Claims
- 1. A conductive pattern incorporated in a multilayered substrate made of glass-ceramic and to be baked together with the multilayered substrate, the conductive pattern including Ag as a main component, Cr and/or Cr compound, and Mn and/or Mn compound, and Al and/or Al compound.
- 2. The conductive pattern as claimed in claim 1, wherein Cr and/or Cr compound content calculated based on Cr2O3 is 0.1-2.0 mass % relative to Ag.
- 3. The conductive pattern as claimed in claim 1, wherein Mn and/or Mn compound content calculated based on MnO2 is 0.1-5.0 mass % relative to Ag.
- 4. The conductive pattern as claimed in claim 1, wherein the Al and/or Al compound content calculated based on Al2O3 is 0.1-1.0 mass % relative to Ag.
- 5. The conductive pattern as claimed in claim 1, wherein the conductive pattern is a capacitor electrode.
- 6. A multilayered substrate having a multilayered unit including a plurality of substrates made of glass-ceramic and conductive patterns incorporated in the multilayered unit and baked together with the multilayered unit, the conductive pattern including Ag as a main component, Cr and/or Cr compound, and Mn and/or Mn compound, and Al and/or Al compound.
- 7. The multilayered substrate as claimed claim 6, wherein each of the substrates contains a glass component and a ceramic component so that the volume ratio between the glass component and the ceramic component contents is 50:50 to 80:20.
- 8. The multilayered substrate as claimed in claim 6, wherein each of the substrates contains a glass component including SiO2—RO—Al 2O3—B2O3 (where R is alkaline earth metal).
- 9. The multilayered substrate as claimed in claim 6, wherein each of the substrates contains a ceramic component including one or more components selected from the group consisting of Al2O3, TiO2, and TiO2 compound.
- 10. The multilayered substrate as claimed in claim 6, wherein the conductive patterns are capacitor electrodes.
- 11. A method for fabricating a multilayered substrate comprising:preparing a conductive composition including metal powder containing Ag at not less than 95 mass %, a sintering restrainer containing Cr and/or Cr compound, and Al and/or Al compound, a dielectric loss conditioner containing Mn and/or Mn compound, and a vehicle; forming electrodes made of the conductive composition on a plurality of green sheets formed of a glass-ceramic; laminating the plurality of green sheets on which the electrodes are formed to form a laminated product; and, sintering the laminated product.
- 12. The method for fabricating a multilayered substrate as claimed in claim 11, wherein Cr and/or Cr compound content calculated based on Cr2O3 is 0.1-2.0 mass % relative to metal powder.
- 13. The method for fabricating a multilayered substrate as claimed in claim 11, wherein Mn and/or Mn compound content calculated based on MnO2 is 0.1-5.0 mass % relative to metal powder.
- 14. The method for fabricating a multilayered substrate as claimed in claim 11, wherein the Al and/or Al compound content calculated based on Al2O3 is 0.1-1.0 mass % relative to metal powder.
- 15. The method for fabricating a multilayered substrate as claimed in claim 11, wherein the metal powder has an average grain size of 0.1μm-10μm.
- 16. The method for fabricating a multilayered substrate as claimed in claim 11, wherein the sintering step is performed at a temperature of 750° C.-940° C.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2000-0200003 |
Jan 2000 |
JP |
|
RELATED APPLICATIONS
This application claims the priority of PCT/JP01/00380, filed Jan. 22, 2001, which designated the United States of America; PCT/JP01/00380 was published in the Japanese language as WO 01/56047, Aug. 2, 2001.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
PCT/JP01/00380 |
|
WO |
00 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO01/56047 |
8/2/2001 |
WO |
A |
US Referenced Citations (7)
Foreign Referenced Citations (4)
Number |
Date |
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05041110 |
Feb 1993 |
JP |
05047209 |
Feb 1993 |
JP |
06020516 |
Jan 1994 |
JP |
11021644 |
Jan 1999 |
JP |