characterised by the composition of the lapping agent

Industry

CPC
B24B37/044

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Parent Industries

BPERFORMING OPERATIONS TRANSPORTING B24Grinding technology B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS B24B37/00Lapping machines or devices Accessories

Current Industry

B24B37/044characterised by the composition of the lapping agent

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Polishing liquid
- Patent number 12,203,007
- Issue date Jan 21, 2025
- Hoya Corporation
- Hiroki Nakagawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Atmospheric plasma in wafer processing system optimization
- Patent number 12,198,935
- Issue date Jan 14, 2025
- Axus Technology, LLC
- Daniel Ray Trojan
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing agent for synthetic quartz glass substrate and method for...
- Patent number 12,173,193
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Mitsuhito Takahashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition and method for polysilicon CMP
- Patent number 12,157,834
- Issue date Dec 3, 2024
- CMC MATERIALS LLC
- Sarah Brosnan
- B24 - GRINDING POLISHING
Information Patent Grant
Multi-layered windows for use in chemical-mechanical planarization...
- Patent number 12,138,735
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Chung Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition
- Patent number 12,139,643
- Issue date Nov 12, 2024
- Fujimi Incorporated
- Yuichiro Nakagai
- B24 - GRINDING POLISHING
Information Patent Grant
Electrical cleaning tool for wafer polishing tool system
- Patent number 12,128,455
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Wen Liu
- B08 - CLEANING
Information Patent Grant
Platen rotation device
- Patent number 12,090,602
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Bruce Cho
- B24 - GRINDING POLISHING
Information Patent Grant
Face-up wafer electrochemical planarization apparatus
- Patent number 12,090,600
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Kevin H. Song
- B24 - GRINDING POLISHING
Information Patent Grant
High oxide film removal rate shallow trench (STI) chemical mechanic...
- Patent number 12,091,581
- Issue date Sep 17, 2024
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP slurry composition for polishing tungsten pattern wafer and met...
- Patent number 12,077,681
- Issue date Sep 3, 2024
- Samsung SDI Co., Ltd.
- Ji Ho Lee
- B24 - GRINDING POLISHING
Information Patent Grant
Ruthenium CMP chemistry based on halogenation
- Patent number 12,037,517
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry composition and method of poli...
- Patent number 12,024,651
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing apparatus
- Patent number 12,020,946
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ld.
- Yu-Ping Tseng
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for chemical mechanical polishing and forming interconnect...
- Patent number 12,002,684
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ji Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition, polishing method, and method for producing s...
- Patent number 11,992,914
- Issue date May 28, 2024
- Fujimi Incorporated
- I-Chun Chang
- B24 - GRINDING POLISHING
Information Patent Grant
CMP system and method of use
- Patent number 11,984,323
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Chien Hou
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition and method for producing same
- Patent number 11,976,220
- Issue date May 7, 2024
- FUJIMI INCORPORATED
- Kohsuke Tsuchiya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of reducing semiconductor substrate surface unevenness
- Patent number 11,901,186
- Issue date Feb 13, 2024
- Massachusetts Institute of Technology
- Li Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for polishing silicon substrate and polishing composition set
- Patent number 11,897,081
- Issue date Feb 13, 2024
- FUJIMI INCORPORATED
- Shinichiro Takami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of polishing silicon wafer
- Patent number 11,890,719
- Issue date Feb 6, 2024
- Sumco Corporation
- Shuhei Matsuda
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for polishing dielectric layer in forming semiconductor device
- Patent number 11,862,472
- Issue date Jan 2, 2024
- Yangtze Memory Technologies Co., Ltd.
- Xiaohong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard abrasive particle-free polishing of hard materials
- Patent number 11,820,918
- Issue date Nov 21, 2023
- Entegris, Inc.
- Rajiv K. Singh
- B24 - GRINDING POLISHING
Information Patent Grant
Ruthenium CMP chemistry based on halogenation
- Patent number 11,820,919
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Paul Abel
- B24 - GRINDING POLISHING
Information Patent Grant
Calcium carbonate slurry
- Patent number 11,806,836
- Issue date Nov 7, 2023
- Illumina, Inc.
- Robert Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing liquid composition for silicon oxide film
- Patent number 11,795,346
- Issue date Oct 24, 2023
- Kao Corporation
- Yohei Uchida
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition and polishing method
- Patent number 11,781,039
- Issue date Oct 10, 2023
- FUJIMI INCORPORATED
- Tomoaki Ishibashi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing liquid, polishing liquid set, and polishing method
- Patent number 11,767,448
- Issue date Sep 26, 2023
- Resonac Corporation
- Takaaki Matsumoto
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing compositions and methods of use thereof
- Patent number 11,732,157
- Issue date Aug 22, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Yannan Liang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization composition for polishing oxide m...
