and the gas accommodating chamber is restricted, sudden changes in the back pressure caused by the occurrence or disappearance of creases are prevented, and therefore the pressure is stabilized. Furthermore, it is also possible to prevent the aggregation of the dispersed material in the liquid, at the points where creases occur.
Desirably, the all or a portion of the movable film is constituted by a flexible film having stretch properties or an elastic film having stretch properties.
In this aspect of the invention, since the movable film has stretch properties, then there is no need to limit the range of movement of the movable film in order to prevent the occurrence of creases, and therefore the composition is suitable for achieving large volume of the liquid accommodating chamber.
Desirably, the movable film has a perimeter edge portion which is affixed to the container, and a central portion which is joined to the perimeter edge portion; and the perimeter edge portion has a lower rigidity than the central portion.
To give concrete modes, firstly, there is a mode where the central portion of the movable film is made of a first elastic material, and the perimeter edge portion of the movable film is made of a second elastic material which has a lower spring constant and is more liable to stretch than the first elastic material. Secondly, there is a mode where the central portion of the movable film is made of a rigid material, whereas the perimeter edge portion of the movable film is made of an elastic material. Thirdly, there is a mode where the perimeter edge portion and the central portion of the movable film are made of the same elastic material, and the thickness of the perimeter edge portion of the movable film is made smaller than the thickness of the central portion of the movable film. It is also possible to use a flexible material having stretch properties, instead of an elastic material.
Desirably, the back pressure adjustment apparatus for a liquid ejection head further comprises a stopper member which is provided in the container and restricts a range of movement of the movable film.
In this aspect of the invention, the movable film is prevented from deforming beyond its stress tolerances (beyond its allowable stress), by the stopper member, and therefore damage to the film is avoided.
Desirably, the movable film has a gas permeable portion.
In this aspect of the invention, by employing the movable film not only as a device for back pressure adjustment in the liquid ejection head, but also as a gas separating membrane for deaeration of the ejection liquid, it is possible to deaerate the ejection liquid in the container.
Desirably, the back pressure adjustment apparatus for a liquid ejection head further comprises a heater incorporated with the movable film.
In this aspect of the invention, it is possible to adjust the temperature of the liquid in the liquid accommodating chamber. Furthermore, by heating the liquid during deaeration of the ejection liquid, it is possible to improve the deaeration performance.
According to the present invention, it is possible to provide a back pressure adjustment apparatus which is suited to the supply of large volumes of liquid and is able to stabilize the back pressure variations in the liquid ejection head.
The nature of this invention, as well as other objects and benefits thereof, will be explained in the following with reference to the accompanying drawings, in which like reference characters designate the same or similar parts throughout the figures and wherein:
In
The liquid accommodating chamber 32 is a chamber which is connected to a liquid ejection head 50, which forms a liquid ejection device for ejecting a prescribed liquid, such as ink, onto a prescribed ejection receiving medium. The liquid accommodating chamber 32 temporarily accommodates liquid to be supplied to the liquid ejection head 50. By adjusting the pressure of the liquid inside the liquid accommodating chamber 32, the pressure of the liquid inside the liquid ejection head 50 is adjusted.
The gas accommodating chamber 33 is a chamber connected to the pressure adjustment pump 34, which forms a pressure adjustment device for adjusting the pressure of the liquid inside the liquid accommodating chamber 32 (in other words, the back pressure of the liquid ejection head 50) by changing the volume of the gas accommodating chamber 33 and the liquid accommodating chamber 32 by causing all or a portion of the movable film 31 to stretch (elongate or contract). The gas accommodating chamber 33 accommodates a prescribed gas, such as air. A pressure sensor 38 is connected to this gas accommodating chamber 33.
