This application is based on and claims priority under 35 U.S.C. § 119 to Korean Patent Application No. 10-2022-0170042, filed on Dec. 7, 2022, in the Korean Intellectual Property Office, the disclosure of which is incorporated by reference herein in its entirety.
Embodiments of the present disclosure relate to a baffle inspection apparatus.
As the aspect ratio of semiconductor devices increases, semiconductor devices may be damaged during cleaning and drying processes of a substrate on which the semiconductor devices are formed. In order to reduce damage to semiconductor devices, a supercritical fluid cleaning process is used to clean and dry the semiconductor devices using supercritical carbon dioxide.
Embodiments of the present disclosure provide a baffle inspection apparatus for inspecting non-uniform spacing and baffle defects that may occur when baffles are coupled.
Problems solved by embodiments of the present disclosure are not limited to the aforementioned problems, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.
According to embodiments of the present disclosure, a baffle inspection apparatus is provided and includes: a baffle including a spray surface configured to receive and spray fluid; an upper vessel coupled to the baffle such that the spray surface of the baffle faces downwards; an upper plate above the upper vessel and supporting the upper vessel; a lower vessel below the upper vessel and apart from the upper vessel and the upper plate; a pressure measurement sensor on an upper surface of the lower vessel; a lower plate on a lower surface of the lower vessel and supporting the lower vessel; and a support that supports the upper plate and the lower plate. The upper vessel includes a flow path pipe that is configured to supply the fluid to the baffle so that the fluid is sprayed from the spray surface of the baffle.
According to embodiments of the present disclosure, a baffle inspection apparatus is provided and includes: a baffle including a spray surface configured to receive and spay fluid; an upper vessel coupled to the baffle such that the spray surface of the baffle faces downward; an upper plate above the upper vessel and supporting the upper vessel; a lower vessel below the upper vessel and apart from the upper vessel and the upper plate; a pressure measurement sensor on an upper surface of the lower vessel; a lower plate on a lower surface of the lower vessel and supporting the lower vessel; a support that supports the upper plate and the lower plate. The upper vessel comprises a flow path pipe that is configured to supply the fluid to the baffle so that the fluid is sprayed from the spray surface of the baffle, and the baffle inspection apparatus further includes: a supply tank connected to the flow path pipe, the supply tank configured to store the fluid and to supply the fluid to the flow path pipe; a pump configured to apply pressure to the fluid and supply the fluid to the supply tank; and a processing unit that includes at least one processor, the processing unit configured to receive result data measured by the pressure measurement sensor, process the result data, and visualize the result data.
According to embodiments of the present disclosure, a baffle inspection apparatus is provided and includes: a baffle including a spray surface configured to receive and spray fluid; an upper vessel including a flow path pipe that is configured to supply the fluid to the baffle so that the fluid is sprayed from the spray surface of the baffle, the upper vessel coupled to the baffle such that the spray surface of the baffle faces downwards; an upper plate above the upper vessel and supporting the upper vessel; a lower vessel below the upper vessel and apart from the upper vessel and the upper plate; a pressure measurement sensor on an upper surface of the lower vessel and configured to measure pressure according to a position of the pressure measurement sensor, the pressure measurement sensor being a capacitance measurement sensor; a lower plate on a lower surface of the lower vessel and supporting the lower vessel; a plurality of leveling screws in the lower plate and configured to adjust a level of the lower vessel to maintain a level of the pressure measurement sensor; a support that supports the upper plate and the lower plate; a supply tank connected to the flow path pipe, the supply tank configured to store the fluid and supply the fluid to the flow path pipe; a pump configured to apply pressure to the fluid and supply the fluid to the supply tank; and a processing unit including at least one processor, the processing unit configured to receive result data measured by the pressure measurement sensor, process the result data, and visualize the result data. The upper vessel includes a baffle hole that is inwardly concaved from a lower surface of the upper vessel, and the baffle includes a baffle coupling surface that is complementarily coupled to the baffle, the baffle coupling surface being on a side of the baffle that is opposite to the spray surface.
Embodiments will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings in which:
Hereinafter, non-limiting example embodiments of the present disclosure are described in detail with reference to the accompanying drawings. The same reference numerals are used for the same components in the drawings, and redundant descriptions thereof are omitted.
It will be understood that when an element is referred to as being “on,” “connected to,” or “coupled to” another element, it can be directly on, connected to, or coupled to the other element or intervening elements may be present. In contrast, when an element is referred to as being “directly on,” “directly connected to,” or “directly coupled to” another element, there are no intervening elements present.
