This section is intended to introduce the reader to various aspects of art that may be related to various aspects of the present disclosure, which are described and/or claimed below. This discussion is believed to be helpful in providing the reader with background information to facilitate a better understanding of the various aspects of the present disclosure. Accordingly, it should be understood that these statements are to be read in this light, and not as admissions of prior art.
Highly pure polycrystalline silicon (polysilicon) is a starting material for the fabrication of electronic components and solar cells. It is obtained by thermal decomposition or reduction, with hydrogen, of a silicon source gas. This process is known to those skilled in the art as chemical vapor deposition (CVD). Polysilicon can be produced in so-called Siemens reactors. The chemical vapor deposition of elemental silicon in these CVD reactors takes place on silicon rods, so-called thin rods. The rods are placed in a metal bell jar of the Siemens reactor and are connected electrically to a source of electrical current. These rods are heated to more than 1000° C. through resistive heating when electric current is supplied to the rods. Reaction gas comprising hydrogen and a silicon source gas, for example trichlorosilane, is introduced into the bell jar. The gas mixture is heated by conductive heat transfer when it contacts the surfaces of the rods so that the CVD reaction takes place on the surfaces of silicon rods.
A majority of the electrical energy that is converted to thermal energy at the rods is radiated from the surfaces of the rods due to the high temperatures of the rods. Some of the thermal radiation from each rod becomes incident upon adjacent rods and is absorbed by the rods, thereby contributing to the heating of the rods. The reaction gas is transparent to the thermal radiation, and therefore, the energy of the thermal radiation is not transferred to the reaction gas. Instead, a majority of the thermal radiation reaches the metal wall of the bell jar of the Siemens reactor. The metal wall at least partially absorbs the incident thermal radiation. Heat at the metal wall is transferred by convection to liquid flowing through cooling channels surrounding the metal wall. Transferring heat from the metal wall prevents corrosion of the wall, mechanically stabilizes the wall under pressure, and inhibits silicon deposits on the wall.
In one aspect, a bell jar for a Siemens reactor of the type used to deposit polycrystalline silicon on a plurality of heated silicon rods via chemical vapor deposition process generally comprises a thermally conductive inner wall having an interior surface at least partially defining an interior space adapted to receive the plurality of heated silicon rods therein. A thermal radiation shield in the interior space is generally adjacent to and in opposing relationship with the interior surface of the inner wall. The thermal radiation shield is substantially opaque to thermal radiation emitted from the plurality of heated silicon rods in the interior space of the bell jar.
In another aspect, a method of constructing a radiation shield in a bell jar for a Siemens reactor of the type used to deposit polycrystalline silicon on a plurality of heated silicon rods via chemical vapor deposition process generally comprises providing a plurality of mounting members in at least one row around an interior surface of an inner wall of the bell jar. The interior surface of the inner wall at least partially defines an interior space of the bell jar that is adapted to receive the plurality of heated silicon rods. A plurality of thermal radiation shield members are mounted on the mounting members so that the thermal radiation shield members are arranged side-by-side with respect to one another around the interior surface of the inner wall of the bell jar. The thermal radiation shield members are substantially opaque to thermal radiation emitted from the plurality of heated silicon rods in the interior space of the bell jar during the chemical vapor deposition process.
In yet another aspect, a method of reducing heat loss in a Siemens reactor due to thermal radiation emitted by heated silicon rods in an interior space of a bell jar of the Siemens reactor generally comprises supplying electrical energy to the silicon rods disposed in the interior space of the bell jar of the Siemens reactor. The silicon rods convert the electrical energy into thermal energy, whereby the silicon rods emit thermal radiation. The thermal radiation emitted from the silicon rods is reflected and absorbed using a thermal radiation shield in the interior space of the bell jar. The thermal radiation shield is secured in opposing relationship to the inner wall of the bell jar. The thermal radiation shield is substantially opaque to the thermal radiation emitted from the silicon rods.
Various refinements exist of the features noted in relation to the above-mentioned aspects. Further features may also be incorporated in the above-mentioned aspects as well. These refinements and additional features may exist individually or in any combination. For instance, various features discussed below in relation to any of the illustrated embodiments may be incorporated into any of the above-described aspects, alone or in any combination.
Referring now to the drawings, and in particular to
The bell jar 10 also includes a dome-shaped top 16 (
Referring to
Each of the upper and lower rows of shield members 32 span substantially an entire circumference of the inner wall 12 of the bell jar 10, and together, the upper and lower rows span along substantially an entire height of the inner wall from adjacent the open bottom of the bell jar 10 to adjacent the dome-shaped top 16 of the bell jar. The shield 30 opposes or covers at least a majority of the interior surface area of the inner wall 12, and may cover at least about 80% of the interior surface area of the inner wall, and more suitably at least about 88% of the interior surface area of the inner wall and about 67.5% of the combined interior surface of the inner wall and the dome-shaped top 16. The shield 30 may oppose or cover other percentages of the interior surface area of the inner wall 12 without departing from the scope of the present disclosure. Moreover, in other embodiments the shield 30 may also oppose or cover a portion or a majority of the dome-shaped top 16.
In the illustrated embodiment (
Referring to
Each shield member 32 has an opening 48 in an upper portion thereof that is sized and shaped to receive one of the hangers 36. In particular, the opening 48 is sized and shaped to allow the shield member 32 to be moved over and past the upper lip 40 of the hanger 36. The upper lip 40 acts as a stop that inhibits the shield member 32 from unintentionally slipping off the hanger 36; the shield member 32 must be lifted upward and then moved inward toward the center of the interior space 14 in order to remove the shield member from the hanger 36. With the body member 36a of the hanger 36 received in the opening 48, an upper peripheral margin partially defining the opening 48 rests on the upper surface of the body member.
