COLORED DEVICE CASING AND SURFACE-TREATING METHOD FOR FABRICATING SAME

Abstract

A colored device casing includes a base, a color layer and a bonding layer. The base has at least one smooth region, and the color layer is located over the smooth region of the base. The color layer includes titanium, and has a value for L* in the range from 51.55 to 52.55, a value for a* in the range from 13.12 to 14.12 and a value for b* in the range from 6.27 to 7.27 according to the Commission Internationale del'Eclairage, (CIE, International Commission on Illumination) LAB system. The bonding layer is located between the substrate and the color layer, providing adhesion therebetween. A surface-treating method for fabricating the colored casing is also provided.

Description

BACKGROUND

1. Technical Field

The present disclosure relates to device casings, and particularly, to a casing colored by physical vapor deposition (PVD).

2. Description of Related Art

Colored device casings are usually formed by injection of colored plastic or spraying paint on a surface of a casing. However, neither method provides attractive metal texture. Furthermore, metal coating technology is complicated and difficult to control, so only a few colors are available for metal casings.

Therefore, it is desirable to provide a casing and a method for fabricating the casing which can overcome the described limitations.

BRIEF DESCRIPTION OF THE DRAWINGS

Many aspects of the disclosure can be better understood with reference to the drawings. The components in the drawings are not necessarily drawn to scale, the emphasis instead being placed upon clearly illustrating the principles of the present colored device casing and method for fabricating the casing. Moreover, in the drawings, like reference numerals designate corresponding parts throughout various views.

FIG. 1 is a schematic view of a mobile phone with a colored device casing according to an embodiment of the present disclosure.

FIG. 2 is a schematic cross section of part of the colored device casing shown in FIG. 1, showing, inter alia, a color layer.

FIG. 3 is a schematic diagram illustrating the L* value of the color layer shown in FIG. 2 according to the Commission Internationale del'Eclairage, (CIE, International Commission on Illumination) LAB system.

FIG. 4 is a schematic diagram illustrating the a* value and the b* value of the color layer shown in FIG. 2 according to the CIE LAB system.

FIG. 5 is a flowchart illustrating an exemplary surface-treating method for fabricating a colored device casing, such as, for example, that of FIG. 1.

DETAILED DESCRIPTION

Embodiments of the disclosure will now be described in detail with reference to the accompanying drawings.

Referring to FIG. 1 and FIG. 2, a first embodiment of the present disclosure provides a colored device casing 10 including a base 1, a bonding layer 2, a color layer 3 and an optional coating layer 4. The colored device casing 10 in this embodiment is a casing of a mobile phone, but is not limited thereto. The bonding layer 2 is located on and covers the base 1; the color layer 3 is located on and covers the bonding layer 2; and the coating layer 4 is located on and covers the color layer 3.

The base 1 can be metal such as steel, or ceramic, or glass. The base 1 includes at least one surface to be coated, which includes at least one smooth region.

The smooth region is also referred to as a high-gloss or a mirror-like region. It is noted that the base 1 may include many surfaces to be coated, each surface including many different surface conditions. For example, the base 1 may include both a high-gloss region and a matte region.

The bonding layer 2 is formed between the base 1 and the color layer 3 for connection therebetween. Thus, the bonding layer 2 can include any material providing proper adhesion, such as chromium nitride (CrN).

The color layer 3 is configured to provide desired color, and includes one or more metal layers, such as a layer of an alloy of titanium (Ti) and aluminum (Al).

The coating layer 4 can include any appropriate material for protection, such material providing pollution resistance, electrical insulation, moisture insulation, and/or mechanical hardness.

The colored device casing 10 including the base 1, the bonding layer 2 and the color layer 3 without the coating layer 4 may exhibit a Vickers hardness equaling or exceeding 400 HV.

Referring to FIG. 3 and FIG. 4, the color layer 3 located above the base 1 and the bonding layer 2 in the smooth region includes a value for L* between 51.55 and 52.55, a value for a* between 13.12 and 14.12 and a value for b* between 6.27 and 7.27 according to the Commission Internationale del'Eclairage, (CIE, International Commission on Illumination) LAB system.

FIG. 5 shows an exemplary surface-treating method for fabricating a colored device casing such as, for example, the colored device casing 10. In the method, first, a base 1 is provided. The base 1 may undergo certain surface-treatments in advance as required. For instance, a pre-cleaning step may be carried out on the base 1, or the roughness of the base 1 may be enhanced to better support a subsequently formed bonding layer 2.

Subsequently, a bonding layer 2 is formed on a predetermined surface or region of the base 1. The bonding layer 2 may be formed by PVD, especially PVD sputtering. In one embodiment, argon plasma is excited at a flow rate from 27 to 33 standard cubic centimeters per minute (sccm) by a radio frequency (RF) generator to bombard a chromium target, and nitrogen gas is supplied at a flow rate from 108 to 132 sccm. As a result, chromium vapor is generated and combines with the nitrogen gas, and chromium nitride is obtained and deposits on the base 1.

