using mainly spraying means

Industry

CPC
H01L21/67051

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67051using mainly spraying means

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for smoothly exhausting the atmosphere in a processing sp...
- Patent number 12,331,399
- Issue date Jun 17, 2025
- Semes Co., Ltd.
- Ju Won Kim
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,334,370
- Issue date Jun 17, 2025
- Semes Co., Ltd.
- Sangmin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated semiconductor part cleaning system
- Patent number 12,327,738
- Issue date Jun 10, 2025
- Applied Materials, Inc.
- Jenn C. Chow
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,322,609
- Issue date Jun 3, 2025
- Ebara Corporation
- Kohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing liquid supply apparatus and method of removing solids fr...
- Patent number 12,322,610
- Issue date Jun 3, 2025
- Semes Co., Ltd.
- Mu Hyeon Lee
- B08 - CLEANING
Information Patent Grant
Apparatus and methods for cleaning a package
- Patent number 12,322,608
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ying-Hao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method and substrate processing method
- Patent number 12,322,586
- Issue date Jun 3, 2025
- SCREEN Holdings Co., Ltd.
- Koji Nishiyama
- B08 - CLEANING
Information Patent Grant
Wafer processing apparatus and wafer processing method
- Patent number 12,322,607
- Issue date Jun 3, 2025
- ZEUS CO., LTD.
- Seung Dae Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,311,415
- Issue date May 27, 2025
- Semes Co., Ltd.
- Do Hyung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus having bowl assembly
- Patent number 12,308,256
- Issue date May 20, 2025
- DEVICEENG CO., LTD
- Taek Youb Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrasonically activated water ejector
- Patent number 12,303,946
- Issue date May 20, 2025
- Disco Corporation
- Xiaoming Qiu
- B08 - CLEANING
Information Patent Grant
Wafer treatment apparatus and method for reducing scattering of tre...
- Patent number 12,308,257
- Issue date May 20, 2025
- Semes Co., Ltd.
- Young Jin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped-channel scanning nozzle for scanning of a material surface
- Patent number 12,300,480
- Issue date May 13, 2025
- Elemental Scientific, Inc.
- Beau A. Marth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid supply unit and substrate processing apparatus incl...
- Patent number 12,300,514
- Issue date May 13, 2025
- Semes Co., Ltd.
- Seong Soo Lee
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Substrate processing apparatus and substrate processing method havi...
- Patent number 12,300,518
- Issue date May 13, 2025
- Tokyo Electron Limited
- Kazuki Kosai
- B08 - CLEANING
Information Patent Grant
Methods for retaining a processing liquid on a surface of a semicon...
- Patent number 12,288,698
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer-type wafer cleaning device and method for controlling...
- Patent number 12,288,699
- Issue date Apr 29, 2025
- SK SILTRON CO., LTD.
- Gun Ho Lee
- B08 - CLEANING
Information Patent Grant
Substrate treatment device
- Patent number 12,278,120
- Issue date Apr 15, 2025
- Shibaura Mechatronics Corporation
- Minami Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for determining fluid dynamics of liquid film...
- Patent number 12,272,576
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Pin Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate and method for treating substrate
- Patent number 12,272,544
- Issue date Apr 8, 2025
- Semes Co., Ltd.
- Do Gyeong Ha
- B08 - CLEANING
Information Patent Grant
Unit for supplying liquid, apparatus and method for treating substr...
- Patent number 12,266,546
- Issue date Apr 1, 2025
- Semes Co., Ltd.
- Do Gyeong Ha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning system for semiconductor
- Patent number 12,266,547
- Issue date Apr 1, 2025
- Suzhou Zhicheng Semiconductor Technology Co., Ltd.
- Tianxiang Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for wafer cleaning
- Patent number 12,257,610
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bo Chen Chen
- B08 - CLEANING
Information Patent Grant
Particle removing assembly and method of servicing assembly
- Patent number 12,257,612
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Hsueh Wu
- B08 - CLEANING
Information Patent Grant
Substrate processing method
- Patent number 12,255,082
- Issue date Mar 18, 2025
- Tokyo Electron Limited
- Yuta Hamashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,249,533
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Yoshinori Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and filler member provided therein
- Patent number 12,234,555
- Issue date Feb 25, 2025
- Semes Co., Ltd.
- Jin Mo Jae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,237,180
- Issue date Feb 25, 2025
- Semes Co., Ltd.
- Jun Young Choi
- B08 - CLEANING
Information Patent Grant
Support unit and substrate treating apparatus
- Patent number 12,237,181
- Issue date Feb 25, 2025
- Semes Co., Ltd.
- Ho Jong Hwang
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,230,515
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Nobuhiko Mouri
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
PARTICLE REMOVING ASSEMBLY AND METHOD OF SERVICING ASSEMBLY
