Claims
- 1. A beam shaping system comprising a laser for producing an initial laser beam, a beam shaping element for shaping the initial laser beam, and a filter for altering the wavefront of the shaped beam to create a non-Gaussian outgoing beam.
- 2. A beam shaping system according to claim 1 in which the filter comprises a phase filter for converting an incoming plane wave to an outgoing wave having a power density profile that varies radially according to the Bessel function J0.
- 3. A beam shaping system according to claim 1 wherein the filter comprises a diffractive optical element.
- 4. A beam shaping system according to claim 1 wherein the beam shaping element comprising a diffractive optical element.
- 5. A beam shaping system according to claim 1 wherein the beam shaping element comprises an anamorphic lens.
- 6. A beam shaping system according to claim 1 wherein the initial laser beam is astigmatic.
- 7. A beam shaping system according to claim 6 wherein the laser comprises a diode laser.
- 8. A beam shaping system according to claim 6 wherein the beam shaping element converts the astigmatic initial laser beam into a symmetrical beam.
- 9. A beam shaping system according to claim 2 wherein the phase filter comprises a plurality of concentric rings.
- 10. A beam shaping system according to claim 1 wherein the filter comprises a phase only filter.
- 11. A beam shaping system according to claim 1 wherein the filter comprises a phase and amplitude filter.
- 12. A beam shaping system according to claim 1 wherein the filter comprises an etched substrate.
- 13. A beam shaping system according to claim 1 wherein the outgoing beam is defined generally by a Bessel envelope.
- 14. A beam shaping system according to claim 1 wherein the outgoing beam comprises a coherent combination of a Bessel beam and a Gaussian beam.
- 15. A beam shaping system according to claim 1 including, a beam stop between the beam shaping element and the filter.
- 16. A beam shaping system according to claim 1 wherein the outgoing beam has an amplitude which is defined essentially by the following equation:
- 17. A beam shaping system according to claim 1 wherein the filter is shaped by use the Gerchberg-Saxton algorithm.
- 18. A beam shaping system according to claim 15 wherein the initial laser beam is astigmatic, wherein the beam shaping element converts the initial laser beam to a symmetrical Gaussian beam, and wherein said symmetrical Gaussian beam is truncated by the beam stop prior to impinging upon the filter.
- 19. A beam shaping system according to claim 1 wherein the beam shaping element and the filter are separate elements, separated by an air gap.
- 20. A beam shaping system according to claim 1 including a combined optical element having a first surface defining the beam shaping element and a second surface defining the filter.
- 21. A beam shaping system according to claim 20 wherein the first and second surfaces are etched.
- 22. An optical scanner incorporating a beam shaping system as defined in claim 1.
- 23. A bar code reader incorporating a beam shaping system as defined in claim 1.
- 24. A hand-held computer terminal incorporating a beam shaping system as defined in claim 1.
- 25. A beam shaping system according to claim 1 wherein the outgoing beam comprises a coherent combination of a diffracting beam and a remnant portion of the original beam.
- 26. A beam shaping system according to claim 18 wherein the filter comprises a Bessel filter.
- 27. A beam shaping system according to claim 26 wherein the outgoing beam comprises a coherent combination of a diffracting beam and a remnant portion of the original beam.
- 28. A beam shaping system according to claim 27 wherein the outgoing beam comprises a Bessel-Gaussian beam.
- 29. A method for synthesizing a Bessel-Gaussian beam, comprising the steps of:
a Gaussian beam passing through an aperture to produce a truncated Gaussian beam; the truncated Gaussian beam impinging on a Bessel filter to create a Bessel-Gaussian beam.
- 30. The method of claim 29, further comprising the steps of:
matching the size of the beam waist of the truncated Gaussian beam to the size of the Bessel filter.
- 31. The method of claim 29, wherein said step of impinging comprises the truncated Gaussian beam impinging on the Bessel filter in such a manner that the beam waist of the truncated Gaussian beam passes through the center-circle portion of the Bessel filter.
- 32. The method of claim 29, wherein the Bessel-Gaussian beam has an amplitude which is defined essentially by the following equation:
- 33. A beam shaping system for synthesizing a Bessel-Gaussian beam, comprising:
a laser for producing an initial Gaussian laser beam; an aperture for truncating said laser beam, producing a truncated Gaussian beam; a Bessel filter placed beyond the aperture upon which said truncated Gaussian beam impinges, producing a Bessel-Gaussian beam.
- 34. The beam shaping system of claim 33, further comprising collimation optics for collimating said Gaussian laser beam.
- 35. The beam shaping system of claim 33, wherein the Bessel-Gaussian beam has an amplitude defined essentially by the following equation:
Priority Claims (2)
Number |
Date |
Country |
Kind |
09330053 |
Jun 1999 |
US |
|
09714511 |
Nov 2000 |
US |
|
Parent Case Info
[0001] This disclosure claims priority under 35 U.S.C. § 120 of application Nos. 09/330,053, filed on Jun. 11, 1999, and 09/714,511, filed on Nov. 17, 2000, the disclosures of which are hereby incorporated by reference in their entireties.