Claims
- 1. A system for measuring the characteristics of a thin film layer on the surface of a sample, comprising:
an X-ray source for generating a first probe beam of X-rays; a focusing element for focusing said first probe beam on the surface of said sample such that various X-rays within the focused probe beam create a range of angles of incidence with respect to said surface; a first detector for measuring the intensity of various X-rays as a function of position within the probe beam as reflected, with the positions of the X-rays within said reflected probe beam corresponding to specific angles of incidence with respect to said surface; a light source for generating a second probe beam directed to reflect off the sample; a second detector for monitoring the second probe beam after reflection from the sample and generating second output signals in response thereto, said second output signals being indicative of the tilt of the sample; and a processor capable of utilizing the second output signals to either adjust said tilt or to correct the X-ray intensity measurements to account for said tilt.
- 2. A system according to claim 1, wherein:
said second detector measures changes in an angular direction of the reflected second probe beam in order to provide information about the tilt of the sample
- 3. A system according to claim 1, wherein:
the second detector is a position sensitive detector.
- 4. A system according to claim 1, wherein:
the second detector is further capable of using the second output signals to determine a vertical position of the sample.
- 5. A system according to claim 1, further comprising:
an adjustable stage for supporting the sample.
- 6. A system according to claim 5, wherein:
the processor is further capable of utilizing the second output signals to adjust a vertical position of the sample to keep the first probe beam in focus on the sample surface by sending a control signal to the adjustable stage.
- 7. A system according to claim 5, wherein:
the processor utilizes the second output signals to adjust the tilt of the sample by sending a control signal to the adjustable stage.
- 8. A system according to claim 1, further comprising:
an additional focusing element for focusing said second probe beam on the surface of said sample whereby at least one ray of the focused second probe beam is substantially normal to said surface of said sample.
- 9. A system according to claim 1, wherein:
the light source is a laser light source.
- 10. A system for measuring the characteristics of a thin film layer on the surface of a sample, comprising:
an X-ray source for generating a first probe beam of X-rays; a focusing element for focusing said first probe beam on the surface of said sample such that various X-rays within the focused probe beam create a range of angles of incidence with respect to said surface; a first detector for measuring the intensity of various X-rays as a function of position within the probe beam as reflected, with the positions of the X-rays within said reflected probe beam corresponding to specific angles of incidence with respect to said surface; a light source for generating a second probe beam directed to reflect off the sample; a second detector for monitoring the second probe beam after reflection from the sample and generating second output signals in response thereto, said second output signals being indicative of a vertical position of the sample; and a processor capable of utilizing the second output signals to either adjust said vertical position relative to a focus of said focused first probe beam or to correct the X-ray measurements to account for the relative vertical position.
- 11. A system according to claim 10, wherein:
the second detector is a position sensitive detector.
- 12. A system according to claim 10, wherein:
said second detector is further capable of measuring changes in an angular direction of the reflected second probe beam in order to provide information about the tilt of the sample.
- 13. A system according to claim 10, further comprising:
an adjustable stage for supporting the sample.
- 14. A system according to claim 13, wherein:
the processor adjusts the vertical position of the by sending a control signal to the adjustable stage.
- 15. A system according to claim 13, wherein:
the processor is further capable of utilizing the second output signals to adjust a tilt of the sample by sending a control signal to the adjustable stage.
- 16. A system according to claim 10, further comprising:
an additional focusing element for focusing said second probe beam on the surface of said sample whereby at least one ray of the focused second probe beam is substantially normal to said surface of said sample.
- 17. A system according to claim 10, wherein:
the light source is a laser light source.
CLAIM OF PRIORITY
[0001] This application is a continuation of U.S. patent application Ser. No. 10/643,348, filed Aug. 19, 2003, which is a divisional of U.S. patent application Ser. No. 10/124,776, filed Apr. 17, 2002, which is a divisional of U.S. patent application Ser. No. 09/527,389, filed Mar. 16, 2000, now U.S. Pat. No. 6,453,006 B1.
Divisions (2)
|
Number |
Date |
Country |
Parent |
10124776 |
Apr 2002 |
US |
Child |
10643348 |
Aug 2003 |
US |
Parent |
09527389 |
Mar 2000 |
US |
Child |
10124776 |
Apr 2002 |
US |
Continuations (1)
|
Number |
Date |
Country |
Parent |
10643348 |
Aug 2003 |
US |
Child |
10861120 |
Jun 2004 |
US |