- Publication number 20250187050
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Hsueh WU
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250191943
- Publication date Jun 12, 2025
- SCREEN Holdings Co., Ltd.
- Shinji SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250187043
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- AHRA JEON
- B08 - CLEANING
Information Patent Application
SYSTEMS FOR INTEGRATED DECOMPOSITION AND SCANNING OF A SEMICONDUCTI...
- Publication number 20250189412
- Publication date Jun 12, 2025
- ELEMENTAL SCIENTIFIC, INC.
- Beau A. Marth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS
- Publication number 20250187051
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Seonguk JEONG
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD OF TREATING SUBSTRATE
- Publication number 20250191904
- Publication date Jun 12, 2025
- SEMES CO., LTD.
- So Young PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHIP ATTACHING DEVICE, CHIP PROCESSING SYSTEM, AND CHIP PROCESSING...
- Publication number 20250183222
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Yasutaka Mizomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CUP, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
- Publication number 20250183092
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Kouichirou TANAKA
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
ADJUSTABLE NOZZLE DEVICE
- Publication number 20250170597
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Nathan Ang Wee Kiat
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
A METHOD OF CLEANING A SEMICONDUCTOR SUBSTRATE FOR A SOLAR CELL, AN...
- Publication number 20250174453
- Publication date May 29, 2025
- REC SOLAR PTE. LTD.
- Chui Yu CHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus And Method For Wafer Cleaning
- Publication number 20250161998
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bo Chen CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250167012
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Jihoon JEONG
- B08 - CLEANING
Information Patent Application
SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRAT...
- Publication number 20250167022
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Keita Hirase
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND TURN-OVER DEVICE THEREOF
- Publication number 20250157841
- Publication date May 15, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Yazhou Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250149355
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Susumu HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
- Publication number 20250144677
- Publication date May 8, 2025
- KIOXIA Corporation
- Minako INUKAI
- B08 - CLEANING
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20250149358
- Publication date May 8, 2025
- SCREEN Holdings Co., Ltd.
- Hiroaki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIO3 SPRAY TANK FOR POST CMP SUBSTRATE CLEANING
- Publication number 20250140578
- Publication date May 1, 2025
- Applied Materials, Inc.
- Clinton P. SAKATA
- B24 - GRINDING POLISHING
Information Patent Application
SPIN CHUCK AND WAFER CLEANING DEVICE INCLUDING THE SAME
- Publication number 20250140579
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Sunghwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...
- Publication number 20250140576
- Publication date May 1, 2025
- SEMES CO., LTD.
- Jun Hee CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET PROCESSING APPARATUS
- Publication number 20250140580
- Publication date May 1, 2025
- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Shiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSINGSYSTEM
- Publication number 20250125162
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Takashi UNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOZZLE POSITION ADJUSTING DEVICE, NOZZLE POSITION ADJUSTING METHOD,...
- Publication number 20250100020
- Publication date Mar 27, 2025
- EBARA CORPORATION
- Junya IKEGAMI
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICE, AND SUBSTRATE CLEANING METHOD USING THE...
- Publication number 20250105030
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Jieun SEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPRAYING NOZZLE TYPE OF AN APPARATUS FOR REMOVING A RESIDUAL GAS ON...
- Publication number 20250105031
- Publication date Mar 27, 2025
- VM Inc.
- Hwi Gon JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087476
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kouzou Tachibana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250079220
- Publication date Mar 6, 2025
- SCREEN Holdings Co., Ltd.
- Satoshi KAKINOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR RECOVERING ORGANIC CONTAMINANTS FROM SEMICO...
- Publication number 20250079198
- Publication date Mar 6, 2025
- ELEMENTAL SCIENTIFIC, INC.
- Jacob Unnerstall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE
- Publication number 20250069907
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Hiroki OHNO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPERATION MONITORING METHOD AND MANUFACTURING APPARATUS
- Publication number 20250069922
- Publication date Feb 27, 2025
- SCREEN Holdings Co., Ltd.
- Satoshi OKAMOTO
- G06 - COMPUTING CALCULATING COUNTING