In the illustrated embodiment, upper and lower rails or platforms 50 are secured, such as by welding, to the inner wall 12 and span circumferentially around the inner wall. Bottoms of the shield members 32 rest on the respective platforms 50 to provide additional support to the shield members and to inhibit the shield members from hitting adjacent shield members when the bell jar 10 is moved, particularly when the bell jar is lifted upward to remove the rods from the reactor. In the illustrated embodiment, the lower platform 50 has a recess or groove 51 in an upper surface thereof in which the bottoms of the shield members are received. Although not shown, the upper platform 50 may also have a groove. Alternatively, both of the platforms may have substantially planar upper surfaces or other contours without departing from the scope of the present invention. In one embodiment, the shield members 32 hang from the respective hangers 36 and rest on the respective platforms 50 so that the shield members are spaced apart from (i.e., are not in contact with) the inner wall 16. In other examples, the bell jar 10 may not include one or more of the platforms 50, and the shield members 32 may thereby hang freely from the hanger 36. For example, the upper platform 50 may be omitted.
As shown best in
The total number and the dimensions of the shield members 32 and the arrangement of the shield members in the bell jar 10 (e.g., the number of rows, including a single row) are dependent on the size of the bell jar for a particular reactor. In the illustrated embodiment, the bell jar 10 is sized and shaped to process 12-18 silicon rods during a single CVD process. In such a bell jar 10 and as illustrated, the thermal radiation shield 30 may suitably comprise two rows of shield members 32 (i.e., an upper row and a lower row). One example of a bell jar 10 sized and shaped for 12-18 rods may include 32 shield members 32 in each row. Moreover, in such a bell jar 10, each shield member 32 (
During operation of the reactor, electrical energy from the source of electrical energy is applied to the silicon rods in the interior space 14 of the bell jar 10. The inherent electrical resistance of the silicon rods converts the electrical energy into thermal energy or heat. The thermal energy is transferred by conduction to the reactant gas that contacts the exposed surfaces of the rods, which promotes reactions on the surfaces of the silicon rods to produce polysilicon deposits on the rod surfaces. A majority of the thermal energy is emitted from the surfaces of the rods as thermal radiation. However, because the reactant gases are transparent to the thermal radiation, this thermal energy is not transferred directly to the gases and does not contribute to heating of the gases. The thermal radiation shield 30 is substantially opaque to the thermal radiation and inhibits at least a majority of the thermal radiation emitted from the heated silicon rods, which would otherwise be incident upon the metal inner wall 16, from reaching the inner wall.
In the embodiment where the thermal radiation shield 30 comprises a plurality of silicon shield member 32, it is believed that about 80% of the thermal radiation that is incident upon the shield is absorbed by the shield members. This value is determined by the emissivity of silicon, which is about 0.8 according to literature. The absorbed thermal radiation tends to increase the internal energy of the shield members 32. Thus, the shield members 32 emit thermal radiation, according to their temperatures, in all directions including toward the inner wall 12. However, the shield members 32 are at a much lower temperature than the silicon rods, and therefore, incident thermal radiation from the shield members is less than incident thermal radiation from the silicon rods. Accordingly, less heat must be removed by the cooling jacket 18 as compared to using an unmodified bell jar 10 that does not include the thermal radiation shield 30.
Since silicon is substantially opaque (the coefficient of transmission of silicon is negligible), each of the silicon shield members 32 also reflect about 20% of the incident thermal radiation back toward the silicon rods. This reflected radiation may then be absorbed by the silicon rods to add heat to the rods, which in turn, conduct heat to the reactant gases at the surfaces of the rods.
Based on CFD simulations, the silicon shield 30 may reduce thermal radiation incident on the inner wall 16 by about 30-48% depending on the type of reactor. Without being held to any particular theory, the thermal radiation shield may have a more significant impact on smaller reactors (e.g., 12-18 rod reactors) and less of an impact on larger reactors (e.g., 54 rod reactors) because incident thermal radiation on the shield members 32 is more intense in the smaller reactors. This may be because there are less silicon rods, as compared to the larger reactors, to impede thermal radiation from reaching the shield.
Because the silicon shield 30 reduces incident thermal radiation on the inner wall 16 and reflects and emits thermal radiation back toward the silicon rods, the thermal radiation shield should increase the energy efficiency of the Siemens reactor. Based on CFD simulation, the total energy necessary to complete one CVD process in Siemens reactor including modified bell jar 12 with the thermal radiation shield 30 is decreased by about 20% to about 30% as compared to CVD process using an unmodified bell jar with the Siemens reactor.
This written description uses examples to disclose the invention, including the best mode, and also to enable any person skilled in the art to practice the invention, including making and using any devices or systems and performing any related methods. The patentable scope of the invention may include other examples that occur to those skilled in the art. Such other examples are intended to be within the scope of the invention.
The order of execution or performance of the operations in embodiments of the invention illustrated and described herein is not essential, unless otherwise specified. That is, the operations may be performed in any order, unless otherwise specified, and embodiments of the invention may include additional or fewer operations than those disclosed herein. For example, it is contemplated that executing or performing a particular operation before, contemporaneously with, or after another operation is within the scope of aspects of the invention.
When introducing elements of the present invention or the embodiments thereof, the articles “a”, “an”, “the” and “said” are intended to mean that there are one or more of the elements. The terms “comprising”, “including” and “having” are intended to be inclusive and mean that there may be additional elements other than the listed elements.
As various changes could be made in the above constructions without departing from the scope of the invention, it is intended that all matter contained in the above description and shown in the accompanying drawings shall be interpreted as illustrative and not in a limiting sense.
Number | Date | Country | Kind |
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TO2010A000278 | Apr 2010 | IT | national |