Patent Application
20120216155
1. Field of the Invention
The present invention relates to a checking method for mask design of an integrated circuit, and more particularly, to a method for checking mask design of an integrated circuit according to implant layer data of each functional element of the integrated circuit.
2. Description of the Prior Art
Mask design is a necessary and important step during design and manufacturing processes of an integrated circuit. In the step of mask design, a corresponding mask pattern of each implant layer is generated according to circuit design of the integrated circuit. Thereafter, ions are implanted at the corresponding positions of the implant layers by using the mask in order to manufacture the integrated circuit. If the mask design is incorrect, such that the ions are implanted in an unwanted area, or not implanted in a targeted area, the integrated circuit may not work properly or even cannot work. Therefore, a final check is necessary in the step of mask design.
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However, in the prior art, the method for checking the mask design is performed by human eyes. It is very time consuming, and may cause mistakes if the person checking does not pay attention. Therefore, the checking method of the prior is inefficient.
The present invention provides a checking method for mask design of an integrated circuit, wherein the integrated circuit comprises a plurality of functional elements arranged at different positions, the method comprising generating implant layer data of each functional element of the integrated circuit according to characteristics of each functional element; generating mask design data of the integrated circuit according to circuit design of the integrated circuit; generating a block diagram of the integrated circuit according to the mask design data; determining a corresponding position of the functional element in the block diagram according to the implant layer data; and comparing the implant layer data of the functional element with the mask design data at the corresponding position.
These and other objectives of the present invention will no doubt become obvious to those of ordinary skill in the art after reading the following detailed description of the preferred embodiment that is illustrated in the various figures and drawings.
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However, the block diagram 200 of the integrated circuit generated according to the mask design data of the integrated circuit cannot specify the corresponding position of each functional element A, B, C, D or E in the block diagram 200. Therefore, the method of the present invention further determines the corresponding positions of the functional elements A, B, C, D and E in the block diagram 200 according to the implant layer data of the functional elements A, B, C, D and E. For example, please refer to
After determining the corresponding positions of the functional elements A, B, C, D and E in the block diagram 200, the method of the present invention further compares the implant layer data of the functional elements A, B, C, D and E with the mask design data at the corresponding positions in order to check whether the mask design date is incorrect. For example, after determining the corresponding positions of the functional element A in the block diagram 200, the method of the present invention compares the implant layer data of the functional element A with the mask design data at the corresponding position. In the mask design data, if the functional element A is implanted with ions only at the implant layer a, then the mask design data of the functional element A is correct. If the functional element A is not implanted with ions at the implant layer a, or implanted with ions at other implant layers (ex. implanted with ions at implant layer b), then the mask design data of the functional element A is incorrect. The method of the present invention checks whether the mask design date of other functional elements B, C, D and E is correct in the same way.
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Step 410: Generate implant layer data of each functional element of an integrated circuit according to characteristics of each functional element;
Step 420: Generate mask design data of the integrated circuit according to circuit design of the integrated circuit;
Step 430: Generate a block diagram of the integrated circuit according to the mask design data;
Step 440: Determine a corresponding position of the functional element in the block diagram according to the implant layer data;
Step 450: Compare the implant layer data of the functional element with the mask design data at the corresponding position; and
Step 460: Generate a comparing result after comparing the implant layer data of the functional element with the mask design data at the corresponding position.
Basically, to achieve the same result, the steps of the flowchart 400 need not be in the exact order shown and need not be contiguous, that is, other steps can be inserted between, such as performing design rule check, and converting data format of the mask design data of the integrated circuit. The above steps can be automatically performed by a computer. In addition, the comparing result of step 460 can comprise not only the information of whether the mask design data of the functional element is correct, but also the information of un-checked area of the block diagram 200 for further checking of the un-checked area.
Summarizing the above, the present invention provides a method for checking the mask design data of the integrated circuit by comparing the implant layer data of the functional element with the mask design data at the corresponding position. In contrast to the prior art, the checking method of the present invention can be automatically performed by a computer in order to check the mask date of the integrated circuit in a quick, accurate and efficient way.
Those skilled in the art will readily observe that numerous modifications and alterations of the device and method may be made while retaining the teachings of the invention.
