using mainly spraying means

Industry

CPC
H01L21/67051

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67051using mainly spraying means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 12,347,698
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prewet module and prewet method
- Patent number 12,347,697
- Issue date Jul 1, 2025
- Ebara Corporation
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Treating vessel and liquid processing apparatus
- Patent number 12,341,027
- Issue date Jun 24, 2025
- Semes Co., Ltd.
- Dae Sung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin shaping device
- Patent number 12,341,036
- Issue date Jun 24, 2025
- BONDTECH CO., LTD.
- Akira Yamauchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning apparatus
- Patent number 12,341,052
- Issue date Jun 24, 2025
- ZEUS CO., LTD.
- Seung Dae Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid preparation device, and substrate processing device
- Patent number 12,337,289
- Issue date Jun 24, 2025
- SCREEN Holdings Co., Ltd.
- Hajime Nishide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrate
- Patent number 12,341,028
- Issue date Jun 24, 2025
- Semes Co., Ltd.
- Sun Wook Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for smoothly exhausting the atmosphere in a processing sp...
- Patent number 12,331,399
- Issue date Jun 17, 2025
- Semes Co., Ltd.
- Ju Won Kim
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,334,370
- Issue date Jun 17, 2025
- Semes Co., Ltd.
- Sangmin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated semiconductor part cleaning system
- Patent number 12,327,738
- Issue date Jun 10, 2025
- Applied Materials, Inc.
- Jenn C. Chow
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,322,609
- Issue date Jun 3, 2025
- Ebara Corporation
- Kohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing liquid supply apparatus and method of removing solids fr...
- Patent number 12,322,610
- Issue date Jun 3, 2025
- Semes Co., Ltd.
- Mu Hyeon Lee
- B08 - CLEANING
Information Patent Grant
Apparatus and methods for cleaning a package
- Patent number 12,322,608
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ying-Hao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method and substrate processing method
- Patent number 12,322,586
- Issue date Jun 3, 2025
- SCREEN Holdings Co., Ltd.
- Koji Nishiyama
- B08 - CLEANING
Information Patent Grant
Wafer processing apparatus and wafer processing method
- Patent number 12,322,607
- Issue date Jun 3, 2025
- ZEUS CO., LTD.
- Seung Dae Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,311,415
- Issue date May 27, 2025
- Semes Co., Ltd.
- Do Hyung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus having bowl assembly
- Patent number 12,308,256
- Issue date May 20, 2025
- DEVICEENG CO., LTD
- Taek Youb Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrasonically activated water ejector
- Patent number 12,303,946
- Issue date May 20, 2025
- Disco Corporation
- Xiaoming Qiu
- B08 - CLEANING
Information Patent Grant
Wafer treatment apparatus and method for reducing scattering of tre...
- Patent number 12,308,257
- Issue date May 20, 2025
- Semes Co., Ltd.
- Young Jin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped-channel scanning nozzle for scanning of a material surface
- Patent number 12,300,480
- Issue date May 13, 2025
- Elemental Scientific, Inc.
- Beau A. Marth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid supply unit and substrate processing apparatus incl...
- Patent number 12,300,514
- Issue date May 13, 2025
- Semes Co., Ltd.
- Seong Soo Lee
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Substrate processing apparatus and substrate processing method havi...
- Patent number 12,300,518
- Issue date May 13, 2025
- Tokyo Electron Limited
- Kazuki Kosai
- B08 - CLEANING
Information Patent Grant
Methods for retaining a processing liquid on a surface of a semicon...
- Patent number 12,288,698
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single wafer-type wafer cleaning device and method for controlling...
- Patent number 12,288,699
- Issue date Apr 29, 2025
- SK SILTRON CO., LTD.
- Gun Ho Lee
- B08 - CLEANING
Information Patent Grant
Substrate treatment device
- Patent number 12,278,120
- Issue date Apr 15, 2025
- Shibaura Mechatronics Corporation
- Minami Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for determining fluid dynamics of liquid film...
- Patent number 12,272,576
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Pin Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate and method for treating substrate
- Patent number 12,272,544
- Issue date Apr 8, 2025
- Semes Co., Ltd.
- Do Gyeong Ha
- B08 - CLEANING
Information Patent Grant
Unit for supplying liquid, apparatus and method for treating substr...
- Patent number 12,266,546
- Issue date Apr 1, 2025
- Semes Co., Ltd.
- Do Gyeong Ha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning system for semiconductor
- Patent number 12,266,547
- Issue date Apr 1, 2025
- Suzhou Zhicheng Semiconductor Technology Co., Ltd.
- Tianxiang Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for wafer cleaning
- Patent number 12,257,610
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bo Chen Chen
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250205752
- Publication date Jun 26, 2025
- SCREEN Holdings Co., Ltd.
- Tsungju LIN
- B08 - CLEANING
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20250210379
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Gu Won SEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING A SEMICONDUCTOR WAFER
- Publication number 20250201547
- Publication date Jun 19, 2025
- Siltronic AG
- Damian BROCK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20250201593
- Publication date Jun 19, 2025
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250201635
- Publication date Jun 19, 2025
- EBARA CORPORATION
- Issei SUGANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAN FILTER UNIT, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME,...
- Publication number 20250201590
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Dae-Woong CHOI
- B08 - CLEANING
Information Patent Application
MANUFACTURING METHOD, SUBSTRATE PROCESSING METHOD, AND CONTROL METH...
- Publication number 20250201591
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Do Hyeon YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE REMOVING ASSEMBLY AND METHOD OF SERVICING ASSEMBLY
- Publication number 20250187050
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Hsueh WU
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250191943
- Publication date Jun 12, 2025
- SCREEN Holdings Co., Ltd.
- Shinji SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250187043
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- AHRA JEON
- B08 - CLEANING
Information Patent Application
SYSTEMS FOR INTEGRATED DECOMPOSITION AND SCANNING OF A SEMICONDUCTI...
- Publication number 20250189412
- Publication date Jun 12, 2025
- ELEMENTAL SCIENTIFIC, INC.
- Beau A. Marth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS
- Publication number 20250187051
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Seonguk JEONG
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD OF TREATING SUBSTRATE
- Publication number 20250191904
- Publication date Jun 12, 2025
- SEMES CO., LTD.
- So Young PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHIP ATTACHING DEVICE, CHIP PROCESSING SYSTEM, AND CHIP PROCESSING...
- Publication number 20250183222
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Yasutaka Mizomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CUP, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
- Publication number 20250183092
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Kouichirou TANAKA
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
ADJUSTABLE NOZZLE DEVICE
- Publication number 20250170597
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Nathan Ang Wee Kiat
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
A METHOD OF CLEANING A SEMICONDUCTOR SUBSTRATE FOR A SOLAR CELL, AN...
- Publication number 20250174453
- Publication date May 29, 2025
- REC SOLAR PTE. LTD.
- Chui Yu CHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus And Method For Wafer Cleaning
- Publication number 20250161998
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bo Chen CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250167012
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Jihoon JEONG
- B08 - CLEANING
Information Patent Application
SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRAT...
- Publication number 20250167022
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Keita Hirase
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND TURN-OVER DEVICE THEREOF
- Publication number 20250157841
- Publication date May 15, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Yazhou Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
- Publication number 20250144677
- Publication date May 8, 2025
- KIOXIA Corporation
- Minako INUKAI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250149355
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Susumu HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20250149358
- Publication date May 8, 2025
- SCREEN Holdings Co., Ltd.
- Hiroaki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIO3 SPRAY TANK FOR POST CMP SUBSTRATE CLEANING
- Publication number 20250140578
- Publication date May 1, 2025
- Applied Materials, Inc.
- Clinton P. SAKATA
- B24 - GRINDING POLISHING
Information Patent Application
SPIN CHUCK AND WAFER CLEANING DEVICE INCLUDING THE SAME
- Publication number 20250140579
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Sunghwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...
- Publication number 20250140576
- Publication date May 1, 2025
- SEMES CO., LTD.
- Jun Hee CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET PROCESSING APPARATUS
- Publication number 20250140580
- Publication date May 1, 2025
- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Shiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSINGSYSTEM
- Publication number 20250125162
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Takashi UNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOZZLE POSITION ADJUSTING DEVICE, NOZZLE POSITION ADJUSTING METHOD,...
- Publication number 20250100020
- Publication date Mar 27, 2025
- EBARA CORPORATION
- Junya IKEGAMI
- B08 - CLEANING

