Claims
- 1. A method for polishing a rigid disk comprising the steps of:(a) providing a chemical mechanical polishing composition comprising water, and at least one hydroxylamine additive; (b) applying the chemical mechanical polishing composition to at least one surface of the rigid disk; and (c) removing at least a portion of a metal layer from the rigid disk by bringing a polishing pad into contact with the surface of the rigid disk and moving the pad in relation to the rigid disk to give a polished rigid disk wherein, colloidal silica is added to the chemical mechanical polishing composition, is embedded in the polishing pad, or both prior to removing the at least a portion of the metal layer from the rigid disk.
- 2. The method of claim 1 wherein the chemical mechanical polishing composition has a pH of from about 2.0 to about 5.0.
- 3. The method of claim 1 wherein the chemical mechanical polishing composition includes from about 0.01 to about 5.0 wt % hydroxylamine additive.
- 4. The method of claim 1 wherein the chemical mechanical polishing composition includes from about 0.5 wt % to about 25 wt % of colloidal silica.
- 5. The method of claim 1 wherein the chemical mechanical polishing composition includes from about 1.0 to about 6.0 wt % colloidal silica.
- 6. The method of claim 1 wherein the chemical mechanical polishing composition hydroxylamine additive is a hydroxylamine salt, hydroxylamine or combinations thereof.
- 7. The method of claim 6 wherein the chemical mechanical polishing composition hydroxylamine salt is hydroxylamine nitrate.
- 8. The method according to claim 1 wherein the colloidal silica is incorporated into the polishing pad.
- 9. The method of claim 1 wherein the colloidal silica is incorporated into the chemical mechanical polishing composition.
Parent Case Info
This is a divisional of application Ser. No. 09/425,473 filed Oct. 22, 1999 now U.S. Pat. No. 6,347,928.
US Referenced Citations (16)