The rigid container 30 is a rigid body, and the sum of the volume of the liquid accommodating chamber 32 and the volume of the gas accommodating chamber 33 (in other words, the volume of the rigid container 30) is uniform. Consequently, if the volume of the gas accommodating chamber 33 increases as the movable film 31 stretches, then the volume of the liquid accommodating chamber 32 decreases by an amount corresponding to the increase in the volume of the gas accommodating chamber 33. On the other hand, if the volume of the gas accommodating chamber 33 decreases as the movable film 31 stretches, then the volume of the liquid accommodating chamber 32 increases by an amount corresponding to the decrease in the volume of the gas accommodating chamber 33. By changing the volume of the liquid accommodating chamber 32 in this way, the pressure of the liquid inside the liquid accommodating chamber 32 is changed. In other words, the back pressure of the liquid ejection head 50 is adjusted.
The movable film 31 is a film-shaped medium which is deformable. Desirably, all or a portion of the movable film 31 is constituted by a flexible film or an elastic film which has stretch properties.
If a flexible film which is non-stretchable is used as the movable film 31, then as shown in
If a flexile film having stretch properties is used as the movable film 31, then as shown in
It is also possible to use a multiple-layer structure, as the movable film 31. More specifically, it is also possible to use a flexible film inside which liquid or gel is sealed. In this case, the surface area of the movable film 31 changes and the film stretches, as the thickness of the movable film 31 changes.
Below, a case is described in which the movable film 31 has stretch properties.
Next, various modes of the movable film 31 will be described.
In
The second elastic film 312 in the perimeter edge portion has a lower spring constant and is more liable to stretch, than the first elastic film 311 in the central portion. In other words, while the perimeter edge portion of the movable film 31a is made of a first elastic material, the central portion of the movable film 31a is made of a second elastic material which has a lower spring constant and is more liable to stretch than the first elastic material. The rigidity of the second elastic film 312 in the perimeter edge portion is lower than that of the first elastic film 311 in the central portion. Furthermore, the surface area of the first elastic film 311 in the central portion is greater than the surface area of the elastic film 312 in the perimeter edge portion.
The material of the first elastic film 311 uses an airtight material which is not permeable to air. Concrete examples of the airtight material are described in detail below. If the gas inside the gas accommodating chamber 33 in
In
The rigid film 313 and the elastic film 314 are connected together by a bonding technique, such as thermal welding, ultrasonic welding, or the like.
The material of the rigid film 313 uses an airtight material which is not permeable to air Concrete examples of the airtight material are described in detail below. If the elastic film 314 (made, for example, of silicone rubber) has low airtightness, then desirably, it is sealed with a highly viscous non-volatile liquid, or the like.
In
The first to fifth regions are connected together by bonding, such as thermal welding, ultrasonic welding, or the like.
The spring constant kb of the elastic film which constitutes the second region 315b and the spring constant kd of the elastic film which constitutes the fourth region 315d, which are disposed along the shorter edges of the movable film 31c, are lower than the spring constant ka of the elastic film which constitutes the first region 315a and the spring constant kc of the elastic film which constitutes the third region 315c, which are disposed along the longer edges of the movable film 31c. More specifically, ka=kc>kb=kd. Since the second region 315b and the fourth region 315d which lie along the shorter edges of the movable film 31c are more liable to deform than the first region 315a and the third region 315c which lie along the longer edges of the movable film 31c, then the total amount of deformation of the movable film 31 becomes greater, and this is suitable for achieving a large volume of the liquid accommodating chamber 32.
Here, a case is described in which materials having different spring constants are used for the perimeter edge portion of the movable film 31c, but the present invention is not limited in particular to a case of this kind. It is also possible for the widths Wb, Wd of the second region 315b and the fourth region 315d which are disposed along the shorter edges of the movable film 31c to be made smaller than the widths Wa, Wc of the first region 315a and the third region 315c which are disposed along the longer edges of the movable film 31c. In other words, Wa=Wc>Wb=Wd. If a composition of this kind is adopted, then it is possible to form the first to fourth regions 315a, 315b, 315c and 315d in the perimeter edge portion, of the same material, and therefore the manufacturing process is simplified and manufacturing costs can be reduced.