Thereafter, a color layer 3 is formed on the bonding layer 2. This may include sputtering PVD with argon plasma excited by an RF generator to bombard a titanium target and an aluminum target. Preferably, the titanium target is bombarded at a power range from 27 to 33 kilowatts (kW) and the aluminum target from 9 to 11 kW, at a bias voltage from 216 to 264 volts (V), from 126° C. to 154° C., for 72 to 88 minutes, at 3.02 to 3.69 millitorr (mtorr). The power needed for bombarding the titanium target and the aluminum target may be supplied by two power supplies, such as two RF generators or two medium frequency (MF) generators. The base 1 is rotated around an axis outside the base at 1.8 to 2.2 revolutions per minute (rpm); and rotates on its own axis at 7.2 to 8.8 rpm. This PVD process provides argon gas in a range from 405 to 495 sccm, and nitrogen gas in a range from 135 to 165 sccm.

Accordingly, the colored device casing 10 of the present disclosure provides a desired color and metal texture. The chromaticity coordinate (L*, a*, b*) of the color layer 3 located above the base 1 and the bonding layer 2 in the smooth region is in the range from (51.55 to 52.55, 13.12 to 14.12, 6.27 to 7.27) according to the CIE LAB system.

Furthermore, a coating layer 4 can be optionally formed on the color layer 3, according to any of various suitable techniques known in the art.

The colored device casing 10 of the present disclosure can be applied to any suitable object or device, such as a notebook or a personal digital assistant (PDA). For example, a mobile phone including the colored device casing 10 shown in FIG. 1 exhibits color and metal texture as described above, and thus provides an enhanced appearance.

It is to be understood, however, that even though numerous characteristics and advantages of various embodiments have been set forth in the foregoing description, together with details of the structures and functions of the embodiments, the disclosure is illustrative only; and that changes may be made in detail, especially in matters of arrangement of parts within the principles of the invention to the full extent indicated by the broad general meaning of the terms in which the appended claims are expressed.

Claims

1. A colored device casing, comprising: a base, comprising a surface defining at least one smooth region;a color layer located over the smooth region of the base, the color layer comprising titanium, wherein the color layer comprises a value for L* in the range from 51.55 to 52.55, a value for a* in the range from 13.12 to 14.12 and a value for b* in the range from 6.27 to 7.27 according to the Commission Internationale del'Eclairage, (CIE) LAB system; anda bonding layer located between the base and the color layer providing adhesion therebetween.

2. The colored device casing of claim 1, wherein the base is metal, ceramic or glass.

3. The colored device casing of claim 1, wherein the bonding layer comprises chromium nitride.

4. The colored device casing of claim 1, wherein the color layer comprises an alloy of titanium and aluminum.

5. The colored device casing of claim 1, wherein a Vickers hardness of the colored device casing equals or exceeds 400 HV.

6. The colored device casing of claim 1, further comprising an optional coating layer located over the color layer.

7. A surface-treating method for fabricating a colored device casing, the method comprising: providing a base;forming a bonding layer covering the base; andforming a color layer covering the bonding layer by a first physical vapor deposition (PVD) process, wherein the color layer comprises a value for L* in the range from 51.55 to 52.55, a value for a* in the range from 13.12 to 14.12 and a value for b* in the range from 6.27 to 7.27 according to the Commission Internationale del'Eclairage, (CIE) LAB system.

8. The method of claim 7, wherein the base is metal, ceramic or glass.

9. The method of claim 7, wherein the first PVD process comprises a sputtering deposition by bombarding a titanium target and an aluminum target, the color layer comprises an alloy of titanium and aluminum, and the titanium target is bombarded at a power of from 27 to 33 kW in the first PVD process.

10. The method of claim 9, wherein the aluminum target is bombarded at a power of from 9 to 11 kW in the first PVD process.

11. The method of claim 7, wherein a bias voltage of the first PVD process is from 216 to 264 volts (V).

12. The method of claim 7, wherein a process temperature of the first PVD process is from 126° C. to 154° C.

13. The method of claim 7, wherein the first PVD process lasts from 72 to 88 minutes.

14. The method of claim 7, wherein a process pressure of the first PVD process is from 3.02 to 3.69 mtorr.

15. The method of claim 7, wherein the first PVD process comprises providing argon gas at 405 to 495 standard cubic centimeters per minute (sccm).

16. The method of claim 7, wherein the first PVD process comprises providing nitrogen gas at 135 to 165 sccm.

17. The method of claim 7, wherein the base revolves around an axis outside the base at 1.8 to 2.2 revolutions per minute (rpm) in the first PVD process.

18. The method of claim 7, wherein the base rotates on its own axis at 7.2 to 8.8 rpm in the first PVD process.

19. The method of claim 7, wherein formation of the bonding layer comprises a second PVD process by bombarding a chromium target, and the bonding layer comprises chromium nitride.

20. The method of claim 7, further comprising: forming an optional coating layer covering the color layer.