- Patent number 11,718,767
- Issue date Aug 8, 2023
- VERSUM MATERIALS US, LLC
- Ming-Shih Tsai
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION, MANUFACTURING METHOD FOR SEMICONDUCTOR ELEMENT, AND CL...
- Publication number 20250017209
- Publication date Jan 16, 2025
- FUJIFILM CORPORATION
- Tadashi INABA
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR PREVENTING...
- Publication number 20250019567
- Publication date Jan 16, 2025
- Yi Guo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FACE-UP WAFER ELECTROCHEMICAL PLANARIZATION APPARATUS
- Publication number 20250001547
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Kevin H. Song
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING COMPOSITION
- Publication number 20240400862
- Publication date Dec 5, 2024
- Fujimi Incorporated
- Yoshio MORI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING LIQUID, POLISHING METHOD, COMPONENT MANUFACTURING METHOD,...
- Publication number 20240392162
- Publication date Nov 28, 2024
- Resonac Corporation
- Shogo ARATA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING COMPOSITION
- Publication number 20240392164
- Publication date Nov 28, 2024
- Fujimi Incorporated
- Yoshio MORI
- B24 - GRINDING POLISHING
Information Patent Application
MULTI-LAYERED WINDOWS FOR USE IN CHEMICAL-MECHANICAL PLANARIZATION...
- Publication number 20240383095
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Chung Chen
- B24 - GRINDING POLISHING
Information Patent Application
VACUUM ASSEMBLY FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20240383100
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chen Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR SLURRY QUALITY MONITORING
- Publication number 20240375238
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-CHIANG TSENG
- B24 - GRINDING POLISHING
Information Patent Application
PLATEN ROTATION DEVICE
- Publication number 20240367286
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bruce CHO
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING LIQUID AND POLISHING METHOD
- Publication number 20240368428
- Publication date Nov 7, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B24 - GRINDING POLISHING
Information Patent Application
ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM
- Publication number 20240367202
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wen Liu
- B24 - GRINDING POLISHING
Information Patent Application
Methods of Forming an Abrasive Slurry and Methods for Chemical-Mech...
- Publication number 20240342856
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Mu You
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP AND POLISHIN...
- Publication number 20240336810
- Publication date Oct 10, 2024
- Resonac Corporation
- Yasushi KURATA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHI...
- Publication number 20240336809
- Publication date Oct 10, 2024
- Resonac Corporation
- Yasushi KURATA
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...
- Publication number 20240327677
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hung Liao
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS
- Publication number 20240304455
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing, Ltd.
- Yu-Ping TSENG
- B24 - GRINDING POLISHING
Information Patent Application
MANUFACTURING METHOD FOR MANUFACTURING SUBSTRATE OF NITRIDE CRYSTAL...
- Publication number 20240293912
- Publication date Sep 5, 2024
- KYOCERA CORPORATION
- Mari YOSHIMORI HIGUCHI
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS FOR CHEMICAL MECHANICAL POLISHING AND FORMING INTERCONNECT...
- Publication number 20240290629
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- JI CUI
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND CHEMICAL MECHANICAL POL...
- Publication number 20240278383
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Hwiyoung Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP System and Method of Use
- Publication number 20240274440
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Te-Chien Hou
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURIN...
- Publication number 20240254366
- Publication date Aug 1, 2024
- Fujimi Incorporated
- Haruka ASANO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID AND POLISHING METHOD
- Publication number 20240228830
- Publication date Jul 11, 2024
- Showa Denko Materials Co., Ltd.
- Hiroshi ONO
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING AND METHOD OF PO...
- Publication number 20240218251
- Publication date Jul 4, 2024
- SK enpulse Co., Ltd.
- Seung Chul HONG
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING COMPOSITION
- Publication number 20240199915
- Publication date Jun 20, 2024
- Yuichiro Nakagai
- B24 - GRINDING POLISHING
Information Patent Application
CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN AND METHOD OF POLISHI...
- Publication number 20240174890
- Publication date May 30, 2024
- Samsung SDI Co., Ltd.
- Keun Sam JANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TITANIUM DIOXIDE CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR POLI...
- Publication number 20240174891
- Publication date May 30, 2024
- Entegris, Inc.
- Cheng-Yuan KO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVELY CHARGED ABRASIVE WITH NEGATIVELY CHARGED IONIC OXIDIZER...
- Publication number 20240150614
- Publication date May 9, 2024
- Entegris, Inc.
- Tsuyoshi MASUDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME
- Publication number 20240124744
- Publication date Apr 18, 2024
- Hooi-Sung KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION
- Publication number 20240117219
- Publication date Apr 11, 2024
- Fujimi Incorporated
- Yasuaki ITO
- B24 - GRINDING POLISHING

