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4680061 | Lamont, Jr. | Jul 1987 | |
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5155652 | Logan et al. | Oct 1992 | |
5160152 | Toraguchi et al. | Nov 1992 | |
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5213349 | Elliott | May 1993 | |
5270266 | Hirano et al. | Dec 1993 | |
5315473 | Collins et al. | May 1994 | |
5320982 | Tsubone et al. | Jun 1994 | |
5345999 | Hosokawa | Sep 1994 | |
5350479 | Collins et al. | Sep 1994 | |
5384682 | Watanabe et al. | Jan 1995 | |
5413360 | Atari et al. | May 1995 |
Number | Date | Country |
---|---|---|
357424 | Mar 1990 | EPX |
0452222 | Oct 1991 | EPX |
473930 | Mar 1992 | EPX |
1-251735 | Oct 1989 | JPX |
Entry |
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IBM Technical Disclosure Bulletin, vol. 31, No. 1, Jun. 1988, Electrostatic Wafer Holder for Wafer Cooling During Reactive Ion Etching, pp. 462-464. |