using mainly spraying means

Industry

CPC
H01L21/67051

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67051using mainly spraying means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and methods for determining fluid dynamics of liquid film...
- Patent number 12,272,576
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Pin Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate and method for treating substrate
- Patent number 12,272,544
- Issue date Apr 8, 2025
- Semes Co., Ltd.
- Do Gyeong Ha
- B08 - CLEANING
Information Patent Grant
Unit for supplying liquid, apparatus and method for treating substr...
- Patent number 12,266,546
- Issue date Apr 1, 2025
- Semes Co., Ltd.
- Do Gyeong Ha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning system for semiconductor
- Patent number 12,266,547
- Issue date Apr 1, 2025
- Suzhou Zhicheng Semiconductor Technology Co., Ltd.
- Tianxiang Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for wafer cleaning
- Patent number 12,257,610
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bo Chen Chen
- B08 - CLEANING
Information Patent Grant
Particle removing assembly and method of servicing assembly
- Patent number 12,257,612
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Hsueh Wu
- B08 - CLEANING
Information Patent Grant
Substrate processing method
- Patent number 12,255,082
- Issue date Mar 18, 2025
- Tokyo Electron Limited
- Yuta Hamashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,249,533
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Yoshinori Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,237,180
- Issue date Feb 25, 2025
- Semes Co., Ltd.
- Jun Young Choi
- B08 - CLEANING
Information Patent Grant
Support unit and substrate treating apparatus
- Patent number 12,237,181
- Issue date Feb 25, 2025
- Semes Co., Ltd.
- Ho Jong Hwang
- B08 - CLEANING
Information Patent Grant
Substrate treating apparatus and filler member provided therein
- Patent number 12,234,555
- Issue date Feb 25, 2025
- Semes Co., Ltd.
- Jin Mo Jae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,230,515
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Nobuhiko Mouri
- B08 - CLEANING
Information Patent Grant
Substrate cleaning system and substrate cleaning method
- Patent number 12,220,732
- Issue date Feb 11, 2025
- Ebara Corporation
- Hiroki Takahashi
- B08 - CLEANING
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,217,977
- Issue date Feb 4, 2025
- Semes Co., Ltd.
- Oh Yeol Kwon
- B08 - CLEANING
Information Patent Grant
Liquid supplying device and method for draining liquid thereof
- Patent number 12,208,428
- Issue date Jan 28, 2025
- Ebara Corporation
- Fujihiko Toyomasu
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,211,708
- Issue date Jan 28, 2025
- SCREEN Holdings Co., Ltd.
- Shuichi Yasuda
- B08 - CLEANING
Information Patent Grant
Substrate cleaning apparatus, substrate cleaning method, and non-tr...
- Patent number 12,202,016
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Yuki Ito
- B08 - CLEANING
Information Patent Grant
Cleaning apparatus and polishing apparatus
- Patent number 12,205,831
- Issue date Jan 21, 2025
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Cleaning apparatus for semiconductor wafer and method of cleaning s...
- Patent number 12,205,830
- Issue date Jan 21, 2025
- Sumco Corporation
- Kaito Noda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,205,833
- Issue date Jan 21, 2025
- Semes Co., Ltd.
- Sun Mi Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,198,971
- Issue date Jan 14, 2025
- Semes Co., Ltd.
- Jeongcheol Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate handling in a modular polishing system with single substr...
- Patent number 12,198,944
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Brian J. Brown
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate cleaning method and substrate cleaning device
- Patent number 12,198,947
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Hiroki Ohno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for semiconductor wafer
- Patent number 12,194,510
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuang-Wei Cheng
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 12,198,923
- Issue date Jan 14, 2025
- Semes Co., Ltd.
- Hae-Won Choi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Vapor delivery head for preventing stiction of high aspect ratio st...
- Patent number 12,198,945
- Issue date Jan 14, 2025
- Lam Research AG
- Bhaskar Bandarapu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intelligent customizable wet processing system
- Patent number 12,198,946
- Issue date Jan 14, 2025
- Yangtze Memory Technologies Co., Ltd.
- Gonglian Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,198,948
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Jun Nonaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 12,198,950
- Issue date Jan 14, 2025
- Semes Co., Ltd.
- Myung A Jeon
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus, process fluid treating apparatus, a...
- Patent number 12,198,943
- Issue date Jan 14, 2025
- Semes Co. Ltd
- Junhee Youn
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE CLEANING DEVICE, AND SUBSTRATE CLEANING METHOD USING THE...
- Publication number 20250105030
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Jieun SEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPRAYING NOZZLE TYPE OF AN APPARATUS FOR REMOVING A RESIDUAL GAS ON...
- Publication number 20250105031
- Publication date Mar 27, 2025
- VM Inc.
- Hwi Gon JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOZZLE POSITION ADJUSTING DEVICE, NOZZLE POSITION ADJUSTING METHOD,...
- Publication number 20250100020
- Publication date Mar 27, 2025
- EBARA CORPORATION
- Junya IKEGAMI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087476
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kouzou Tachibana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250079220
- Publication date Mar 6, 2025
- SCREEN Holdings Co., Ltd.
- Satoshi KAKINOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR RECOVERING ORGANIC CONTAMINANTS FROM SEMICO...
- Publication number 20250079198
- Publication date Mar 6, 2025
- ELEMENTAL SCIENTIFIC, INC.
- Jacob Unnerstall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE
- Publication number 20250069907
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Hiroki OHNO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPERATION MONITORING METHOD AND MANUFACTURING APPARATUS
- Publication number 20250069922
- Publication date Feb 27, 2025
- SCREEN Holdings Co., Ltd.
- Satoshi OKAMOTO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250062115
- Publication date Feb 20, 2025
- SCREEN Holdings Co., Ltd.
- Takashi IZUTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER AND METHOD OF WAFER THINNING
- Publication number 20250062114
- Publication date Feb 20, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Michael J. SEDDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CLEANING APPARATUS AND METHOD
- Publication number 20250062140
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jieh-Chau HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CLEANING APPARATUS AND METHOD OF CONTROLLING THE SAME
- Publication number 20250062154
- Publication date Feb 20, 2025
- ZEUS CO., LTD.
- Seung Dae BAEK
- B08 - CLEANING
Information Patent Application
WAFER PROCESSING METHOD
- Publication number 20250058363
- Publication date Feb 20, 2025
- GRAND PROCESS TECHNOLOGY CORPORATION
- Li-tso HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250054783
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Tatsuya NAGAMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING CHAMBER, SUBSTRATE PROCESSING SYSTEM INCLUDING...
- Publication number 20250054805
- Publication date Feb 13, 2025
- SAMSUNG ELECTRONICS CoO., LTD.
- Yongmyung JUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250046627
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Hiroki SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CLEANING APPARATUS
- Publication number 20250040693
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- DONGHOON KWON
- A46 - BRUSHWARE
Information Patent Application
METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER CLEANING
- Publication number 20250041906
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuang-Wei Cheng
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250046628
- Publication date Feb 6, 2025
- EBARA CORPORATION
- Itsuki KOBATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-WET MODULE
- Publication number 20250038014
- Publication date Jan 30, 2025
- EBARA CORPORATION
- Mitsutoshi YAHAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING NOZZLE UNIT AND SUBSTRATE...
- Publication number 20250025923
- Publication date Jan 23, 2025
- SEMES CO., LTD.
- Ju Hwan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250029845
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Hunjae JANG
- B08 - CLEANING
Information Patent Application
TEMPERATURE ADJUSTMENT DEVICE
- Publication number 20250012488
- Publication date Jan 9, 2025
- KELK LTD.
- Hiroki IRIKURA
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...
- Publication number 20250014915
- Publication date Jan 9, 2025
- Samsung Electronics Co., Ltd.
- SANGJINE PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD
- Publication number 20250001465
- Publication date Jan 2, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- B08 - CLEANING
Information Patent Application
ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT
- Publication number 20250006519
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Kyle M. Hanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240416390
- Publication date Dec 19, 2024
- EBARA CORPORATION
- Naoki TOYOMURA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240412986
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Byung Woo SIM
- B08 - CLEANING
Information Patent Application
Ramped Spin-Dry on Semiconductor Wafer
- Publication number 20240404843
- Publication date Dec 5, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Christopher Volk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240404850
- Publication date Dec 5, 2024
- ACM RESEARCH (SHANGHAI), INC.
- Hao Feng
- H01 - BASIC ELECTRIC ELEMENTS