characterised by the composition of the lapping agent

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Polishing liquid

Atmospheric plasma in wafer processing system optimization

Polishing agent for synthetic quartz glass substrate and method for...

Composition and method for polysilicon CMP

Multi-layered windows for use in chemical-mechanical planarization...

Polishing composition

Electrical cleaning tool for wafer polishing tool system

Platen rotation device

Face-up wafer electrochemical planarization apparatus

High oxide film removal rate shallow trench (STI) chemical mechanic...

CMP slurry composition for polishing tungsten pattern wafer and met...

Ruthenium CMP chemistry based on halogenation

Chemical mechanical polishing slurry composition and method of poli...

Chemical mechanical polishing apparatus

Methods for chemical mechanical polishing and forming interconnect...

Polishing composition, polishing method, and method for producing s...

CMP system and method of use

Polishing composition and method for producing same

Method of reducing semiconductor substrate surface unevenness

Method for polishing silicon substrate and polishing composition set

Method of polishing silicon wafer

Methods for polishing dielectric layer in forming semiconductor device

Hard abrasive particle-free polishing of hard materials

Ruthenium CMP chemistry based on halogenation

Calcium carbonate slurry

Polishing liquid composition for silicon oxide film

Polishing composition and polishing method

Polishing liquid, polishing liquid set, and polishing method

Polishing compositions and methods of use thereof

Chemical mechanical planarization composition for polishing oxide m...

Patents Applicationslast 30 patents

COMPOSITION, MANUFACTURING METHOD FOR SEMICONDUCTOR ELEMENT, AND CL...

CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR PREVENTING...

FACE-UP WAFER ELECTROCHEMICAL PLANARIZATION APPARATUS

POLISHING COMPOSITION

POLISHING LIQUID, POLISHING METHOD, COMPONENT MANUFACTURING METHOD,...

POLISHING COMPOSITION

MULTI-LAYERED WINDOWS FOR USE IN CHEMICAL-MECHANICAL PLANARIZATION...

VACUUM ASSEMBLY FOR CHEMICAL MECHANICAL POLISHING

METHOD AND SYSTEM FOR SLURRY QUALITY MONITORING

PLATEN ROTATION DEVICE

POLISHING LIQUID AND POLISHING METHOD

ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM

Methods of Forming an Abrasive Slurry and Methods for Chemical-Mech...

POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP AND POLISHIN...

POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHI...

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLI...

CHEMICAL MECHANICAL POLISHING APPARATUS

MANUFACTURING METHOD FOR MANUFACTURING SUBSTRATE OF NITRIDE CRYSTAL...

METHODS FOR CHEMICAL MECHANICAL POLISHING AND FORMING INTERCONNECT...

CHEMICAL MECHANICAL POLISHING APPARATUS AND CHEMICAL MECHANICAL POL...

CMP System and Method of Use

POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURIN...

POLISHING LIQUID AND POLISHING METHOD

POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING AND METHOD OF PO...

POLISHING COMPOSITION

CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN AND METHOD OF POLISHI...

TITANIUM DIOXIDE CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR POLI...

POSITIVELY CHARGED ABRASIVE WITH NEGATIVELY CHARGED IONIC OXIDIZER...

POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

POLISHING COMPOSITION