Referring to
The baffle 142 may spray fluid supplied through the flow path pipe 152, downwardly from a spray surface 142FA, which is a lower surface of the baffle 142. The baffle 142 may be part of a configuration of a fluid spray device in a separate substrate treating device. As an embodiment, the baffle 142 may be part of a configuration of a device that sprays a cleaning fluid in a cleaning device using a supercritical fluid. For example, the baffle 142 may be a component of a device spraying supercritical carbon dioxide (CO2). Supercritical carbon dioxide has a critical point at a pressure of about 73.0 atm and a temperature of about 31.1° C. The use of the baffle 142 is not limited by the present specification.
As an embodiment, the baffle 142 may be a multi-channel baffle. The multi-channel baffle refers to a baffle 142 in which many holes are formed to overlap each other in layers. The baffle 142 may have a coupling surface 142FB opposite to the spray surface 142FA. The coupling surface 142FB may be complementarily coupled to a baffle hole 141H provided in the upper vessel 141.
As an embodiment, the coupling surface 142FB may have a shape including a portion in which a width of the coupling surface 142FB of the baffle 142 decreases in a direction away from the spray surface 142FA of the baffle 142. In other words, the coupling surface 142FB may have a tapered shape in which the width of the coupling surface 142FB decreases in a direction away from the spray surface 142FA.
For example, with reference to
The coupling surface 142FB of the baffle 142 may be complementarily coupled to the baffle hole 141H provided in the upper vessel 141. The shape of the baffle hole 141H provided in the upper vessel 141 may have substantially the same shape as a shape of the coupling surface 142FB of the baffle 142. Therefore, like the shape of the coupling surface 142FB of the baffle 142 described above, the width of the baffle hole 141H may narrow inwardly from the lower surface 141F of the upper vessel 141.
The width of the baffle hole 141H may be reduced inwardly from the lower surface 141F of the upper vessel 141, forming a tapered shape. For example, with reference to
The lower surface 141F of the upper vessel 141 may be coplanar with the spray surface 142FA of the baffle 142. In other words, the upper vessel 141 and the baffle 142 may be provided such that a plane extending from the lower surface 141F of the upper vessel 141 is the same as a plane extending from the spray surface 142FA of the baffle 142.
The upper plate 113 may be configured to support the upper vessel 141. The upper plate 113 may be bonded to the upper vessel 141, may be coupled to the upper vessel by screws, or welded to the upper vessel 141. As shown in
The upper cap 151 may be located on the upper plate 113. The flow path pipe 152 may pass through the upper cap 151, the upper plate 113, and the upper vessel 141 to supply fluid to the baffle 142. Passing through the upper cap 151, the upper plate 113, and the upper vessel 141, the flow path pipe 152 may supply fluid to the baffle 142. According to an embodiment, a fluid supply line 180 to be described below may be connected to the upper cap 151, and fluid supplied from the fluid supply line 180 may be supplied to the baffle 142 through the flow path pipe 152 that passes through the upper cap 151, the upper plate 113, and the upper vessel 141 and has a straight line shape.
Unlike the configuration shown in
The fluid supplied to the baffle 142 through the fluid supply line 180 and the flow path pipe 152 may be the same as fluid supplied to the baffle 142 during an actual process. Alternatively, the fluid may be air. Alternatively, the fluid supplied to the baffle 142 through the fluid supply line 180 and the flow path pipe 152 may be one or more of gases, such as nitrogen (N2), oxygen (O2), carbon dioxide (CO2), argon (Ar), neon (Ne), and the like. The type of the fluid may be selected according to a purpose of the baffle inspection apparatus 1 according to an embodiment, and a material of the fluid and a combination of materials are not limited by the example embodiments described above.
The upper plate 113 may be fixed and supported by the support 120. According to an embodiment, with reference to
The support 120 may be provided singly or in plurality in the baffle inspection apparatus 1 according to an embodiment. As shown in
The support plate 111 may be connected to a lower end of the support 120 to support the support 120.
The lower vessel 131 may be located below the upper vessel 141. The lower vessel 131 may be located below the upper vessel 141 and may be apart from the lower surface 141F of the upper vessel 141. In other words, the lower vessel 131 may be located below the baffle 142 and may be apart from the spray surface 142FA of the baffle 142.
The pressure measurement unit 150 may be provided on the upper surface of the lower vessel 131. The pressure measurement unit 150 may be referred to as a surface pressure measuring device. The pressure measurement unit 150 is for measuring pressure of fluid, which is sprayed from the baffle 142 located above the pressure measurement unit, applied to the pressure measurement unit 150. According to an embodiment, the area of the pressure measurement unit 150 on the X-Y plane may be substantially equal to the area of the substrate or wafer. Alternatively, a size and shape of the pressure measurement unit 150 on the X-Y plane may be substantially the same as a size and shape of the substrate or wafer. Details of the pressure measurement unit 150 are described below.