using mainly spraying means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and methods for determining fluid dynamics of liquid film...

Apparatus for treating substrate and method for treating substrate

Unit for supplying liquid, apparatus and method for treating substr...

Cleaning system for semiconductor

Apparatus and method for wafer cleaning

Particle removing assembly and method of servicing assembly

Substrate processing method

Substrate processing apparatus

Apparatus for treating substrate

Support unit and substrate treating apparatus

Substrate treating apparatus and filler member provided therein

Substrate processing apparatus and substrate processing method

Substrate cleaning system and substrate cleaning method

Method and apparatus for treating substrate

Liquid supplying device and method for draining liquid thereof

Substrate processing apparatus and substrate processing method

Substrate cleaning apparatus, substrate cleaning method, and non-tr...

Cleaning apparatus and polishing apparatus

Cleaning apparatus for semiconductor wafer and method of cleaning s...

Apparatus and method for treating substrate

Substrate processing apparatus

Substrate handling in a modular polishing system with single substr...

Substrate cleaning method and substrate cleaning device

Method and apparatus for semiconductor wafer

Substrate processing method and substrate processing system

Vapor delivery head for preventing stiction of high aspect ratio st...

Intelligent customizable wet processing system

Substrate processing apparatus

Apparatus and method for processing substrate

Substrate processing apparatus, process fluid treating apparatus, a...

Patents Applicationslast 30 patents

SUBSTRATE CLEANING DEVICE, AND SUBSTRATE CLEANING METHOD USING THE...

SPRAYING NOZZLE TYPE OF AN APPARATUS FOR REMOVING A RESIDUAL GAS ON...

NOZZLE POSITION ADJUSTING DEVICE, NOZZLE POSITION ADJUSTING METHOD,...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SYSTEMS AND METHODS FOR RECOVERING ORGANIC CONTAMINANTS FROM SEMICO...

SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE

OPERATION MONITORING METHOD AND MANUFACTURING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR WAFER AND METHOD OF WAFER THINNING

WAFER CLEANING APPARATUS AND METHOD

WAFER CLEANING APPARATUS AND METHOD OF CONTROLLING THE SAME

WAFER PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING CHAMBER, SUBSTRATE PROCESSING SYSTEM INCLUDING...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

WAFER CLEANING APPARATUS

METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER CLEANING

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PRE-WET MODULE

SUBSTRATE PROCESSING APPARATUS INCLUDING NOZZLE UNIT AND SUBSTRATE...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

TEMPERATURE ADJUSTMENT DEVICE

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...

SUBSTRATE PROCESSING APPARATUS AND METHOD

ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Ramped Spin-Dry on Semiconductor Wafer

SUBSTRATE PROCESSING APPARATUS