Number | Date | Country | Kind |
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2-153717 | Jun 1990 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
4012757 | Koo | Mar 1977 | |
4508749 | Brannon et al. | Apr 1985 | |
4523372 | Balda et al. | Jun 1985 | |
4805071 | Hutter et al. | Feb 1989 | |
5006480 | Chang et al. | Apr 1991 |
Entry |
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Wafer Charging and Beam Interactions In Ion Implantation, White et al., Solid State Technology/Feb. 1985, pp. 151-158. |
A Method Of Surface Charge Neutralization During Ion Implantation, King et al., Nuclear Instruments and Methods in Physics Research B21 (1987) 396-399, North-Holland, Amsterdam (North-Holland Physics Publishing Division). |