In the present mode, in the same manner as the third mode, the spring constant kb of the elastic film which constitutes the second region 315b and the spring constant kd of the elastic film which constitutes the fourth region 315d are lower than the spring constant ka of the elastic film which constitutes the first region 315a and the spring constant kc of the elastic film which constitutes the third region 315c. However, in the present mode, in contrast to the third mode, the spring constant kc of the elastic film which constitutes the third region 315c and which is disposed on the lower side of the movable film 31 in the vertical direction, is lower than the spring contact ka of the elastic film which constitutes the first region 315a and which is disposed on the upper side of the movable film 31 in terms of the vertical direction. In other words, in the present mode, kc<ka<kb=kd By this means, as shown in
Here, a case is described in which materials having different spring constants are used in the upper edge portion and the lower edge portion of the movable film 31d, but the present invention is not limited in particular to a case of this kind. It is also possible to make the width Wc of the third region 315c which is disposed on the lower edge of the movable film 31d smaller than the width Wa of the first region 315a which is disposed on the upper edge of the movable film 31d. In other words, Wa>Wc. If a composition of this kind is adopted, then it is possible to form the first region 315a and the third region 315c in the perimeter edge portion of the same material, and therefore the manufacturing process is simplified and manufacturing costs can be reduced.
In
In
The cross-sectional diagrams in
The stopper members 35 (35a, 35b) which restrict the movable range of the movable film are provided on either side of the movable film 31. More specifically, as shown in
For example, the circular holes 350 having a diameter of approximately 1 to 50 mm are disposed on the whole or a portion of the surface of the stopper member 35. The shape of the holes 350 in the stopper members 35 is not limited in particular to a circular shape, and provided that holes having a substantially similar surface area are formed, it is also possible, for example, to adopt square-shaped holes 350 as shown in
If the holes 350 in the stopper member 35 have a large opening surface area and the portion of the movable film 31 which abuts against the stopper member 35 has low elasticity, then there is a possibility that the movable film 31 may enter inside the holes 350 in the stopper member 35. Therefore, the surface area of the openings of the holes 350 in the stopper member 35 is set to a surface area which prevents the movable film 31 from entering thereinto.
Furthermore, it is desirable that the material of the stopper member 35 should have higher rigidity than the movable film 31. If the liquid is an ink, then it must have ink-resistant properties, and therefore, in general, an ink-resistant metal plate made of stainless steel, or the like, or a ceramic plate, is used as the stopper member 35. There are no particular restrictions on the thickness of the stopper member 35, but, as an example, a plate having a thickness of approximately 0.1 to 2 mm is used.
Even if the movable film 31 receives a force equal to or exceeding its own allowable stress tolerances due to pressure change, the presence of the stopper members 35 prevents damage to the movable film 31. For example, if the pressure sensor (reference numeral 38 in
Furthermore, the stopper members 35 also have an efficient action during pressurized purging, where dummy ejection is performed by pressurizing the ink inside the liquid ejection head 50. In pressurized purging, there is a possibility that extremely large pressure changes may occur within a very short time inside the liquid accommodating chamber 32, in comparison with suction-based purging which suctions ink from the nozzles (reference numeral 51 in
In
By raising the vacuum level of the gas accommodating chamber 33 of the rigid container 30 by using the pressure adjustment pump 34 in
In
The heater 36 inside the movable film 31 has a structure in which a resistance wire is embedded inside a heat-resistant material, such as silicone rubber, fluorine rubber, or polyimide (PI) resin, for example. More desirably, a temperature sensor 37 which determines the temperature is embedded inside the movable film 31, together with the heater 36, since this enables highly accurate determination of the temperature.
The application of the heater 36 is not limited to the deaeration of ink, and the heater 36 may also be used to adjust the temperature of the ink inside the liquid accommodating chamber 32. Since the structure is adopted in which the heater 36 and the ink inside the liquid accommodating chamber 32 lie in close proximity via the surface layer of the movable film 31, then it is possible directly to heat the material for heating, and therefore highly efficient temperature adjustment is possible. Furthermore, by adjusting the temperature of the ink in the sub tank 30 which is located closely to the liquid ejection head 50, it is possible to reduce any fall in the temperature of ink, in comparison with a case where the temperature of the ink is adjusted in the upstream side of the sub tank 30, and therefore excellent energy efficiency is achieved.