using mainly spraying means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Liquid processing apparatus and liquid processing method

Prewet module and prewet method

Treating vessel and liquid processing apparatus

Resin shaping device

Wafer cleaning apparatus

Chemical liquid preparation device, and substrate processing device

Apparatus for processing substrate

Apparatus for smoothly exhausting the atmosphere in a processing sp...

Apparatus and method for treating substrate

Integrated semiconductor part cleaning system

Substrate processing apparatus and substrate processing method

Processing liquid supply apparatus and method of removing solids fr...

Apparatus and methods for cleaning a package

Substrate cleaning method and substrate processing method

Wafer processing apparatus and wafer processing method

Substrate processing apparatus and substrate processing method

Substrate treatment apparatus having bowl assembly

Ultrasonically activated water ejector

Wafer treatment apparatus and method for reducing scattering of tre...

Shaped-channel scanning nozzle for scanning of a material surface

Chemical liquid supply unit and substrate processing apparatus incl...

Substrate processing apparatus and substrate processing method havi...

Methods for retaining a processing liquid on a surface of a semicon...

Single wafer-type wafer cleaning device and method for controlling...

Substrate treatment device

Apparatus and methods for determining fluid dynamics of liquid film...

Apparatus for treating substrate and method for treating substrate

Unit for supplying liquid, apparatus and method for treating substr...

Cleaning system for semiconductor

Apparatus and method for wafer cleaning

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

METHOD FOR CLEANING A SEMICONDUCTOR WAFER

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

FAN FILTER UNIT, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME,...

MANUFACTURING METHOD, SUBSTRATE PROCESSING METHOD, AND CONTROL METH...

PARTICLE REMOVING ASSEMBLY AND METHOD OF SERVICING ASSEMBLY

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

SYSTEMS FOR INTEGRATED DECOMPOSITION AND SCANNING OF A SEMICONDUCTI...

CLEANING APPARATUS

APPARATUS AND METHOD OF TREATING SUBSTRATE

CHIP ATTACHING DEVICE, CHIP PROCESSING SYSTEM, AND CHIP PROCESSING...

CUP, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

ADJUSTABLE NOZZLE DEVICE

A METHOD OF CLEANING A SEMICONDUCTOR SUBSTRATE FOR A SOLAR CELL, AN...

Apparatus And Method For Wafer Cleaning

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRAT...

SUBSTRATE CLEANING APPARATUS AND TURN-OVER DEVICE THEREOF

METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE TREATING APPARATUS

DIO3 SPRAY TANK FOR POST CMP SUBSTRATE CLEANING

SPIN CHUCK AND WAFER CLEANING DEVICE INCLUDING THE SAME

SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...

WET PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSINGSYSTEM

NOZZLE POSITION ADJUSTING DEVICE, NOZZLE POSITION ADJUSTING METHOD,...