Claims
- 1. An apparatus for solid phase chemical synthesis comprising:
- i) a substrate having one or more synthesis intermediates bound thereon, the one or more synthesis intermediates including a reactive group protected from reaction by a removable protecting group attached by a chemical bond to the one or more synthesis intermediates;
- ii) a radiation sensitive compound or group, said radiation sensitive compound or group producing a catalyst when irradiated, and
- iii) an autocatalytic compound or group, said autocatalytic compound or group generating a protecting group removing product when said autocatalytic compound is activated by said catalyst,
- wherein the radiation sensitive compound or group and the autocatalytic compound or group are included in a polymer layer on the substrate and further wherein the radiation sensitive compound or group and the autocatalytic compound or group are nonidentical and wherein the catalyst and autocatalytic compound or group are nonidentical.
- 2. The apparatus recited in claim 1 wherein said radiation sensitive compound is a photosensitive compound.
- 3. The apparatus recited in claim 1 wherein said autocatalytic compound is a masked acid.
- 4. The apparatus recited in claim 1 wherein said synthesis intermediate is a linker molecule.
- 5. The apparatus recited in claim 1 wherein said synthesis intermediate is a nucleotide.
- 6. The apparatus recited in claim 1 wherein said synthesis intermediate is an polynucleotide.
- 7. The apparatus recited in claim 1 wherein said synthesis intermediate is an amino acid.
- 8. The apparatus recited in claim 1 wherein said synthesis intermediate is an polypeptide.
- 9. The apparatus recited in claim 1 wherein said removable protecting group is an acid removable group.
- 10. The apparatus recited in claim 1 wherein said autocatalytic compound is pentafluorobenoic acid.
- 11. The apparatus recited in claim 1 wherein said acid removable protecting group is 5' dimethoxytrityl.
- 12. The apparatus of claim 1 wherein the protecting group is selected from the group consisting of dimethoxytrityl (DMT), tert-butylcarbamate (tBoc), trifluoroacetyl (Tfa), 9-fluorenylmethoxycarbonyl (Fmoc), isobutyrl (iBu), benzoyl (Bz), phenoxyacetyl (pac), acetamidomethyl, acetyl, tert-amyloxycarbonyl, benzyl, benzyloxycarbonyl, 2-(4-biphenylyl)-2-propyloxycarbonyl, 2-bromobenzyloxycarbonyl, tert-butyl, tert-butyloxycarbonyl, 1-carbobenzoxamido-2,2,2-trifluoroethyl, 2,6-dichlorobenzyl, 2-(3,5-dimethoxyphenyl)-2-propyloxycarbonyl, 2,4-dinitrophenyl, dithiasuccinyl, formyl, 4-methoxybenzenesulfonyl, 4-methoxybenzyl, 4-methylbenzyl, o-nitrophenylsulfenyl, 2-phenyl-2-propyloxycarbonyl, .alpha.-2,4,5-tetramethylbenzyloxycarbonyl, p-toluenesulfonyl, xanthenyl, benzyl ester, N-hydroxysuccinimide ester, p-nitrobenzyl ester, p-nitrophenyl ester, phenyl ester, p-nitrocarbonate, p-nitrobenzylcarbonate, trimethylsilyl and pentachlorophenyl ester.
- 13. The apparatus recited in claim 2 wherein said photosensitive compound is a photoactivated acid catalyst.
- 14. The apparatus recited in claim 2 wherein said photosensitive compound is a photoactivated catalyst.
- 15. The apparatus recited in claim 14 wherein said photoactivated catalyst is toluenesulfonic acid.
- 16. The apparatus of claim 14 wherein the photoactivated catalyst is a member selected from the group consisting of naphthoquinone diazide sulfonic acids, 2,1,4-diazonaphthoquinone sulfonic acid esters, 2,1,5-diazonaphthoquinone sulfonic acid esters, nitrobenzyl esters, s-triazine derivatives of nitrobenzyl esters, 1,1-bis(p-chorophenyl)-2,2,2-trichloroethane (DDT), 1,1-bis(p-methoxyphenyl)-2,2,2-trichloroethane, 1,2,5,6,9,10-hexabromocyclododecane, 1,10-dibromodecane, 1,1-bis(p-chlorophenyl)-2,2-dichloroethane, 4,4 dichloro-2-(trichloromethyl) benzhydrol (Kelthane), hexachlorodimethyl sulfone, 2-chloro-6-(trichloromethyl)pyridine, o,o-diethyl-o-(3,5,6-trichloro-2-pyridyl) phosphorothionate, 1,2,3,4,5,6-hexachlorocyclohexane, N(1,1-bis(p-chlorophenyl)-2,2,2-trichloroethyl)acetamide, tris (2,3-dibromopropyl) isocyanurate, 2,2-bis(p-chlorophenyl-1,1-dichloroethylene, tris (trichloromethyl) striazine, 1,1-bis(chlorophenyl)-2,2,2-trichloroethanol, tris(1,2,3-methanesulfonyl) benzene, tris(trichloromethyl)trizine, onium salts, diaryl-diazonium salts, onium salts of group VI and VII of the Periodic Table, halonium salts, quaternary ammonium, phosphonium and arsonium salts, aromatic sulfonium salts, sulfoxonium salts, seleonium salts, sulfonated esters, sulfonyloxy ketones, benzoin tosylate, t-butylphenyl alpha-(ptoluenesulfonyloxy)-acetate, t-butyl alpha-(p-toluenesulfonyloxy)-acetate, di-tert-butylphenyl iodonium triflate (TBI-T), di-tertbutylphenliodonium camphorsulfonate (TBI-CAM), di-tert-butylphenyl iodonium dichloracetate (TBI-DCA), naphthalimidotriftete, phthalimidotosylate, o-nitrobenzyl esters of toluenesulfonic acid, 2-nitro-3,4-dimethoxybenzyl tosylate, ##STR9## wherein R is sulfonate, tosylate, mesolate, PF.sub.6.sup.- or BF.sub.4.sup.-.
- 17. A substrate for use in making a polymer array comprising:
- a) a substrate having one or more synthesis intermediates bound thereon, the one or more synthesis intermediates having a reactive group protected from reaction by a protective group attached by a chemical bond to the one or more synthesis intermediates;
- b) a catalyst system for catalyzing removal of the protective group, the catalyst system contacting the synthesis intermediates and
- wherein the catalyst system is included in a polymer layer on the substrate and further wherein the catalyst system and the protective group are nonidentical.
- 18. A method of making a substrate for use in making a polymer array comprising:
- a) providing a substrate surface having one or more synthesis intermediates bound thereon, the one or more synthesis intermediates having a reactive group protected from reaction by a protective group attached by a chemical bond to the one or more synthesis intermediates;
- b) applying over the substrate surface a polymer layer having a catalyst system capable of catalyzing removal of the protective group.
STATEMENT OF RELATED APPLICATIONS
This application claims priority to United States Provisional Application Serial No. 60/030,826 filed Nov. 14, 1996, hereby incorporated by reference in its entirety.
US Referenced Citations (10)
Foreign Referenced Citations (1)
Number |
Date |
Country |
WO 8910977 |
Nov 1989 |
WOX |