There may be a separation between the baffle hole 141H and the baffle 142 when the baffle 142 is coupled to the baffle hole 141H. When the separation between the baffle hole 141H and the baffle 142 does not occur uniformly around the baffle 142 due to eccentricity of the baffle 142, fluid may be unevenly sprayed from the spray surface 142FA of the baffle 142.
A defect may occur during a manufacturing process of the baffle 142 or an error may occur in a porous structure of the baffle 142 in terms of manufacturing. Such an error occurring when the baffle 142 sprays fluid may cause the baffle 142 to unevenly spray fluid.
The baffle inspection apparatus 1 according to an embodiment may measure pressure of the fluid, sprayed from the spray surface 142FA of the baffle 142, applied to the upper surface of the pressure measurement unit 150. According to an embodiment, a position of each of sensing elements 150S (refer to
In a separate substrate treatment apparatus including baffles, baffle problems, such as non-uniform spacing, baffle defects, and errors may occur in coupling of baffles. In the separate substrate treatment apparatus performing a substrate treatment process, the problem of the baffle may be determined through a process result of the separate substrate treatment apparatus. The process result may be a substrate or a wafer. When a process of separately inspecting the process result is performed to determine the problem of the baffle, costs and process time may increase.
The separate substrate treatment apparatus including a baffle may generally include equipment for measuring an internal pressure. It may be practically impossible for the equipment for measuring the internal pressure to measure the pressure applied by the fluid supplied through the baffle applied to the substrate to be treated in the substrate treatment apparatus according to positions. The equipment for measuring the internal pressure is generally used to measure internal pressure of a chamber of the substrate treatment apparatus. Therefore, even if there is a problem with the baffle, it may be difficult to directly find out the problem with the baffle inside the substrate treatment apparatus. As described above, when the problem of the baffle is determined through the process result, it is a case in which a defect has already occurred in the process result. If a process of separately inspecting the process result is performed to determine the problem of the baffle, costs and process time may increase.
The baffle inspection apparatus 1 according to an embodiment may identify uneven spacing of the baffle 142, defects of the baffle 142, and the like. Positions of the sensing elements 150S included in the pressure measurement unit 150 provided in the baffle inspection apparatus 1 may be matched to pressure values measured by the sensing elements 150S. Accordingly, the pressure of the fluid sprayed from the baffle 142 may be measured according to positions through the pressure measurement unit 150.
Pressure values according to positions may be illustrated to be indicated using a processing unit 500 to be described below. Through this, a position at which the pressure value according to the position of the pressure measurement unit 150 is uniquely greater or smaller than other positions may be identified. Alternatively, a position indicating a value outside a certain range, rather than a positional change of the pressure value within the certain range, may be identified. Through this, it is possible to determine that there are uneven spacing of the baffle 142, defects of the baffles 142, and defects in assembling the baffles 142 with other members.
Accordingly, uneven spacing of the baffle 142 and defects of the baffle 142 may be determined through the pressure value measured by the pressure measurement unit 150. That is, uneven spacing of the baffle 142 and defects of the baffle 142 may not be determined by inspecting a process result which has undergone the substrate treatment process, but may be determined through the baffle inspection apparatus 1, which is a separate apparatus according to an embodiment. Accordingly, processing defects of the baffle 142 may be easily determined through the baffle inspection apparatus 1 according to an embodiment.
The baffle inspection apparatus 1 according to an embodiment may include the processing unit 500. The processing unit 500 may receive data measured by the pressure measurement unit 150 wiredly or wirelessly and process the data. According to an embodiment, the pressure measurement unit 150 and the processing unit 500 may be connected through a data cable 510 so that the processing unit 500 may receive the data.
According to embodiments, the processing unit 500 may be implemented in a computer device, such as a personal computer or server that executes a program. For example, the processing unit 500 may include a memory device, such as read only memory (ROM) and random access memory (RAM), and at least one processor configured to perform certain operations and algorithms, such as a microprocessor, a central processing unit (CPU), a graphics processing unit (GPU), and the like. Also, the processing unit 500 may include a receiver and a transmitter for receiving and transmitting electrical signals. According to embodiments, the memory device (also referred to as memory) may comprise computer instructions that, when executed by the at least one processor, are configured to cause the processing unit 500 to perform its functions.
