Details of electrostatic chucks

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CPC
H01L21/6833

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/6833Details of electrostatic chucks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Edge seal for lower electrode assembly
- Patent number 12,368,025
- Issue date Jul 22, 2025
- Lam Research Corporation
- David Schaefer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, apparatus, and system for dynamically controlling an electr...
- Patent number 12,368,067
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Yixiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and semiconductor processing apparatus
- Patent number 12,362,217
- Issue date Jul 15, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and semiconductor fabrication method us...
- Patent number 12,362,216
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Daehyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder and methods of use
- Patent number 12,362,218
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chi Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 12,362,149
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage and manufacturing method thereof
- Patent number 12,354,901
- Issue date Jul 8, 2025
- NHK Spring Co., Ltd.
- Hibiki Yokoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus and display panel manufacturing apparatus incl...
- Patent number 12,354,903
- Issue date Jul 8, 2025
- Samsung Display Co., Ltd.
- Gyungmin Baek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,354,890
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Shota Ezaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, substrate processing apparatus, and substrate...
- Patent number 12,354,852
- Issue date Jul 8, 2025
- Semes Co., Ltd.
- Hyun Tak Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,354,849
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Gyeong min Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic material having high resistivity and high corrosion resista...
- Patent number 12,354,900
- Issue date Jul 8, 2025
- NGK Insulators, Ltd.
- Akiyoshi Hattori
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,347,658
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Ryota Sakane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning electrostatic chuck
- Patent number 12,347,716
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yueh-Lin Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck device power supply, electrostatic chuck device...
- Patent number 12,347,715
- Issue date Jul 1, 2025
- Hamamatsu Photonics K.K.
- Takahiro Tsuchiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for cryogenic applications
- Patent number 12,347,659
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,340,985
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for semiconductor manufacturing apparatus
- Patent number 12,340,990
- Issue date Jun 24, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support unit and substrate treating apparatus
- Patent number 12,341,030
- Issue date Jun 24, 2025
- Semes Co., Ltd.
- Kyung Man Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature control apparatus for semiconductor processing equipmen...
- Patent number 12,341,037
- Issue date Jun 24, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck including a heater element with mutiple heating...
- Patent number 12,341,049
- Issue date Jun 24, 2025
- Toto Ltd.
- Akihito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous plug for electrostatic chuck gas delivery
- Patent number 12,341,048
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Alexander Sulyman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 12,341,050
- Issue date Jun 24, 2025
- Toto Ltd.
- Akihito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support gap pumping to prevent glow discharge and light-up
- Patent number 12,334,383
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- James David Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for minimizing substrate backside damage
- Patent number 12,334,384
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Liangfa Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cryogenic micro-zone electrostatic chuck connector assembly
- Patent number 12,331,984
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter device and plasma processing apparatus
- Patent number 12,334,309
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tunable temperature controlled substrate support assembly
- Patent number 12,334,385
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier chuck and methods of forming and using thereof
- Patent number 12,327,749
- Issue date Jun 10, 2025
- Intel Corporation
- Deniz Turan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck device, pressure calculation method and program
- Patent number 12,327,750
- Issue date Jun 10, 2025
- Horiba Stec, Co., Ltd.
- Lei Ma
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS
- Publication number 20250239476
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250233001
- Publication date Jul 17, 2025
- TOTO LTD.
- Yuki SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BASE, ELECTROSTATIC CHUCK DEVICE, AND MANUFACTURING METHOD OF BASE
- Publication number 20250233010
- Publication date Jul 17, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Yuya Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250226256
- Publication date Jul 10, 2025
- Tomoegawa Corporation
- Ryouji Shikata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...
- Publication number 20250226188
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Jung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Susceptor For High Temperature Semiconductor Process
- Publication number 20250226257
- Publication date Jul 10, 2025
- MICO CERAMICS LTD.
- Mina Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS
- Publication number 20250226255
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Arvinder Manmohan Singh Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER
- Publication number 20250218845
- Publication date Jul 3, 2025
- KYOCERA CORPORATION
- Tomoya TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250218846
- Publication date Jul 3, 2025
- HITACHI HIGH-TECH CORPORATION
- Tomoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20250218746
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- In Hee KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218844
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Iksu Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218843
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Iksu BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND METHOD
- Publication number 20250218741
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jin Hyeok KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250210326
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUSCEPTOR
- Publication number 20250210396
- Publication date Jun 26, 2025
- MiCo Ceramics Ltd.
- Jung-Chul Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE SUPPORT UNIT
- Publication number 20250210395
- Publication date Jun 26, 2025
- SEMES CO., LTD.
- Kuk Saeng KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20250210394
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Masaki ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HANDLING ASSEMBLY, HANDLING SYSTEM AND METHOD
- Publication number 20250210392
- Publication date Jun 26, 2025
- Intel Corporation
- Bhaskar Jyoti KRISHNATREYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20250210393
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Masaki ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20250210397
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Masaki ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE
- Publication number 20250210408
- Publication date Jun 26, 2025
- NHK Spring Co., Ltd.
- Jun FUTAKUCHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESC DESIGN WITH ENHANCED TUNABILITY FOR WAFER FAR EDGE PLASMA PROFI...
- Publication number 20250201538
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Jian LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD
- Publication number 20250201601
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Kazuhito YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER CIRCUIT, CONTROLLING METHOD THEREOF, AND SUBSTRATE PROCESSIN...
- Publication number 20250201615
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Byeong Hyeon KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE STRUCTURE OF AN ELECTROSTATIC CHUCK AND METHOD FOR FORMING...
- Publication number 20250191955
- Publication date Jun 12, 2025
- Feedback Technology Corp.
- Tsung-Feng Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK DEVICE AND COOLING PLATE
- Publication number 20250191956
- Publication date Jun 12, 2025
- HORIBA STEC, CO., LTD.
- Esteban GONZALEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH CLAMP FORCE ELECTROSTATIC CHUCK FOR NON-FLAT SUBSTRATES
- Publication number 20250191957
- Publication date Jun 12, 2025
- Entegris, Inc.
- Steven Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250191960
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Hyun Sun CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUSCEPTOR
- Publication number 20250191954
- Publication date Jun 12, 2025
- NGK Insulators, Ltd.
- Yutaka UNNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Assembly for Plasma Processing Apparatus
- Publication number 20250191958
- Publication date Jun 12, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS

Details of electrostatic chucks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Edge seal for lower electrode assembly

Method, apparatus, and system for dynamically controlling an electr...

Electrostatic chuck and semiconductor processing apparatus

Plasma processing apparatus and semiconductor fabrication method us...

Substrate holder and methods of use

Film stress control for plasma enhanced chemical vapor deposition

Stage and manufacturing method thereof

Deposition apparatus and display panel manufacturing apparatus incl...

Stage and plasma processing apparatus

Electrostatic chuck, substrate processing apparatus, and substrate...

Plasma processing apparatus

Ceramic material having high resistivity and high corrosion resista...

Stage and plasma processing apparatus

Method for cleaning electrostatic chuck

Electrostatic chuck device power supply, electrostatic chuck device...

Electrostatic chuck assembly for cryogenic applications

Plasma processing apparatus and plasma processing method

Member for semiconductor manufacturing apparatus

Support unit and substrate treating apparatus

Temperature control apparatus for semiconductor processing equipmen...

Electrostatic chuck including a heater element with mutiple heating...

Porous plug for electrostatic chuck gas delivery

Electrostatic chuck

Substrate support gap pumping to prevent glow discharge and light-up

Methods and apparatus for minimizing substrate backside damage

Cryogenic micro-zone electrostatic chuck connector assembly

Filter device and plasma processing apparatus

Tunable temperature controlled substrate support assembly

Carrier chuck and methods of forming and using thereof

Electrostatic chuck device, pressure calculation method and program

Patents Applicationslast 30 patents

ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS

ELECTROSTATIC CHUCK

BASE, ELECTROSTATIC CHUCK DEVICE, AND MANUFACTURING METHOD OF BASE

ELECTROSTATIC CHUCK

PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...

Susceptor For High Temperature Semiconductor Process

EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS

SAMPLE HOLDER

PLASMA PROCESSING APPARATUS

APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE

SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS AND METHOD

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

CERAMIC SUSCEPTOR

SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE SUPPORT UNIT

MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT

HANDLING ASSEMBLY, HANDLING SYSTEM AND METHOD

MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT

MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT

STAGE

ESC DESIGN WITH ENHANCED TUNABILITY FOR WAFER FAR EDGE PLASMA PROFI...

PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASUREMENT METHOD

HEATER CIRCUIT, CONTROLLING METHOD THEREOF, AND SUBSTRATE PROCESSIN...

SURFACE STRUCTURE OF AN ELECTROSTATIC CHUCK AND METHOD FOR FORMING...

ELECTROSTATIC CHUCK DEVICE AND COOLING PLATE

HIGH CLAMP FORCE ELECTROSTATIC CHUCK FOR NON-FLAT SUBSTRATES

SUBSTRATE PROCESSING APPARATUS

CERAMIC SUSCEPTOR

Electrostatic Chuck Assembly for Plasma Processing Apparatus