Next the material of the movable film 31 will be described in detail.
It is also possible to use a film of organic material for the airtight material of the movable film 31. The film of organic material having airtight properties (gas barrier properties) with respect to oxygen may be, for example, PVDC polyvinylidene chloride), EVOH (ethylene/vinyl alcohol copolymer), PAN (polyacryl nitrile), or the like.
However, a single-layer film may have poor liquid resistance and therefore a multiple-layer film is desirably used. For example, if EVOH, which has high water absorption, is formed as a single layer, then the film will swell and deform, and therefore it is desirable to adopt a structure in which PE (polyethylene) is disposed on either surface of the film, in order to protect the EVOH. Here, the film thickness is, for example, approximately 10 to 50 μm in the EVOH layer, and approximately 30 to 300 μm in the PE on either surface, the layers being designed in accordance with the required flexibility.
Furthermore, a metal vapor deposition film is used as the airtight material of the movable film 31. For example, a metal having low rigidity, such as aluminum (Al), gold, silver, or the like, is used. For instance, a multiple-layer metal vapor deposition film formed with LDPE (low-density polyethylene) is used on either surface of the Al vapor deposition film. Here, the film thickness is, for example, approximately 2 to 15 μm in the Al film and approximately 30 to 300 μm in the PE layers on either surface. In general, a metal film having a thickness of approximately 10 nm has the capacity to shut out gas, which means that the film thickness can be reduced greatly compared to a case where an organic material is used. However, in the case of a metal film formed by vapor deposition, pinholes are liable to occur, and gas leaks out via the pinholes, and therefore, in order to prevent this gas leakage, the film thickness is increased. It is desirable that the metal portion should be formed as thinly as possible, in order to maintain the flexibility of the film, and therefore it is desirable to deposit the metal film by sputtering. In this case, the film thickness is approximately 10 nm to 100 nm, the film is able to deform readily, and therefore stable pressure control becomes possible. If a single-layer metal film is adopted, then stainless steel is used, for example. The film thickness is approximately 3 to 15 μm, for example.
The liquid ejection head 50 shown as an example in
The liquid ejection head 50 comprises a plurality of liquid ejection elements 54, each comprising a nozzle 51 which ejects liquid, a pressure chamber 52 connected to the corresponding nozzle 51, and a liquid supply port 53 for supplying liquid to the corresponding pressure chamber 52, the recording elements 54 being arranged in two directions, namely, a main scanning direction M and an oblique direction forming a prescribed acute angle θ (where 0° C.<θ<90°) with respect to the main scanning direction M. In
In specific terms, the nozzles 51 are arranged at a uniform pitch d in the direction forming a prescribed acute angle of θ with respect to the main scanning direction M, and hence the nozzle arrangement can be treated as equivalent to a configuration in which nozzles are arranged at an interval of d×cos θ in a single straight line following the main scanning direction M.
Furthermore,
In
The liquid ejection head 50 is composed by bonding a nozzle plate 501 formed with nozzles 51 to a pressure chamber plate 502 in which pressure chambers 52 and the like are formed. In other words, one surface of the nozzle plate 501 forms a liquid ejection surface 501a in which nozzles 51 are arranged in a two-dimensional configuration as shown in FIG. 15A, and the other surface of the nozzle plate 501 forms a bonding surface 501b which is bonded to the pressure chamber plate 502. The pressure chambers 52, the liquid supply ports 53 and the common flow channel 55 are formed in the pressure chamber plate 502. A diaphragm 56 is bonded to the surface of the pressure chamber plate 502 on the opposite side to the bonding surface 501b with the nozzle plate 501, and this diaphragm 56 constitutes a ceiling plate of the pressure chambers 52. The piezoelectric elements 58 are formed on the diaphragm 56.