As described above, the processing unit 500 may arrange the pressure data measured by the pressure measurement unit 150 according to the positions of the sensing elements 150S provided in the pressure measurement unit 150, which is described below. The processing unit 500 may visualize the corresponding measured pressure value according to the position and display the visualized pressure value. For example, the processing unit 500 may visualize (e.g., on a display provided as a part of or separately from the baffle inspection apparatus) a pressure measurement value by displaying a location indicating a high pressure in red and a location indicating a relatively low pressure in blue so that a user may easily recognize the distribution of the pressure measurement value.
The pressure applied to the pressure measurement unit 150 by the fluid sprayed from the baffle 142 may be identified through pressure visualization data according to the position of the pressure measurement unit 150. Through this, it is possible to determine whether there is uneven spacing of the baffle 142 or defects of the baffle 142. Accordingly, it is possible to easily identify whether the baffle 142 is unevenly spaced or the baffle 142 is defective through the baffle inspection apparatus 1 according to an embodiment.
According to an embodiment, the baffle inspection apparatus 1 may further include a storage tank 200 storing fluid, a pump 300 applying pressure to the fluid, and a supply tank 400 supplying the fluid to the baffle 142 through the fluid supply line 180. The storage tank 200, the pump 300, and the supply tank 400 may be connected through the fluid supply line 180. The supply tank 400 may be connected to the flow path pipe 152 through the fluid supply line 180. The pump 300 may apply pressure to the fluid. According to an embodiment, the pump 300 may apply a pressure of about 2 bar or more and about 100 bar or less to the fluid. Therefore, the fluid stored in the supply tank 400 may have the pressure of about 2 bar or more and about 100 bar or less. In an embodiment, the pump 300 may apply a pressure of about 70 bar to the fluid. Accordingly, the fluid stored in the supply tank 400 may have a pressure of about 70 bar.
Referring to
Referring to
Two or more leveling screws 160 may be provided. As an embodiment, as shown in
The leveling screw 160 may include a screw head 160UF, a screw thread 161 provided around a screw body, a support portion 162 engaged with the screw thread 161, a support bearing 163 embedded in the support portion 162 and provided around the screw body, a spur gear 164 embedded in the support portion 162 and provided around the screw body, and a worm gear 166 engaged with the spur gear 164 and embedded in the support portion 162.
The screw head 160UF may contact the lower surface of the lower vessel 131. A height of the lower vessel 131 may be adjusted according to a height of the screw head 160UF. The height may be adjusted by rotating the worm gear 166. When the screw head 165 provided at one end of the worm gear 166 is rotated, the worm gear 166 may rotate. When the worm gear 166 rotates, the spur gear 164 may rotate by a screw thread provided around the worm gear 166. When the spur gear 164 rotates, the leveling screw 160 may ascend or descend in a vertical direction according to the rotation of the spur gear 164.
Because the leveling screw 160 controls the rotation of the worm gear 166, rather than directly adjusting the rotation of the spur gear 164, the leveling screw 160 is advantageous for fine height adjustment. Therefore, through fine height adjustment of the screw head 160UF of the leveling screw 160, the leveling of the lower vessel 131 and the pressure measurement unit 150 placed on the lower vessel 131 may be easily achieved.
The leveling screw may be the leveling screw 170 as shown in
When the screw head 170BF is rotated, the leveling screw 170 may ascend or descend in a vertical direction of the screw top 170UF along the screw thread. The leveling screw 170 of
Referring to
A state of the support 120 may be adjusted between a fastened state and a non-fastened state through the fastening member 114. In a state in which the fastening member 114 is fastened to the support 120, the fastening member 114 is fixed to the support 120 so that the lower plate 112 does not move. In a state in which the fastening member 114 is not fastened to the support 120, the vertical height of the lower plate 112 may be adjusted based on the support plate 111. According to an embodiment, as shown in
Referring to
Referring to
As an embodiment, the baffle 142 may have a cylindrical shape. The shape of the baffle hole 141H provided in the upper vessel 141 may have the same shape as the shape of the coupling surface 142FB of the baffle 142. Like the shape of the coupling surface 142FB of the baffle 142 described above, the baffle hole 141H may have a circular shape inwardly recessed from the lower surface 141F of the upper vessel 141 to be complementarily coupled to the baffle 142 having a cylindrical shape.
While non-limiting example embodiments have been particularly shown and described in the present disclosure, it will be understood that various changes in form and details may be made therein without departing from the spirit and scope of the present disclosure.
Number | Date | Country | Kind |
---|---|---|---|
10-2022-0170042 | Dec 2022 | KR | national |