using mainly spraying means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus for smoothly exhausting the atmosphere in a processing sp...

Apparatus and method for treating substrate

Integrated semiconductor part cleaning system

Substrate processing apparatus and substrate processing method

Processing liquid supply apparatus and method of removing solids fr...

Apparatus and methods for cleaning a package

Substrate cleaning method and substrate processing method

Wafer processing apparatus and wafer processing method

Substrate processing apparatus and substrate processing method

Substrate treatment apparatus having bowl assembly

Ultrasonically activated water ejector

Wafer treatment apparatus and method for reducing scattering of tre...

Shaped-channel scanning nozzle for scanning of a material surface

Chemical liquid supply unit and substrate processing apparatus incl...

Substrate processing apparatus and substrate processing method havi...

Methods for retaining a processing liquid on a surface of a semicon...

Single wafer-type wafer cleaning device and method for controlling...

Substrate treatment device

Apparatus and methods for determining fluid dynamics of liquid film...

Apparatus for treating substrate and method for treating substrate

Unit for supplying liquid, apparatus and method for treating substr...

Cleaning system for semiconductor

Apparatus and method for wafer cleaning

Particle removing assembly and method of servicing assembly

Substrate processing method

Substrate processing apparatus

Substrate treating apparatus and filler member provided therein

Apparatus for treating substrate

Support unit and substrate treating apparatus

Substrate processing apparatus and substrate processing method

Patents Applicationslast 30 patents

PARTICLE REMOVING ASSEMBLY AND METHOD OF SERVICING ASSEMBLY

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

SYSTEMS FOR INTEGRATED DECOMPOSITION AND SCANNING OF A SEMICONDUCTI...

CLEANING APPARATUS

APPARATUS AND METHOD OF TREATING SUBSTRATE

CHIP ATTACHING DEVICE, CHIP PROCESSING SYSTEM, AND CHIP PROCESSING...

CUP, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

ADJUSTABLE NOZZLE DEVICE

A METHOD OF CLEANING A SEMICONDUCTOR SUBSTRATE FOR A SOLAR CELL, AN...

Apparatus And Method For Wafer Cleaning

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRAT...

SUBSTRATE CLEANING APPARATUS AND TURN-OVER DEVICE THEREOF

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE

SUBSTRATE TREATING APPARATUS

DIO3 SPRAY TANK FOR POST CMP SUBSTRATE CLEANING

SPIN CHUCK AND WAFER CLEANING DEVICE INCLUDING THE SAME

SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...

WET PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSINGSYSTEM

NOZZLE POSITION ADJUSTING DEVICE, NOZZLE POSITION ADJUSTING METHOD,...

SUBSTRATE CLEANING DEVICE, AND SUBSTRATE CLEANING METHOD USING THE...

SPRAYING NOZZLE TYPE OF AN APPARATUS FOR REMOVING A RESIDUAL GAS ON...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SYSTEMS AND METHODS FOR RECOVERING ORGANIC CONTAMINANTS FROM SEMICO...

SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE

OPERATION MONITORING METHOD AND MANUFACTURING APPARATUS