The rigid container 30 of the back pressure adjustment apparatus 100 shown in
In
The main tank 60 is a tank forming a supply source of ink. The supply pump 62 for supplying the ink inside the main tank 60 to the liquid ejection head 50 via the interior of the liquid accommodating chamber 32 of the sub tank 30, and the filter 61 which removes the foreign matter in the ink inside the first supply flow channel 71, are provided in a first supply flow channel 71 which leads from the main tank 60 to the liquid accommodating chamber 32 of the sub tank 30. The pressure sensor 38 which determines the pressure of the gas inside the gas accommodating chamber 33 is formed with the gas accommodating chamber 33 of the sub tank 30. The supply flow channel opening and closing valve 64 which opens and closes a second supply flow channel 72, leading from the liquid accommodating chamber 32 of the sub tank 30 to the liquid ejection head 50, is provided in the second supply flow channel 72. The circulation pump 63 for circulating the ink between the liquid ejection head 50 and the liquid accommodating chamber 32 of the sub tank 30, and the circulation flow channel opening and closing valve 65 which opens and closes a circulation flow channel 73 leading from the liquid ejection head 50 to the liquid accommodating chamber 32 of the sub tank 30, are provided in the circulation flow channel 73. The expulsion flow channel opening and closing valve 66 which opens and closes an expulsion flow channel 74 for expelling liquid from inside the liquid ejection head is provided in the expulsion flow channel 74. The gas bubble removal valve 67 which opens and closes a gas bubble removal tube 75 for removing gas bubbles from inside the liquid accommodating chamber 32 of the sub tank 30 is provided in the air bubble removal tube 75.
The control unit 210 is constituted by a CPU and peripheral circuits of same, and controls sections of the liquid ejection apparatus 200, such as the pressure adjustment pump 34, the liquid ejection head 50, the supply pump 62, the circulation pump 63, the supply flow channel opening and closing valve 64, the circulation flow channel opening and closing valve 65, the expulsion flow channel opening and closing valve 66, the gas bubble removal valve 67, and the like. Furthermore, the control section 210 adjusts the pressure of the liquid inside the liquid accommodating chamber 32 of the sub tank 30 on the basis of the output signals from the pressure sensor 38, by changing the volume of the gas accommodating chamber 33 in the sub tank 30 and causing the movable film 31 in the sub tank 30 to deform, by using the pressure adjustment pump 34. In other words, the control unit 210 adjusts the pressure of the liquid inside the liquid accommodating chamber 32 of the sub tank 30 (in other words, the back pressure of the liquid ejection head 50), by adjusting the pressure of the gas inside the gas accommodating chamber 33 of the sub tank 30 as determined by the pressure sensor 38 (the gas inside the gas accommodating chamber 33 is treated like the pressure of the liquid inside the liquid accommodating chamber 32). The pressure sensor may be formed with the liquid accommodating chamber 32 of the sub tank 30, in such a manner that the back pressure of the liquid ejection head 50 is adjusted on the basis of the output signals from this pressure sensor.
The storage unit 212 stores programs that are executed by the control unit 210, and various types of information required for the execution of these programs.
Upon initial filling, as shown in
Normally, during printing, as shown in
Alternatively, the following may be possible: during printing, as shown in
During the removal of gas bubbles, firstly, as shown in
During pressurized purging, as shown in
The initial filling process, the printing process, the gas bubble removal process, and the pressurized purging process illustrated in
The present invention is not limited to the examples described in the present specification or shown in the drawings, and various design modifications and improvements may of course be implemented without departing from the scope of the present invention.
It should be understood that there is no intention to limit the invention to the specific forms disclosed, but on the contrary, the invention is to cover all modifications, alternate constructions and equivalents falling within the spirit and scope of the invention as expressed in the appended claims.
Number | Date | Country | Kind |
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2007-075251 | Mar 2007 | JP | national |