Claims
- 1. A method of manufacturing a chip electronic part, comprising the steps of:forming a conductor pattern on the surface of a ceramic member; forming an insulating protective layer on said conductor pattern; forming grooves in said insulating protective layer near an end face of said insulating protective layer; and forming external electrodes on end faces of said insulating protective layer, the external electrodes extending from the end faces of said insulating protective layer no further than said grooves.
- 2. A method according to claim 1, wherein said step of forming a conductor pattern includes photolithography.
- 3. A method according to claim 1, wherein said step of forming external electrodes includes the steps of:forming an undercoating layer by a dry plating process; forming a second layer by wet plating; and forming a third layer by wet plating.
- 4. A method according to claim 3, wherein said dry plating process step includes a process selected from the group consisting of sputtering, ionplating, and deposition.
- 5. A method according to claim 3, wherein said wet plating process steps include electrolytic plating processes.
- 6. A method according to claim 1, wherein said step of forming grooves includes forming said grooves running from one side to the other side of the ceramic member near corresponding end faces of said insulating protective layer.
- 7. A method according to claim 1, wherein said step of forming grooves includes forming said grooves on corners of said insulating protective layer.
- 8. A method according to claim 1, further comprising the step of forming leading electrodes leading from said conductor pattern to end faces of said ceramic member.
Parent Case Info
This application is a divisional, of application Ser. No. 08/921,508, filed Sep. 2, 1997.
US Referenced Citations (8)